• Title/Summary/Keyword: Combinatorial RF sputtering

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Investigation of Al-Ag thin films for high-performance SAW devices with low insertion loss and high frequency selectivity

  • JaeCheol Park
    • Journal of Surface Science and Engineering
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    • v.57 no.5
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    • pp.379-385
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    • 2024
  • Al-Ag thin films with varying compositions were fabricated using a combinatorial sputtering system to develop highly sensitive SAW devices. The Al-Ag sample library exhibited a wide range of electrical resistivity and chemical compositions, providing valuable data for selecting optimal materials. Recognizing the significant influence of both resistivity and density of IDT electrodes on the generation of acoustic waves from piezoelectric materials, three types of Al-Ag thin films with different Al contents were fabricated, maintaining a consistent thickness of 150 nm. As the Al content decreased from 84.6 at% to 21.7 at%, the resistivity increased from 5.1 to 0.8 × 10-5 Ω-cm, while the calculated density increased from 3.9 to 8.8 g/cm3. The SAW devices fabricated with these Al-Ag IDT electrodes resonated at 71 MHz without frequency shifts, but the resonant frequency selectivity and insertion loss deteriorated with decreasing Al content, highlighting the predominant influence of electrode density over electrical conductivity on SAW device performance.

Recent progress in oxide phosphor thin-film electroluminescent devices

  • Minami, Tadatsugu;Miyata, Toshihiro
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.27-32
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    • 2006
  • The present status and prospects for further development of thin-film electroluminescent (TFEL) devices using oxide phosphors are described. High-luminance oxide TFEL devices have been recently developed using a new combinatorial deposition technique featuring rf magnetron sputtering with a subdivided powder target. In addition, new flexible oxide TFEL devices have been fabricated on an oxide ceramic sheet and operated stably in air above $200^{\circ}C$.

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Effect of SAW-IDT Electrodes Composed of Aluminum-Nickel Composite Thin Films on the Acoustic Performance of SAW Devices

  • Jae-Cheol Park
    • Journal of Sensor Science and Technology
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    • v.33 no.5
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    • pp.353-358
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    • 2024
  • Al-Ni thin films were fabricated using combinatorial sputtering system to realize highly sensitive surface acoustic wave (SAW) devices. The Al-Ni sample library was grown with various chemical compositions and electrical resistivities, which provided important information for selecting the most suitable materials for SAW devices. As acoustic waves generated from piezoelectric materials are significantly affected by the resistivity and density of the interdigital transducer (IDT) electrodes, three types of Al-Ni thin films with different Al contents were fabricated. The thickness of the Al-Ni thin film used in the SAW-IDT electrode was fixed at 100 nm. As the Al content of the Al-Ni film decreased from 79.2 to 24.5 at%, the resistivity increased slightly from 4.8 to 5.8 × 10-5 Ω-cm, whereas the calculated density increased significantly from 3.6 to 6.9 g/cm3. The SAW device composed of Al-Ni IDT electrodes resonated at 71 MHz without frequency shifts; however, the selectivity of the resonant frequency and insertion loss deteriorated as the Al content decreased. When there is no significant difference in the electrical characteristics of the SAW-IDT electrodes, the performance of the SAW devices can be determined by the density of the IDT electrodes.

Dependence of the Structural and Electrical Properties of Co-Sputtered Zn-Doped ITO Thin Films on the Composition and Oxygen Partial Pressure

  • Heo, Gi-Seok;Kim, EunMi
    • Journal of the Korean Ceramic Society
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    • v.50 no.4
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    • pp.288-293
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    • 2013
  • Zn-In-Sn-O films were prepared at room temperature by combinatorial RF-magnetron co-sputtering system. The cationic contents of the films were varied using a compositionally combinatorial technique. The effects of the oxygen partial pressure and film compositionon the structural and electrical properties were investigated. The Zn-In-Sn-O films deposited at Ar gas atmosphere showed an amorphous phaseirrespective of the film composition. However, the amorphous Zn-In-Sn-O films with a Zn content below 30.0 at% were converted into a bixbyite type-ITO polycrystalline phase with an increase in the oxygen partial pressure. The resistivity, carrier concentration, and Hall mobility were strongly affected by the oxygen partial pressure and chemical composition of the film. At sufficiently high carrier densities above $5{\times}10^{18}cm^{-3}$, the conduction behavior of amorphous Zn-In-Sn-O film changes from thermally activated to degenerate band conduction accompanied with high mobility.

Annealing effect of Zn-Sn-O films deposited using combinatorial method (Combinatorial 방법으로 증착한 Zn-Sn-O계 박막의 열처리 효과)

  • Ko, Ji-Hoon;Kim, In-Ho;Kim, Dong-Hwan;Lee, Kyeong-Seok;Park, Jong-Keuk;Lee, Taek-Sung;Baik, Young-Jun;Cheong, Byung-Ki;Kim, Won-Mok
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07b
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    • pp.998-1001
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    • 2004
  • ZnO, $SnO_2$ 타겟 각각의 RF 파워를 50 W, 38 W로 고정시킨 후 combinatorial RF magnetron sputtering법을 사용하여 기판 위치에 따라서 조성 구배를 주어 여러 가지 조성의 Zn-Sn-O(ZTO) 박막을 제작하였다. 시편의 열처리에 따른 물성 변화를 분석하기 위해 Rapid Thermal Annealer(RTA)을 이용하여 450, $650{^\circ}C$의 온도 및 $10^{-2}$ Ton의 진공 분위기에서 각각 1 시간 동안 열처리하였다. XRD 분석 결과 상온에서 제작된 ZTO 박막은 Sn 18 at%의 조성을 갖는 시편을 제외하고 모두 비정질상으로 나타났다. $450^{\circ}C$에서 열처리 후 구조적인 변화는 보이지 않았으나, 캐리어 농도와 이동도는 증가하였으며 Sn 54 at%의 조성에서 최고 $25.4cm^2/Vsec$의 전자 이동도를 나타내었다. $26{\leq}Sn$ $at%{\leq}65$의 조성 범위를 갖는 박막은 가시광 영역에서 80 % 이상의 투과도를 가졌으며 $650^{\circ}C$에서 결정화가 되면서 투과도가 증가하였다.

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