• Title/Summary/Keyword: CVD(chemical vapor deposition)

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Deposition of diamond film at low pressure using the RF plasma CVD (고주파 플라즈마 CVD에 의한 저 압력에서의 다이아몬드 막의 성장)

  • Koo, Hyo-Geun;Park Sang-Hyun;Park Jae-Yoon;Kim Kyoung-Hwan
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.50 no.2
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    • pp.49-56
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    • 2001
  • Diamond thin films have been deposited on the silicon substrate by inductively coupled radio frequency plasma enhanced chemical vapor deposition system. The morphological features of thin films depending on methane concentration and deposition time have been studied by scanning electron microscopy and Raman spectroscopy. The diamond particles deposited uniformly on silicon substrate($10{\times}10[mm^2]$) at the pressure of 1[torr], a methane concentration of 1[%], a hydrogen flow rate of 60[sccm], a substrate temperature of $840\{sim}870[^{\circ}C]$, an input power of 1[kw], and a deposition time of 1[hour]. With increasing deposition time, the diamond particles grew, and than about 3 hours have passed, the graphitic phase carbon thin film with "cauliflower-like" morphology deposited on the diamond thin films.

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Carbon Nanotube Synthesis and Growth Using Zeolite by Catalytic CVD and Applications

  • Zhao, Wei;Nam, Seo Dong;Pokhrel, Ashish;Gong, Jianghong;Kim, Ik Jin
    • Journal of the Korean Ceramic Society
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    • v.50 no.1
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    • pp.1-17
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    • 2013
  • Since their first discovery, carbon nanotubes (CNTs) have become a material central to the field of nanotechnology. Owing to their splendid physical, structural and chemical properties, they have the potential to impact a wide range of applications, including advanced ceramics, nanoelectronic devices, nanoscale sensors, solar cells, battery electrodes, and field emitters. This review summarizes the synthetic methods of preparing CNTs and focuses on the chemical vapor deposition (CVD) method, especially catalytic CVD. In order to stabilize and disperse the catalyst nanoparticles (NPs) during synthesis, zeolite was implemented as the template to support metal-containing NPs, so that both CNTs in the bulk and on a 2D substrate were successfully synthesized. Despite more challenges ahead, there is always hope for widespread ever-new applications for CNTs with the development of technology.

Various Shape of Carbon Layer on Ga2O3 Thin Film by Controlling Methane Fraction in Radio Frequency Plasma Chemical Vapor Deposition (Ga2O3박막 상에서의 RF 플라즈마 화학기상증착법의 메테인 분율 조절에 의한 탄소층의 다양한 형상 제어 연구)

  • Seo, Ji-Yeon;Shin, Yun-Ji;Jeong, Seong-Min;Kim, Tae-Gyu;Bae, Si-Young
    • Journal of the Korean Society for Heat Treatment
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    • v.35 no.2
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    • pp.51-56
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    • 2022
  • In this study, we controlled the shape of a carbon layer on gallium oxide templates. Gallium oxide layers were deposited on sapphire substrates using mist chemical vapor deposition. Subsequently, carbon layers were formed using radio frequency plasma chemical vapor deposition. Various shapes of carbon structures appeared according to the fraction of methane gas, used as a precursor. As methane gas concentration was adjusted from 1 to 100%, The shapes of carbon structures varied to diamonds, nanowalls, and spheres. The growth of carbon isotope structures on Ga2O3 templates will give rise to improving the electrical and thermal properties in the next-generation electronic applications.

A Study on the Flow Characteristics over the Rotating Susceptor in CVD Reactor (CVD 반응로 내부 회전 원판 주위의 유동 특성 연구)

  • Cha, Kwan;Kim, Youn-J.;Boo, J.H.
    • Proceedings of the KSME Conference
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    • 2001.06e
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    • pp.213-218
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    • 2001
  • The characteristics of the fluid flow and mass transfer in a vertical atmospheric pressure chemical vapor deposition (APCVD) are numerically studied. In order to get the optimal process parameters for the uniformity of deposition on a substrate, Navier-Stokes and energy equations have been solved for the pressure, mass-flow rate and temperature distribution in a CVD reactor. Results show that the thermal boundary condition at the reactor wall has an important effect in the formation of buoyancy-driven secondary cell when radiation effect is considered. Results also show that reduction of the buoyancy effect on the heated reactor improves the uniformity of deposition.

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Preparation of Alumina Composite Membranes by Chemical Vapor Deposition (화학기상증착법을 이용한 알루미나 복합 분리막의 제조)

  • 안상욱;최두진;현상훈
    • Journal of the Korean Ceramic Society
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    • v.31 no.8
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    • pp.927-933
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    • 1994
  • Alumina composite membranes were prepared by chemical vapor deposition (CVD) using aluminum-tri-isopropoxide as a precursor. Porous alumina supports were used in deposition, which were in disk shape with mean pore diameter of 0.1 ${\mu}{\textrm}{m}$ and prepared by slip-coasting process. film deposition morphology on porous support was simulated through depositing alumina film on polycrystalline silicon pattern, and its step coverage observed by SEM showed one deviated from uniform step coverage. N2 permeability through composite membranes and the pressure dependence decreased as the deposition time increased. Initially, the N2 permeability of the top layer was tend to decrease rapidly, and then the degree of decrease in N2 permeability was tend to diminish with deposition time. The N2 permeability increased with heat treatment temperature and the crack was generated in top layer at 100$0^{\circ}C$.

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