• Title/Summary/Keyword: Cathode Flow Rate

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Electroplating on the Lead Frames Fabricated from Domestic Copper Plate (국산동판을 사용한 리드프레임 도금기술에 관한 연구)

  • Jang, Hyeon-Gu;Lee, Dae-Seung
    • Journal of the Korean institute of surface engineering
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    • v.19 no.3
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    • pp.92-108
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    • 1986
  • An electroplating on the lead frame fabricated from domestic copper plate was studied experimentally. In this study, nickel was plated on the thin copper lead frame and silver layer was coated on the nickel film in the cyanide electrolyte. The effect of process variables such as current density, plating time, coating thickness and flow rate of electrolytic solution on the properties of coating was investigated. Some samples on each step were fabricated during electroplating. The results obtained from polarization measurement, observation of SEM photograph, adhesion test of coating and microhardness test are as follows. On silver plating, polarization resistance of potentiostatic cathodic polarization curve is reduced as the flow rate of Ag electrolytic solution increases. And above resistance is also reduced when the minor chemicals of sodium cyanide and sodium carbonate are added in potassium silver cyanide bath. The reduced polarization resistance makes silver deposition on the cathode easy. An increase in the current density and the coating thickness causes the particle size of deposit to coarsen, and consequently the Knoop microhardness of the coating decreases. On selective plating an increase in the flow rate of plating solution lead to do high speed plating with high current density. In this case, the surface morphology of deposit is of fine microstructure with high Knoop hardness. An increasing trend of the adhesion of coating was shown with increasing the current density and flow rate of electrolytic solution.

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Performance of Solid Oxide Fuel Cells with Direct Internal Reforming of Methane

  • Kim, Young Jin;Lim, Hyung-Tae
    • Journal of the Korean Ceramic Society
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    • v.52 no.5
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    • pp.325-330
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    • 2015
  • Performance of solid oxide fuel cells (SOFCs), in comparison with that under hydrogen fuel, were investigated under direct internal reforming conditions. Anode supported cells were fabricated with an Ni+YSZ anode, YSZ electrolyte, and LSM+YSZ cathode for the present work. Measurements of I-V curves and impedance were conducted with S/C (steam to carbon) ratio of ~ 2 at $800^{\circ}C$. The outlet gas was analyzed using gas chromatography under open circuit condition; the methane conversion rate was calculated and found to be ~ 90% in the case of low flow rate of methane and steam. Power density values were comparable for both cases (hydrogen fuel and internal steam reforming of methane), and in the latter case the cell performance was improved, with a decrease in the flow rate of methane with steam, because of the higher conversion rate. The present work indicates that the short-term performance of SOFCs with conventional Ni+YSZ anodes, in comparison with that under hydrogen fuel, is acceptable under internal reforming condition with the optimized fuel flow rate and S/C ratio.

The study of silicon etching using the high density hollow cathode plasma system

  • Yoo, Jin-Soo;Lee, Jun-Hoi;Gangopadhyay, U.;Kim, Kyung-Hae;Yi, Jun-Sin
    • 한국정보디스플레이학회:학술대회논문집
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    • 2003.07a
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    • pp.1038-1041
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    • 2003
  • In the paper, we investigated silicon surface microstructures formed by reactive ion etching in hollow cathode system. Wet anisotropic chemical etching technique use to form random pyramidal structure on <100> silicon wafers usually is not effective in texturing of low-cost multicrystalline silicon wafers because of random orientation nature, but High density hollow cathode plasma system illustrates high deposition rate, better film crystal structure, improved etching characteristics. The etched silicon surface is covered by columnar microstructures with diameters form 50 to 100nm and depth of about 500nm. We used $SF_{6}$ and $O_{2}$ gases in HCP dry etch process. This paper demonstrates very high plasma density of $2{\times}10^{12}$ $cm^{-3}$ at a discharge current of 20 mA. Silicon etch rate of 1.3 ${\mu}s/min$. was achieved with $SF_{6}/O_{2}$ plasma conditions of total gas pressure=50 mTorr, gas flow rate=40 sccm, and rf power=200 W. Our experimental results can be used in various display systems such as thin film growth and etching for TFT-LCDs, emitter tip formations for FEDs, and bright plasma discharge for PDP applications. In this paper we directed our study to the silicon etching properties such as high etching rate, large area uniformity, low power with the high density plasma.

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A Study on an Operating Conditions for the Direct Ethanol Fuel Cell (직접에탄올 연료전지의 운전조건에 관한 연구)

  • Kim, Young-Chun;Koo, Bon-Kook;Jang, Mun-Gug;Ji, Hag-Bae;Han, Sang-Bo;Park, Jae-Youn
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.60 no.11
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    • pp.2076-2082
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    • 2011
  • The goal of this paper is to find an operating conditions of the single direct ethanol fuel cell such as the cell temperature, and flow rates of ethanol and oxygen. To investigate the output characteristics, the electrical current increased from 0[A] with interval of 0.001[A] every 2[s], and the cell voltage was increased until the voltage became 0.05[V]. Related to the effect of the cell temperature, the output characteristics both voltage and power were increased upto 80[$^{\circ}C$] according to the increase of the current density, but those were decreased over that temperature. In addition, the optimal flow rate of ethanol in anode was identified as of 2[mL/min] due to the dependence of generation rate such as the hydrogen ion and electron. And the flow rate of oxygen in cathode was desirable to about 300[sccm/min], it might be affected by the chemical reaction rate of the water formation among hydrogen ion, electron, and oxygen. Consequently, the fundamental conditions were identified in this work, and it will be carried out to find the best conditions of membrane by the effect of the plasma surface treatment, and the effect of other catalysts except for a platinum.

Effects of nitrogen doping on mechanical and tribological properties of thick tetrahedral amorphous carbon (ta-C) coatings (질소 첨가된 ta-C 후막코팅의 기계 및 트라이볼로지적 특성연구)

  • Gang, Yong-Jin;Jang, Yeong-Jun;Kim, Jong-Guk
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2016.11a
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    • pp.156-156
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    • 2016
  • The effect of nitrogen doping on the mechanical and tribological performance of single-layer tetrahedral amorphous carbon (ta-C:N) coatings of up to $1{\mu}m$ in thickness was investigated using a custom-made filtered cathode vacuum arc (FCVA). The results obtained revealed that the hardness of the coatings decreased from $65{\pm}4.8GPa$ to $25{\pm}2.4GPa$ with increasing nitrogen gas ratio, which indicates that nitrogen doping occurs through substitution in the $sp^2$ phase. Subsequent AES analysis showed that the N/C ratio in the ta-C:N thick-film coatings ranged from 0.03 to 0.29 and increased with the nitrogen flow rate. Variation in the G-peak positions and I(D)/I(G) ratio exhibit a similar trend. It is concluded from these results that micron-thick ta-C:N films have the potential to be used in a wide range of functional coating applications in electronics. To achieve highly conductive and wear-resistant coatings in system components, the friction and wear performances of the coating were investigated. The tribological behavior of the coating was investigated by sliding an SUJ2 ball over the coating in a ball-on-disk tribo-meter. The experimental results revealed that doping using a high nitrogen gas flow rate improved the wear resistance of the coating, while a low flow rate of 0-10 sccm increased the coefficient of friction (CoF) and wear rate through the generation of hematite (${\alpha}-Fe_2O_3$) phases by tribo-chemical reaction. However, the CoF and wear rate dramatically decreased when the nitrogen flow rate was increased to 30-40 sccm, due to the nitrogen inducing phase transformation that produced a graphite-like structure in the coating. The widths of the wear track and wear scar were also observed to decrease with increasing nitrogen flow rate. Moreover, the G-peaks of the wear scar around the SUJ2 ball on the worn surface increased with increasing nitrogen doping.

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Enhancement of the Thickness Uniformity of a Phosphor Layer in the Cold Cathode Fluorescent Lamp

  • Kim, Min-Wan;Kim, Hie-Chul;Kim, Suk-Hwan;Lee, Sang-Woo;Choi, Byung-Ho;Kim, Kyung-Hwan;Sohn, Woo-Keun
    • 한국정보디스플레이학회:학술대회논문집
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    • 2004.08a
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    • pp.1068-1071
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    • 2004
  • We report the techniques to obtain the high uniformity of the phosphor film thickness in the cold cathode fluorescent lamps, which are widely used as a back-light for the liquid crystal display. The thickness variation of the phosphor layer was sensitive to blowing conditions. The optimum conditions were obtained at flow rate of 15 sccm for 30 min at 40 $^{\circ}C$. The optimum and uniform thickness of a phosphor layer gives good luminous output.

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A Study on the TiC Coating Using Hollow Cathode Discharge Ion Plating (HCD 이온 플레이팅 방법을 이용한 TiC 코팅에 관한 연구)

  • Kim, In-Cheol;Seo, Yong-Woon;Whang, Ki-Whoong
    • Proceedings of the KIEE Conference
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    • 1991.11a
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    • pp.261-264
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    • 1991
  • Titanium carbide(TiC) films were deposited on stainless-steel sheets using HCD(Hollow Cathode Discharge) reactive ion plating. Acetylene gas was used as the reactant gas. The characteristics of TiC films were examined by X-Ray diffraction, $\alpha$-step, ESCA(Electron Spectroscopy for Chemical Analysis), and, AES(Auger Electron Spectroscopy). The results were discussed with regard to various deposition conditions(bias voltage, acetylene flow rate, temperature).

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산업단지내 독성유기화합물 및 중금속으로 오염된 토양의 정화복원기술 상용화 연구

  • 김수곤;손규동;박지연;최희철;양지원
    • Proceedings of the Korean Society of Soil and Groundwater Environment Conference
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    • 2004.04a
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    • pp.31-34
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    • 2004
  • Feasibility of electrokinetic(EK)-Fenton process and Ozone chemical oxidation were investigated for tile removal of organic contaminants and heavy metals from the contaminated soil. In EK-Fenton process, accumulated electroosmotic flow(EOF) was 80 L for 26 days. Removal efficiency of TPH, As, and Ni were 61%, 36%, and 47%, respectively. The concentration of As was high near the anode due to the transport of anionic As toward the anode, while the concentration of Ni was high near the cathode by the movement of cationic Ni to the cathode. Field scale application of in-situ ozonation was carried out for removal of TPH in 3-D test cell (3 m$\times$2 m$\times$2 m). After 25 days of ozone injection, more than 80% of removal rate was observed through the test cell.

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Study on Anomalous Electron Diffusion in the Hall Effect Thruster

  • Kwon, Kybeom;Walker, Mitchell L.R.;Mavris, Dimitri N.
    • International Journal of Aeronautical and Space Sciences
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    • v.15 no.3
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    • pp.320-334
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    • 2014
  • Over the last two decades, numerous experimental and numerical efforts have examined physical phenomena in plasma discharge devices. The physical mechanisms that govern the anomalous electron diffusion from the cathode to the anode in the Hall Effect Thruster (HET) are not fully understood. This work used 1-D numerical method to improve our understanding and gain insight into the effect of the anomalous electron diffusion in the HET. To this end, numerical solutions are compared with various experimental HET performance measurements and the effects of anomalous electron diffusion are analyzed. The relationships between the anomalous electron diffusion and important parameters of the HET are also studied quantitatively. The work identifies the cathode mass flow rate fraction, radial magnetic field distribution, and discharge voltage as significant factors that affect anomalous electron diffusion. Additionally, the study demonstrates a computational process to determine the radial magnetic field distribution required to achieve specific thruster performance goals.

Analysis of Flow Rate Inducing Voltage Loss in a 100 cm2 Class Molten Carbonate Fuel Cell

  • Lee, Choong-Gon
    • Journal of Electrochemical Science and Technology
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    • v.2 no.1
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    • pp.20-25
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    • 2011
  • This work focuses on the behavior of the overpotential increase due to a utilization rise in a molten carbonate fuel cell. The behavior is generally explained by Nernst loss, which is a kind of voltage loss due to the thermodynamic potential gradients in a polarization state due to the concentration distribution of reactant species through the gas flow direction. The evaluation of Nernst loss is carried out with a traditional experimental method of constant gas utilization (CU). On the other hand, overpotential due to the gas-phase mass-transport resistance at the anode and cathode shows dependence on the utilization, which can be measured using the inert gas step addition (ISA) method. Since the Nernst loss is assumed to be due to the thermodynamic reasons, the voltage loss can be calculated by the Nernst equation, referred to as a simple calculation (SC) in this work. The three values of voltage loss due to CU, ISA, and SC are compared, showing that these values rise with increases in the utilization within acceptable deviations. When we consider that the anode and cathode reactions are significantly affected by the gas-phase mass transfer, the behavior strongly implies that the voltage loss is attributable not to thermodynamic reasons, namely Nernst loss, but to the kinetic reason of mass-transfer resistance in the gas phase.