• 센서학회지
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• 제3권2호
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• pp.16-23
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• 1994

오염수에서 유기인 화합물을 측정하기 위해 개발된 광섬유 바이오센서의 신호의 분석과 최적설계를 위하여 센서에 사용되어진 AChE효소(acetylcholinesterase)의 반응, 반응기 내의 유체거동 및 물질전달현상의 해석이 필요하다. 사용되어진 센서의 반응기 부분을 해석하고 재설계하기 위하여 효소 반응을 연구하고, 이동현상학적으로 유체 및 물질확산 현상을 해석하여 반응기 모델을 성립하였다. 사용되어진 유기인 화합물에 의해 저해되는 AChE효소의 측정범위인 0-2 ppm 사이에서 저해반응을 실험하였으며, 비가역 저해 효소 반응식을 제안하였다. 반응기를 두상 즉 벌크상과 효소층으로 나누어 유체거동을 해석하였으며, 고정화겔 내의 확산의 영향을 조사하였다. 반응식, 유체거동식 및 확산식을 연계하여 세워진 반응기 전체모델을 제시하였고, 이를 이용하여 신호를 해석하였다. 제시된 모델을 이용하여 효소량, 효소층의 두께의 증가에 따른 센서 신호량의 민감도를 전산모사하였다.

• Carbon letters
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• 제12권2호
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• pp.116-119
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• 2011

C/SiC composites were prepared by boron nitride (BN)-assisted liquid silicon infiltration (LSI), and their anti-oxidation and mechanical properties were investigated. The microstructures, bulk densities, and porosities of the C/SiC composites demonstrated that the infiltration of liquid silicon into the composites improved them, because the layered-structure BN worked as a lubricant. Increasing the amount of BN improved the anti-oxidation of the prepared C/SiC composites. This synergistic effect was induced by the assistance of BN in the LSI. More thermally stable SiC was formed in the composite, and fewer pores were formed in the composite, which reduced inward oxygen diffusion. The mechanical strength of the composite increased up to the addition of 3% BN and decreased thereafter due to increased brittleness from the presence of more SiC in the composite. Based on the anti-oxidation and mechanical properties of the prepared composites, we concluded that improved anti-oxidation of C/SiC composites can be achieved through BN-assisted LSI, although there may be some degradation of the mechanical properties. The desired anti-oxidation and mechanical properties of the composite can be achieved by optimizing the BN-assisted LSI conditions.

• 한국환경농학회지
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• 제28권4호
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• pp.371-377
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• 2009

In this study, simultaneous nitrification and denitrification (SND) from synthetic wastewater were performed to evaluate dissolved oxygen(DO) effects on chemical oxygen demand(COD) and nitrogen removal in a single membarne bio-reactor(MBR). DO levels in MBR at Run 1, 2, and 3 were 1.9~2.2, 1.3~1.6, and 0.7~1.0 mg/L, respectively. Experimental results indicated that DO had an important factor to affect COD and total nitrogen(TN) removal. SND were able to be accomplished in the continuous-aeration MBR by controlling ambient DO concentration. It is postulated that, because of the oxygen diffusion limitation, an anoxic micro-zone was formed inside the flocs where the denitrification might occur. From the results of this study, 96% of COD could be removed at DO of 0.7mg/L. At run 2 72.92% of nitrogen was removed by the mechanisms of SND (7.75mg-TN/L in effluent). In this study, SND was successfully occurred in a MBR due to high MLSS that could help to form anoxic zone inside microbial floc at bulk DO concentrations of 1.3~1.6mg/L.

• Progress in Superconductivity
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• 제9권1호
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• pp.80-84
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• 2007

Charcoal was used as a carbon source for improving the critical current density of $MgB_2$ and the effect of annealing temperature on the $J_c$ of $MgB_2$ was investigated. The charcoal powder used in this study was $1{\sim}2$ microns in size and was prepared by wet attrition milling. $MgB_2$ bulk samples with a nominal composition of $Mg(B_{0.95}C_{0.05})_2$ were prepared by in situ process of Mg and B powders. The powder mixture was uniaxially compacted into pellets and heat treated at temperatures of $650^{\circ}C\;-\;1000^{\circ}C$ for 30 minutes in flowing Ar gas. It was found that superconducting transition temperature of $Mg(B_{0.95}C_{0.05})_2$ decreased by charcoal additions which indicates the carbon substitution for boron site. $J_c$ of $Mg(B_{0.95}C_{0.05})_2$ was lower than that of the undoped $MgB_2$ at the magnetic fields smaller than 4 Tesla, while it was higher than that of the undoped sample especially at the magnetic field higher than 4 T. High temperature annealing seems to be effective in increasing $J_c$ due to the enhanced carbon diffusion into boron sites.

• JSTS:Journal of Semiconductor Technology and Science
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• 제2권4호
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• pp.259-267
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• 2002

We present a novel 3D fabrication method with single X-ray process utilizing an X-ray mask in which a micro-actuator is integrated. An X-ray absorber is electroplated on the shuttle mass driven by the integrated micro-actuator during deep X-ray exposures. 3D microstructures are revealed by development kinetics and modulated in-depth dose distribution in resist, usually PMMA. Fabrication of X-ray masks with integrated electrothermal xy-stage and electrostatic actuator is presented along with discussions on PMMA development characteristics. Both devices use $20-\mu\textrm{m}$-thick overhanging single crystal Si as a structural material and fabricated using deep reactive ion etching of silicon-on-insulator wafer, phosphorous diffusion, gold electroplating, and bulk micromachining process. In electrostatic devices, $10-\mu\textrm{m}-thick$ gold absorber on $1mm{\times}1mm$ Si shuttle mass is supported by $10-\mu\textrm{m}-wide$, 1-mm-long suspension beams and oscillated by comb electrodes during X-ray exposures. In electrothermal devices, gold absorber on 1.42 mm diameter shuttle mass is oscillated in x and y directions sequentially by thermal expansion caused by joule heating of the corresponding bent beam actuators. The fundamental frequency and amplitude of the electrostatic devices are around 3.6 kHz and $20\mu\textrm{m}$, respectively, for a dc bias of 100 V and an ac bias of 20 VP-P (peak-peak). Displacements in x and y directions of the electrothermal devices are both around $20{\;}\mu\textrm{m}$at 742 mW input power. S-shaped and conical shaped PMMA microstructures are demonstrated through X-ray experiments with the fabricated devices.

• Journal of Information Display
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• 제12권4호
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• pp.209-212
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• 2011

The threshold voltage shift (${\Delta}V_{th}$) under positive-voltage bias stress (PBS) of InGaZnO (IGZO) thin-film transistors (TFTs) annealed at different temperatures in air was investigated. The dramatic degradation of the electrical performance was observed at the sample that was annealed at $700^{\circ}C$. The degradation of the saturation mobility (${\mu}_{sat}$) resulted from the diffusion of indium atoms into the interface of the IGZO/gate insulator after crystallization, and the degradation of the subthreshold slope (S-factor) was due to the increase in the interfacial and bulk trap density. In spite of the degradation of the electrical performance of the sample that was annealed at $700^{\circ}C$, it showed a smaller ${\Delta}V_{th}$ under PBS conditions for $10^4$ s than the samples that were annealed at $500^{\circ}C$, which is attributed to the nanocrystal-embedded structure. The sample that was annealed at $600^{\circ}C$ showed the best performance and the smallest ${\Delta}V_{th}$ among the fabricated samples with a ${\mu}_{sat}$ of $9.38cm^2/V$ s, an S-factor of 0.46V/decade, and a ${\Delta}V_{th}$ of 0.009V, which is due to the passivation of the defects by high thermal annealing without structural change.

• 한국수소및신에너지학회논문집
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• 제14권1호
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• pp.17-23
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• 2003

$H_2$ permeation flux though a $100{\mu}m-thick$ Pd-Ru (6wt%) membrane was measured at various temperatures and pressures. The permeation flux followed the Sievert's law and thus the rate-limiting step of the hydrogen permeation was the bulk atomic diffusion step. The activation energy of the permeation flux was obtained at 17.9 kJ/mol and this value is consistent with those published previously. While no degradation of the permeation flux wasfound in the membrane exposed to the $O_2$ and $CO_2$ environments for 100 hours, the membrane exposed to $N_2$ environment for 100 hours showed the degradation in the $H_2$ permeation flux. The $H_2$ permeation was decreased as the exposure temperature to $N_2$, environment was increased. The $H_2$ permeation flux was fully recovered after the membrane was kept in the $H_2$ environment for certain time. The permeation flux degradation might be caused by the formation of metal nitride on the membrane surface.

• 전자공학회논문지
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• 제53권3호
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• pp.39-45
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• 2016

본 논문에서는 게르마늄 응축 공정을 모델링하고 공정을 적용한 나노와이어 구조의 게르마늄 PMOSFET의 특성을 소자 시뮬레이션을 통하여 확인하였다. 기존의 연구 결과들을 토대로 하여 모델링을 수행한 결과, 게르마늄 응축 공정 과정에서 얻게 되는 벌크 영역에서의 게르마늄 농도($C_B$)에 대한 실리콘 게르마늄-실리콘 산화막 계면에서의 게르마늄 농도의 비율($C_S$)은 약 4.03, 해당 공정 온도에서 게르마늄 원자의 유효 확산 계수($D_{eff}$)은 약 $3.16nm^2/s$으로 추출되었다. 나아가, 게르마늄 응축 공정을 통하여 구현할 수 있는 실리콘 코어 상에 얇은 게르마늄 채널을 갖는 나노와이어 채널 구조의 PMOSFET을 설계하고 성능을 분석하였다. 이를 통하여, 전영역을 실리콘으로 혹은 게르마늄으로 하는 채널을 갖는 소자에 비하여 실리콘 코어-게르마늄 채널의 동축 이종접합 채널을 갖는 소자가 우수한 특성을 가질 수 있음을 확인하였다.

• 센서학회지
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• 제23권3호
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• pp.207-210
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• 2014

$TiO_2$ oxide semiconductor is being widely studied in various applications such as photocatalyst and photosensor. Pd/$TiO_2$ gas sensor is mainly used to detect $H_2$, CO and ethanol. This study focus on increasing hydrogen detection ability of Pd/$TiO_2$ in room temperature through Al-doping. Pd/$TiO_2$ was fabricated by the hydrothermal method. Contacting to Aluminum (Al) foil led to Al doping effect in Pd/$TiO_2$ by thermal diffusion and enhanced hydrogen sensing response. $TiO_2$ nanoparticles were sized at ~30 nm of diameter from scanning electron microscope (SEM) and maintained anatase crystal structure after Al doping from X-ray diffraction analysis. Presence of Al in $TiO_2$ was confirmed by X-ray photoelectron spectroscopy at 73 eV. SEM-energy dispersive spectroscopy measurement also confirmed 2 wt% Al in Pd/$TiO_2$ bulk. The gas sensing test was performed with $O_2$, $N_2$ and $H_2$ gas ambient. Pd/Al-doped $TiO_2$ did not response $O_2$ and $N_2$ gas in vacuum except $H_2$. Finally, the normalized resistance ratio ($R_{H2on}/R_{H2off}$) of Pd/Al-doped $TiO_2$ increases about 80% compared to Pd/$TiO_2$.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.207-207
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• 2012

Si quantum dot (QD) imbedded in a $SiO_2$ matrix is a promising material for the next generation optoelectronic devices, such as solar cells and light emission diodes (LEDs). However, low conductivity of the Si quantum dot layer is a great hindrance for the performance of the Si QD-based optoelectronic devices. The effective doping of the Si QDs by semiconducting elements is one of the most important factors for the improvement of conductivity. High dielectric constant of the matrix material $SiO_2$ is an additional source of the low conductivity. Active doping of B was observed in nanometer silicon layers confined in $SiO_2$ layers by secondary ion mass spectrometry (SIMS) depth profiling analysis and confirmed by Hall effect measurements. The uniformly distributed boron atoms in the B-doped silicon layers of $[SiO_2(8nm)/B-doped\;Si(10nm)]_5$ films turned out to be segregated into the $Si/SiO_2$ interfaces and the Si bulk, forming a distinct bimodal distribution by annealing at high temperature. B atoms in the Si layers were found to preferentially substitute inactive three-fold Si atoms in the grain boundaries and then substitute the four-fold Si atoms to achieve electrically active doping. As a result, active doping of B is initiated at high doping concentrations above $1.1{\times}10^{20}atoms/cm^3$ and high active doping of $3{\times}10^{20}atoms/cm^3$ could be achieved. The active doping in ultra-thin Si layers were implemented to silicon quantum dots (QDs) to realize a Si QD solar cell. A high energy conversion efficiency of 13.4% was realized from a p-type Si QD solar cell with B concentration of $4{\times}1^{20}atoms/cm^3$. We will present the diffusion behaviors of the various dopants in silicon nanostructures and the performance of the Si quantum dot solar cell with the optimized structures.