• Title/Summary/Keyword: Chemical Vapor Reaction

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Effect of Gallium Addition to HZSM-5 on Catalytic Pyrolysis of an LDPE-LLDPE-EVA Copolymer Mixture (HZSM-5를 이용한 LDPE-LLDPE-EVA공중합체 혼합물의 접촉 열분해 반응에 미치는 Gallium 첨가 효과)

  • Jeon, Jong-Ki;Kim, Hyunjin;Kim, Min Ji;Kang, Tae-Won;Park, Young-Kwon
    • Applied Chemistry for Engineering
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    • v.18 no.1
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    • pp.58-63
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    • 2007
  • The aim of the present work is to study the effect of gallium addition to HZSM-5 on recovery rates of gaseous and liquid products and carbon number distribution in the catalytic cracking of a polymer mixture, LDPE, LLDPE, and EVA copolymer, with a composition similar to that found in real agricultural film wastes. Ga/HZSM-5 system produced a larger amount of aromatic hydrocarbons than HZSM-5. The yield of aromatic compound in vapor phase contact was higher than that in liquid phase contact. The yield of aromatic compound increased with the amount of catalyst and with the reaction temperature of catalyst bed. The effect of gallium addition on the carbon number distribution was not great.

Preparation of Nickel Nanopowder using the Transferred Arc Plasma for MLCCs (이송식 아크 플라즈마를 이용한 MLCC용 니켈 나노분말의 합성)

  • Jung, Da-Woon;Oh, Seung-Min;Park, Dong-Wha
    • Korean Chemical Engineering Research
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    • v.46 no.4
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    • pp.701-706
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    • 2008
  • Nano-sized nickel powders were prepared by evaporating the bulk nickel metarial using transferred arc thermal plasma. Nitrogen gases are easily dissociated to atomic nitrogen in thermal plasma and they are quickly dissolved in molten nickel. Super-saturated atomic nitrogen in molten nickel is recombined to nitrogen gas because of the relatively low temperature of nickel surface. Generally, the recombine reaction of atomic nitrogen is exothermic, so bulk nickel is quickly evaporated to nickel vapor due to the thermal energy of recombine reaction. The particle size of nickel powder was controlled by $N_2$ used as the diluting gas. It was observed that as the diluting gas flow rate was increase, the particle size was decreased and the particle size distribution was narrowed. The average particle size at 250 l/min of the diluting gas was 202 nm analyzed by means of the particle size analyzer (PSA).

Modeling on Hydrogen Effects for Surface Segregation of Ge Atoms during Chemical Vapor Deposition of Si on Si/Ge Substrates

  • Yoo, Kee-Youn;Yoon, Hyunsik
    • Korean Chemical Engineering Research
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    • v.55 no.2
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    • pp.275-278
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    • 2017
  • Heterogeneous semiconductor composites have been widely used to establish high-performance microelectronic or optoelectronic devices. During a deposition of silicon atoms on silicon/germanium compound surfaces, germanium (Ge) atoms are segregated from the substrate to the surface and are mixed in incoming a silicon layer. To suppress Ge segregation to obtain the interface sharpness between silicon layers and silicon/germanium composite layers, approaches have used silicon hydride gas species. The hydrogen atoms can play a role of inhibitors of silicon/germanium exchange. However, there are few kinetic models to explain the hydrogen effects. We propose using segregation probability which is affected by hydrogen atoms covering substrate surfaces. We derived the model to predict the segregation probability as well as the profile of Ge fraction through layers by using chemical reactions during silicon deposition.

Kinetic Study on Preparation of Iron Fine Powders by Hydrogen Reduction of Ferous Chloride Vapor (염화물의 기상환원반응에 의한 미립질 철분말의 생성속도에 관한 연구)

  • Lee, Hwa-Yeong;Kim, Seong-Gyu
    • Korean Journal of Materials Research
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    • v.10 no.6
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    • pp.385-391
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    • 2000
  • A kinetic study on the preparation of iron powder by hydrogen reduction of ferrous chloride vapor has been carried out both experimentally and theoretically. For the preparation of iron powder, ferrous chloride was vaporized and transported to a reaction zone by Ar gas used as carrier. Ferrous chloride vapor and hydrogen were mixed and subject to a reduction reaction at high temperature to produce iron powder and HCI gas. Iron powder was collected with organic solvent at the end of reaction zone and HCI gas was also absorbed in a caustic soda solution to determine the conversion ratio of ferrous chloride. For the development of rate equations, a 1st-order reaction and equilibration of ferrous chloride vapor with Ar gas were assumed. According to the results, the rate constant, k could be expressed as $k=7,879exp(-53,840/RT)\textrm{dm}^3/mole.sec$ and the activation energy was found to be 53.84kJ/mole. From TEM observation, the particle size distribution of iron powder produced was found to be in the range of $0.1~1.0{\mu\textrm{m}}$ which was not significantly influenced by reaction temperature or gas flow rates.

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Chemical Reaction of $H_2$/Air Mixture Inhibited by Heptafluoropropane(HFP) during Autoignition Process (HFP가 첨가된 수소/공기 혼합기의 자연점화에서의 화학반응)

  • Lee, Eui-Ju;Oh, Chang-Bo
    • Proceedings of the Korea Institute of Fire Science and Engineering Conference
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    • 2008.04a
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    • pp.100-103
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    • 2008
  • Autoignition suppression of hydrogen/air premixed mixtures by $CF_3CHFCF_3$(HFP) was investigated computationally. Numerical simulation was performed in isobaric and homogeneous system to evaluate the induction times. The detailed chemistry of 93 species and 817 reaction mechanism was introduced for hydrogen/air/HFP mixtures. The results shows the similar concentrations for the major reactants such as hydrogen and oxygen during autoignition while water vapor produced at the ignition temperature was decomposed later, which leaded to the shoulder on the concentration of H, OH and O radical with time. The fluorine included from HFP was converted mainly to stable HF and the carbon was formed to various species, CF2, CF2O, CO etc. More details of chemical effects of HFP addition will be investigate with sensitivity analysis in the near future.

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Deposition of $MgB_2$ Thin Films on Alumina-Buffered Si Substrates by using Hybrid Physical-Chemical Vapor Deposition Method (혼성물리화학기상 증착법에 의한 알루미나 완충층을 가진 실리콘 기판 위의 $MgB_2$ 박막제조에 대한 연구)

  • Lee, T.G.;Park, S.W.;Seong, W.K.;Huh, J.Y.;Jung, S.G.;Lee, B.K.;An, K.S.;Kang, W.N.
    • Progress in Superconductivity
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    • v.9 no.2
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    • pp.177-182
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    • 2008
  • [ $MgB_2$ ] thin films were fabricated using hybrid physical-chemical vapor deposition (HPCVD) method on silicon substrates with buffers of alumina grown by using atomic layer deposition method. The growth war in a range of temperatures $500\;{\sim}\;600^{\circ}C$ and under the reactor pressures of $25\;{\sim}\;50\;Torr$. There are some interfacial reactions in the as-grown films with impurities of mostly $Mg_2Si$, $MgAl_2O_4$, and other phases. The $T_c$'s of $MgB_2$ films were observed to be as high as 39 K, but the transition widths were increased with growth temperatures. The magnetization was measured as a function of temperature down to the temperature of 5 K, but the complete Meissner effect was not observed, which shows that the granular nature of weak links is prevailing. The formation of mostly $Mg_2Si$ impurity in HPCVD process is discussed, considering the diffusion and reaction of Mg vapor with silicon substrates.

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Determination of Bi Impurity in Lead Stock Standard Solutions by Hydride-generation Inductively Coupled Plasma Mass Spectrometry

  • Park, Chang J.
    • Bulletin of the Korean Chemical Society
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    • v.25 no.2
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    • pp.233-236
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    • 2004
  • Total impurity analysis of a primary standard solution is one of the essential procedures to determine an accurate concentration of the standard solution by the gravimetry. Bi impurity is determined in Pb standard solutions by inductively coupled plasma mass spectrometry (ICP-MS). The direct nebulization of the Pb standard solution produces a significant amount of the Pb matrix-induced molecular ions which give rise to a serious spectral interference to the Bi determination. In order to avoid the spectral interference from the interferent $^{208}PbH^+$, the hydride generation method is employed for the matrix separation. The Bi hydride vapor is generated by reaction of the sample solution with 1% sodium borohydride solution. The vapor is then directed by argon carrier gas into the ICP after separation from the mixture solution in a liquid-gas separator made of a polytetrafluoroethylene membrane tube. The presence of 1000 ${\mu}$g/mL Pb matrix caused reduction of the bismuthine generation efficiency by about 40%. The standard addition method is used to overcome the chemical interference from the Pb matrix. Optimum conditions are investigated for the hydride-generation ICPMS. The detection limit of this method is 0.5 pg/mL for the sample solutions containing 1000 ${\mu}$g/mL Pb matrix.

Preparation of Pt Catalyst Supported on Zeolite Sheet and Its Performance of Toluene Combustion (제올라이트 쉬트 담지 백금촉매의 제조 및 톨루엔 연소 특성)

  • Kim, Jin-Bae;Im, Na Rae;Kim, Hong Soo;Yoo, Yoon Jong
    • Applied Chemistry for Engineering
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    • v.22 no.3
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    • pp.323-327
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    • 2011
  • A zeolite sheet (ceramic paper containing zeolite) made in a cylindrical configuration can be applied to a honeycomb rotor for the effective VOC removal. In this study, the zeolite sheet containing ZSM-5 was used as a support for Pt-loading, and its catalytic activity for the toluene combustion reaction was compared with those of the other Pt catalysts loaded on ${\gamma}-Al_2O_3$ and cordierite honeycomb. Pt/zeolite sheet catalyst showed a higher activity for toluene combustion reaction than that of $Pt/{\gamma}-Al_2O_3$ or Pt/cordierite honeycomb. On the other hand, the dispersion of Pt particles loaded on the zeolite sheet was improved by the pretreatment with $NH_3-H_2O$ vapor at room temperature. Consequently, the pretreatment of Pt/zeolite sheet by $NH_3-H_2O$ vapor significantly enhanced the catalytic activation for toluene combustion reaction.

Influence of the Water Vapor Content on the Hydrogen Reduction Process of Nanocrystalline NiO

  • Jung, Sung-Soo;An, Hyo-Sang;Lee, Jai-Sung
    • Korean Journal of Metals and Materials
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    • v.48 no.4
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    • pp.315-319
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    • 2010
  • In this study, the hydrogen reduction behavior of ball-milled NiO nanopowder was investigated depending on the partial pressure of water vapor. The hydrogen reduction behavior was analyzed by thermogravimetry and hygrometry under heating to 873 K in hydrogen. In order to change the partial pressure of the water vapor, the dew point of hydrogen was controlled in the range of 248 K~293 K by passing high-purity hydrogen through a saturator that contained water. Interestingly, with the increase in the dew point of the hydrogen atmosphere, the first step of the hydrogen reduction process decreased and the second step gradually increased. After the first step, a pore volume analysis revealed that the pore size distribution in the condition with a higher water vapor pressure shifted to a larger size, whereas the opposite appearedat a lower pressure. Thus, it was found that the decrease in the pore volume during the chemical reaction controlled process at a dew point of 248 K caused a reduction in retardation in the diffusion controlled process.

Synthesis of Novel Platinum Precursor and Its Application to Metal Organic Chemical Vapor Deposition of Platinum Thin Films

  • Lee, Sun-Sook;Lee, Ho-Min;Park, Min-Jung;An, Ki-Seok;Kim, Jin-Kwon;Lee, Jong-Heun;Chung, Taek-Mo;Kim, Chang-Gyoun
    • Bulletin of the Korean Chemical Society
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    • v.29 no.8
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    • pp.1491-1494
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    • 2008
  • A novel platinum aminoalkoxide complex, Pt$(dmamp)_2$ has been prepared by the reaction of cis-$(py)_2PtI_2$ with two equivalents of Na(dmamp) (dmamp = 1-dimethylamino-2-methyl-2-propanolate). Single-crystal X-ray crystallographic analysis shows that the Pt(dmamp)2 complex keeps a square planar geometry with each two nitrogen atoms and two oxygen atoms having trans configuration. Platinum films have been deposited on TaN/ Ta/Si substrates by metal organic chemical vapor deposition (MOCVD) using Pt$(dmamp)_2$. As-deposited platinum thin films did not contain any appreciable amounts of impurities except a little carbon. As the deposition temperature was increased, the films resistivity and deposition rate increased. The electrical resistivity (13.6 $\mu\Omega$cm) of Pt film deposited at 400 ${^{\circ}C}$ is a little higher than the bulk value (10.5 $\mu\Omega$cm) at 293 K. The chemical composition, crystalline structure, and morphology of the deposited films were investigated by X-ray photoelectron spectroscopy, X-ray diffraction, and atomic force microscopy.