• Title/Summary/Keyword: CVD(chemical vapor deposition)

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Study of New Light Source with Nano Carbon Material (나노카본을 이용한 조명용 신광원에 관한 연구)

  • Kim, Kwang-Bok;Kim, Yong-Won;Jung, Han-Gi;Song, Yoon-Ho
    • Proceedings of the Korean Institute of IIIuminating and Electrical Installation Engineers Conference
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    • 2006.05a
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    • pp.31-34
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    • 2006
  • The characteristic of carbon nano fiber (CNF) as electron emitters was described. Carbon nano fiber (CNF) of herringbone was prepared by thermal chemical vapor deposition(CVD), mixed with binders and conductive materials, and then were formed by screen-printing process. In order to increase effectively field emissions, the surface treatment of rubbing & peel-off was applied to the printed CNF emitters on cathode electrode. The measurements of field emission properties were carried out by using a diode structure inline vacuum chamber. CNF of herringbone type showed good emission properties that a turn on field was as low as $2.5V/{\mu}m$ and current density was as large as $0.15mA/cm^2$ of $4.5V/{\mu}m$ with electric field. After the vacuum packaged panel of 5-inch in diagonal, the measured white brightness was as high as $7000cd/m^2$ at 1900V of anode and 700V of gate voltage.

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Growth of Carbon Nanotubes at Low temperature by HF-PECVD (Hot-filament 화학기상증착법을 이용한 탄소나노튜브의 저온 성장)

  • Chang, Yoon-Jung;Choi, Eun-Chang;Park, Yong-Seob;Choi, Won-Seok;Hong, Byung-You
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.151-152
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    • 2007
  • 탄소나노튜브(CNTs)는 우수한 물리적, 화학적, 기계적 특성으로 다양한 분야에서 연구가 진행 되고있다. 특히, field emission displays (FEDs)로의 응용을 위해서는 기본적으로 sodalime glass 위에 직접 CNTs를 성장시켜야 하며, 소자 응용을 위해 기판인 sodalime glass를 왜곡시키는 온도보다 낮은 온도에서 CNT의 수직 성장이 이루어져야 한다. 본 연구에서는 Hot-filament plasma enhanced chemical vapor deposition (HF-PECVD)를 이용하여 합성온도를 400, 450, 500, $550^{\circ}C$로 변화시켰으며 촉매 층인 Ni의 두께를 5~40 nm까지 조절하여 탄소나노튜브를 합성하였다. 저온에서 합성된 탄소나노튜브는 FE-SEM을 이용하여 성장 형태 및 표면 특성을 확인하였으며, 미세구조는 HR-TEM을 이용하여 확인하였다.

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Effects of TiN bufer on field emission properties of conical-type tungsten tips with carbon nanotubes coated (원뿔형 CNT-W 팁의 TiN 완충막 유무에 따른 전계방출 특성)

  • Kim, Young-Kwang;Yun, Sung-Jun;Kim, Won;Kim, Jong-Pil;Park, Chang-Kyun;Park, Jin-Seok
    • Proceedings of the KIEE Conference
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    • 2007.07a
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    • pp.1271-1272
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    • 2007
  • Experimental results regarding to the structural properties of carbon nanotubes (CNTs) and the field-emission characteristics of CNT-coated tungsten (W) tips are presented. CNTs are successfully grown on conical-type W-tips by inductively coupled plasma-chemical vapor deposition (ICP-CVD) with or without inserting a TiN-buffer layer prior to the formation of Ni catalysts. For all the CNTs grown, their nanostructures, morphologies, and crystalline structures are analyzed by FESEM, HRTEM, and Raman spectroscopy. Furthermore, the emission properties of CNT-based field-emitters are characterized to estimate the maximum current density and the threshold voltage. The results obtained in this study indicate that the emission current level of the CNT-emitter without using a TiN buffer is desirable for the application of micro-focused x-ray systems.

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Characteristics of Semiconductor-Atomic Superlattice for SOI Applications (SOI 응용을 위한 반도체-원자 초격자 구조의 특성)

  • Seo, Yong-Jin;Park, Sung-Woo;Lee, Kyoung-Jin;Kim, Gi-Uk;Park, Chang-Jun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.11a
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    • pp.180-183
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    • 2003
  • The monolayer of oxygen atoms sandwitched between the adjacent nanocrystalline silicon layers was formed by ultra high vacuum-chemical vapor deposition (UHV-CVD). This multi-layer Si-O structure forms a new type of superlattice, semiconductor-atomic superattice (SAS). According to the experimental results, high-resolution cross-sectional transmission electron microscopy (HRTEM) shows epitaxial system. Also, the current-voltage (I-V) measurement results show the stable and good insulating behavior with high breakdown voltage. It is apparent that the system may form an epitaxially grown insulating layer as possible replacement of silicon-on-insulator (SOI), a scheme investigated as future generation of high efficient and high density CMOS on SOI.

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ISPM을 이용한 Silane PECVD 공정 중 발생하는 오염입자 측정에 관한 연구

  • Jeon, Gi-Mun;Seo, Gyeong-Cheon;Sin, Jae-Su;Na, Jeong-Gil;Kim, Tae-Seong;Sin, Jin-Ho;Go, Mun-Gyu;Yun, Ju-Yeong;Kim, Jin-Tae;Sin, Yong-Hyeon;Gang, Sang-U
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.338-338
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    • 2010
  • 공정 중 발생하는 입자는 반도체 생산 수율에 가장 큰 영향을 끼치는 원인으로 파악되며, 생산 수율을 저하시키는 원인 중 70% 가량이 이와 관련된 것으로 알려져 있다. 현재 반도체 공정에서 입자를 계측하는데 사용하는 PWP (Particle per Wafer Pass) 방법은 표준 측정방법으로 널리 쓰이고 있으나, 실시간으로 입자의 양을 측정할 수 없고, Test wafer 사용에 따른 비용증가의 단점이 있어 공정 중에 입자를 실시간으로 측정할 수 있는 대안기술이 필요한 실정이다. ISPM (In-Situ Particle Monitoring)은 레이저 산란방식을 이용한 실시간 입자측정 장비로서 오염원 발생에 대한 즉각적인 대처와 조치가 가능하고 부가적인 추가 비용이 발생하지 않기 때문에 실시간 모니터링 장비가 없는 현재의 반도체 공정에 충분히 적용될 가능성이 있다. 특히 CVD 공정은 반도체 공정의 약 30%를 차지할 만큼 중요한 단계로 생성되는 오염입자 모니터링을 통해 공정 불량 유무를 판단할 수 있을 것으로 기대된다. 본 연구에서는 Silane 가스를 이용한 PECVD (Plasma Enhanced Chemical Vapor Deposition) 공정 중 발생되는 오염입자를 ISPM을 이용하여 실시간으로 측정하였다. 챔버 배기구에 두 가지 타입의 ISPM을 설치하고 공정압력, 유량, 플라즈마 파워를 공정변수로 하여 각각의 조건에서 발생되는 오염입자의 분포 변화를 실시간으로 측정하였으며 결과를 비교 분석하였다.

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Geometrical and Electronic Structure of Epitaxial Graphene on SiC(0001) : A Scanning Tunneling Microscopy Study

  • Ha, Jeong-Hoon;Yang, Hee-Jun;Baek, Hong-Woo;Chae, Jung-Seok;Hwang, Beom-Yong;Kuk, Y.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.368-368
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    • 2010
  • Monolayers of graphite can be grown by fine controlled surface graphitization on the surfaces of various metallic and semiconducting materials. Epitaxial graphene grown on polished silicon carbide crystal surfaces has drawn much attention due to well known vacuum annealing procedures from surface analysis methods, especially scanning tunneling microscopy(STM) and scanning tunneling spectroscopy(STS). In this study, we have grown single layer and few layer graphene on silicon terminated 6H-SiC(0001) crystals. The growth of graphene layers were observed by low energy electron diffraction(LEED) patterns. Scanning tunneling microscopy and spectroscopy measurements were performed to illustrate the electronic structure which may display some clue on the influence of the underlying structure. Spatially resolved STS results acquired at the edges of epitaxial graphene show in detail the electron density of states, which is compared to theoretical calculations. STM measurements were also done on graphene films grown by chemical vapor deposition(CVD) and transferred onto a SiC(0001) crystal. These observations may provide a hint for the understanding of carrier scattering at the edges.

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Synthesis and Temperature-Dependent Local Structural Properties of Ti2O3

  • Hwang, Inhui;Jin, Zhenlan;Park, Changin;Jiang, Bingzhi;Han, S.W.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.202.2-202.2
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    • 2013
  • Ti2O3 is known as a typical Mott insulator with a transition temperature of near $200^{\circ}C$. Unlike VO2, Ti2O3 does not have a structural phase transition near the metal-insulator-transition (MIT) temperature. We investigated the temperature-dependent thermal vibration change using temperature-dependent x-ray absorption fine structure (XAFS) at Ti K-edge in the temperature range of 300~600 K. Ti2O3 powder and films were synthesized using thermal chemical vapor deposition (CVD) at $800{\sim}900^{\circ}C$. X-ray diffraction measurements show a single phased Ti2O3 at room temperature. XAFS confirmed no structural phase transition in the temperature of 300~600 K. A small but distinguishable structural disorder change was observed near the transition temperature. We will discuss the MIT behavior with the change of structural disorder.

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다양한 기판에 FTS(Facing Target Sputtering)방법으로 제작된 AZO박막의 광전 특성에 관한 연구

  • ;Seo, Seong-Bo;Kim, Hwa-Min
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.176.1-176.1
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    • 2013
  • TCO (Transparent Conductive Oxide)는 투명 전도성 산화물 높은 투과율과 낮은 비저항 가지고 있어서 최근 사용된 평판디스플레이 LCD(liquid crystal display), PDP (Plasma Display Panel), OLED (Organic Light Emitting Display) 에 많이 사용되고 있다. 현재 양산화 되고 있는 ITO (Indium tin Oxide)는 좋은 전도율과 높은 투과율로서 가장 많이 쓰인다. 하지만 ITO중에 Indium Oxide는 치명적인 독성을 가지고 있으며 In의 저장량이 적어 시간이 갈수록 가격이 비싸지는 등 여러 가지 단점을 가지고 있다. 그것에 비해 AZO (aluminum-doped zinc oxide)는 독성이 없고 가격도 저렴하여 ITO의 단점을 보완 할 수 있는 물질이다. AZO 증착은 현재 sol-gel, CVD(chemical vapor deposition), Sputter, 등으로 사용되고 있으며 현재 많은 연구가 진행되고 있다. 본 실험에서는 PEN 기판을 사용하였으며, 플라즈마의 열적 데미지로 인한 기판의 변형 등 여러 가지 문제를 해결하기 위하여 박막의 열적 변형이 적고, 고밀도 플라즈마로 양질의 박막 증착이 가능한 FTS (Facing Target Sputtering)방법을 사용하여 AZO박막을 증착시키고 구조적, 전기적, 광학적인 특성을 평가 하였다. 측정 분석 결과 AZO는 가시광 영역에 높은 투과율이 요구되는 Flexible display 표시장치와 OLED, PDP, 유기태양전지 등 많은 영역에 사용이 가능 할 것이라 사료된다.

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Atomic Force Microscopy Study on Correlation between Electrical Transport and Nanomechanical properties of Graphene Layer

  • Kwon, Sang-Ku;Choi, Sung-Hyun;Chung, H.J.;Seo, S.;Park, Jeong-Young
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.85-85
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    • 2010
  • Graphene, the building block of graphite, is one of the most promising materials due to their fascinating electronic transport properties. The pseudo-two-dimensional sp2 bonding in graphene layers yields one of the most effective solid lubricants. In this poster, we present the correlation between electrical and nanomechanical properties of graphene layer grown on Cu/Ni substrate with CVD (Chemical Vapor Deposition) method. The electrical (current and conductance) and nanomechanical (adhesion and friction) properties have been investigated by the combined apparatus of friction force microscopy/conductive probe atomic force microscopy (AFM). The experiment was carried out in a RHK AFM operating in ultrahigh vacuum using cantilevers with a conductive TiN coating. The current was measured as a function of the applied load between the AFM tip and the graphene layer. The contact area has been obtained with the continuum mechanical models. We will discuss the influence of mechanical deformation on the electrical transport mechanism on graphene layers.

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Structural, morphological, optical, and photosensing properties of Cs2TeI6 thin film synthesized by two-step dry process

  • Hoat, Phung Dinh;Van Khoe, Vo;Bae, Sung-Hoon;Lim, Hyo-Jun;Hung, Pham Tien;Heo, Young-Woo
    • Journal of Sensor Science and Technology
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    • v.30 no.5
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    • pp.279-285
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    • 2021
  • Recently, cesium tellurium iodine (Cs2TeI6) has emerged as an inorganic halide perovskite material with potential application in optoelectronic devices due to its high absorption coefficient, suitable bandgap and because it consists of nontoxic and earth-abundant elements. However, studies on its fabrication process as well as photoresponse characteristics are limited. In this study, a simple and effective method is introduced for the synthesis of Cs2TeI6 thin films by a two-step dry process. A Cs2TeI6-based lateral photosensor was fabricated, and its photoresponse characteristics were explored under laser illuminations of four different wavelengths in the visible range: 405, 450, 520, and 655 nm. The initial photosensing results suggest potential application and can lead to more promising studies of Cs2TeI6 film in optoelectronics.