• Proceedings of the KSME Conference
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• 2000.11b
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• pp.532-537
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• 2000

The purpose of this study is to determine the performance of a commercial air cleaner in removing tobacco smoke indoors. Following injection of tobacco smoke in a room, decay rates for particle concentrations were obtained far mass concentration at each point. The size distribution of the tobacco smoke particles was approximately $1.266{\mu}m$ in mass median diameter with a geometric standard deviation of 1.313. The air cleaner consisted of an electrostatic filtration unit and a fan operated at a flow rate of 5.98 CMM. The collection efficiency for $>1\;{\mu}m$ was more than 99%. Without air cleaner operation, tobacco smoke concentration ratio in room decreased to 30% of initial values within 30 minutes and with air cleaner operation, decreased to 90% of initial values in the test chamber, volume $51.27\;m^3$. Without air cleaner operation, tobacco smoke concentration ratio in room decreased to 10% of initial values within 30 minutes and with air cleaner operation, decreased to 30-70% of initial values in the test chamber, volume $149.2\;m^3$.

• Proceedings of the KIPE Conference
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• 2003.07b
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• pp.611-615
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• 2003

In this paper, a operation characteristics and analysis of the HB(half bridge) inverter for remote plasma system are studied. the remote plasma system is cleaning system for the chemical vapor deposition (CVD) chamber in semiconductor processing. The remote plasma system is powered by the RF generator The main power stage of the RF generator is used for the HB PWM inverter with an low pass filter in the secondary circuit of the transformer. The detailed mode analysis of HB invertor was described. The operation characteristics of Remote Plasma Source are verified by simulation and experimental results.

• Journal of the Korean Vacuum Society
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• v.1 no.1
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• pp.1-10
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• 1992

Three chemical precleaning methods-degreasing, electropolishing and acidic etching-suitable for stainless steel vacuum chamber have been studied and compared. The techniques used in evaluating and comparing the three treatments include Auger analysis and the measurement of the outgassing rate. The obtained outgassing rates (N2 equivalent) are 1.1 $\times$ 10-10torr l/s cm2 and 3.9 $\times$ 10-11torr l/s cm2 for degreasing electropolishing, and etching method, respectively, after 48 hours from the initial pumpdown at room temperature. A simple model is introduced to analyze the pumpdown curve. Some surface parameters, such as surface coverage, mean residence time, and desorption energy, are calculated from corresponding equations derived from this model.

• Journal of the Korean Recycled Construction Resources Institute
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• v.8 no.3
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• pp.356-364
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• 2020

An experimental study to investigate the effect of self-cleaning of mortar mixed with photocatalyst was performed out in this study. Test parameters included the photocatalyst content and surface roughness of the specimens. The experimental mortar specimens were manufactured by mixing a photocatalyst by cement weight of 2.5%, 5.0%, 7.5% and 10.0%. In addition, the surface roughness was categorized into three cases. They included flat surface condition, little surface roughness(medium roughness), and high surface roughness. After mortar specimens were cured for 28 days, they were illuminated by an ultraviolet lamp for 24 hours and immersed in a methylene blue conditioning solution for 12 hours. Thereafter, an ultraviolet(UV) lamp was illuminated on the specimens for 48 hours in an experimental chamber and then the color change of methylene blue solution was measured by using a spectrophotometer over illuminating time of UV lamp. The color change of methylene blue tended to increase as photocatalyst contents increased. Test results meant that photocatalyst was effective for self-cleaning in mortar. However, the color change of the methylene blue solution did not show a noticeable tendency at different surface roughness conditions. It might be due to the uneven photocatalyst distribution on the surface of mortar specimens.

• Proceedings of the Korean Vacuum Society Conference
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• 2000.02a
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• pp.180-180
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• 2000

Plasma source ion implantation is a new doping technique for the formation of shallow junction with the merits of high dose rate, low-cost and minimal wafer charging damage. In plasma source ion implantation process, the wafer is placed directly in the plasma of the appropriate dopant ions. Negative pulse bias is applied to the wafer, causing the dopant ions to be accelerated toward the wafer and implanted below the surface. In this work, inductively couples plasma was generated by anodized Al antenna that was located inside the vacuum chamber. The outside wall of Al chamber was surrounded by Nd-Fe-B permanent magnets to confine the plasma and to enhance the uniformity. Before implantation, the wafer was pre-sputtered using DC bias of 300B in Ar plasma in order to eliminate the native oxide. After cleaning, B2H6 (5%)/H2 plasma and negative pulse bias of -1kV to 5 kV were used to form shallow p+/n junction at the boron dose of 1$\times$1015 to 5$\times$1016 #/cm2. The as-implanted samples were annealed at 90$0^{\circ}C$, 95$0^{\circ}C$ and 100$0^{\circ}C$during various annealing time with rapid thermal process. After annealing, the sheet resistance and the junction depth were measured with four point probe and secondary ion mass spectroscopy, respectively. The doping uniformity was also investigated. In addition, the electrical characteristics were measured for Schottky diode with a current-voltage meter.

• Journal of Korean Society for Atmospheric Environment
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• v.31 no.1
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• pp.54-62
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• 2015

Small scale paint overspray booths are being operated nationwidely, for repair of passenger car body parts. paint aerosols are emitted from the paint overspray booth in operations. In paint overspray booth operations without ventilation system and air pollutants collection unit, it may land on nearby equipment. In this study a removal of sticky paint aerosol for application of the small-scale overspray paint booth. it's cause the surface of filter bag from generated sticky paint aerosol. To remove adhesion of paint aerosol the agglomerating agents are injected and mixed with sticky paint aerosols prior to reach the filter bag. The paint spray rate was set as $10{\pm}5g/min$ from air-atomized spray guns in the spray booth, injection rate of agglomerating was $10{\pm}5g/min$ in the mixing chamber. The filtration velocity including air pollutants varied from 0.2 m/min to 0.4 m/min. Bag cleaning air pressure was set as $5.0kg_f/min$ for detaching dust cake from surface of filter bag. Bag cleaning interval at the filtration velocity of 0.2 m/min was around 3 times longer than that of the 0.4 m/min. The residual pressure drop maintained highest value at the highest filtration velocity. Fractional efficiency of 99.952%~99.971% was possible to maintain for the particle size of 2.5 microns. Total collection efficiency at the filtration velocity of 0.2 m/min was 99.42%. During this study we could confirm high collection efficiency and long cleaning intervals for the test with filtration velocity of 0.2 m/min indicating an optimal value for the given dimensions of the test unit and test operating conditions.

• Journal of the Korean Vacuum Society
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• v.19 no.5
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• pp.371-376
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• 2010

The GaAs epitaxial layers were grown on Si(100) substrates by molecular beam epitaxy (MBE) using the two-step method. The Si(100) substrates were cleaned with three different surface cleaning methods of vacuum heating, As-beam exposure, and Ga-beam deposition at the substrate temperature of $800^{\circ}C$ in the MBE growth chamber. Growth temperature and thickness of the GaAs epitaxial layer were $800^{\circ}C$ and $1{\mu}m$, respectively. The surface structure and properties were investigated by reflection high-energy electron diffraction (RHEED), AFM (Atomic force microscope), DXRD (Double crystal x-ray diffraction), PL (Photoluminescence), and PR (Photoreflectance). From RHEED, the surface structure of GaAs epitaxial layer grown on Si(100) substrate with Ga-beam deposition is ($2{\times}4$). The GaAs epitaxial layer grown on Si(100) substrate with Ga-beam deposition has a high quality.

• Applied Microscopy
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• v.47 no.1
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• pp.55-62
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• 2017

This paper describes experiments aimed at characterizing the behavior of field electron emitters fabricated by coating carbon fibers with epoxylite resin. Polyacrylonitrile carbon fibers of type VPR-19, thermally treated at $2,800^{\circ}C$, were used. Each was initially prepared in a "uncoated" state, by standard electro polishing and cleaning techniques, and was then examined in a scanning electron microscope. The fiber was then baked overnight in a field electron microscope (FEM) vacuum chamber. Current-voltage characteristics and FEM images were recorded on the following day or later. The fiber was then removed from the FEM, coated with resin, "cured" by baking, and replaced in the FEM. After another overnight bake, the FEM characterization measurements were repeated. The coated fibers had significantly better performance than uncoated fibers. This confirms the results of earlier experiments, and is thought to be due in part to the formation of a conducting channel in the resin over layer. For the coated fiber, lower voltages were needed to obtain the same emission current. The coated fibers have current-voltage characteristics that show smoother trends, with greater stability and repeatability. No switch-on phenomena were observed. In addition, the emission images on the phosphor-coated FEM screen were more concentrated, and hence brighter.

• Journal of the Korean Vacuum Society
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• v.8 no.4B
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• pp.514-518
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• 1999

Gold (Au) is not supposed to react with sapphire(single crystalline ) under thermodynamic equillibrium, therefore, a strong adhesion between these two dissimilar materials is not expected. However, pull test showed that the gold film sputter-deposited onto annealed and pre-sputtered sapphire exhibited very strong adhesion even without post-deposition annealing. Strongly and weakly adhered samples as a result of the pull testing were selected to investigate the adhesion mechanisms with Auger electron spectroscopy. The Au/ interfaces were analyzed using a new technique that probes the interface on the film using Auger electron escape depth. It revealed that one or two monolayers of Au-Al-O compound formed at the Au/Sapphire interface when AES in the UHV chamber. It showed that metallic aluminum was detected on the surface of sapphire substrates after irradiating for 3 min. with 7keV Ar+ -ions. These results agree with TRIM calculations that yield preferential ion-beam etching. It is concluded that the formation of Au-Al-O compound, which is responsible for the strong metal-ceramic bonding, is due to ion-induced cleaning and reduction of the sapphire surface, and the kinetic energy of depositing gold atoms, molecules, and micro-particles as a driving force for the inter-facial reaction.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.16 no.5
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• pp.157-165
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• 2017

The high-pressure resin transfer molding (HP-RTM) technology has been commercialized for fast production of fiber reinforced composite materials. The high-pressure mixing head was one of the most core component of the HP-RTM process. In this study, a mixing head was systematically designed, manufactured and evaluated. This mixing head was composed of a nozzle, a mixing chamber, a cleaning piston part, and an internal mold release part. In actual, a straight-type structure was newly designed instead of the conventional L-type structure for improving the maximum mixing pressure and mixing ratio precision. The performance of mixing head was showed maximum mixing pressure of 15.22MPa and mixing ratio precision of 0.12%. CFRP molding experiments were successfully obtained a 6~11 laminating carbon sheet using HP-RTM presses and specimen molds.