• Title/Summary/Keyword: Chemical fluctuation

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Nonclassical Chemical Kinetics for Description of Chemical Fluctuation in a Dynamically Heterogeneous Biological System

  • Lim, Yu-Rim;Park, Seong-Jun;Lee, Sang-Youb;Sung, Jae-Young
    • Bulletin of the Korean Chemical Society
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    • v.33 no.3
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    • pp.963-970
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    • 2012
  • We review novel chemical kinetics proposed for quantitative description of fluctuations in reaction times and in the number of product molecules in a heterogeneous biological system, and discuss quantitative interpretation of randomness parameter data in enzymatic turnover times of ${\beta}$-galactosidase. We discuss generalization of renewal theory for description of chemical fluctuation in product level in a multistep biopolymer reaction occurring in a dynamically heterogeneous environment. New stochastic simulation results are presented for the chemical fluctuation of a dynamically heterogeneous reaction system, which clearly show the effects of the initial state distribution on the chemical fluctuation. Our stochastic simulation results are found to be in good agreement with predictions of the analytic results obtained from the generalized master equation.

Point Particle Approximation for Single and Two Species Diffusion-Influenced Reactions

  • Kim, Hyojoon
    • Bulletin of the Korean Chemical Society
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    • v.34 no.5
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    • pp.1454-1456
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    • 2013
  • The fluctuations in concentrations of reactants dominate the long-time dynamics of the single (A + A ${\rightarrow}$ 0) and two species (A + B ${\rightarrow}$ 0) diffusion-influenced annihilation reactions. Although hierarchical Smoluchowski approaches can provide a systematic and flexible framework to deal with the fluctuation effects, their results are too complicated to be analytically solved. For the efficient numerical calculation of the complicated fluctuation effect terms, we show that the presented point particle approximation is not only practical but also quite accurate for most conditions in diffusion-influenced reaction systems.

Rheological behavior during the phase separation of thermoset epoxy/thermoplastic polymer blends

  • Kim, Hongkyeong;Kookheon Char
    • Korea-Australia Rheology Journal
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    • v.12 no.1
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    • pp.77-81
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    • 2000
  • Rheological behavior of thermoset/thermoplastic blends of epoxy/polyethersulphone (PES) was monitored during curing of the epoxy resin. During the isothermal curing of the mixture, a fluctuation in viscosity just before the abrupt viscosity increase was observed. This fluctuation is found to be due to the phase separation of PES from the matrix epoxy resin during the curing. The experimentally observed viscosity fluctuation is simulated with a simple two phase suspension model in terms of the increase in domain size. The viscosity profiles obtained experimentally at different isothermal curing temperatures are in good agreement with the predictions from the simple model taking into account the viscosity change due to the growth of PES domain and the network formation of the epoxy matrix.

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Numerical Simulation of Thermal Fluctuation of Hot and Cold Fluids Mixing in a Tee Junction

  • Gao, Kai;Lu, Tao
    • International Journal of Advanced Culture Technology
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    • v.3 no.2
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    • pp.171-178
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    • 2015
  • In this work, mixing processes of hot and cold fluids of three different jet types are predicted by large-eddy simulation (LES) on FLUENT platform. Temperature at different positions of internal wall and mixing conditions of T-junctions at different times are obtained, then the simulated normalized mean and root-mean square (RMS) temperature, temperature contour and velocity vector of every case are compared. The results indicate that, the mixing regions in the tee junction is related to the jet type, and temperature fluctuations on the pipe wall in the type of the deflecting jet is the least.

Concentration Dependences of the Isotropic Raman Line Widths of Acetonitrile and Acetonitrile-d$_3$ in Carbon Tetrachloride

  • Choe, Joong-Chul;Kim, Myung-Soo
    • Bulletin of the Korean Chemical Society
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    • v.7 no.1
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    • pp.63-66
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    • 1986
  • Concentration dependences of the isotropic Raman line widths for the $ {\nu}_1$ (C-H and C-D) and the ${\nu}_2\;(C{\equiv}N)$ modes for $CH_3CN$ and $CD_3CN\;in\;CCl_4$ solutions have been investigated. For the ${\nu}_1$ modes, the dephasing seems to be a good description for the isotropic line broadening in $CCl_4$ solution even though the concentration fluctuation can reproduce the experimental results also. For the ${\nu}_2$ modes, the concentration fluctuation was the dominant mechanism for the concentration-dependent line broadening.

The Minimum Fluidization Velocity of Gaussian Distribution Particle System According to Standard Deviation (Gaussian 분포의 입자군의 표준편차에 따른 최소유동화속도)

  • Jang, Hyun Tae;Park, Tae Sung;Cha, Wang Seog
    • Korean Chemical Engineering Research
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    • v.46 no.3
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    • pp.567-570
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    • 2008
  • The present study investigated the applicability of the minium fludization velocity measuring method using linear regression analysis between the standard deviation of pressure fluctuation and gas velocity in multi-particle sand on a fluidized bed 0.109 in inner diameter. We measured minium fludization velocity according to the standard deviation of particle distribution in Gaussian distribution. The measured value compared with other researchers' equations. The minium fludization velocity derived from the linear regression analysis of the standard deviation of pressure fluctuation and pressure drop inside the bed. We also found that the minium fludization velocity of a multi-particle system using the standard deviation of pressure fluctuation must be measured at freely bubbling region.

OES based PECVD Process Monitoring Accuracy Improvement by IR Background Signal Subtraction from Emission Signal (적외선 배경신호 처리를 통한 OES 기반 PECVD공정 모니터링 정확도 개선)

  • Lee, Jin Young;Seo, Seok Jun;Kim, Dae-Woong;Hur, Min;Lee, Jae-Ok;Kang, Woo Seok
    • Journal of the Semiconductor & Display Technology
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    • v.18 no.1
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    • pp.5-9
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    • 2019
  • Optical emission spectroscopy is used to identify chemical species and monitor the changes of process results during the plasma process. However, plasma process monitoring or fault detection by using emission signal variation monitoring is vulnerable to background signal fluctuations. IR heaters are used in semiconductor manufacturing chambers where high temperature uniformity and fast response are required. During the process, the IR lamp output fluctuates to maintain a stable process temperature. This IR signal fluctuation reacts as a background signal fluctuation to the spectrometer. In this research, we evaluate the effect of infrared background signal fluctuation on plasma process monitoring and improve the plasma process monitoring accuracy by using simple infrared background signal subtraction method. The effect of infrared background signal fluctuation on plasma process monitoring was evaluated on $SiO_2$ PECVD process. Comparing the $SiO_2$ film thickness and the measured emission line intensity from the by-product molecules, the effect of infrared background signal on plasma process monitoring and the necessity of background signal subtraction method were confirmed.

Nonlinear Response of Classical Dynamical Systems to Short Pulses

  • Dellago, Christoph;Mukamel, Shaul
    • Bulletin of the Korean Chemical Society
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    • v.24 no.8
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    • pp.1107-1110
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    • 2003
  • Valuable insight into the nonlinear dynamics of a system can be gleaned from its response to a single intense short pulse. We derive expressions for the corresponding nonlinear response functions and show that the fluctuation-dissipation theorem may be extended beyond the linear response limit to an arbitrary pulse intensity. As an illustrative example, we calculate response functions up to 11th order for the regular Lorentz gas in two dimensions.

Improvement of the Quality of Cryogenic Machining by Stabilization of Liquid Nitrogen Jet Pressure (액체질소 분사 안정화를 통한 극저온가공 품질 향상)

  • Gang, Myeong Gu;Min, Byung-Kwon;Kim, Tae-Gon;Lee, Seok-Woo
    • Journal of the Korean Society for Precision Engineering
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    • v.34 no.4
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    • pp.247-251
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    • 2017
  • Titanium alloy has been widely used in the aerospace industry because of its high strength and good corrosion resistance. During cutting, the low thermal conductivity and high chemical reactivity of titanium generate a high cutting temperature and accelerates tool wear. To improve cutting tool life, cryogenic machining by using a liquid nitrogen (LN2) jet is suggested. In cryogenic jet cooling, evaporation of LN2 in the tank and transfer tube could cause pressure fluctuation and change the cooling rate. In this work, cooling uniformity is investigated in terms of liquid nitrogen jet pressure in cryogenic jet cooling during titanium alloy turning. Fluctuation of jet spraying pressure causes tool temperature to fluctuate. It is possible to suppress the fluctuation of the jet pressure and improve cooling by using a phase separator. Measuring tool temperature shows that consistent LN2 jet pressure improves cryogenic cooling uniformity.