• Title/Summary/Keyword: Borosilicate glass

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Characterisation and Durability of a Vitrified Wasteform for Simulated Chrompik III Waste

  • Walling, Sam A.;Gardner, Laura J.;Pang, H.K. Celine;Mann, Colleen;Corkhill, Claire L.;Mikusova, Alexandra;Lichvar, Peter;Hyatt, Neil C.
    • Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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    • v.19 no.3
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    • pp.339-352
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    • 2021
  • Legacy waste from the decommissioned A-1 nuclear power plant in the Slovak Republic is scheduled for immobilisation within a tailored alkali borosilicate glass formulation, as part of ongoing site cleanup. The aqueous durability and characterisation of a simulant glass wasteform for Chrompik III legacy waste, was investigated, including dissolution experiments up to 112 days (90℃, ASTM Type 1 water). The wasteform was an amorphous, light green glassy product, with no observed phase separation or crystalline inclusions. Aqueous leach testing revealed a suitably durable product over the timescale investigated, comparing positively to other simulant nuclear waste glasses and vitreous products tested under similar conditions. Iron and titanium rich precipitates were observed to form at the surface of monolithic samples during leaching, with the formation of an alkali deficient alteration layer behind these at later ages. Overall this glass appears to perform well, and in line with expectations for this chemistry, although longer-term testing would be required to predict overall durability. This work will contribute to developing confidence in the disposability of vitrified Chrompik legacy wastes.

Development of transparent dielectric paste for PDP (플라즈마 디스플레이용 투명 유전체 페이스트의 개발)

  • Kim, Hyung-Jong;Chung, Yong-Sun;Joo, Kyoung;Auh, Keun-Ho
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.9 no.1
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    • pp.50-54
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    • 1999
  • Plasma display panel is a potential candidate for HDTV, due to the fact that the screen size can easily be increased by a thick film technology. In this study, transparent dielectric materials which satisfied the requirements of dielectrics for PDP was developed using lead alumina borosilicate glasses. The Paste which had thixotropic behavior suitable for screen printing was made of this glass composition. the paste became more thixotropic as the particle size decreased. After firing, the cross sectional area of the thick film was analyzed by SEM. The voids in the thick film were removed using bimodal particle system. The dielectric thick film showed good adhesion characteristics.

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Fabrication and mechanical properties of $Al_2O_3/AL$ composites by reactive melt infiltration (반응용융 침투법에 의한 $Al_2O_3/AL$복합재료의 제조 및 기계적 특성 평가)

  • ;;;T. Watari
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.7 no.4
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    • pp.610-618
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    • 1997
  • $Al_2O_3$/Al composite was produced by the infiltration of molten Al Into $Al_2$O$_3$ preform at 900-$1200^{\circ}C$, The process was accelerated by spreading borosilicate glass powder onto the interface between Al powder compact and $Al_2O_3$ preform. Melt infiltration initialed after incubation period, and the growth of infiltration was observed to be linearly propotional with time. The major components of the composite are $Al_2O_3$ and Al with a trace of Si which is remained from borosilicate, the reaction accelerator. Relative density of the composite increased with the particle size of $Al_2O_3$ but decreased with infiltration temperature. As infiltration temperature increases from room to $950^{\circ}C$ higher strength and fracture toughness were obtained.

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Composition and Temperature Dependence of Structural Changes in Borosilicate Glasses by Spectrometer (분광계에 의한 Borosilicate계 글라스의 조성 및 온도의존성 평가)

  • Park Sung-Je;Ryu Bong-Ki
    • Korean Journal of Materials Research
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    • v.15 no.12
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    • pp.786-790
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    • 2005
  • We investigated the particularity of temperature and composition changes in $xNa_2O{\cdot}(52.5-x)B_2O_3{\cdot}47.5SiO_2$ glasses by use of FT-IR, $^{11}B$ NMR, Raman spectrometer. From FT-IR and $^{11}B$ NMR spectrometer, we thought that tetrahedral boron, $BO_4$ units are created $N_4$ increasing tendency generated near $600^{\circ}C$. It's expected that composition ana heat treatment directly contributed to structural changes, this changes are following to $Na_2O$ increasing or decreasing. caused by $N_4\;and\;BO_4$ units are caused by relatively increasing or decreasing in the glasses' structure. Particularly, $BO_4$ units are converted to $BO_3$ units after $600^{\circ}C$ heat treatment for 50h in the composition of $x<18(R<0.5,\;R=Na_2O/B_2O_3\;mol\%)$. On the order hand, $BO_3$ units are converted to, $BO_4$ units after $600^{\circ}C$ heat treatment for 50h in the composition of $x{\geq}18\;(R>0.5)$. This particularity of composition and temperature dependence of structural changes are similarly represented by Raman analysis results.

Compositional Effects on Thermal and Electrical Properties of Dielectric Glass Paste

  • Kim, Teock-Nam;Lee, Jea-Yeol;Kim, Hyung-Sun;Hu, Jeung-Soo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2000.01a
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    • pp.95-96
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    • 2000
  • The effect of $Al_2O_3$ on the dielectric constant and the coefficient of thermal expansion of lead borosilicate glasses for the application of PDP glass paste was investigated. Measurements were made theoretically by using empirical equations on the composition of the of glasses in which the $PbO/Al_2O_3$, $B_2O_3/Al_2O_3$ and $SiO_2/Al_2O_3$ ratios were systematically varied. As a result, with increasing $PbO/Al_2O_3$ the thermal expansion coefficient and the dielectric constant noticeably increased, while the change of $B_2O_3/Al_2O_3$ and $SiO_2/Al_2O_3$ ratios did not affect those properties of the glasses.

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Affinity Separations Using Microfabricated Microfluidic Devices: In Situ Photopolymerization and Use in Protein Separations

  • Chen Li;Lee, Wen-Chien;Lee, Kelvin H.
    • Biotechnology and Bioprocess Engineering:BBE
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    • v.8 no.4
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    • pp.240-245
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    • 2003
  • The use of microfabricated microfluidic devices offers significant advantages over current technologies including fast analysis time and small reagent requirements. In the context of proteomic research, the possibility of using affinity-based separations for prefractionation of samples using microfluidic devices has significant potential. We demonstrate the use of microscale devices to achieve affinity separations of proteins using a device fabricated from borosilicate glass wafers. Photolithography and wet etching are used to pattern individual glass wafers and the wafers are fusion bonded at 650$^{\circ}C$ to obtain enclosed channels. A polymer has been successfully polymerized in situ and used either as a frit for packing beads or, when derivatized with Cibacron Blue 3GA, as a separation matrix. Both of these technologies are based on in situ UV photopolymerization of glycidyl methacrylate (GMA) and trimethylolpropane trimethacrylate (TRIM) in channels.

Melting and draining tests on glass waste form for the immobilization of Cs, Sr, and rare-earth nuclides using a cold-crucible induction melting system

  • Choi, Jung-Hoon;Lee, Byeonggwan;Lee, Ki-Rak;Kang, Hyun Woo;Eom, Hyeon Jin;Park, Hwan-Seo
    • Nuclear Engineering and Technology
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    • v.54 no.4
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    • pp.1206-1212
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    • 2022
  • Cold-crucible induction melting (CCIM) technology has been intensively studied as an advanced vitrification process for the immobilization of highly radioactive waste. This technology uses high-frequency induction to melt a glass matrix and waste, while the outer surface of the crucible is water-cooled, resulting in the formation of a frozen glass layer (skull). In this study, for the fabrication of borosilicate glass waste form, CCIM operation test with 60 kg of glass per batch was conducted using surrogate wastes composed of Cs, Sr, and Nd as a representative of highly radioactive nuclides generated during spent nuclear fuel management. A 60 kg-scale glass waste form was successfully fabricated through melting and draining processes using a CCIM system, and its physicochemical properties were analyzed. In particular, to enhance the controllability and reliability of the draining process, an air-cooling drain control method that can control draining through air-cooling near drain holes was developed, and its validity for draining control was verified. The method can offer controllability on various draining processes, such as molten salt or molten metal draining processes, and can be applied to a process requiring high throughput draining.

Measurement of Electrical Conductivity of Glass Melter at High Temperature (유리 용융물의 고온에서 전기 전도도 측정)

  • Kim, Taesam;Kil, Daesup;Jung, Hunsaeng;Kang, Eunhee;Yoon, Soksung
    • Analytical Science and Technology
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    • v.13 no.6
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    • pp.775-780
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    • 2000
  • The electrical conductivity of glass melter at high temperature has been measured. The conductivity is an important physical property for the research and the manufacturing process of glass. Because high temperature is an inconvenient situation to measure the conductivity of glass melter, we have made a platinum crucible and electrode and have measured the conductivity at high temperature. KCl solution, of which concentration is adjusted to the conductivity of glass melter, is used to get parameters of the conductivity cell. A measuring circuit is composed with an AC 1 kHz sine wave generator and an operational amplifier. The cell constants are determined from the measured voltages and the equivalent conductances of KCl solution. Various cells are tested to find a suitable shape for high temperature experiment. The results are compared by cell size, electrode depth, and cell configuration. The conductivity of the borosilicate melter is $0.053{\Omega}^{-1}cm^{-1}$ at $1,450^{\circ}C$.

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Wafer-level Fabrication of Ball Lens by Cross-cut and Reflow of Wafer-bonded Glass on Silicon

  • Lee, Dong-Whan;Oh, Jin-Kyung;Choi, Jun-Seok;Lee, Hyung-Jong;Chung, Woo-Nam
    • Journal of the Optical Society of Korea
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    • v.14 no.2
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    • pp.163-169
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    • 2010
  • Novel wafer-level fabrication of a glass ball-lens is realized for optoelectronic applications. A Pyrex wafer is bonded to a silicon wafer and cross-cut into a square-tile pattern, followed by wet-etching of the underlying silicon. Cubes of Pyrex on the undercut silicon are then turned into ball shapes by thermal reflow, and separated from the wafer by further etching of the silicon support. Radial variation and surface roughness are measured to be less than ${\pm}3\;{\mu}m$ and ${\pm}1\;nm$, respectively, for ball diameter of about $500\;{\mu}m$. A surface defect on the ball that is due to the silicon support is shown to be healed by using a silicon-optical-bench. Optical power-relay of the ball lens showed the maximum efficiency of 65% between two single-mode fibers on the silicon-optical-bench.

Polycrystalline silicon films for solar cell application by solution growth (태양전지용 다결정 실리콘 박막의 용액 성장법에 관한 연구)

  • Soo Hong Lee;Martin A. Green
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.4 no.2
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    • pp.119-130
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    • 1994
  • To deposit silicon on borosilicate glass substrates, 18 different substrate combinations were investigated because of the difficulty of direct deposition of silicon. Sucessful results were obtained from Al-and Mg-treated glass and furnace annealed sputtered silicon deposited glass substrates. A continuous silicon thin film on a large area substrates was obtained in the temperatures ranges from $420^{\circ}C to 520^{\circ}C$. These thin films might be applied to lower the cost of solar cells and solar cell modules.

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