Stabilizing Properties of SiOF Film with Low Dielectric Constant by $N_2O$ Plasma Annealing
($N_2O$ 플라즈마 열처리에 의한 저유전율 SiOF 박막의 물성 안정화)
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- Korean Journal of Materials Research
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- v.8 no.4
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- pp.317-322
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- 1998