• Title/Summary/Keyword: CCC-r chart

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A Synthetic Exponentially Weighted Moving-average Chart for High-yield Processes

  • Kusukawa, Etsuko;Kotani, Takayuki;Ohta, Hiroshi
    • Industrial Engineering and Management Systems
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    • v.7 no.2
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    • pp.101-112
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    • 2008
  • As charts to monitor the process fraction defectives, P, in the high-yield processes, Mishima et al. (2002) discussed a synthetic chart, the Synthetic CS chart, which integrates the CS (Confirmation Sample)$_{CCC(\text{Cumulative Count of Conforming})-r}$ chart and the CCC-r chart. The Synthetic CS chart is designed to monitor quality characteristics in real-time. Recently, Kotani et al. (2005) presented the EWMA (Exponentially Weighted Moving-Average)$_{CCC-r}$ chart, which considers combining the quality characteristics monitored in the past with one monitored in real-time. In this paper, we present an alternative chart that is more superior to the $EWMA_{CCC-r}$ chart. It is an integration of the $EWMA_{CCC-r}$ chart and the CCC-r chart. In using the proposed chart, the quality characteristic is initially judged as either the in-control state or the out-of-control state, using the lower and upper control limits of the $EWMA_{CCC-r}$ chart. If the process is not judged as the in-control state by the $EWMA_{CCC-r}$ chart, the process is successively judged, using the $EWMA_{CCC-r}$ chart. We compare the ANOS (Average Number of Observations to Signal) of the proposed chart with those of the $EWMA_{CCC-r}$ chart and the Synthetic CS chart. From the numerical experiments, with the small size of inspection items, the proposed chart is the most sensitive to detect especially the small shifts in P among other charts.

Exponentially Weighted Moving Average Chart for High-Yield Processes

  • Kotani, Takayuki;Kusukawa, Etsuko;Ohta, Hiroshi
    • Industrial Engineering and Management Systems
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    • v.4 no.1
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    • pp.75-81
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    • 2005
  • Borror et al. discussed the EWMA(Exponentially Weighted Moving Average) chart to monitor the count of defects which follows the Poisson distribution, referred to the $EWMA_c$ chart, as an alternative Shewhart c chart. In the $EWMA_c$ chart, the Markov chain approach is used to calculate the ARL (Average Run Length). On the other hand, in order to monitor the process fraction defectives P in high-yield processes, Xie et al. presented the CCC(Cumulative Count of Conforming)-r chart of which quality characteristic is the cumulative count of conforming item inspected until observing $r({\geq}2)$ nonconforming items. Furthermore, Ohta and Kusukawa presented the $CS(Confirmation Sample)_{CCC-r}$ chart as an alternative of the CCC-r chart. As a more superior chart in high-yield processes, in this paper we present an $EWMA_{CCC-r}$ chart to detect more sensitively small or moderate shifts in P than the $CS_{CCC-r}$ chart. The proposed $EWMA_{CCC-r}$ chart can be constructed by applying the designing method of the $EWMA_C$ chart to the CCC-r chart. ANOS(Average Number of Observations to Signal) of the proposed chart is compared with that of the $CS_{CCC-r}$ chart through computer simulation. It is demonstrated from numerical examples that the performance of proposed chart is more superior to the $CS_{CCC-r}$ chart.

The in-control performance of the CCC-r chart with estimated parameters (추정된 모수를 사용한 CCC-r 관리도에서 관리상태의 성능)

  • Kim, Jaeyeon;Kim, Minji;Lee, Jaeheon
    • The Korean Journal of Applied Statistics
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    • v.31 no.4
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    • pp.485-495
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    • 2018
  • The CCC-r chart is more effective than traditional attribute control charts for monitoring high-quality processes. In-control process parameters are typically unknown and should be estimated when implementing a CCC-r chart. Phase II control chart performance can deteriorate due to the effect of the estimation error. In this paper, we used the standard deviation of average run length (ARL) as well as the average of ARL to quantify the between-practitioner variability in the CCC-r chart performance. The results indicate that the CCC-r chart requires larger Phase I data than previously recommended in the literature in order to have consistent chart in-control performance among practitioners.

Performance of CCC-r charts with bootstrap adjusted control limits (붓스트랩에 기초하여 조정한 관리한계를 사용하는 CCC-r 관리도의 성능)

  • Kim, Minji;Lee, Jaeheon
    • The Korean Journal of Applied Statistics
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    • v.33 no.4
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    • pp.451-466
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    • 2020
  • CCC-r chart is effective for high-quality processes with a very low fraction nonconforming. The values of process parameters should be estimated from the Phase I sample since they are often not known. However, if the Phase I sample size is not sufficiently large, an estimation error may occur when the parameter is estimated and the practitioner may not achieve the desired in-control performance. Therefore, we adjust the control limits of CCC-r charts using the bootstrap algorithm to improve the in-control performance of charts with smaller sample sizes. The simulation results show that the adjustment with the bootstrap algorithm improves the in-control performance of CCC-r charts by controlling the probability that the in-control average number of observations to signal (ANOS) has a value greater than the desired one.

A Study on the Monitoring of Reject Rate in High Yield Process

  • Nam, Ho-Soo
    • Journal of the Korean Data and Information Science Society
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    • v.18 no.3
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    • pp.773-782
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    • 2007
  • The statistical process control charts are very extensively used for monitoring of process mean, deviation, defect rate or reject rate. In this paper we consider a control chart to monitor the process reject rate in the high yield process, which is based on the observed cumulative probability of the number of items inspected until r defective items are observed. We first propose selection of the optimal value of r in the CPC-r charts, and also consider the usefulness of the chart in high yield process such as semiconductor or TFT-LCD manufacturing process.

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