• 한국기계가공학회지
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• 제18권5호
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• pp.1-8
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• 2019

Breath analysis using a portable device is better than the classical breath analysis system in terms of installation and operation. There is an increasing need to develop cost-effective equipment for testing gas sensors from the viewpoint of functionalities that can be applied applicable to portable devices. In the present study, an economical gas chamber for in-situ gas measurement is implemented with a single gas chamber without using expensive gas storage and control equipment; the gas response characteristics are analyzed using the above-described chamber. The main features of the implemented gas chamber are simple injection procedure, improved gas diffusion, easy measurement and cleaning, support for low-power mode measurement function for portable devices, and open source platform. Moreover, an analysis of gas response characteristics based on changes in sensor voltage show that the sensitivity and 90% response time are affected by the sensor voltage. Furthermore, the sensitivity graph has an inflection point in a specific range. The gas sensor applied in this study showed fast response speed and high sensitivity for sensor voltages of 3.0-3.5 V, regardless of the concentration of acetone gas, the target gas used in this study.

• 한국산학기술학회논문지
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• 제15권3호
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• pp.1229-1235
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• 2014

LPG차량의 공기 흡입 시스템에서 먼지 입자의 대부분은 공기 청정기를 통해 제거되지만, 아주 작은 입자는 제거되지 않고 흡기계통에 축적되게 된다. 이 축적된 카본은 공회전 속도 제어와 센서신호 그리고 배출가스에 영향을 주게 된다. 또한 엔진 채터링 현상이나 자동변속기의 변속시점 불량등을 야기시킨다. 이 연구는 세척액을 사용하여 흡기계통을 세척하는 것에 관한 것이다. 워밍업된 챠량에서 흡입호스를 제거하고 세척액을 사용하여 가속시에 세척액을 흡입장치에 분사시켜 흡기계통을 세척하는 것이다. 세척액을 사용하여 스로틀 바디, ISC, 서지탱크, 흡입매니폴드, 흡기밸브, 연소실까지 세척함으로서 다음과 같은 실험결과를 얻을 수 있다. 스로틀 밸브가 정확하게 작동되어 TPS의 센서 신호 전압이 개선되었으며, 차량이 정지하는 경우 ISC 시스템은 공회전 속도 제어를 원활하게 작동하였다. 또한 일산화탄소는 약 0.15 %, 탄화수소는 약 20~100PPM으로 각각 감소되어 배기가스가 현저하게 개선되었다.

• Journal of Welding and Joining
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• 제17권4호
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• pp.32-38
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• 1999

PAL(Pohang Accelerator Laboratory) designed and manufactured a 5m-long straight vacuum chamber to adopt U7 undulator that is the first insertion device. Top and bottom plates of the vacuum chamber were made of Al alloy A5083-H321, and welded together by the GTAW welding. The leak rate is less than 1×{TEX}$10^{-10}${/TEX} torr·ℓ/s with negligible welding deformation. The pressure has been maintained below {TEX}$10^{-10}${/TEX} torr after installation. This paper reports the welding process and the method applied to achieve ultimate vacuum performance and t satisfy integrity of welds.

• 한국수소및신에너지학회논문집
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• 제30권5호
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• pp.428-435
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• 2019

A comparative evaluation of engine cleanliness was performed on the transport gasoline blended with bio- alcohols, and this study was considered to achieve the aim of greenhouse gas reduction in Korea. In particular, the fuel blended with bio-ethanol and bio-butanol showed the best engine cleaning performance both on combustion chamber deposits and intake valve deposits. The deposit control gasoline additive was effective to remove intake valve deposits. In contrast, the amount of combustion chamber deposits were tend to increase even though fuels blended with bio-alcohols were used. In overall, fuels blended with bio-alcohols, compared to fossil fuels, still showed outstanding performance in terms of engine cleanliness.

• 조명전기설비학회논문지
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• 제20권8호
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• pp.6-14
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• 2006

본 논문은 TFT-LCD(Thin Film Transistor Liquid Crystal Display) PECVD(Plasma Enhanced Chemical Vapor Deposition) 장비 공정용 챔버(Chamber) 세정을 위한 새로운 플라즈마 세정방법에 적합한 플라즈마 발생방법과 플라즈마 발생을 위한 고주파 전원장치의 전력회로에 관한 연구이다. 세정에 요구되는 고밀도 플라즈마는 안테나 형태의 기존 ICP(Inductively Coupled Plasma) 방식에 강자성체인 페라이트 코어를 적용하므로 써 $1{\times}10^{11}[EA/cm^3]$이상의 고밀도 플라즈마 발생을 가능하게 하였다. 플라즈마 발생을 위한 400[kHz] 고주파 전력 변환장치의 경우 범용 HB(Half Bridge) 인버터 방식을 적용하여 플라즈마 부하에서도 안정적인 영전압 스위칭 동작을 확인 하였다. 변압기 직렬결합 방식을 사용한 10[kW] 고출력을 통해 $A_r$과 $NF_3$가스 분위기하에서 플라즈마의 밀도와 $NF_3$가스 분해율을 측정하므로서 고주파 전력 변환 장치의 성능을 입증하였다.

• 한국표면공학회지
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• 제34권5호
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• pp.403-408
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• 2001

In this work, the cyclic perfluorinated ether (c-C$_4$F$_{8}$O) with very high destructive removal efficiency (DRE) than other alternative gases, such as $C_3$F$_{8}$, c-C$_4$F$_{8}$ and NF$_3$ was used as an alternative process chemical. The plasma cleaning of silicon nitride using gas mixtures of c-C$_4$F$_{8}$O/O$_2$ and c-C$_4$F$_{8}$O/O$_2$+ $N_2$ was investigated in order to evaluate the effects of adding $N_2$ to c-C$_4$F$_{8}$O/O$_2$ on the global warming effects. Under optimum condition, the emitted net perfluorocompounds (PFCs) during cleaning of silicon nitride were quantified and then the effects of additive $N_2$ by obtaining the destructive removal efficiency (DRE) and the million metric tons of carbon equivalent (MMT-CE) were calculated. DRE and MMTCE were obtained by evaluating the volumetric emission using. Fourier transform-infrared spectroscopy (FT-IR). During the cleaning using c-C$_4$F$_{8}$O/O$_2$+$N_2$, DRE values as high as (equation omitted) 98% were obtained and MMTCE values were reduced by as high as 70% compared to the case of $C_2$F$_{6}$O$_2$. Recombination characteristics were indirectly investigated by combining the measurements of species in the chamber using optical emission spectroscopy (OES), before and after the cleaning, in order to understand any correlation between plasma and emission characteristics as well as cleaning rate of silicon nitride.silicon nitride.

• 유기물자원화
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• 제15권4호
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• pp.138-146
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• 2007

서울시에는 아직도 생활하수와 빗물이 함께 흘러가는 합류식 하수관거지역이 많다. 이들 지역의 모든 건물들은 화장실 세정수로부터 고체상 물질을 분리해서 저장하는 정화조가 설치되어 있다. 정화조는 연 1회 이상 청소를 해야 하며 이 과정에서 분뇨가 수거된다. 수거분뇨는 처리시설이 필요로 하며, 과부족이 없는 처리시설을 확보하기 위해서는 장래에 발생할 분뇨수거량을 예측해야 한다. 본 연구에서는 그 분뇨수거량의 예측방법을 검토하였다. 여러 가지 예측인자 중 건물연면적이 가장 신뢰할 수 있었고, 수거분뇨는 처리 시설이 필요로 하며, 과부족이 없는 처리시설을 확보하기 위해서는 장래에 발생할 분뇨수거량을 예측해야 한다. 본 연구에서는 그 분뇨수거량의 예측방법을 검토하였다. 여러 가지 예측인자 중 건물연면적이 가장 신뢰할 수 있었고, 분뇨수거량이 꾸준하게 증가해서 2020년 서울시에서는 1일 13,149kL이 발생할 것으로 평가되었다. BOD의 변화도 예측이 가능하였다.

• 반도체디스플레이기술학회지
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• 제23권2호
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• pp.100-106
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• 2024

To generate the plasma required in dry cleaning processes, the plasma chamber must be supplied with a high-quality AC voltage with a voltage of more than 1 kV and a frequency of 400 kHz. In the existing research, many methods to supply high power have been studied, but how to improve the quality of the power for high-quality plasma has been relatively little studied. In this paper, we propose a study to improve the quality of RF power circuit for high-quality plasma generation in dry cleaning method. Existing methods in the environment of full-bridge-based RF power circuits must perform PWM duty control in the light load region. This causes distortions in the waveform, resulting in poor power quality, which directly leads to poor plasma quality. To solve these problems, a half-bridge switching method is proposed and the improvement in waveform quality is verified. To verify the feasibility of the design and control algorithm proposed in this paper, an RF power circuit prototype is fabricated and the proposed design and control method is verified through simulation and actual experiments under dummy load.

• 한국반도체및디스플레이장비학회:학술대회논문집
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• 한국반도체및디스플레이장비학회 2007년도 춘계학술대회
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• pp.128-131
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• 2007

As the minimum feature size decrease, control of contamination by nanoparticles is getting more attention in semiconductor process. Cleaning technology which removes nanoparticles is essential to increase yield. A reference wafer on which particles with known size and number are deposited is needed to evaluate the cleaning process. We simulated particle trajectories in the chamber by using FLUENT. Charged monodisperse particles are generated using scanning mobility particle sizer (SMPS) and deposited on the wafer by electrostatic force. The experimental results agreed with the simulation results well. We calculate the particles loss in pipe flow theoretically and compare with the experimental results.

• 반도체디스플레이기술학회지
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• 제3권2호
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• pp.11-15
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• 2004

Scales, accumulated on some parts of semiconductor equipments such as sputters and CVD during the device fabrication processes, often lower the lifetime of the equipments and production yields. Thus, many equipment parts have be cleaned regularly. In this study, an attempt to establish an effective process to remove scales on the sidewall of collimators located inside the chamber of the sputter was made. The EDX analysis revealed that the scales were composed of Ti and TiN with the columnar structure. Through the trial-and-error experiments, it was found that the etching in the $HNO_3$:$H_2SO_4$:$H_2O$=4:2:4 solution for 5.5 hrs at $67^{\circ}C$, after the oxide removal in the HF solution, and the heat-treatment at $700^{\circ}C$ for 1 min., was the most effective process for the scale removal.