• Korean Journal of Materials Research
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• v.17 no.11
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• pp.618-621
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• 2007

Chromium nitride (CrN) films were deposited on silicon substrate by RF magnetron sputtering assisted by inductive coupled nitrogen plasma without intentional substrate heating. Films were deposited with different levels of bombarding energy by nitrogen ions $(N^+)$ to investigate the influence of substrate bias voltage $(V_b)$ on the growth of CrN thin films. XRD spectra showed that the crystallographic structure of CrN films was strongly affected by substrate bias voltage. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) results showed that surface roughness and grain size of the CrN films varied significantly with bias voltage. For - 80 $V_b$ depositions, the CrN films showed bigger grain sizes than those of other bias voltage conditions. The lowest surface roughness of 0.15 nm was obtained from the CrN films deposited at .130 $V_b$.

• 연구논문집
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• s.31
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• pp.127-133
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• 2001

In chromium electrodeposition, crack is inevitably accompanied by chromium layer. Behavior of crack formation and crack density were different from the plating conditions such as current density, temperature, waveform of applied current and so on. And cracks have an influence on the corrosion resistance of chromium deposit, because corrosion occurs through the network of cracks between deposit and substrate. Therefore, many researches have been achieved in order to remove the cracks in chromium deposit. Formation of double layers, Cr/Cr and Ni/Cr were investigated to increase corrosion resistance of chromium deposit in this study. As pretreatment prior to outer chromium coating, acid pickling and current control method were examined. Cracks in cross-section of each sample were observed with SEM and CASS(Copper modified acetic acid salt spray) test was performed to evaluate corrosion resistance. It was found that corrosion resistance of Cr/Cr and Ni/Cr double layers were superior to Cr or Ni single layer from the results of CASS test.

• Journal of the Korean institute of surface engineering
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• v.55 no.1
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• pp.18-23
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• 2022

Presence of cracks in electrodeposited hard chromium layer, which provide a path of corrosive media to steel substrate, is a serious issue in metal finishing with chromium electroplating. In this study, we added sodium molybdate in an electrolyte for chromium electroplating bath. 130g/L of sodium molybdate in Sargent bath for chromium electroplating causes a codepostion of molybdenum with chromium in a rage of 0.61 ~ 3.14 wt.%. The co-deposited molybdenum enhances the crystallinity of chromium layer, thus the hardness is slightly decreases by the addition of molybdate in electrolyte. However, due to the co-deposition of molybdenum, a crack-free chromium layer could be electrodeposited. Such crack-free chromium layer shows a significantly improved corrosion resistance.

• Journal of the Korean Society for Heat Treatment
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• v.16 no.6
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• pp.335-340
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• 2003

To improve properties of wear resistance and anti-corrosion of the trivalent chromium platings, oxinitrocarbunsing and steam oxidation were conducted. Armophous trivalent Cr platings could be transformed to chromium carbides of high hardness, that showed low friction and wear rate. Even though micro-cracks were within as platings, superior anti-corrosion property was obtained by these treatments due to healing of cracks at the interface between the trivalent chromium platings and substrate.

• Journal of Drive and Control
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• v.15 no.1
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• pp.10-15
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• 2018

The hydraulic cylinder seals are used not only to protect leakage of the working fluids but also to prevent incoming of foreign particles into the system. Chromium plating is generally applied to improve corrosion and wear resistance. It has been noticed that sealing surface damage occurs due to the hard foreign/wear particles contained in the hydraulic oil. In this study, a three-bodied sliding contact problem related with a PTFE seal, a spherical particle and chrome-plated steel substrate is modeled to investigate the relations to wear mechanism. Using the nonlinear finite element software, MARC/MENTAT, the deformed shapes, the von Mises and first principal stress distributions with plating thickness were compared. The sealing surface was mainly abraded by hard particles embedded in the seal. The plastic deformation of the steel substrate decreased with thicker plating. Hence it could be more effective to coat the sealing surface of a hydraulic cylinder with a hard material such as TiN, TiC and DLC.

• Korean Journal of Materials Research
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• v.12 no.1
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• pp.82-88
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• 2002

Chromium carbide films were deposited on high speed steels using a Cr_3C_2$ target by magnetron sputtering. Effects of the deposition parameters (power, Ar pressure and substrate temperature) on deposition rates and surface roughnesses of the films were investigated. The morphologies of those films were characterized by scanning electron microscopy and atomic force microscopy. The grain size of the samples deposited using dc-power is larger than that using equivalent rf-power. The hardness of the sample increases with increasing rf-power, whereas the elastic modulus nearly does not change with rf-power. The optimum sputter deposition conditions for chromium carbide on high speed steels in the corrosion resistance aspect were found to be the rf-power with small roughness.

• Journal of the Korean institute of surface engineering
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• v.52 no.3
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• pp.111-116
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• 2019

Chromium was coated on a steel substrate by the Cr(III) electroplating method, and corroded at $500-900^{\circ}C$ for 5 h in $N_2/0.1%H_2S-mixed$ gas to study the high-temperature corrosion behavior of the Cr(III) coating in the highly corrosive $H_2S-environment$. The coating consisted of (C, O)-supersaturated, nodular chromium grains with microcracks. Corrosion was dominated by oxidation owing to thermodynamic stability of oxides compared to sulfides and nitrides. Corrosion initially led to formation of the thin $Cr_2O_3$ layer, below which (S, O)-dissolved, thin, porous region developed. As corrosion progressed, a $Fe_2Cr_2O_4$ layer formed below the $Cr_2O_3$ layer. The coating displayed relatively good corrosion resistance due to formation of the $Cr_2O_3$ scale and progressive sealing of microcracks.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2001.11a
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• pp.29-30
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• 2001

This paper presents some results of plasma nitriding on hard chromium deposit. The substrates were C45 steel and $30~50{\;}\mu\textrm{m}$ of chromium deposit by electroplating was formed. Plasma nitriding was carried out in a plasma nitriding system with $95NH_3{\;}+{\;}SCH_4$ atmosphere at the pressure about 600 Pa and different temperature from $450^{\circ}C{\;}to{\;}720^{\circ}C$ for various time. Optical microscopy and X-ray diffraction were used to evaluate the characteristics of surface nitride layer formed by nitrogen diffusion from plasma atmosphere inward iCr coating and interface carbide layer formed by carbon diffusion from substrate outward Cr coating. The microhardness was measured using microhareness tester at the load of 100 gf. Corrosion resistance was evaluated using the potentiodynamic measurement in 3.5% NaG solution. A saturated calomel electrode (SiCE) was used as the reference electrode. Fig.1 shows the typical microstructures of top surface and cross-section for nitrided and unnitrided samples. Aaer plasma nitriding a sandwich structure was formed consisting of surface nitride layer, center chromium layer and interface carbide layer. The thickness of nitride and carbide layers was increased with the increase of processing temperature and time. Hardness reached about 1000Hv after nitriding while 900Hv for unnitrided hard chromium deposit. X-ray diffraction indicated that surface nitrided layer was a mixture of $Cr_2N$ and CrN at low temperature and erN at high temperature (Fig.2). Anodic polarization curves showed that plasma nitriding can greatly improve the corrosion resistance of chromium e1ectrodeposit. After plasma nitriding, the corrosion potential moved to noble direction and passive current density was lower by 1 to 4 orders of magnitude compared with chromium deposit(Fig.3).

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2009.05a
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• pp.177-181
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• 2009

Compositional gradient CrNx coatings were fabricated using arc ion plating in Ar/$N_2$ gaseous mixture by gradually increasing $N_2$ flux rate from 0 to 120 SCCM. The effect of negative substrate bias on the film microstructure and mechanical properties were systematically investigated with XRD, GDOES, and SEM. The results show that substrate bias has an important influence on film growth and microstructure of gradient CrNx coatings. The coatings mainly crystallized in the mixture of hexagonal $Cr_{2}N$ and fcc CrN phases. By increasing substrate bias, film microstructure evolved from an apparent columnar structure to an equiaxed one. With increasing substrate bias, deposition rate first increased, and then decreased. The maximum of deposition rate was 15 nm/min obtained at a bias of -50V.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2002.05a
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• pp.37-37
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• 2002

Diamoncl/Mo/Ni multi-layers on SKH-51 steel substrate was prepared to improve the abrasive wear resistance of a tool and die by a commercial chemical vapor deposition unit and electro-plating. The diamond after 7 hour deposition had cuba-octahedral structure with 2~5$\mu\textrm{m}$ grains. The existence of non-ferrous metals such as chromium, nickel and molybdenum between diamond and SKH-51 substrate results in forming higher quality of diamond layer by retarding carbon diffusion in the diamond layer during deposition, and also improving hardness and wear resistance. Surface cracks on the film was sometimes observed by the difference of by the thermal expansion coefficients between the steel substrate and the deposited layers during cooling.