• Journal of Electrical Engineering and Technology
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• v.2 no.4
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• pp.532-536
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• 2007

Carbon nanotube (CNT) properties, produced using a magnetic null discharge (MND) plasma production technology, were investigated. We firstly deposited the Fe layer 200 nm in thickness on Si substrate by the magnetic null discharge sputter method at the substrate temperature of $300도C$, and then prepared CNTs on the catalyst layer by using the magnetic null discharge (MND) based CVD method. CNTs were deposited in a gas mixture of CH4 and N2 at a total pressure of 1 Torr by the MND-CVD method. The substrate temperature and the RF power were $650^{\circ}C$ and 600W, respectively. The characterization data indicated that the proposed source could synthesize CNTs even under relatively severe conditions for the magnetic null discharge formation.

• Proceedings of the Membrane Society of Korea Conference
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• 2002.05a
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• pp.35-41
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• 2002

Dense oxygen ionic conducting materials can be used for oxygen separation membranes at high temperatures. However, they show relatively low permeation flux because of their large resistances. To reduce resistances and improve the oxygen permeation flux, thin dense yttria-stabilized-zirconia (YSZ)/Pd composite dual-phase membranes were fabricated by a new approach that combines the reservoir method and chemical vapor deposition (CVD). A thin porous YSZ layer was coated on a porous alumina support by dip-coating the YSZ suspension. A continuous Pd phase was formed inside pores of the YSZ layer by the reservoir method. The residual pores of the YSZ/Pd layer were plugged with yttria/zirconia by CVD to ensure the gas tightness of the membranes. The oxygen permeation fluxes through these composite membrane were 2.0$\times$10$^{-8}$ mol/cm$^2$.s and 4.8$\times$10$^{-8}$ mol/cm$^2$.s at 105$0^{\circ}C$ when air and oxygen were used as the permeate gases, respectively. These oxygen permeation values are about 1 order of magnitude higher than those of pure YSZ membranes prepared under similar conditions.

• Proceedings of the KIEE Conference
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• 1989.07a
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• pp.386-389
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• 1989

Phosphorus nitride films on InP surface were grown by a Photo-CVD (chemical vapor deposition) technique over 100-250 $^{\circ}C$ range of substrate temperature, which is based on direct photolysis of $PCl_3/H_2$ and $NH_3$ gas mixtures by 185nm ultraviolet light from a low pressure mercury lamp. The film growth rate ed the refractive index(n) were shown about 700-800 ${\AA}/hr$ and 1.7-1.8, respectively. Composition ratio and interface properties were analyzed by AES(Auger Electron Spectroscopy) and XPS (X-ray Photoelectron Spectorscopy) technique.

• Journal of Advanced Marine Engineering and Technology
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• v.41 no.2
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• pp.146-149
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• 2017

Si clusters generated during the plasma chemical vapor deposition (CVD) process have a great influence on the quality of the fabricated films. In particular, in hydrogenated amorphous silicon thin films (a-Si:H) used for thin film solar cells, Si clusters are mainly responsible for light-induced degradation. In this study, we investigated the amount of clusters incorporated into thin films using a quartz crystal microbalance (QCM) and specially designed cluster eliminating filters, and investigated the effect of the DC grid mesh in preventing cluster incorporation. Experimental results showed that as the applied voltage of the grid mesh, which is placed between the electrode and the QCM, decreased, the number of clusters incorporated into the film decreased. This is due to the electrostatic force from the grid mesh bias, and this method is expected to contribute to the fabrication of high-quality thin films by preventing Si cluster incorporation.

• Proceedings of the Korean Operations and Management Science Society Conference
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• 2000.04a
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• pp.107-110
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• 2000

화학 박막 증착용(CVD : Chemical Vapor Deposition) 클러스터 장비는 다양한 공정 경로가 가능하며 물류 흐름이 매우 복잡해질 수 있다. 또한, 공정이 종료된 웨이퍼는 제한 시간 내에 챔버에서 꺼내져야만 한다. 클러스터 장비는 두 개의 팔을 가진 로봇이며, 빈 쪽 팔을 이용하여 공정이 종료된 웨이퍼를 꺼낸 후, 다른 쪽 팔을 이용하여 이전 공정에서 가져온 웨이퍼를 해당 공정에 넣어 주는 스왑(SWAP) 방식으로 운영된다. 이러한 스왑 방식에서는 로봇 작업 순서가 결정되어 진다. 그러나, 로봇의 팔 이외에 임시버퍼가 없고, 각 챔버는 엄격한 체제 시간 제약(Residency Time Constraint)을 가지고 있기 때문에 로봇의 작업 시점의 제어가 필요하다. 본 논문에서는 간단한 Earliest Starting 방식으로 로봇의 작업 시점을 제어한다고 가정했을 때, 스왑 방식을 운용하면서 체제 시간 제약을 만족하는 공정 시간들의 조건을 제시한다. 공정 시간은 엔지니어에 의해 다소 조정이 가능하므로 공정 시간들의 조건은 엔지니어에게 스케줄 가능한 공정 시간을 결정할 수 있도록 지원해 주는 시스템에 활용 가능하다. 또한, 본 논문에서는 FSM(Finite State Machine)을 이용하여 CTC(Cluster Tool Controller) 내부의 실시간 스케줄러 구현 방법을 제안한다.

• Journal of the Korean Society for Heat Treatment
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• v.13 no.5
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• pp.318-323
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• 2000

The planarization of rough polycrystalline diamond films synthesized by DC arc discharge plasma jet CVD (chemical vapor deposition) was attempted using KrF excimer laser pulses. The effects of laser incidence angle and reaction gases (ozone and oxygen) on etching rate of diamond were studied. The temperature change of diamond and graphite with different laser fluences was calculated by computer simulation to explain the etching behavior of diamond films. The threshold energy density from the experiment for etching of pure crystalline diamond was about $1.7J/cm^2$ and fairly matched the simulation value. Preferential etching of a particular crystallographic plane was observed through scanning electron microscopy. The etching rate of diamond with ozone was lower than that with oxygen. When the angle of incidence was $80^{\circ}$ to the diamond surface normal, the peak-to-valley surface roughness was Significantly reduced from $20{\mu}m$ to $0.5{\mu}m$.

• Journal of Environmental Science International
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• v.7 no.5
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• pp.669-677
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• 1998

A porous $\alpha$-alumina tube of 2.5 mm O.D. and 1.9 mm I.D. was used as the support of an inorganic membrane. Macropores of the tube, about 150 nm in size, were plugged with silica formed by thermal decomposition of tetraethylorthosilicate at $600^{\circ}C$. The forced cross-flow CVD method that reactant was evacuated through the porous wall of the support was very effective in plugging macropores. The H$_2$ permeance of the prepared membrane was of the order of $10^{-8}/ molㆍs^{-1}/ㆍm^{-2}/. Pa{-1}$/, while the $N_2$ permeance was below $10^{-11}/ molㆍs^{-1}/ㆍm^{-2}/ㆍPa^{-1}$/ at $600^{\circ}C$. This was comparable to that of silica-modified Vycor glass whose size was 4 nm.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.20 no.5
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• pp.389-393
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• 2007

We fabricated field-effect transistor based carbon nanotubes(CNTs) directly grown by thermal chemical vapor deposition(CVD) and analyzed their performance. The Ethylene ($C_2H_4$), hydrogen($H_2$) and Argon(Ar) gases were used for the growth of CNTs at $700\;^{\circ}C$. The growth properties of CNTs on the device were analyzed by SEM and AFM. The electrical transport characteristics of CNT FET were investigated by I-V measurement. Transport through the nanotubes is dominated by holes at room temperature. By varying the gate voltage, we successfully modulated the conductance of FET device by more than 7 orders of magnitude.

• Journal of Sensor Science and Technology
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• v.16 no.4
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• pp.313-318
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• 2007

Single-wall carbon nanotube field-effect transistors (SWCNT FETs) of top gate structure were fabricated in a conventional metal-oxide-semiconductor field effect transistor (MOSFET) with gate electrodes above the conduction channel separated from the channel by a thin $SiO_{2}$ layer. The carbon nanotubes (CNTs) directly grown using thin Fe film as catalyst by thermal chemical vapor deposition (CVD). These top gate devices exhibit good electrical characteristics, including steep subthreshold slope and high conductance at low gate voltages. Our experiments show that CNTFETs may be competitive with Si MOSFET for future nanoelectronic applications.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2015.11a
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• pp.305-305
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• 2015

알루미늄 방열판 위에 MPCVD(Microwave Plasma Enhanced Chemical Vapor Deposition) 장치를 이용하여 DC 바이어스 전압을 기판에 인가하면서 $Ar+CH_4$ 가스 분위기에서 증착한 나노결정질 다이아몬드(Nanocrystalline Diamond; NCD) 박막의 방열 특성을 평가하였다. XRD와 Raman spectroscopy를 이용하여 증착된 박막이 NCD인지를 확인하였으며 FE-SEM 및 FIB로 박막의 표면 및 단면의 형상을 관찰하였다. 다이아몬드가 증착된 방열판에 LED를 부착하여 발열시키고 열유동측정기의 하나인 T3-ster를 사용하여 방열 특성을 분석하였다. 기존 알루미늄(Al) 기판(5.55 K/W)보다 다이아몬드 증착(Dia-Al) 기판(3.88 K/W)의 열저항 값이 현저히 작았다, 또한 LED 접합온도는 Dia-Al 기판이 Al 기판보다 약 $3.5^{\circ}C$만큼 낮았다. 적외선 열화상 카메라로 발열 중인 시편의 전면과 후면을 촬영한 결과, LED가 부착된 전면부에서는 최고 발열 부위(hot spot)의 면적이 Al 기판의 경우가 Dia-Al 기판보다 높았고, 후면부에서는 그 반대의 경향을 보였다. 이들 데이터로부터 다이아몬드 증착 방열판이 기존의 방열판보다 방열특성이 우수한 것으로 해석할 수 있으며, 다이아몬드 박막을 방열판으로 사용하면 LED의 사용 수명과 효율이 높아질 것으로 기대된다.