• Title/Summary/Keyword: Chemical laser

Search Result 888, Processing Time 0.031 seconds

Experimental Study of 3-Dimensional Rapid Prototyping by Laser Chemical Vapor Deposition (레이저 화학증착을 이용한 3차원 쾌속조형에 관한 실험적 연구)

  • Ryu Jae Eun;Lee Young Lim
    • Transactions of the Korean Society of Mechanical Engineers A
    • /
    • v.29 no.1 s.232
    • /
    • pp.14-21
    • /
    • 2005
  • Laser chemical vapor deposition can be an effective technique for a rapid prototyping with ceramic materials, in particular. The objective of the study is to fabricate several 3-dimensional objects by stacking multi-layers as well as to find out some basic aspects of a rapid prototyping with laser chemical vapor deposition such as deposition characteristics with traversing speed of the laser, possible problems in stacking multi-layers etc. The limit speed of the laser that can grow a tilted SiC rod was found in this study, and laser directing writing that occurs over the limit speed was also investigated. Finally, a zigzag-shaped rod, a spiral-shaped rod, a wall and a square duct were successfully fabricated with laser chemical vapor deposition of tetramethylsilane

Effects of Temperature and Mass Flux on Deuterium Fluoride Chemical Laser Performance (온도와 질량유속이 불화중수소 화학 레이저 성능에 미치는 영향)

  • Park Byung-Suh;Lee Jung-Hwan
    • Journal of the Korea Institute of Military Science and Technology
    • /
    • v.7 no.4 s.19
    • /
    • pp.100-106
    • /
    • 2004
  • The effects of adiabatic flame temperature and mass flux on deuterium fluoride(DF) chemical laser performance were investigated. The power flux and specific power, which are important parameters containing the information of scaling effects of laser device magnitude, and chemical efficiency were selected as a judging parameter of DF laser performance. For the specific power, it was decreased by the increase of power flux of DF laser. Higher the adiabatic flame temperature of atomic fluorine generator, higher the chemical efficiency of DF laser was changed. It seems that the mass flux effect on the chemical efficiency is not remarkable.

Experimental Study of the Growth of the SiC Rod using Nd-Yag Laser Chemical Vapor Deposition (Nd-Yag 레이저 화학증착을 이용한 SiC 로드 성장에 관한 실험적 연구)

  • Lim, Young;Ryu, Jae-Eun
    • Transactions of the Korean Society of Mechanical Engineers A
    • /
    • v.28 no.4
    • /
    • pp.481-488
    • /
    • 2004
  • Laser chemical vapor deposition can be used as a new approach for a rapid prototyping technique. The purpose of the study is to fabricate several 3-dimensional objects that are relatively simple as well as to find the characteristics of SiC rod growth that is the first step in developing a new rapid prototyping technique with laser chemical vapor deposition. In the study, SiC rods were generated with varying precursor pressure for 5 minutes. Deposition rates with varying precursor pressure, shapes of rods, surface roughness and component organization were investigated, in particular. Finally, several simple objects like a branch or a propeller were successfully fabricated using laser chemical vapor deposition.

Effects of Pressure Ratio on Population Inversion in a DF Chemical Laser with Concurrent Lasing

  • Park, Jun-Sung;Baek, Seung-Wook
    • Proceedings of the Korean Society of Propulsion Engineers Conference
    • /
    • 2004.03a
    • /
    • pp.287-293
    • /
    • 2004
  • A numerical simulation is presented for investigating the effects of pressure ratio of $D_2$ injector to supersonic nozzle on the population inversion in the DF chemical laser cavity, while a lasing concurrently takes place. The laser beam is generated between the mirrors in the cavity and it is important to obtain stronger population inversion and more uniform distribution of the excited molecules in the laser cavity in order to produce high power laser beam with good quality. In this study, these phenomena are investigated by means of analyzing the distributions of the DF excited molecules and the F atom used as an oxidant, while simultaneously estimating the maximum small signal and saturated gains and power in the DF chemical laser cavity. For the numerical solution, an 11-species (including DF molecules in various excited states of energies), 32-step chemistry model is adopted for the chemical reaction of the DF chemical laser system. The results are discussed by comparison with two $D_2$injector pressure cases; 192 torr and 388.64 torr. Major results reveal that in the resonator, stronger population inversions occur in the all transitions except DF(1)-DF(0), when the $D_2$injection pressure is lower. But, the higher $D_2$injection pressure provides a favorable condition for DF(1)-DF(0) transition to generate the higher power laser beam. In other words, as the pressure of $D_2$injector increases, the maximum small signal gain in the $V_{1-0}$ transition, which is in charge of generating most of laser power, becomes higher. Therefore, the total laser beam power becomes higher.r.

  • PDF

Tandem laser-induced breakdown spectroscopy laser-ablation inductively-coupled plasma mass spectrometry analysis of high-purity alumina powder

  • Lee, Yonghoon;Kim, Hyang
    • Analytical Science and Technology
    • /
    • v.32 no.4
    • /
    • pp.121-130
    • /
    • 2019
  • Alumina is one of the most important ceramic materials because of its useful physical and chemical properties. Recently, high-purity alumina has been used in various industrial fields. This leads to increasing demand for reliable elemental analysis of impurities in alumina samples. However, the chemical inertness of alumina makes the sample preparation for conventional elemental analysis a tremendously difficult task. Herein, we demonstrated the feasibility of laser ablation for effective sampling of alumina powder. Laser ablation performs sampling rapidly without any chemical reagents and also allows simultaneous optical emission spectroscopy and mass spectrometry analyses. For six alumina samples including certified reference materials and commercial products, laser-induced breakdown spectroscopy (LIBS) and laser-ablation inductively-coupled plasma mass spectrometry (LA-ICP-MS) analyses were performed simultaneously based on a common laser ablation sampling. LIBS was found to be useful to quantify alkali and alkaline earth metals with limits-of-detection (LODs) around 1 ppm. LA-ICP-MS could quantify transition metals such as Ti, Cu, Zn, and Zr with LODs in the range from a few tens to hundreds ppb.

Laser via drilling technology for the EWT solar cell (EWT 태양전지 제작을 위한 레이저 미세 관통홀 가공 기술)

  • Lee, Hong-Gu;Seo, Se-Young;Hyun, Deoc-Hwan;Lee, Yong-Wha;Kim, Gang-Il;Jung, Woo-Won;Lee, Ah-Reum;Cho, Jaee-Ock
    • Journal of the Korean Solar Energy Society
    • /
    • v.31 no.4
    • /
    • pp.103-111
    • /
    • 2011
  • Laser drilling of vias is the one of key technologies in developing Emitter-Wrap Through(EWT) solar cell which is particularly attractive due to the use of industrial processing and common solar grade p-type silicon materials. While alternative economically feasible drilling process is not available to date, the processing time and laser induced damage should be as small as possible in this process. This paper provides an overview on various factors that should be considered in using the laser via drilling technology for developing highly efficient and industrially applicable EWT solar cells.

엑사이머 레이져를 이용한 실리콘웨이퍼의 미세가공

  • 윤경구;이성국;황경현
    • Proceedings of the Korean Society of Precision Engineering Conference
    • /
    • 1997.04a
    • /
    • pp.1058-1062
    • /
    • 1997
  • Development of laser induced chemical etching technologt with KrF laser are carried out in this study for micromachining of silicon wafer. The paper is devoted to experimental identification of excimer laser induced mechanism of silicon under chlorine pressures(0.02~500torr). Experimental results on pulsed KrF excimer laser etching of silicon in chorine atmosphere are presented. Etching rate dependency on laser fluence and chlorine pressure are discussed on the basis of experimental analysis, it is concluded that accurate digital micro machining process of silicon wafer can achieved by KrF laser induced chemical etching technology.