• Title/Summary/Keyword: Crystal impurity

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Hydrothermal Synthesis and Characterization of BaTiO3 Fine Powders (BaTiO3 미세 분말의 수열합성 및 특성분석)

  • Park, Jung-Hoon;Park, Sangdo
    • Korean Chemical Engineering Research
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    • v.45 no.5
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    • pp.448-454
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    • 2007
  • Hydrothermal synthesis was conducted with starting material as Barium hydroxide and hydrous titania ($TiO_2{\cdot}xH_2O$) to obtain barium titanate fine Powder. The conversion, crystal structure and properties of as-prepared powder were investigated according to reaction temperature, time and concentration. The effect of variables on conversion was in order of time < temperature < concentration and the maximum conversion reached to 99.5% in the case of hydrothermal synthesis at $180^{\circ}C$ for 2 h with 2.0 M reactant concentration. At low concentration such as 0.25 M, formation of unreacted $BaCO_3$ and $TiO_2$ was not inevitable at even high reaction temperature and these components converted into $BaTi_2O_5$ at high temperature and remained as impurity. As concentration of reactant increased, the size of as-synthesized $BaTiO_3$ powder deceased and Ba/Ti molar ratio approached into 1, showing Ba/Ti ratio of $1{\pm}0.005$ for reaction at $180^{\circ}C$ for 2 h with 2.0 M concentration.

a-Si:H/a-SiN:H 계면에서 각각 phosphorus로 도핑된 층이 TFT 이동도에 미치는 영향

  • Ji, Jeong-Hwan;Lee, Sang-Gwon;Kim, Byeong-Ju;Mun, Yeong-Sun;Choe, Si-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.254-254
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    • 2011
  • 현재 AMLCD(Active Matrix Liquid Crystal Display)는 노트북, 컴퓨터, TV등 여러 영상매체에 있어 가장 많이 활용되고 있는 디스플레이로 손꼽힌다. AMLCD에 구동소자로 사용되는 a-Si:H TFT는 낮은 제조비용과 축적된 기술을 바탕으로 가장 많이 쓰이고 있다. 특히 a-Si이 가지는 소형화나 대형화의 편의성은 모바일 기기, projection TV, 광고용 패널 등 적용분야가 점점 넓어지고 있는 추세이다. 하지만 a-Si라는 물질 자체가 가지는 낮은 이동도는 더 많은 application을 위해 해결되어야 할 과제이다. 낮은 이동도는 a-Si 실리콘 원자간 결합의 불규칙성 및 무질서와 dangling bond에 의한 localize state(deep trap, band tail)의 존재 때문에 발생하며 결과적으로 TFT 소자의 특성의 저하를 가져온다. 앞선 연구에서는 carrier이동도의 개선을 위해서 첫 번째로 insulator층과 active층 사이의 계면 상태를 향상시키기 위해 insulator로 쓰이는 a-SiN층 표면에 0~18 sccm의 유량으로 phosphorus를 주입하였다. AFM분석을 해본 결과 phosphorus를 주입함으로써 계면의 roughness가 줄어드는 것을 확인 할 수 있었다. 이러한 계면의 roughness 감소는 표면 산란(surface scattering)및 전자 포획(trap)의 영향을 줄임으로써 이동도의 향상을 가져왔다. 두 번째로 active층으로 쓰이는 a-Si:H 층의 표면에 phosphorus를 0?9sccm의 유량으로 doping하였다. 이로 인해 channel이 형성되는 active 영역에 직접적으로 불순물을 doping됨으로써 전도도를 증가되어 이동도를 향상시켰다. 하지만 지나친 doping은 불순물 산란(impurity scattering)의 증가로 인해 이동도를 저하시키는 결과를 보여 주었다. 본 연구에서는 TFT의 이동도 향상을 위해 두 가지의 technology를 함께 적용시켜 a-SiN/a-Si:H 계면 각각에 phosphorus를 주입 및 doping을 하였다. 모든 박막은 PECVD로 제작하였으며 각 박막의 두께는 a-SiN/a-SiN(phosphorus)/a-Si:H(doped)/a-Si:H/n+ a-Si($2350{\AA}/150{\AA}/150{\AA}/1850{\AA}/150{\AA}$)으로 고정하고 유량을 변화시키면서 특성을 관찰하였다.

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Properties of ZnO:Al Films Prepared by Spin Coating of Aged Precursor Solution

  • Shrestha, Shankar Prasad;Ghimire, Rishi;Nakarmi, Jeevan Jyoti;Kim, Young-Sung;Shrestha, Sabita;Park, Chong-Yun;Boo, Jin-Hyo
    • Bulletin of the Korean Chemical Society
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    • v.31 no.1
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    • pp.112-115
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    • 2010
  • Transparent conducting undoped and Al impurity doped ZnO films were deposited on glass substrate by spin coat technique using 24 days aged ZnO precursor solution with solution of ethanol and diethanolamine. The films were characterized by UV-Visible spectroscopy, X-ray diffraction (XRD), scanning electron microscope (SEM), electrical resistivity ($\rho$), carrier concentration (n), and hall mobility ($\mu$) measurements. XRD data show that the deposited film shows polycrystalline nature with hexagonal wurtzite structure with preferential orientation along (002) crystal plane. The SEM images show that surface morphology, porosity and grain sizes are affected by doping concentration. The Al doped samples show high transmittance and better resistivity. With increasing Al concentration only mild change in optical band gap is observed. Optical properties are not affected by aging of parent solution. A lowest resistivity ($8.5 \times 10^{-2}$ ohm cm) is observed at 2 atomic percent (at.%) Al. With further increase in Al concentration, the resistivity started to increase significantly. The decrease resistivity with increasing Al concentration can be attributed to increase in both carrier concentration and hall mobility.

A Study on the Electrical Characteristic of Organic Thin Film by Physical Vapor Deposition Method (진공증착법을 이용한 유기 박막의 전기적 특성에 관한 연구)

  • Park, Su-Hong
    • The Transactions of the Korean Institute of Electrical Engineers P
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    • v.57 no.2
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    • pp.140-145
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    • 2008
  • The purpose of this paper is to discuss the fabrication of $\beta$-PVDF($\beta$-Polyvinylidene fluoride, ${\beta}-PVF_2$) organic thin films using the vapor deposition method. Vapor deposition was performed under the following conditions: the temperature of evaporator, the applied electric field, and the pressure of reaction chamber were $270^{\circ}C$, 142.4 kV/cm, and $2.0{\times}10^{-5}\;Torr$, respectively. The molecular structure of the evaporated organic thin films were evaluated by a FT-IR. The results showed that the characteristic absorption peaks of $\beta$-form crystal increase from 72% to 95.5% with an increase in the substrate temperature. In the analysis of the electric characteristics, the abnormal increases in the relative dielectric constant and the dielectric loss factor in the regions of low frequency and high temperature are known to be caused by inclusion of impurity carriers in the PVDF organic thin films. In order to analyze quantitatively the abnormalities in the conductivity mechanism caused by ionic impurities, the product of the ion density and the mobility that affect the electrical property in polymeric insulators is analyzed. In the case of a specimen produced by varying the substrate temperature from $30^{\circ}C$ to $105^{\circ}C$, the product of mobility and the ion density decreased from $4.626{\times}10^8$ to $8.47{\times}10^7/V{\cdot}cm{\cdot}s$. This result suggests that the higher the substrate temperature is maintained, the better excluded the impurities are, and the more electrically stable material can be obtained.

The characteristics of AlW thin film for TFT-LCD bus line (TFT-LCD bus line을 위한 Al-W 박막 특성에 관한 연구)

  • Dong-Sik Kim;Chong Ho Yi;Kwan Soo Chung
    • Journal of the Korean Vacuum Society
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    • v.9 no.3
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    • pp.233-236
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    • 2000
  • The structural, electrical and chemical characteristics of Al alloy thin film with low impurity concentrations AlW deposited by using dc magnetron sputtering deposition are investigated for the applications as data bus line in the TFT-LCD panel. The deposited thin films show the decrease of resistivity and the increase of grain size after the RTA at $300^{\circ}C$ for 20 min.. Moreover, the resistivity of AlW does not show appreciable grain size dependence after RTA. It is concluded that the decrease of resistivity after RTA is due to the increase of grain size. The annealed AlW is found to be hillock free. And for investigating chemical attack in TFT-LCD etching processing the electric potential of AlW alloy for Ag/AgCl were investigated by cyclic voltammetry. When W wt.% of AlW alloy was higher than about 3%, the electric potential of AlW was more positive than ITO's. Therefore AlW alloy thin film can be propose to use for data bus line.

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The characteristics of AlNd thin film for TFT-LCD bus line (TFT-LCD bus line용 AlNd 박막 특성에 관한 연구)

  • Dong-Sik Kim;Sung Kwan Kwak;Kwan Soo Chung
    • Journal of the Korean Vacuum Society
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    • v.9 no.3
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    • pp.237-241
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    • 2000
  • The structural, electrical and etching characteristics of Al alloy thin film with low impurity concentrations AlNd deposited by using do magnetron sputtering deposition are investigated for the applications as gate bus line in the TFt-LCD panel. And ITO thin film was deposited on AlNd, then the contact resistance was measured by Kelvin resistor. The deposited thin films show the decrease of resistivity and the increase of grain size after the RTA at $300^{\circ}C$ for 20 min. Moreover, the resistivity of AlNd does not show appreciable grain size dependence after RTA. It is concluded that the decrease of resistivity after RTA is due to the increase of grain size. The annealed AlNd is found to be hillock free. The etching profiles of AlNd was good and the minimun contact resistance was about $110\;{\mu\Omega}cm$. Calculation results reveal that the AlNd (2wt.%) thin film can be applicable to 25" SXGA class TFT-LCD panels.

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Effects of Preparation Conditions in the Spray Pyrolysis on the Characteristics of Ca8Mg(SiO4)4Cl2:Eu2+ Phosphor (분무열분해 공정의 제조 조건이 Ca8Mg(SiO4)4Cl2:Eu2+ 형광체 특성에 미치는 영향)

  • Han, Jin-Man;Koo, Hye-Young;Lee, Sang-Ho;Kang, Yun-Chan
    • Korean Journal of Materials Research
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    • v.18 no.2
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    • pp.92-97
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    • 2008
  • In spray pyrolysis, the effects of the preparation temperature, flow rate of the carrier gas and concentration of the spray solution on characteristics such as the morphology, size, and emission intensity of $Ca_8Mg(SiO_4)_4Cl_2:Eu^{2+}$ phosphor powders under long-wavelength ultraviolet light were investigated. The phosphor powders obtained post-treatment had a range of micron sizes with regular morphologies. However, the composition, crystal structure and photoluminescence intensity of the phosphor powders were affected by the preparation conditions of the precursor powders. The $Ca_8Mg(SiO_4)_4Cl_2:Eu^{2+}$ phosphor powders prepared at temperatures that were lower and higher than $700^{\circ}C$ had low photoluminescence intensities due to deficiencies related to the of Cl component. The phosphor powders with the deficient Cl component had impurity peaks of $Ca_2SiO_4$. The optimum flow rates of the carrier gas in the preparation of the $Ca_8Mg(SiO_4)_4Cl_2:Eu^{2+}$ phosphor powders with high photoluminescence intensities and regular morphologies were between 40 and 60 l/minute. Phosphor powders prepared from a spray solution above 0.5 M had regular morphologies and high photoluminescence intensities.

Fabrication and Characterization of Spherical Carbon-Coated Li3V2(PO4)3 Cathode Material by Hydrothermal Method with Reducing Agent

  • Moon, Jung-In;Song, Jeong-Hwan
    • Korean Journal of Materials Research
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    • v.29 no.9
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    • pp.519-524
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    • 2019
  • Spherical $Li_3V_2(PO_4)_3$ (LVP) and carbon-coated LVP with a monoclinic phase for the cathode materials are synthesized by a hydrothermal method using $N_2H_4$ as the reducing agent and saccharose as the carbon source. The results show that single phase monoclinic LVP without impurity phases such as $LiV(P_2O_7)$, $Li(VO)(PO_4)$ and $Li_3(PO_4)$ can be obtained after calcination at $800^{\circ}C$ for 4 h. SEM and TEM images show that the particle sizes are $0.5{\sim}2{\mu}m$ and the thickness of the amorphous carbon layer is approximately 3~4 nm. CV curves for the test cell are recorded in the potential ranges of 3.0~4.3 V and 3.0~4.8 V at a scan rate of $0.01mV\;s^{-1}$ and at room temperature. At potentials between 3.0 and 4.8 V, the third $Li^+$ ions from the carbon-coated LVP can be completely extracted, at voltages close to 4.51 V. The carbon-coated LVP exhibits an initial specific discharge capacity of $118mAh\;g^{-1}$ in the voltage region of 3.0 to 4.3 V at a current rate of 0.2 C. The results indicate that the reducing agent and carbon source can affect the crystal structure and electrochemical properties of the cathode materials.

Dielectric and Electrical Characteristics of Lead-Free Complex Electronic Material: Ba0.8Ca0.2(Ti0.8Zr0.1Ce0.1)O3

  • Sahu, Manisha;Hajra, Sugato;Choudhary, Ram Naresh Prasad
    • Korean Journal of Materials Research
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    • v.29 no.8
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    • pp.469-476
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    • 2019
  • A lead-free bulk ceramic having a chemical formula $Ba_{0.8}Ca_{0.2}(Ti_{0.8}Zr_{0.1}Ce_{0.1})O_3$ (further termed as BCTZCO) is synthesized using mixed oxide route. The structural, dielectric, impedance, and conductivity properties, as well as the modulus of the synthesized sample are discussed in the present work. Analysis of X-ray diffraction data obtained at room temperature reveals the existence of some impurity phases. The natural surface morphology shows close packing of grains with few voids. Attempts have been made to study the (a) effect of microstructures containing grains, grain boundaries, and electrodes on impedance and capacitive characteristics, (b) relationship between properties and crystal structure, and (c) nature of the relaxation mechanism of the prepared samples. The relationship between the structure and physical properties is established. The frequency and temperature dependence of the dielectric properties reveal that this complex system has a high dielectric constant and low tangent loss. An analysis of impedance and related parameters illuminates the contributions of grains. The activation energy is determined for only the high temperature region in the temperature dependent AC conductivity graph. Deviation from the Debye behavior is seen in the Nyquist plot at different temperatures. The relaxation mechanism and the electrical transport properties in the sample are investigated with the help of various spectroscopic (i.e., dielectric, modulus, and impedance) techniques. This lead free sample will serve as a base for device engineering.

Optical properties of $ZnIn_2Se$ and $ZnIn_2Se_4$:Co single crystals ($ZnIn_2Se_4$$ZnIn_2Se_4$:Co 단결정의 광학적 특성)

  • 최성휴;방태환;박복남
    • Journal of the Korean Vacuum Society
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    • v.6 no.2
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    • pp.129-135
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    • 1997
  • Undoped and Co-doped $ZnIn_2Se_4$ single crystals crystallized in the tetragonal space group 142m, with lattice constants a=5.748 $\AA$ and c=11.475 $\AA$, and a=5.567 $\AA$ and c=11.401 $\AA$. The optical absorption measured near the fundamental band edge showed that the optical energy band structure of these compounds had an indirect band gap, the direct and the indirect energy gaps of these compounds decreased as temperature changed from 10 to 300 K. The temperature coefficients of the direct energy gaps were found to be $\alpha=3.71\times10^{-4}$eV/K and $\beta$=519 K for $\alpha=3.71\times10^{-4}$eV/K and $\beta$=421K for $ZnIn_2Se_4$: Co. The temperature coefficients of the indirect energy gaps were also found to be $\alpha=2.31\times10^{-4}$ eV/K and $\beta$=285 K for $ZnIn_2Se_4$, and $\alpha=3.71\times10^{-4}$eV/K and $\beta$=609 K for $ZnIn_2Se_4$:Co, respectively. Six impurity optical absorption peaks due to cobalt are observed in $ZnIn_2Se_4$:Co single crystal. These impurity optical absorption peaks can be attibuted to the electronic transitions between the split energy levels of$CO^{2+}$ ions located at Td symmetry site of $ZnIn_2Se_4$ host lattice. The 1st order spin-orbit coupling constant ($\lambda$), Racah parameter (B), and crystal field parameter (Dq) ARE GIVEN AS -$243\textrm{cm}^{-1}, 587\textrm{cm}^{-1}, \;and\;327\textrm{cm}^{-1}$, respectively.

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