• Title/Summary/Keyword: Cu target

Search Result 229, Processing Time 0.023 seconds

The fabrication and properties of ${YBa}_{2}{Cu}_{3}{O}_{7-x}$ thin films by laser ablation (레이저 어브레이션법에 의한 ${YBa}_{2}{Cu}_{3}{O}_{7-x}$ 박막의 제조와 특성)

  • 이덕출;최충석
    • The Transactions of the Korean Institute of Electrical Engineers
    • /
    • v.44 no.8
    • /
    • pp.1063-1067
    • /
    • 1995
  • The superconducting properties of YBa$_{2}$Cu$_{3}$$O_{7-x}$(YBaCuO) thin films prepared by laser ablation have been investigated. The x-ray diffraction patterns and surface morphology of the films were substantially different from one another. The compositional ratios of YBaCuO films were controlled by the conditions of the target-substrate distance. The YBaCuO films manufactured on MgO(100) substrate were indicated T$_{c}$(zero)=91.2 K, T$_{c}$(onset)=93 K, and J$_{c}$=3.5*10$^{5}$ A/cm$^{2}$(at 77.3K). The optimum conditions were found to be a substrate temperature of 710 .deg. C, a energy density of 2 J/cm$^{2}$, and a target-substrate distance of 60 mm in an oxygen partial pressure of 200 mTorr.0 mTorr.

  • PDF

Effects of Deposition Conditions on Properties of CuNi thin Films Fabricated by Co-Sputtering of Dual Targets (이중 타겟의 동시 스퍼터링을 이용한 CuNi 박막 제작시 증착변수가 박막의 물성에 미치는 영향)

  • Seo, Soo-Hyung;Lee, Jae-Yup;Park, Chang-Kyun;Park, Jin-Seok
    • The Transactions of the Korean Institute of Electrical Engineers C
    • /
    • v.50 no.1
    • /
    • pp.11-16
    • /
    • 2001
  • CuNi alloy films are deposited by co-sputtering of dual targets (Cu and Ni, respectively). Effects of the co-sputtering conditions, such as powers applied to the targets, deposition pressures, and substrate temperatures, on the structural and electrical properties of deposited films are systematically investigated. The composition ratio of Ni/Cu is almost linearly decreased by increasing the DC power applied to the Cu target from 25.6 W to 69.7 W with the RF power applied to the Ni target unchanged(140 W). it is noted that the chamber pressure during deposition and the film thickness give rise to a change of the Ni/Cu ratio within the films deposited. The former may be due to a higher sputtering yield of Cu atom and the latter due to the re-sputtering phenomenon of Cu atoms on the surface of deposited film. The film deposited at higher pressures or at lower substrate temperatures have a smaller crystallite size, a higher electrical resistivity, and much more voids. This may be attributed to a lower surface mobility of sputtered atoms over the substrate.

  • PDF

Deposition of copper oxide by reactive magnetron sputtering

  • Lee, Jun-Ho;Lee, Chi-Yeong;Lee, Jae-Gap
    • Proceedings of the Materials Research Society of Korea Conference
    • /
    • 2010.05a
    • /
    • pp.49.2-49.2
    • /
    • 2010
  • Copper oxide films have been deposited on silicon substrates by direct current magnetron sputtering of Cu in O2 / Ar gas mixtures. The target oxidation occurring as a result of either adsorption or ion-plating of reactive gases to the target has a direct effect on the discharge current and the resulting composition of the deposited films. The kinetic model which relates the target oxidation to the discharge current was proposed, showing the one-to-one relationship between discharge current characteristics and film stoichiometry of the deposited films.

  • PDF

Fabrication of High-Tc Superconducting $YBa_2Cu_3O_{7-x}$ Thin Films by Off-Axis RF Magnetron Sputtering (Off-Axis RF 마그네트론 스퍼터링에 의한 $YBa_2Cu_3O_{7-x}$ 고온 초전도 박막의 제조)

  • 성건용;서정대;강광용;장순호
    • Journal of the Korean Ceramic Society
    • /
    • v.28 no.3
    • /
    • pp.243-251
    • /
    • 1991
  • High-Tc YBa2Cu3O7-x superconducting thin films have been prepared by single-target off-axis RF magnetron sputtering. Optimal ratio of Y : Ba : Cu of the single-target was determined as 1 : 1.65 : 3.35 in order to obtain the stoichiometric films. Tc, crystalline phase, and microstructures of the surface and cross-section of the ex-situ YBa2Cu3O7-x thin films on MgO(100) had a Tc, zero of 80K, and the films on LaAlO3/Si had a Tc, on-set of 90 K and a Tc, zero of 70 K.

  • PDF

Effect of Copper Content on the Microstructural Properties of Mo-Cu-N Films (Copper 함량에 따른 Mo-Cu-N 박막의 미세구조 변화에 대한 연구)

  • Shin, Jung-Ho;Choi, Kwang-Soo;Wang, Qi-Min;Kim, Kwang-Ho
    • Journal of Surface Science and Engineering
    • /
    • v.43 no.6
    • /
    • pp.266-271
    • /
    • 2010
  • Ternary Mo-Cu-N films were deposited on Si wafer substrates with various copper contents by magnetron sputtering method using Mo target and Cu target in $Ar/N_2$ gaseous atmosphere. As increasing $N_2$ pressure, the microstructure of Mo-N films changed from ${\gamma}-Mo_2N$ of (111) having face-centered-cubic (FCC) structure to $\delta$-MoN of (200) having hexagonal structure. Detailed the microstructures of the Mo-Cu-N coatings were studied by X-ray diffraction, scanning electron microscopy and field emission transmission electron microscope. The results indicated that the incorporation of copper into the growing Mo-N coating led to the $Mo_2N$ and MoN crystallites were more well-distributed and refined and the copper existed in grain boundary. Ternary Mo-Cu-N films had a composite microstructure of the nanosized crystal crystalline ${\gamma}-Mo_2N$ and $\delta$-MoN surrounded by amorphous $Cu_3N$ phase.

Factors affecting passivation of Cu(Mg) alloy film (Cu(Mg) alloy의 산화방지막 형성에 영향을 미치는 인자)

  • 조흥렬;조범석;이원희;이재갑
    • Journal of the Korean Vacuum Society
    • /
    • v.9 no.2
    • /
    • pp.144-149
    • /
    • 2000
  • Variables affecting the passivation capability of Cu(Mg) alloy films, which were sputter deposited from a Cu (4.5 at. %) target, have been investigated. The results show that the passivation capability of a Cu(Mg) alloy film is a function of annealing temperature, $O_2$ pressure, and Mg content in the film. Increasing the annealing temperature up to $500^{\circ}C$ favors formation of a dense MgO layer on the surface which has a growth limited thickness of 150 $\AA$. Decreasing the $O_2$ pressure enhances the preferential oxidation of Mg over Cu. Furthermore, increasing the Mg content in the Cu(Mg) film promotes formation of a dense MgO layer. Vacuum pre-annealing was found to be very effective in segregating Mg to the surface, facilitating the passivation capability of the Cu(Mg) alloy film even when the Mg content is low. In the current study, self-aligned MgO layers with low resistivity and an effective passivation capability over the Cu surface, have been obtained by manipulating these factors when Cu(Mg) thin films are annealed.

  • PDF

Modality of Heavy Metal Contamination of Soil in Military Rifle Shooting Range (소화기 사격장의 중금속 오염 양상)

  • Lee, Kwang-Lyeol;Hyun, Jae-Hyuk
    • Journal of Soil and Groundwater Environment
    • /
    • v.21 no.3
    • /
    • pp.58-63
    • /
    • 2016
  • The study examined the level of heavy metal contamination by dividing military rifle shooting ranges into the three areas, i.e firing, trajectory, and target. The target area was found to be contaminated at a level higher (Cu 845 mg/kg, Pb 30,487 mg/kg) than the Worrisome Level of Soil Contamination (hereinafter referred to as the “Worrisome Level”) The trajectory area was predicted to be free from contamination, but it did indicate contamination although it was pretty much lower (Cu 23 mg/kg, Pb 99 mg/kg) than Worrisome Level. This is attributed to the contamination spread when rearranging the soil of the target area during the maintenance of the shooting range. The firing area was also predicted to be free from heavy metal contamination, but the results analyzed indicated a contamination higher (Cu 201 mg/kg, Pb 2,286 mg/kg) than Worrisome Level. This is attributed to the fragments of the broken bullet scattering due to the pressure generated as the bullet leaves the muzzle. An examination of heavy metal contamination in the discharge area as well as gutters to prevent the intrusion of rain water from perimeter revealed a high level of contamination (Cu 298 mg/kg, Pb 6,497 mg/kg), which makes it necessary to take measures.

Effect of Laser Shot Number on the Surface Particle Density of $YBa_2Cu_3O_{7-x}$ Thin Films by Pulsed Laser Deposition (펄스레이저 입사수에 따른 $YBa_2Cu_3O_{7-x}$박막의 표면입자밀도 변화)

  • 서정대;성건용
    • Journal of the Korean Ceramic Society
    • /
    • v.31 no.3
    • /
    • pp.312-320
    • /
    • 1994
  • Effect of the laser shot number on the particulates density of the pulsed laser deposited YBa2Cu3O7-x thin films and the laser irradiated surface morphology of the YBa2Cu3O7-x bulk target have been investigated. Until 100 laser shots of cumulative irradiation, the films has the particulates density of ~103 mm-2. However, after 100 laser shots, the density was increased more than 10 times. This results has been explained by the change of particulate ejection path with the development of conical structure at the target surface.

  • PDF

The properties of$Y_1Ba_2Cu_3O_{7-x}$ superconducting thin films deposited by 'off-axis' pulsed laser deposition (Off-axis'레이저 기법에 의한 고온 초전도 $Y_1Ba_2Cu_3O_{7-x}$박막의 특성)

  • 문병무
    • Electrical & Electronic Materials
    • /
    • v.8 no.3
    • /
    • pp.285-290
    • /
    • 1995
  • High quality $Y_{1}$Ba$_{2}$Cu$_{3}$$O_{7-x}$ thin films have been fabricated by pulsed Nd:YAG laser deposition using an unusual 'off-axis' target-substrate geometry. Various properties of superconducting $Y_{1}$Ba$_{2}$Cu$_{3}$$O_{7-x}$ thin films have been studied systematically as a function of oxygen pressure during the deposition, in both 'on-axis' and the unusual 'off-axis' target substrate geometries. In the 'off-axis' geometry, one can completely eliminate the so-called 'laser droplets' from the film surface and thus obtain smooth high quality films. It is found that films with optimum structural and electrical properties are obtained at a lower oxygen pressure range during the 'off-axis' deposition when compared with that required in the 'on-axis' deposition geometry.

  • PDF