• Journal of the Korean Vacuum Society
• /
• v.11 no.4
• /
• pp.194-200
• /
• 2002

MOCVD(metal-organic chemical vapor deposition) copper thin film was annealed at various conditions and the eletrical properties and micro-structures were investigated to find the optimal annealing condition and its effect. Cu thin film annealed at Ar 1 torr, $400^{\circ}C$ had the most improved resistivity of 1.98 $\mu\Omega$cm, and texture; the ratio of $I_{(111)}/I_{(200)}$ was varied from 2.03 to 3.11, and Cu thin film annealed at Ar 1 torr, $450^{\circ}C$ had the largest grain size and uniformity. After the annealing, the EM(electromigration) test was followed to ensure the improved properties by annealing. Compare to other conditions, Cu patterns annealed at Ar 1 torr, $400 ^{\circ}C$ had the most improved properties when it came to the EM resistance, which was due to the low resistivity, the preferential evolution of texture to (111) plane, and the reduction of surface roughness of annealed copper film.

• Journal of the Korean Vacuum Society
• /
• v.7 no.4
• /
• pp.328-333
• /
• 1998

Lattice-matched InAIAs epilayers were grown on (001) InP substrate by low pressure metalorganic chemical vapor deposition. The effects of growth conditions on the properties of InAIAs were analyzed, and InGaAs/InAIAs single and multiple quantum wells were successfully grown. It was observed that the optical property of InAIAs epilayers was improved in the temperature range of 620~$700^{\circ}C$ as the growth temperature increased due to the reduction of oxygen incorporation, however, the crystallinity decreased at temperatures higher than $750^{\circ}C$ due to the degraded crystallinity of the bufter layers. The enhanced incorporation of AI into epilayer was observed at high $AsH_3$flow rates and it was explained in terms of the differences in bond strengths of AI-As and In-As. The measured photoluminescence peak energies from InGaAs/InAIAs single quantum wells were consistent with the calculated ones based on transfer matrix method. High-order satellite peaks and fine thickness fringes were observed by high-resolution x-ray diffraction, implying that the high-quality multiple quantum wells with abrupt heterointerfaces were grown.

• Applied Chemistry for Engineering
• /
• v.17 no.6
• /
• pp.586-590
• /
• 2006

As one of electro active polymers for soft smart materials, the ionic polymer metal composites (IPMC) are easy to produce through chemical reduction processing and show high displacements at low voltage. When the IPMC actuates, the deformation depends on a few factors including the structure of based membrane, species and morphology of the metal electrodes, the nature of cations and the level of hydration. As previously published, we have been studying on improvement of actuation through surface electrode modification of IPMC to grasp the effect of electrode morphology on actuation. This study is comparative experiments through the chemical reaction and deposition by ion beam assisted deposition (IBAD) in order to prepare the very thin and homogeneous surface electrode of IPMC. The IPMCs were prepared with different surface roughness of polymer membrane, and the influence of the surface roughness on the actuation was studied. By investigating the electrical properties and driving displacement, the actuating properties of IPMC with different surface roughness were studied.

• Clean Technology
• /
• v.29 no.1
• /
• pp.71-75
• /
• 2023

In general, the presence of non-selective intercrystalline (grain boundary) defects in polycrystalline metal-organic framework (MOF) or zeolite membranes, which are known to be ca. 1 nm in size, causes lower membrane performance (selectivity) than the intrinsically expected. In this study we show that applying a thin polymeric coating of polydimethylsiloxane (PDMS) on a polycrystalline MOF membrane is effective to cap the non-selective intercrystalline defects and therefore improve membrane performance. To demonstrate the concept, first, polycrystalline UiO-66, one of Zr-based MOFs, membranes were prepared by an in-situ solvothermal growth. By controlling membrane growth condition with respect to growth temperature, we were able to obtain polycrystalline UiO-66 membranes at 150 ℃ with intercrystalline defects of which the quantity is not significant, so it can be plugged by the suggested PDMS deposition. Second, their performances were compared before and after the PDMS deposition. As expected, the PDMS deposition ended up with a noticeable increase in CO₂/N₂ ideal selectivity from 6 to 14, indicating successful intercrystalline defect plugging. However, the enhancement in CO₂/N₂ selectivity was accompanied by a significant reduction in CO₂ permeance from 5700 to 33 GPU because the PDMS deposition not only plugs defects but also forms a continuous coating on membrane surface, adding an additional transport resistance.

• Clean Technology
• /
• v.23 no.3
• /
• pp.308-313
• /
• 2017

In this study, we investigated the electrocatalytic effects of the N and O co-doping of Graphite Felt (GF) electrode for the vanadium redox flow battery (VRFB) at the cathode and the anode reaction, respectively. The electrodes were prepared by chemical vapor deposition (CVD) with $NH_3-O_2$ at 773 K, and its effects were compared with an electrode prepared by an O doping treatment. The surface morphology and chemical composition of the electrodes were characterized by scanning electron microscopy (SEM) and photoelectron spectroscopy (XPS). The electrocatalytic properties of these electrodes were characterized in a VRFB single cell comparing the efficiencies and performance of the electrodes at the cathode, anode, and single cell level. The results exhibited about 2% higher voltage and energy efficiencies on the N-O-GF than the O-GF electrode. It was found that the N and O co-doping was particularly effective in the enhancement of the reduction-oxidation reaction at the anode.

• Korean Journal of Materials Research
• /
• v.34 no.6
• /
• pp.283-290
• /
• 2024

The aggressive scaling of dynamic random-access memory capacitors has increased the need to maintain high capacitance despite the limited physical thickness of electrodes and dielectrics. This makes it essential to use high-k dielectric materials. TiO₂ has a large dielectric constant, ranging from 30~75 in the anatase phase to 90~170 in rutile phase. However, it has significant leakage current due to low energy barriers for electron conduction, which is a critical drawback. Suppressing the leakage current while scaling to achieve an equivalent oxide thickness (EOT) below 0.5 nm is necessary to control the influence of interlayers on capacitor performance. For this, Pt and Ru, with their high work function, can be used instead of a conventional TiN substrate to increase the Schottky barrier height. Additionally, forming rutile-TiO₂ on RuO₂ with excellent lattice compatibility by epitaxial growth can minimize leakage current. Furthermore, plasma-enhanced atomic layer deposition (PEALD) can be used to deposit a uniform thin film with high density and low defects at low temperatures, to reduce the impact of interfacial reactions on electrical properties at high temperatures. In this study, TiO₂ was deposited using PEALD, using substrates of Pt and Ru treated with rapid thermal annealing at 500 and 600 ℃, to compare structural, chemical, and electrical characteristics with reference to a TiN substrate. As a result, leakage current was suppressed to around 10^-6 A/cm² at 1 V, and an EOT at the 0.5 nm level was achieved.

• 한국신재생에너지학회:학술대회논문집
• /
• 2006.11a
• /
• pp.316-319
• /
• 2006

There is a worldwide interest in the development and commercialization of Polymer Electrolyte Membrane Fuel Cells (PEMFCs) for vehicular and stationary applications. One of the major objectives is the reduction of loaded electrode materials, which is comprise of the Pt-based noble metals. In this paper, a novel chemical strategy is described for the preparation and characterization of carbon-supported and surface-alloys, which were prepared by using a successive reduction process. After preparing Au colloid nanoparticles, the deposition of Au colloid nanoparticles occurred spontaneously in the carbon black-dispersed aqueous solution. Then nano-scaled active materials were formed on the surface of carbon-supported Au nanoparticles. The structural and electrochemical analyses indicate that the active materials were deposited on the surface of Au nanoparticles selectively and that an at toying process occurred during the successive reducing process The carbon-supported & surface-alloys showed the higher electrocatalytic activity than those of the particle-alloys and commercial one (Johnson-Matthey) for the reaction of methanol and formic acid oxidation. The increased electrocatalytic activity might be attributed to the effective surface structure of surface-alloys, which have a high utilization of active materials for the surface reaction of electrode.

• Korean Journal of Materials Research
• /
• v.31 no.12
• /
• pp.719-726
• /
• 2021

Through the process of chemical vapor deposition, Tungsten Hexafluoride (WF₆) is widely used by the semiconductor industry to form tungsten films. Tungsten Hexafluoride (WF₆) is produced through manufacturing processes such as pulverization, wet smelting, calcination and reduction of tungsten ores. The manufacturing process of Tungsten Hexafluoride (WF₆) is required thorough quality control to improve productivity. In this paper, a real-time detection system for oxidation defects that occur in the manufacturing process of Tungsten Hexafluoride (WF₆) is proposed. The proposed system is implemented by applying YOLOv5 based on Convolutional Neural Network (CNN); it is expected to enable more stable management than existing management, which relies on skilled workers. The implementation method of the proposed system and the results of performance comparison are presented to prove the feasibility of the method for improving the efficiency of the WF₆ manufacturing process in this paper. The proposed system applying YOLOv5s, which is the most suitable material in the actual production environment, demonstrates high accuracy (mAP@0.5 99.4 %) and real-time detection speed (FPS 46).

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.20 no.10
• /
• pp.864-868
• /
• 2007

Effect of high-temperature annealing on morphology of fully coherent self-assembled InAs quantum dots' grown on Si (100) substrates at $450^{\circ}C$ by atmospheric pressure metalorganic chemical vapor deposition(APMOCVD) was investigated by atomic force microscopy(AFM). When the dots were annealed at 500 - 600$^{\circ}C$ for 15 sec - 60 min, there was no appreciable change in the dot density but the heights of the dots increased along with the reduction in the diameters. In segregation from the InAs quantum dots and/or from the 2-dimensional InAs wetting layer which was not transformed into quantum dots looked responsible for this change in the dot size. However the change rates remained almost same regardless of annealing time and temperature, which may indicate that the morphological change due to thermal annealing is done instantly when the dots are exposed to high temperature annealing.

• Transactions on Electrical and Electronic Materials
• /
• v.9 no.2
• /
• pp.62-66
• /
• 2008

We report on the growth mechanism of vertically aligned carbon nanotubes (VACNTs) using ultra thin Ni catalysts and direct current plasma enhanced chemical vapor deposition (PECVD) system. The CNTs were grown with -600 V bias to substrate electrode and catalyst thickness variation of 0.07 nm to 3 nm. The CNT density was reduced with catalyst thickness reduction and increased growth time. Cone like CNTs were grown with ultra thin Ni thickness, and it results from an etch of carbon network by reactive etchant species and continuous carbon precipitation on CNT walls. Vertically aligned sparse CNTs can be grown with ultra thin Ni catalyst.