• Title/Summary/Keyword: CL Surface

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The Study of Etching Characteristic in $SrBi_2$$Ta_2$$O_9$ Thin Film by Optical Emission Spectroscopy (OES를 이용한 SBT 박막의 식각 특성 연구)

  • 신성욱;김창일;장의구
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.14 no.3
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    • pp.185-189
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    • 2001
  • In this paper, since the research on the etching of SrBi$_2$Ta$_2$$O_{9}$(SBT) thin film was few (specially Cl$_2$-base) we had studied the surface reaction of SBT thin films. We have used the OES(optical emission spectroscopy) in high density plasma etching as a function of RF power, dc bias voltage, and Cl$_2$/(Cl$_2$+Ar) gas mixing ratio. It had been found that the etch rate of SBT thin films appeared to be more affected by the physical sputtering between Ar ions and surface of the SBT compared to the chemical reaction. The change of Cl radical density that was measured by the OES as a function of gas combination showed the change of the etch rate of SBT thin films. Therefore, the chemical reactions between Cl radical in plasma and components of the SBT enhanced to increase the etch rates SBT thin films. These results were confirmed by XPS(x-ray photoelectron spectroscopy) analysis.s.

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Interaction of Rare Earth Chloride Salts to Alumina and Mullite in LiCl-KCl at 773 K

  • Horvath, David;Warmann, Stephen;King, James;Marsden, Kenneth;Hoover, Robert
    • Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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    • v.18 no.3
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    • pp.337-346
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    • 2020
  • Two commonly used ceramics in molten salt research are alumina and mullite. The two ceramics were exposed to a combination of rare earth chlorides (YCl3, SmCl3, NdCl3, PrCl3, and CeCl3; each rare earth chloride of 1.8 weight percent) in LiCl-KCl at 773 K for approximately 13 days. Scanning electron microscopy with wave dispersion spectra was utilized to investigate a formation layer or deposition of rare earths onto the ceramic. Only the major constituents of the ceramics (Al, Si, and O2) were observed during the wave dispersion spectra. X-ray fluorescence was used as well to determine concentration changes in the molten salt as a function of ceramic exposure time. This study shows no evidence of ionic exchange or layer formation between the ceramics and molten chloride salt mixture. There are signs of surface tension effects of molten salt moving out of the tantalum crucible into secondary containment.

The Influence of H+ and Cl- Ions on the Corrosion Inhibitive Effect of Poly(para-aminophenol) for Iron in Hydrochloric acid

  • Manivel, P.
    • Corrosion Science and Technology
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    • v.16 no.4
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    • pp.187-193
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    • 2017
  • Polymer amines are found to show distinct corrosion inhibition effects in acidic media. The functional groups of organic compounds have a wide role in the physical and chemical properties, for the inhibition efficiency with respect to steric factors, aromaticity, and electron density. The influence of $H^+$ ions and $Cl^-$ ions on the corrosion inhibitive effect of poly(p-aminophenol) for iron in hydrochloric acid was studied using electrochemical methods such as impedance, linear polarization, and Tafel polarization techniques. The experiments were conducted with and without the inhibitor, poly(p-aminophenol). The concentration range of $H^+$ ions and $Cl^-$ ions are from 1 M to 0.05 M and 1 M to 0.1 M, respectively. With the inhibitor poly(p-aminophenol), this study shows that inhibition efficiency decreases with the reduction of $H^+$ ion and $Cl^-$ ion concentrations in aqueous solution. Further, it reveals that the adsorption of an inhibitor on the surface of iron is dependent on the concentrations of $H^+$ and $Cl^-$ ions in the solution and the adsorption of inhibitor on the iron surface through the cationic form of amine.

Protective Metal Oxide Coatings on Zinc-sulfide-based Phosphors and their Cathodoluminescence Properties

  • Oh, Sung-Il;Lee, Hyo-Sung;Kim, Kwang-Bok;Kang, Jun-Gill
    • Bulletin of the Korean Chemical Society
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    • v.31 no.12
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    • pp.3723-3729
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    • 2010
  • We investigated the high-excitation voltage cathodoluminescence (CL) performance of blue light-emitting (ZnS:Ag,Al,Cl) and green light-emitting (ZnS:Cu,Al) phosphors coated with metal oxides ($SiO_2$, $Al_2O_3$, and MgO). Hydrolysis of the metal oxide precursors tetraethoxysilane, aluminum isopropoxide, and magnesium nitrate, with subsequent heat annealing at $400^{\circ}C$, produced $SiO_2$ nanoparticles, an $Al_2O_3$ thin film, and MgO scale-type film, respectively, on the surface of the phosphors. Effects of the phosphor surface coatings on CL intensities and aging behavior of the phosphors were assessed using an accelerating voltage of 12 kV. The MgO thick film coverage exhibited less reduction in initial CL intensity and was most effective in improving aging degradation. Phosphors treated with a low concentration of magnesium nitrate maintained their initial CL intensities without aging degradation for 2000 s. In contrast, the $SiO_2$ and the $Al_2O_3$ coverages were ineffective in improving aging degradation.

Numerical analysis of magnetization of HgBa$_2Ca_2Cu_3O_{8+{\delta}}$ superconductor (HgBa_2Ca_2Cu_3O_{8+{\delta}}$ 초전도체 자화의 수치적 해석)

  • Kim, Bong-Jun;Kim, Young-Cheol;Kim, Young-Jin;Back, Sang-Min
    • 한국초전도학회:학술대회논문집
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    • v.9
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    • pp.218-221
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    • 1999
  • Magnetization measurements have been carried out on grain aligned Hg-1223 with the applied field parallel to the c-axis. The temperature dependence of the lower critical field H$_{cl}$(T) was determined by considering the effect of the surface barrier on the magnetization. H$_{cl}$(T) have been determined .from magnetic hysteresis loops within the framework of the modified Kim-Anderson critical-state model, where the surface barrier and the lower critical field are explicitly considered. At high temperature, H$_{cl}$(T) is identified as H$_p$(T). This results are agreed with the theory of Bean-Livinston surface barriers.

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A Study of The Etched ZnO Thin Film Surface using inductively coupled plasma system (유도결합 플라즈마를 이용하여 식각된 ZnO 박막 표면연구)

  • Woo, Jong-Chang;Kim, Chang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.384-384
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    • 2010
  • The surface reaction characteristics of Zinc Oxide (ZnO) in $Cl_2/BCl_3$/Ar gas ratio using inductively coupled plasma system were investigated. It was found that ZnO etch rate shows a non-monotonic behavior with increasing both Ar fraction in $Cl_2/BCl_3$ plasma, RF power, and gas pressure. The maximum ZnO etch rate of 53 nm/min was obtained for $Cl_2$(3 sccm)/$BCl_3$(16 sccm) /Ar(4 sccm) gas mixture. The chemical state of etched surfaces was investigated with X-ray diffraction (XRD) and the etched surface was investigated to the rms by atomic force microscopy (AFM). From these data, the suggestions on the ZnO etch mechanism were made by secondary ion mass spectrometery (SIMS).

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Geometric Modeling and Five-axis Machining of Tire Master Models

  • Lee, Cheol-Soo
    • International Journal of Precision Engineering and Manufacturing
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    • v.9 no.3
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    • pp.75-78
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    • 2008
  • Tire molds are manufactured by aluminum casting, direct five-axis machining, and electric discharging machining. Master models made of chemical wood are necessary if aluminum casting is used. They are designed with a three-dimensional computer-aided design system and milled by a five-axis machine. In this paper, a method for generating and machining a tire surface model is proposed and demonstrated. The groove surfaces, which are the main feature of the tire model, are created using a parametric design concept. An automatically programmed tool-like descriptive language is presented to implement the parametric design. Various groove geometries can be created by changing variables. For convenience, groove surfaces and raw cutter location (CL) data are generated in two-dimensional drawing space. The CL data are mapped to the tread surface to obtain five-axis CL data to machine the master model. The proposed method was tested by actual milling using the five-axis control machine. The results demonstrate that the method is useful for manufacturing a tire mold.

Characterization of PECVD and LPCVD a-Si films crystallized by excimer laser (엑시머 레이저를 이용하여 결정화한 PECVD 및 LPCVD 비정질 실리콘 박막의 특성 분석)

  • 최홍석;이성규;장근호;전명철;한민구
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.33A no.6
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    • pp.172-177
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    • 1996
  • We have characterized XeCl excimer-laser-induced crystallization of thin amorphous silicon films deposited by PECVD (${\alpha}$-Si:H) and LPCVD (${\alpha}$-Si). The electrical properties, surface roughness and crystallinity of crystallized thin films have been measured. The dc conductivities, crystallinity andsurface roughness of the films increased as the laser energy density and shot density were increased. The properties of laser annealed films deposited by LPCVD were better than those of thin films deposite by PECVD. We have also found that the multiple shots with relative low energy density were more benifical to the improsvement of surface roughness than the single shot with high energy density preserving the crystallinity.

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VHF-PECVD OF Ti/TiN WITH SILANE REDUCTION PROCESS

  • Mizuno, Shigeru
    • Journal of Surface Science and Engineering
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    • v.29 no.5
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    • pp.350-356
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    • 1996
  • This paper presents VHF-Plasma Enhanced Chemical Vapor Deposition (VHF-PECVD) of Ti/TiN with silne reduction process, using $TiCl_4$ source. VHF plasma, which is denser than a conventional RF plasma, produces a large number of radicals. Silane reduction process, which supplies silane radicals, more promotes dissociation of Ti-Cl bond than a conventional hydrogen reduction process. therefore, the VHF-PECVD with silane reduction process forms high quality Ti/TiN films, which have low level of Cl content(<0.2 at.%). In result, the resistivity for Ti or TiN is less than 200$\mu$$\Omega$cm. The surface morphology of Ti film is very smooth. The structure of TiN film is amorphous. Furthermore, excellent step coverage for the films is obtained.

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Surface Reactions after the Etching of CeO$_2$ Thin films using Inductively Coupled C1$_2$/CF$_4$/Ar Plasmas (유도결합 C1$_2$/CF$_4$/Ar 플라즈마를 이용한 CeO$_2$ 박막 식각후 표면반응)

  • 이병기;김남훈;장윤성;김경섭;김창일;장의구
    • Journal of the Microelectronics and Packaging Society
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    • v.9 no.2
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    • pp.27-31
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    • 2002
  • In this study, $CeO_2$ thin films were etched with an addition of $Cl_2$ gas to $Ar/CF_4$ gas mixing in an inductively coupled plasma (ICP) etcher by the etching parameter such as RF power of 700 W, chamber pressure of 15 mTorr and dc bias voltage of -200 volts. The etch rate of $CeO_2$ films was 250 $\AA$/min with an addition of 10% $Cl_2$ gas to $Ar/CF_4$ gas mixture and the selectivity to SBT film was 0.4 at that condition. The surface reactions of the etched $CeO_2$ thin films were investigated by X-ray photoelectron spectroscopy (XPS). It was analyzed that Ce peaks were mainly observed in Ce-O bonds formed $CeO_2$ or $Ce_2O_3$ compounds. Cl peaks were detected by the peaks of Cl $2p_{3/2}$ and Cl $2p_{1/2}$. Almost all of Cl atoms were combined with Ce atoms like $CeCl_x$ or $Ce_x/O_yCl_z$ compounds.

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