• 제목/요약/키워드: Crystal nucleation and growth

검색결과 168건 처리시간 0.026초

Crystal Growing of NaX type Zeolite

  • Ha, Jong-Pil;Seo, Dong-Nam;Kim, Seong-Yong;Jung, Mi-Jeong;Moon, In-Ho;Cho, Sang-Joon;Park, Hyun-Min;Kim, Ik-Jin
    • 한국결정성장학회:학술대회논문집
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    • 한국결정성장학회 1999년도 PROCEEDINGS OF 99 INTERNATIONAL CONFERENCE OF THE KACG AND 6TH KOREA·JAPAN EMG SYMPOSIUM (ELECTRONIC MATERIALS GROWTH SYMPOSIUM), HANYANG UNIVERSITY, SEOUL, 06월 09일 JUNE 1999
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    • pp.351-360
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    • 1999
  • A large NaX type zeolite crystal of a uniform particle size of 20${\mu}{\textrm}{m}$ are grown with various H2O content by hydrothermal reaction and added seed crystal (2~3 ${\mu}{\textrm}{m}$) to reactant solution as a function of different adding seed levels from 3 to 15 %. The result that increased purity of NaX zeolite above 95% and homogeneity of crystal size by increasing adding seed levels, also decreased crystallization time. It was explained that adding seed to synthesis solution leaded out increase of surface area of physical contact reaction and directed growth of seed crystal, so more rapid consumption of reaction gel as increase seeding levels.

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LI$_2$O-Al$_2$O$_3$-SiO$_2$계 유리의 catalytic crystallization에 미치는 열처리 효과 (The effect of heat treatment on catalytic crystallization in Li$_2$O-Al$_2$O$_3$-SiO$_2$ glass system)

  • 박원규;이채현
    • 한국결정성장학회지
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    • 제6권2호
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    • pp.275-285
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    • 1996
  • The effect of heat-treatment on catalytic crystallization in $LI_2O-Al_2O_3-SiO_2$ glass system over its glass transition temperature was investigated. Glass composition $4Li_2O{cdot}22AL_2O_3{cdot}66SiO_2{cdot}2TiO_2{cdot}2.5ZrO_2{cdot}1.5P_2O_5{cdot}1.0Na_2O{cdot}1.0As_2O_3$ (wt%) was selected and heat-treated at different heating conditions to obtain transparent glass-ceramic. Nucleation and crystallization behaviour of this composition were estimated by differential thermal analysis (DTA) and X-ray diffractometer (XRD) and its thermal expansion coefficients were measured by Dilatometer. As a result, glass transition temperature was $730^{\circ}C$ and two maximum nucleation temperatures were estimated at $730^{\circ}C$ and 82$0^{\circ}C$ using JMA(Johson-Mehl-Avrami) equation by DTA. $ZrTiO_4$ $\beta$-Quartz solid solution and $\beta$-Spodumene crystals were identified by XRD. The optimum crystallization temperature was 92$0^{\circ}C$ and three step heating schedule was expected to be useful to obtain transparent glass-ceramic.

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미립 코발트분말 합성을 위한 polyol공정에서 비균질계 핵생성 반응 (Heterogeneous nucleations in the polyol process for the preparation of fine cobalt particles)

  • 김동진;정헌생;우상덕;이재장;안종관
    • 한국결정성장학회지
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    • 제12권2호
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    • pp.73-79
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    • 2002
  • 코발트, 니켈, 구리 그리고 귀금속분말에 적용할 수 있는 polyol법은 균질한 크기와 형상을 갖는 금속분말합성에 매우 효과적인 공정이다 이 때 polyol은 용매, 환원제 그리고 보호제의 역학을 한다 $AgNO_3$글 촉매제로 첨가하여 비균질계 핵생성 반응을 야기할 경우 서브마이크폰 크기(0.5$\mu$m)의 코발트 분말을 한성학 수 있었다. 또한 촉매제인 Ag 핵의 수출 변화시키므로써 코발트 분말의 입도를 제어할 수 있음을 확인하였다.

Crystallization in Li$_2$O-A1$_2$O$_3$-SiO$_2$ Glass induced by 355 nm Nd:YAG Laser Irradiation

  • Lee, Yong-Su;Kang, Won-Ho
    • 마이크로전자및패키징학회지
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    • 제7권2호
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    • pp.43-46
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    • 2000
  • Nd:YAG laser of 355 nm wavelength, which amounts to 3.5 eV, produced by a harmonic generator was used to create Ag metallic particles as seeds for nucleation in photosensitive glass containing $Ag^+$ and $Ce^{3+}$ . The pulse widths and frequency of the laser were 8ns and 10 Hz, respectively. For crystalline growth, heat-treatment following laser irradiation was carried out at $570^{\circ}C$ for 1h. Then, the $LiAlSi_3O^8$ crystal phase appeared in the laser irradiated lithium aluminum silicate glass. We present the effect of laser-induced nucleation compared with spontaneous nucleation by heat treatment fur crystallization in the glass.

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Crystallization in Li20-A1203-Si02 Glass induced by 355nm Nd:YAG Laser Irradiation

  • Lee, Yong-Su;Kang, Won-Ho;Song, Sun-Dal
    • 한국마이크로전자및패키징학회:학술대회논문집
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    • 한국마이크로전자및패키징학회 2000년도 Proceedings of 5th International Joint Symposium on Microeletronics and Packaging
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    • pp.112-117
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    • 2000
  • Nd:YAG laser of 355nm wavelength, which amounts to 3.5eV, produced by a harmonic generator was used to create Ag metallic particles as seeds for nucleation in photosensitive glass containing Ag+ and Ce3+. The pulse widths and frequency of the laser were 8ns and 10Hz, respectively. For crystalline growth, heat-treatment following laser irradiation was carried out at $570^{\circ}C$ fur 1h. Then, the LiAlSi3O8. crystal phase appeared in the laser irradiated lithium aluminum silicate glass. We present the effect of laser-induced nucleation compared with spontaneous nucleation by heat treatment for crystallization in the glass.

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적외선 반사체용 결정화유리 제조 및 광학적 특성평가 (Fabrication and Optical Characterization of Glass-ceramics for IR Reflector)

  • 박규한;신동욱;변우봉
    • 한국세라믹학회지
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    • 제38권12호
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    • pp.1137-1143
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    • 2001
  • 본 연구에서는 적외선 반사체 제조를 위하여 MAS(MgO-Al$_2$O$_3$-SiO$_2$)계 유리로부터 핵행성 및 결정성장의 2단계 열처리에 의해 cordierite(2MgO.2Al$_2$O$_3$5SiO$_2$)와 rutile(TiO$_2$)을 주결정상으로 하는 결정화유리를 제조하였다. MgO-Al$_2$O$_3$-SiO$_2$3성분계 조성에 조핵제로 TiO$_2$를 첨가하여 용융법으로 유리를 제조한 후 결정화 열처리를 하여 핵생성 및 결정화 거동과 결정화유리의 결정상, 입자 크기와 확산 반사율과의 관계를 관찰하였다. 그 결과 75$0^{\circ}C$에서 3시간동안 핵생성 시킨 후 110$0^{\circ}C$/5hr 이상의 열처리 조건에서 cordierite와 rutile이 주결정상으로 석출되었으며 570~2500nm 범위에서 90% 이상의 반사율을 갖는 결정화유리를 제조하였다.

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용매열합성법을 통한 단분산된 ZnGa2O4 구형 입자의 제조 및 특성 (Facile synthesis and characteristics of monodispersed ZnGa2O4 microsphere via solvothermal method)

  • 우무현;강봉균;윤대호
    • 한국결정성장학회지
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    • 제26권3호
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    • pp.109-114
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    • 2016
  • 용매열합성법과 하소 과정으로 이루어진 두 단계 공정을 통해 단분산된 마이크로 크기의 구형 $ZnGa_2O_4$ 입자를 합성하였다. 합성된 3차원 구조의 구형 $ZnGa_2O_4$ 입자는 핵 생성과정에서 발생된 $ZnGa_2O_4$ 핵들이 자기 조립에 의해 형성된다. 이렇게 3차원 구조의 입자를 형성하는 원리인 '핵 성성'과 '자기 조립' 과정은 계면활성제인 PEG(polyethylene glycol)의 영향을 받는다. 그 이유는 계면활성제인 PEG의 농도가 임계응집농도(critical aggregation concentration)를 결정짓기 때문이다. 그리고 $ZnGa_2O_4$ 단상 합성을 위해 원료인 zinc acetate의 양을 조절했으며, 최적의 하소 조건을 결정하고자 TG-DTA를 통해 열적 거동을 확인했다. 또한 열처리 전 모체와 $900^{\circ}C$에서 1시간의 열처리 과정을 거친 산화물을 구성하는 작용기의 변화를 규명하기 위해 FT-IR을 측정하였다.

Microwave plasma CVD에서 Ni 기판에 다이아몬드 박막 증착 (Diamond thin film deposition on Ni in microwave plasma CVD)

  • 김진곤;류수착;조현
    • 한국결정성장학회지
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    • 제12권6호
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    • pp.311-316
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    • 2002
  • 2-step 증착법과 Bias-Enhanced Nucleation(BEN)법을 이용해 다결정 Ni 기판에 고품질의 다이아몬드 박막 합성을 연구하였다. $810^{\circ}C$에서 1시간 증착하여 soot충을 형성시킨 후 기판온도를 soot층의 형성이 억제되는 온도인 $925^{\circ}C$로 올려 5시간 증착하는 2-step법을 통해 고품질의 다이아몬드를 합성할 수 있었다. 또한, $925^{\circ}C$에서 -220V의 bias를 10분 동안 기판에 인가한 후 2시간 동안 증착하는 BEN법을 이용해 양질의 다이아몬드를 합성할 수 있었다. $925^{\circ}C$에서 bias 처리를 하지 않은 경우에는 10시간 동안 증착을 시도한 후에도 다이아몬드가 생성되지 않았다.

Metalorganic chemical vapor deposition of semiconducting ZnO thin films and nanostructures

  • Kim Sang-Woo
    • 한국결정성장학회지
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    • 제16권1호
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    • pp.12-19
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    • 2006
  • Metalorganic chemical vapor deposition (MOCYD) techniques have been applied to fabricate semiconducting ZnO thin films and nanostructures, which are promising for novel optoelectronic device applications using their unique multifunctional properties. The growth and characterization of ZnO thin films on Si and $SiO_2$ substrates by MOCYD as fundamental study to realize ZnO nanostructures was carried out. The precise control of initial nucleation processes was found to be a key issue for realizing high quality epitaxial layers on the substrates. In addition, fabrication and characterization of ZnO nanodots with low-dimensional characteristics have been investigated to establish nanostructure blocks for ZnO-based nanoscale device application. Systematic realization of self- and artificially-controlled ZnO nanodots on $SiO_2/Si$ substrates was proposed and successfully demonstrated utilizing MOCYD in addition with a focused ion beam technique.

Epitaxial Growth of $Y_2O_3$ films by Ion Beam Assisted Deposition

  • Whang, C.N.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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    • pp.26-26
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    • 2000
  • High quality epitaxial Y2O3 thin films were prepared on Si(111) and (001) substaretes by using ion beam assisted deposition. As a substrate, clean and chemically oxidized Si wafers were used and the effects of surface state on the film crystallinity were investigated. The crystalline quality of the films were estimated by x-ray scattering, rutherford backscattering spectroscopy/channeling, and high-resolution transmission electron microscopy (HRTEM). The interaction between Y and Si atoms interfere the nucleation of Y2O3 at the initial growth stage, it could be suppressed by the interface SiO2 layer. Therefore, SiO2 layer of the 4-6 layers, which have been known for hindering the crystal growth, could rather enhance the nucleation of the Y2O3 , and the high quality epitaxial film could be grown successfully. Electrical properties of Y2O3 films on Si(001) were measured by C-V and I-V, which revealed that the oxide trap charge density of the film was 1.8$\times$10-8C/$\textrm{cm}^2$ and the breakdown field strength was about 10MV/cm.

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