• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2011년도 춘계학술대회 및 Fine pattern PCB 표면 처리 기술 워크샵
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• pp.33-35
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• 2011

Films of CrAlN and CrZrN were deposited on a steel substrate by closed field unbalanced magnetron sputtering, and their oxidation behaviors were investigated. CrAlN films consisted of dense, polycrystalline CrN and AlN fine columns. The formed oxides consisted primarily of crystalline $Cr_2O_3$ incorporated with $Al_2O_3$. The oxide layers were thin and compact so as to make CrAlN films more protective than CrN films. In case of CrZrN films, Zr atoms were dissolved in the CrN phase. Zr atoms advantageously refined the columnar structure, reduced the surface roughness, and increased the micro-hardness. However, the addition of Zr did not increased oxidation resistance, mainly because Zr was not a protective element. All the deposited films displayed relatively good oxidation resistance, owing to the formation of the highly protective $Cr_2O_3$ on their surface. The $Cr_{40}Zr_9N$ and $Cr_{31}Zr_{16}N$ films oxidized to $Cr_2O_3$ as the major phase and ${\alpha}-ZrO_2$ as the minor one, whereas the CrN film oxidized to $Cr_2O_3$.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.94-94
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• 2013

The Cr-Zr-N films have much improved mechanical properties and very smooth surface roughness. However, in spite of their outstanding properties, the Cr-Zr-N coatings revealed their mechanical properties deteriorated severely with increasing Zr content at $500^{\circ}C$ ecause of very rapid oxidation. Recently oxynitride films have been widely studied due to their excellent unique mechanical properties and oxidation resistance. In this work, CrZr-O-N films with various O contents were synthesized by unbalanced magnetron sputtering with Cr-Zr segment targets (Cr:Zr volume ratios is 1：1) and all films were prepared in a nitrogen rich mixture of N2 and O2. Characteristics such as crystalline structure, hardness and chemical composition as a function of the O content were investigated by X-ray diffraction (XRD), field emission scanning electron microscope (FE-SEM), microhardness testing system and energy dispersive spectroscopy (EDS). Results showed that the thin films had dense and compact microstructure as O content in the films increases. The microstructure of the thin films consisted of mainly crystalline Cr (Zr)N phase and Cr2O3 phase. The maximum hardness and elastic modulus of the films was measured to be approximately 33.2 GPa and 280.6 GPa from the films with low content of O elements. Detailed experimental results will be presented.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2012년도 춘계학술발표회 논문집
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• pp.167-168
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• 2012

Films of CrN, $Cr_{40}Zr_9N$, and $Cr_{31}Zr_{16}N$ were deposited on a steel substrate by closed field unbalanced magnetron sputtering, and their oxidation behaviors at $700^{\circ}C$ and $800^{\circ}C$ for up to 60h in air were investigated. All the deposited films were composed of the CrN phase. Zirconium atoms in $Cr_{40}Zr_9N$ and $Cr_{31}Zr_{16}N$ films partially dissolved in the CrN phase. They advantageously refined the columnar structure, reduced the surface roughness, and increased the microhardness. The CrN film displayed relatively good oxidation resistance, owing to the formation of the highly protective $Cr_2O_3$ on its surface. The $Cr_{40}Zr_9N$ and $Cr_{31}Zr_{16}N$ films oxidized to $Cr_2O_3$ as the major phase and ${\alpha}-ZrO_2$ as the minor one. They oxidized primarily by the inward transport of oxygen. The addition of Zr could not increase the oxidation resistance of the CrN film, because the formed $ZrO_2$ that was intermixed in the $Cr_2O_3$-rich oxide layer was oxygen permeable, and developed the compressive stress in the oxide scale owing to the volume expansion during its formation.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2011년도 춘계학술대회 및 Fine pattern PCB 표면 처리 기술 워크샵
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• pp.190-190
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• 2011

CrZrN 박막은 우수한 기계적 특성과 우수한 표면 조도특성을 가지고 있다. 본 연구에서는 CrZrN 박막에 Si를 첨가하여 CrZrN 박막의 부식 특성 향상을 알아보기 위하여 염수 분무 실험과 분극실험을 통하여 박막의 부식 특성을 평가하였다. Si의 함량이 증가함에 따라 부식 특성이 향상되는 것을 알 수 있었다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2011년도 춘계학술대회 및 Fine pattern PCB 표면 처리 기술 워크샵
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• pp.189-189
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• 2011

CrZrN 박막은 CrN 박막에 비해서 향상된 기계적 특성과 우수한 표면 조도특성을 가지고 있다. 그러나 $500^{\circ}C$ 이상에서 기계적 특성이 급격히 감소하는 현상이 알려져 있다. 본 연구에서는 CrZrN 박막에 Si를 첨가하여 Si 함량에 따른 고온에서의 기계적 특성을 CrZrN 박막과 비교하였다. $500^{\circ}C$에서 마모 실험한 결과 CrZrN 박막에 비하여 소량의 Si의 첨가만으로 고온에서의 마모 특성이 향상되는 것을 확인하였다. 이것은 Si 첨가에 따라 고온에서 안정한 비정질상의 형성 영향으로 판단된다.

• 한국결정성장학회지
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• 제31권1호
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• pp.37-42
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• 2021

화학적 조성이 TiZrN 박막의 구조적 특성 및 열적 특성에 미치는 영향을 조사하였다. 증착된 TixZr1-xN(x = 0.87, 0.82, 0.7, 0.6, 0.28) 박막에서 Zr 분율이 증가함에 따라 결정립 크기가 감소하고 주상 구조에서 입계상 구조로 점진적으로 변화하는 미세구조 변화가 관찰되었다. 또한 XRD 분석을 통해 Zr 분율이 0.4까지 증가할 때 TiN 상에서 TiZrN 상으로의 점진적인 결정상 전이가 일어났음을 확인하였다. 900℃ 온도에서의 열처리 이후 Ti0.82Zr0.18N과 Ti0.7Zr0.3N 박막은 rutile 상 TiO2와 TiZrO4 산화물이 공존하는 형태로 전환된 반면에 Ti0.6Zr0.4N 박막은 TiZrO4 산화물로 변화함을 확인하였다. 다섯 가지 조성의 TiZrN 박막 중에서 Ti0.6Zr0.4N 박막이 가장 우수한 고온 안정성을 나타내었고, Inconel 617 기판의 열산화에 의해 발생하는 Cr의 표면 확산을 억제하는 열산화 저항성 향상 효과가 가장 우수함을 확인하였다.