• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2004년도 하계종합학술대회 논문집(1)
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• pp.221-224
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• 2004

This paper has researched on-chip spiral inductor in digital CMOS technology by modeling physical structure based on foundry parameter. To show the possibility of its application to RF design, we designed dual band RF front-end receiver. The simulated receiver have gain of 23/23.5 dB and noise figure of 2.8/3.36 dB at 2.45/5.25 GHz, respectively. It occupies $16mm^2$ in $0.25{\mu}m$ CMOS with 5 metal layer.

• Transactions on Electrical and Electronic Materials
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• 제12권5호
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• pp.175-188
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• 2011

As complementary metal-oxide semiconductor (CMOS) continues to scale down deeper into the nanoscale, various device non-idealities cause the I-V characteristics to be substantially different from well-tempered metal-oxide semiconductor field-effect transistors (MOSFETs). The last few years witnessed a dramatic increase in nanotechnology research, especially the nanoelectronics. These technologies vary in their maturity. Carbon nanotubes (CNTs) are at the forefront of these new materials because of the unique mechanical and electronic properties. CNTFET is the most promising technology to extend or complement traditional silicon technology due to three reasons: first, the operation principle and the device structure are similar to CMOS devices and it is possible to reuse the established CMOS design infrastructure. Second, it is also possible to reuse CMOS fabrication process. And the most important reason is that CNTFET has the best experimentally demonstrated device current carrying ability to date. This paper discusses and reviewsthe feasibility of the CNTFET's application at this point of time in integrated circuits design by investigating different types of circuit blocks considering the advantages that the CNTFETs offer.

• 한국전자파학회논문지
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• 제16권2호
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• pp.144-148
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• 2005

본 논문은 $CMOS\;0.18\;{\mu}m$ 고정을 이용한 MB-OFDM UWB용 VGA를 설계하였다. 제 안된 VGA는 $-6\~45dB$의 가변이득 조정이 가능하고 3 dB Bandwidth는 필요 성능인 264 MHz를 만족하였다. 2단 연속 구조인 증폭부와 DC 성분을 제거하는 DC offset canceller로 구성되어 있고 1.8 V 바이어스에 4 mA 소비 전류를 만족하였다.

• 전자공학회논문지A
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• 제28A권10호
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• pp.821-829
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• 1991

In this paper, a BICMOS technology that has CMOS devices for digital application and bipolar devices for high voltage (80V) analog applications is presented. Basic concept to design BICMOS device is simple process technology without making too many performance trade-offs. The base line process is poly gate p-well CMOS process and three additional masking steps are added to improve bipolar characteristics. The key ingredients of bipolar integration are n+ buried layer process, up/down isolation process and p-well base process. The bipolar base region is formed simultaneously with the region of CMOS p-well area to reduce mask and heat cycle steps. As a result, hFE value of NPN bipolar transistor is 100-150(Ic=1mA). Collector resistance value is 138 ohm in case of bent type collector structure. Breakdown voltage of BVebo, BVcbo and BVceo are 21V, 115V and78V respectively. Threshold voltage is ${\pm}$1.0V for NMOS and PMOS transistor. Breakdown voltage of NMOS and PMOS transistor is obtained 22V and 19V respectively. 41 stage CMOS ring oscillator has 0.8ns delay time.

• 대한전자공학회논문지SD
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• 제45권2호
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• pp.13-20
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• 2008

본 논문에서는 CMOS 이미지 센서의 웨이퍼 레벨 어셈블리를 위한 스페이스 제작 방법을 설명하였다. 스페이스 제작을 위해서 SU-8, PDMS, Si-interposer를 이용하는 세 가지 방법을 제안하였다. SU-8 스페이스에서는 균일한 두께 특성을 위해서 웨이퍼 회전 장치를 고안했으며, PDMS 스페이스에서는 glass/PDMS/glass 구조의 정렬 접합을 위해서 새로운 접합 방법을 제안하였다. Si-interposer를 이용한 스페이스 제작에서는 DRF을 이용한 접합 조건을 확립하였다. 세 가지의 실험 결과 Si-interposer를 이용한 스페이스 제작 시 glass/스페이스/glass 구조의 접합력이 가장 뛰어났으며, 접합력의 크기는 32.3MPa의 전단응력을 나타내었다.

• 한국정보통신학회:학술대회논문집
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• 한국해양정보통신학회 2008년도 추계종합학술대회 B
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• pp.571-574
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• 2008

본 논문에서는 개선된 회로를 적용한 $256{\times}256$ 픽셀 저항형 지문센서를 제안하고 있다. 단위 픽셀 수준의 센싱 회로는 가변적인 전류를 전압으로 변환하여 이진 디지털 신호로 만든다. 정전기에 효과적으로 대처할 수 있는 인접 픽셀 간 전기적 차폐 레이아웃 구조를 제안하고 있다. 전체회로는 단위 센서 회로를 확장하여 ASIC 설계방식을 통하여 설계한 뒤 로직 및 회로에 대하여 모의실험을 하였다. 전체회로는 $0.35{\mu}m$ 표준 CMOS 공정규칙을 적용하여 센서블록은 전주문 방식을 적용하고 전체 칩은 자동배선 틀을 이용하여 반주문 방식으로 레이아웃을 실시하였다.

• Journal of Information Display
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• 제3권2호
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• pp.1-5
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• 2002

A CMOS driving circuit for active matrix type polymer electroluminescent displays was designed to develop an on-chip microdisplay on the single crystal silicon wafer substrate. The driving circuit is a conventional structure that is composed of the row, column and pixel driving parts. 256 gray scales were implemented using pulse amplitude modulation method. The 2-transistor driving scheme was adopted for the pixel driving part. The layout was carried out considering the compatibility with the standard CMOS process. Judging from the layout of the driving circuit, it turns that it is possible to implement a high-resolution display about 400 ppi resolution. Through the HSPICE simulation, it was verified that this circuit is capable of driving a VGA signal mode display and implementing 256 gray levels.

• ETRI Journal
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• 제19권4호
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• pp.402-413
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• 1997

A CMOS device which has an extended heavily-doped amorphous silicon source/drain layer on the field oxide and an amorphous silicon local interconnection (ASLI) layer in the self-aligned source/drain region has been studied. The ASLI layer has some important roles of the local interconnections from the extended source/drain to the bulk source/drain and the path of the dopant diffusion sources to the bulk. The junction depth and the area of the source/drain can be controlled easily by the ASLI layer thickness. The device in this paper not only has very small area of source/drain junctions, but has very shallow junction depths than those of the conventional CMOS device. An operating speed, however, is enhanced significantly compared with the conventional ones, because the junction capacitance of the source/drain is reduced remarkably due to the very small area of source/drain junctions. For a 71-stage unloaded CMOS ring oscillator, 128 ps/gate has been obtained at power supply voltage of 3.3V. Utilizing this proposed structure, a buried channel PMOS device for the deep submicron regime, known to be difficult to implement, can be fabricated easily.

• 한국통신학회논문지
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• 제27권10C호
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• pp.987-992
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• 2002

본 논문에서는 ㎓대역의 고속 클럭 신호를 필요로 하는 데이터 통신 시스템 분야에 응용될 수 있는 새로운 구조의 클럭 및 데이터 복원회로를 구현하였다. 구현된 회로는 고속 데이터 전송시 주로 사용되는 NRZ형태의 데이터 복원에 적합한 구조로서 위상동기 회로에 발생하는 high frequency jitter를 방지하기 위한 새로운 위상 검출 구조를 갖추고 있다. 또 가변적인 지연시간을 갖는 delay cell을 이용한 위상검출기를 이용하여 위상 검출기가 갖는 dead zone 문제를 해결하고, 항상 최적의 동작을 수행하여 빠른 동기 시간을 갖는다. 수십 Gbps급 대용량을 수신할 수 있도록 다채널 확장에 용이한 구조를 사용하였으며, 1.25Gbps급 데이터를 복원하기 위한 클럭 생성을 목표로 하여 CMOS 0.25$\mu\textrm{m}$ 공정을 사용하여 구현한 후 그 동작을 측정을 통해 검증하였다.

• 센서학회지
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• 제24권2호
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• pp.79-82
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• 2015

This paper proposes a novel complementary metal oxide semiconductor (CMOS) active pixel sensor (APS) and presents its performance characteristics. The proposed APS exhibits a linear-logarithmic response, which is simulated using a standard $0.35-{\mu}m$ CMOS process. To maintain high sensitivity and improve the dynamic range (DR) of the proposed APS at low and high-intensity light, respectively, two additional nMOSFETs are integrated into the structure of the proposed APS, along with a photogate. The applied photogate voltage reduces the sensitivity of the proposed APS in the linear response regime. Thus, the conversion gain of the proposed APS changes from high to low owing to the addition of the capacitance of the photogate to that of the sensing node. Under high-intensity light, the integrated MOSFETs serve as voltage-light dependent active loads and are responsible for logarithmic compression. The DR of the proposed APS can be improved on the basis of the logarithmic response. Furthermore, the reference voltages enable the tuning of the sensitivity of the photodetector, as well as the DR of the APS.