• 제목/요약/키워드: Chemisorbed

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The Electronic Structure of Methanethiol Adsorbed on Silver Surface: An Extended Huckel Study

  • Hwang, Sun-Gu;Jang, Yun-Hee;Kim, Ho-Jing
    • Bulletin of the Korean Chemical Society
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    • 제12권6호
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    • pp.635-643
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    • 1991
  • The adsorption of methanethiol on a Ag(100) surface has been studied with Extended Huckel calculation in the cluster approximation of the substrate. Since it has been known that methanethiol is chemisorbed dissociatively on silver surface by rupture of S-H bond, the methanethiolate radical is taken as adsorbate. Of the various adsorption sites, the 4-fold hollow site is preferred. The methanethiolate radical is mainly adsorbed via its 2e orbital. The charge transfer from metal to this level leads to the C-S bond weakening, which is consistent with the red shift of C-S stretching mode in surface enhanced Raman (SER) spectrum.

Vibrational Spectroscopic Study of Benzenethiol on Silver Surface

  • Yi, Whi-Kun;Park, Cheol-Woo;Kim, Myung-Soo;Kim, Kwan
    • Bulletin of the Korean Chemical Society
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    • 제8권4호
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    • pp.291-296
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    • 1987
  • Vibrational spectroscopy has been applied to the benzenethiol molecule adsorbed on the silver surface. The results of infrared and Raman spectral studies have led to the conclusion that benzenethiol is chemisorbed dissociatively on the silver surface by rupture of S-H bond and the benzenethiolate formed upon adsorption is bound to silver via its sulfur atom. It seemed more likely that benzenethiol is adsorbed as being inclined to the silver surface. On contact with oxygen, the geometry of the adsorbed species appeared to bear a resemblance to that of silver benzenethiolate salt. The infrared bands of adsorbed species remained with little decrease of intensity even after the prolonged evacuation at 673 K, indicating that benzenethiol is very strongly chemisorbred to the silver surface.

Platinum Precursor 특성에 따른 Pt/TiO2 촉매의 SO2 산화 반응특성 연구 (Characteristics of SO2 Oxidation of Pt/TiO2 Catalyst according to the Properties of Platinum Precursor)

  • 김재관;박석운;남기복;홍성창
    • 공업화학
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    • 제31권4호
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    • pp.368-376
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    • 2020
  • 본 연구에서는 SO2를 제어하기 위한 산화 촉매에서 platinum (Pt)을 활성금속으로 하는 촉매의 반응특성에 관한 분석을 수행하였다. Titania (TiO2) 지지체에 다양한 precursor 형태의 Pt를 사용하여 Pt/TiO2 촉매를 제조하여 실험에 사용하였다. Pt/TiO2 상의 Pt2+ 또는 Pt4+와 같은 Pt valence state에 따른 SO2 산화의 성능 차이는 나타나지 않으며, PtClx과 같은 Pt chloride species는 전체적으로 SO2 산화 성능을 감소시킨다. 또한, XPS 분석을 수행하여 SO2 산화 반응 전/후의 촉매상의 valence state를 분석한 결과 SO2 산화반응 이후 lattice oxygen의 감소 및 surface chemisorbed oxygen의 증가를 확인할 수 있다. 따라서 Pt/TiO2 촉매의 SO2의 산화 반응은 PtOx에 해당하는 lattice oxygen의 반응과 oxygen vacancy에 의한 산화-환원 반응이 진행되는 Mar-Van Krevelen 메커니즘이 주요한 SO2 산화 반응임을 판단할 수 있으며, 이러한 결과를 통하여 촉매 상에 존재하는 PtOx (Pt2+ 또는 Pt4+)의 oxygen species가 주요한 활성 site로 작용함을 확인할 수 있다.

Influence of Surface Morphology and Substrate on Thermal Stability and Desorption Behavior of Octanethiol Self-Assembled Monolayers

  • ;강훈구;;;노재근
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.219-219
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    • 2012
  • The formation and thermal desorption behaviors of octanethiol (OT) SAMs on single crystalline Au (111) and polycrystalline Au, Ag, and Cu substrates were examined by X-ray photoelectron microscopy (XPS), thermal desorption spectroscopy (TDS), and contact angle (CA) measurements. XPS and CA measurements revealed that the adsorption of octanethiol (OT) molecules on these metals led to the formation of chemisorbed self-assembled monolayers (SAMs). Three main desorption fragments for dioctyl disulfide (C8SSC8+, dimer), octanethiolate (C8S+), and octanethiol (C8SH+) were monitored using TDS to understand the effects of surface morphology and the nature of metal substrates on the thermal desorption behavior of alkanethiols. TDS measurements showed that a sharp dimer peak with a very strong intensity on single crystalline Au (111) surface was dominantly observed at 370 K, whereas a broad peak on the polycrystalline Au surface was observed at 405 K. On the other hand, desorption behaviors of octanethiolates and octanethiols were quite similar. We concluded that substrate morphology strongly affects the dimerization process of alkanethiolates on Au surfaces. We also found that desorption intensity of the dimer is in the order of Au>>Ag>Cu, suggesting that the dimerization process occurs efficiently when the sulfur-metal bond has a more covalent character (Au) rather than an ionic character (Ag and Cu).

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Influence of transient surface hydrogen on Aluminum catalyzed Silicon nanowire growth

  • 신내철
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.125.2-125.2
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    • 2016
  • Semiconductor nanowires are essential building blocks for various nanotechnologies including energy conversion, optoelectronics, and thermoelectric devices. Bottom-up synthetic approach utilizing metal catalyst and vapor phase precursor molecules (i.e., vapor - liquid - solid (VLS) method) is widely employed to grow semiconductor nanowires. Al has received attention as growth catalyst since it is free from contamination issue of Si nanowire leading to the deterioration of electrical properties. Al-catalyzed Si nanowire growth, however, unlike Au-Si system, has relatively narrow window for stable growth, showing highly tapered sidewall structure at high temperature condition. Although surface chemistry is generally known for its role on the crystal growth, it is still unclear how surface adsorbates such as hydrogen atoms and the nanowire sidewall morphology interrelate in VLS growth. Here, we use real-time in situ infrared spectroscopy to confirm the presence of surface hydrogen atoms chemisorbed on Si nanowire sidewalls grown from Al catalyst and demonstrate they are necessary to prevent unwanted tapering of nanowire. We analyze the surface coverage of hydrogen atoms quantitatively via comparison of Si-H vibration modes measured during growth with those obtained from postgrowth measurement. Our findings suggest that the surface adsorbed hydrogen plays a critical role in preventing nanowire sidewall tapering and provide new insights for the role of surface chemistry in VLS growth.

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Study on the Retarding Mechanism and Strength Loss of Gypsum from Hydrolyzed Wheat Protein Retarder

  • Ding, Yi;Fang, Youchun;Fang, Hui;Zhang, Qicai;Zhang, Fengjun;Oh, Won-Chun
    • 한국세라믹학회지
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    • 제52권1호
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    • pp.28-32
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    • 2015
  • In this article, the influence of a hydrolyzed wheat protein retarder on the hydration process, ion concentration in liquid phase, degree of supersaturation, and crystal morphology of plaster was investigated. Furthermore, the retarding mechanism and the strength loss of gypsum were also studied by scanning electron microscopy (SEM). The results indicate that the use of the hydrolyzed wheat protein retarder for plaster achieved a better retarding effect and lower strength loss. The combination of gypsum plaster with the retarder not only decreased the plaster's early hydration rate and prolonged its setting time efficiently, but also militated against the crystal morphology of dihydrate gypsum. For example, the crystal dimensions changed little, but the proportion of needle-shaped crystals decreased. Combination with calcium ions on the surface of dihydrate gypsum crystal nuclei may form a chemisorbed layer, reduce the surface energy of the crystal nuclei, and inhibit the growth of the crystal nuclei of dihydrate gypsum. Consequently, the hydration process of building gypsum becomes greatly extended and is slowed down significantly.

암모니아 펄스 플라즈마를 이용한 원자층 증착된 질화텅스텐 확산방지막 특성 ([ $NH_3$ ] Pulse Plasma Treatment for Atomic Layer Deposition of W-N Diffusion Barrier)

  • 이창우
    • 마이크로전자및패키징학회지
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    • 제11권4호
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    • pp.29-35
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    • 2004
  • 암모니아 펄스플라즈마를 이용하여 $WF_6$ 가스와 $NH_3$ 가스를 교대로 흘려줌으로써 Si 기판위에 질화텅스텐 확산방지막을 증착하였다. $WF_6$ 가스는 Si과 반응하여 표면침식이 과도히 발생하였으나 암모니아 ($NH_3$)가스를 펄스 플라즈마를 인가하여 $WF_6$와 같이 사용하면 Si 표면을 질화처리 함으로써 표면침식을 막아주며 질화텅스텐 박막을 쉽게 증착할 수 있었다. 그 이유는 암모니아 가스의 분해를 통한 Si 기판의 흡착을 용이하게 하여 질화텅스텐 박막 증착이 가능하기 때문이다. 이러한 증착 미케니즘과 암모니아 펄스 플라즈마 효과에 대하여 조사하였다.

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습도 및 미끄럼속도가 질화규소의 마멸거동에 미치는 영향에 관한 연구 (Effects of Humidity and Sliding Speed on the Wear Behavior of Silicon Nitride Ceramics)

  • 이기현;김경웅
    • 대한기계학회논문집
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    • 제18권10호
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    • pp.2597-2605
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    • 1994
  • The wear behavior of two types of $Si_3N_4$ exposed to high and low humidity was examined at various sliding speeds, using bearing steel as disk material under pin-on-disk type sliding conditions. Higher wear rates were obtained at a high humidity than at a low humidity. As the sliding speed was increased, the wear rates were decreased and the effect of humidity on the wear rates of $Si_3N_4$ was reduced. The result that the $Si_3N_4$ pin showed higher wear rate under the high humidity condition was explained by the decrease in microhardness of $Si_3N_4$ due to the chemisorbed moisture on the pin and plowing action by the hard particles of $Fe_2O_3$ from the disk. An increase in the sliding speed is supposed to reduce the effect of humidity on the wear rate of $Si_3N_4$ by raising the average temperature of the disk surface and the local temperature at pin-disk contact point.

$Ag/{\alpha}-Al_2O_3Ag/SnO_2$ 촉매상에서의 에틸렌 산화반응 (Oxidation of Ethylene over $Ag/{\alpha}-Al_2O_3Ag/SnO_2$)

  • 전기원;한종수;전학제
    • 대한화학회지
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    • 제28권2호
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    • pp.109-113
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    • 1984
  • 여러가지 함량으로 은을 입힌$ Ag/{\alpha}-Al_2O_3$$Ag/SnO_2$상에서의 반응실험과 촉매의 Auger spectra, $SnO_2$에 흡착된 산소의 EPR spectra를 비교하여 담체의 종류가 에틸렌 산화반응의 활성과 선택성에 미치는 영향을 조사하였다. $SnO_2$상에서는 흡착산소중 O-가 반응에 참여하여 ethylene를 완전 산화하는 방향으로 유도하므로써 ethylene oxide 생성의 선택성을 저하시키는 것 같다.

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Formation and Structure of Self-Assembled Monolayers of Octylthioacetates on Au(111) in Catalytic Tetrabutylammonium Cyanide Solution

  • Park, Tae-Sung;Kang, Hun-Gu;Choi, In-Chang;Chung, Hoe-Il;Ito, Eisuke;Hara, Masahiko;Noh, Jae-Geun
    • Bulletin of the Korean Chemical Society
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    • 제30권2호
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    • pp.441-444
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    • 2009
  • The formation and structure of self-assembled monolayers (SAMs) by the adsorption of acetyl-protected octylthioacetate (OTA) on Au(111) in a catalytic tetrabutylammonium cyanide (TBACN) solution were examined by means of scanning tunneling microscopy (STM), X-ray photoelectron spectroscopy (XPS), and cyclic voltammetry (CV). Molecular-scale STM imaging revealed that OTA molecules on Au(111) in a pure solvent form disordered SAMs, whereas they form well-ordered SAMs showing a c(4 × 2) structure in a catalytic TBACN solution. XPS and CV measurements also revealed that OTA SAMs on Au(111) formed in a TBACN solution have a stronger chemisorbed peak in the S 2p region at 162 eV and a higher blocking effect compared to OTA SAMs formed in a pure solvent. In this study, we clearly demonstrate that TBACN can be used as an effective deprotecting reagent for obtaining well-ordered SAMs of thioacetyl-protected molecules on gold.