• 제목/요약/키워드: Barrier-type alumina

검색결과 14건 처리시간 0.028초

나노 기공성 알루미나의 생성과 화학적 용해 거동 (Formation and Chemical Dissolution Behaviors of Nano Porous Alumina)

  • 오한준;정용수;지충수
    • 한국표면공학회지
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    • 제43권5호
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    • pp.217-223
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    • 2010
  • For an application as templates of high performance with proper pore size and shape, porous anodic alumina films were prepared by anodization in oxalic acid, and formation behaviors of anodic alumina layer as well as dissolution process in acid solution have been investigated. The surface characteristics on anodic alumina layer were shown to be dependent on the fabrication parameters for anodization. For the dissolution behaviors of anodic alumina, the thickness of the barrier-type alumina layer decreased linearly with the rate of 0.98 nm/min in $H_3PO_4$ solution at $30^{\circ}C$. The changes of the anodic alumina layers were analyzed by SEM and TEM.

기공성 알루미나 산화 피막을 이용한 나노 금속화합물의 제조 (Fabrication of Nano Metal Compounds Using Porous Aluminum Oxide Films)

  • 오한준;정용수;지충수
    • 한국표면공학회지
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    • 제43권5호
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    • pp.248-254
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    • 2010
  • Porous $Al_2O_3$ film can be utilized as template for fabrication of nano-structured materials. Porous anodic alumina layer as template was prepared by anodization of aluminum in oxalic acid, and the pore diameter and barrier-type alumina layer can be controlled for proper anodizing parameter by widening process in $H_3PO_4$ solution. The $SiO_2$ nanodot and Ni nanowire was fabricated using anodic alumina template and their characteristics were investigated using SEM and TEM with EDS. Especially the growth mechanism of $SiO_2$ nanodot in alumina membrane compared with thinning of the alumina barrier layer during anodization was also investigated.

콜로이드성 알루미나 분말 입자의 응집현상의 컴퓨터 시뮬레이션 (Computer simulation of agglomeration in colloidal alumina powder suspension)

  • 김종철;오근호
    • 한국결정성장학회지
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    • 제9권2호
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    • pp.224-230
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    • 1999
  • 콜로이드성 알루미나 분말 입자들의 현탁액에서 입자들의 응집현상을 시뮬레이션 하였다. 현탁액 속의 알루미나 분말 입자들은 입자간 포텐셜 에너지를 가지고 있으며 시간이 경과함에 따라 현탁액으 전체적인 에너지를 감소시키는 방향으로 시스템을 변화시킨다. 현탁액 속의 분말 입자들의 응집 현상을 입자간 포텐셜 곡선의 유형에 따라 관찰하였다. 단거리에서 강한 친화 포텐셜 에너지를 가지는 입자들은 무정형 망목 응집구조를 유도하며 응집체의 크기가 작아지고 단거리에서 강한 척력 포텐셜 에너지와 장거리에서 상대적으로 강한 친화 포텐셜 에너지를 가지는 분말 입자들이 밀집충진 응집구조에 접근하고 응집체의 크기가 상대적으로 커지게 된다. 입자간 에너지 분포에 강한 반발에너지 장벽이 존재하는 경우에 입자들이 응집함에 따라 이러한 에너지는 장벽이 사라지게 되며 이러한 현상은 입자의 응집패턴의 변화를 의미한다.

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플라즈마 디스플레이 패널의 격벽형성의 에칭 메커니즘 (Etching Mechanism of Barrier Ribs in Plasma Display Panel)

  • 정유진;전재삼;성우경;김형순
    • 반도체디스플레이기술학회지
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    • 제5권3호
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    • pp.33-36
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    • 2006
  • To produce a fine structure with uniform surface of barrier ribs in PDP, acid etching process has been used in manufacture process. It is necessary to understand the mechanism of etching, particularly on the interface of ceramic fillers and matrix glass. We investigated the effect of ceramic fillers (ZnO, $Al_2O_3$) on the microstructure of borate glass system to find an etching mechanism of barrier ribs. The barrier ribs was etched with several steps, dissolving a small amount of residual glass, taking out alumina fillers, and removing a cluster type of ZnO fillers and glass matrix.

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평판형 유전체 장벽 방전 반응기에서 Acetonitrile의 분해 특성 (Decomposition of Acetonitrile by Planar Type Dielectric Barrier Discharge Reactor)

  • 송영훈;김관태;류삼곤;이해완
    • 한국군사과학기술학회지
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    • 제5권3호
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    • pp.105-112
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    • 2002
  • A combined process of non-thermal plasma and catalytic techniques has been investigated to treat toxic gas compounds in air. The treated gas in the present study is $CH_3$CN that has been known to be a simulant of toxic chemical agent. A planar type dielectric barrier discharge(DBD) reactor has been used to generate non-thermal plasma that produces various chemically active species, O, N, OH, $O_3$, ion, electrons, etc. Several different types of adsorbents and catalysts, which are MS 5A, MS 13X, Pt/alumina, are packed into the plasma reactor, and have been tested to save power consumption and to treat by-products. Various aspects of the present techniques, which are decomposition efficiencies along with the power consumption, by-product analysis, reaction pathways modified by the adsorbents and catalysts, have been discussed in the present study.

평판형 유전체 장벽 방전 반응기에서 충진물질에 따른 아세토나이트릴의 분해 특성 (Decomposition of Acetonitrile Using a Planar Type Dielectric Barrier Discharge Reactor Packed with Adsorption and Catalyst Materials)

  • 김관태;송영훈;김석준
    • 한국대기환경학회지
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    • 제19권2호
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    • pp.157-165
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    • 2003
  • A combined process of non-thermal plasma and catalytic technique has been investigated to treat $CH_3$CN gas in the atmosphere. A planar type dielectric barrier discharge (DBD) reactor has been used to generate the non-thermal plasma that produces various chemically active species, such as O, N, OH, $O_3$, ion, electrons, etc. Several different types of the beads. which are Molecular Sieve (MS) 5A, MS 13X, Pt/alumina beads, are packed into the DBD reactor, and have been tested to characterize the effects of adsorption and catalytic process on treating the $CH_3$CN gas in the DBD reactor. The test results showed that the operating power consumption and the amounts of the by-products of the non-thermal plasma process can be reduced by the assistance of the adsorption and catalytic process.

메탄으로부터 촉매와 유전체 장벽 방전 반응기를 활용한 C2 화합물의 합성 (Synthesis of C2 Chemicals from Methane in a Dielectric Barrier Discharge (DBD) Plasma Bed)

  • 오지환;전종현;정재권;하경수
    • Korean Chemical Engineering Research
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    • 제56권1호
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    • pp.125-132
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    • 2018
  • 유전체 장벽 방전 반응기에서 규칙적인 메조기공 갖는 촉매를 사용하여 플라즈마 에너지를 이용한 메탄의 직접전환반응 연구를 수행하였다. 촉매는 MgO/OMA (ordered mesoporous alumina), $MgO/{\gamma}-Al_2O_3$$MgO/{\alpha}-Al_2O_3$를 사용하여 반응하였다. Pulse 고전압을 이용한 플라즈마 반응기에서 촉매 MgO/OMA를 사용하였을 때 $C_2$ 화합물의 선택도는 67%로 최고의 성능을 나타내었다. 금속산화물 종류, 규칙적인 메조기공 구조, 알루미나의 상변화 그리고 전원공급방식에 따른 효과를 고려하여 반응기 성능 및 생성물 분포를 비교하였다. BET (Brunauer, Emmett, Teller), X 선 회절, 주사전자현미경, 열 무게 분석으로 촉매의 반응 전후의 특성을 분석하였다.

나노 인덴터를 이용한 플라즈마 디스플레이 소자(PDP)내 격벽의 기계적 물성 평가 (Evaluation of Mechanical Properties of Barrier Ribs for Plasma Display Panel Using Nano Indenter Technology)

  • 정병해;김형순
    • 한국재료학회지
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    • 제13권1호
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    • pp.53-58
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    • 2003
  • For the rib materials in PDP(plasma display panel), an effective method to improve the mechanical properties is to form a composite material by reinforcing a glass matrix with rigid fillers, such as alumina and titania powders. In this study, two types of ribs with different volume percent of fillers and with different glass matrix were tested for hardness, Young's modulus with the Berkovich indentation. As a result, cracks appeared around at the load of 1345 mN for the dense type of rib, while porous one endured until 2427 mN without any crack formation. Young's modulus and hardness decreased at the range: 90∼65 GPa, 9∼4 GPa, respectively as a function of indent load. Thus, a new method with nanoindenter represents a possible evaluation method for mechanical properties of barrier ribs.

Effects of ceramic fillers on fracture resistance of barrier ribs of PDP

  • Baek, Se-Kyung;Kim, Yong-Seog
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.552-554
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    • 2004
  • Barrier ribs of plasma display panel (PDP) are glass matrix composite reinforced with alumina particles. Mechanical properties of the ribs are very crucial for the improvement in reliability of the panel as the ribs might fracture during transportation and service. In this study, therefore, the effects of filler type and content on the mechanical properties of the ribs were investigated. The fillers used include $Al_2O_3$, $TiO_2$, $ZrO_2$ and fused silica. The content of the filler was changed from 0 to 40 vol.%. The mechanical properties of the ribs measured were hardness, Young's modulus, fracture toughness, and 3-point bending modulus. The fracture toughness evaluated by micro-Vicker's indentation of the composites, in general, was measured to increase with the content of the filler until the sintered density does not decrease significantly. The improvement, however, was dependent on the type of filler employed.

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N-형 $WO_{3}$계 가스센서의 전기적 특성 (Electrical properties of n-type $WO_{3}$ based gas sensors)

  • 양종인;김일진;임한조;한상도;정관수
    • 센서학회지
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    • 제7권3호
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    • pp.188-196
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    • 1998
  • $WO_{3}$계 n-형 반도체 가스센서의 검지특성 및 전기적 특성을 조사하였다. 공기중에서 결합제가 첨가되지 않은 $WO_{3}:TiO_{2}$(4 wt. %) 센서의 낱알경계에서의 전위장벽의 크기는 0.26 V로 나타났으며, 결합제로서 $Al_{2}O_{3}$, PVA (polyvinyl alcohol ), silica sol이 첨가된 센서의 경우는 전위장벽이 각각 0.17, 0.22, 0.26 V로 관측되었다. 이들 시료를 $NO_{x}$가 120 ppm 첨가된 분위기에 노출시켰을 때, 결합제가 첨가되지 않은 센서의 경우는 낱알경계에서의 전위장벽이 0.59 V로 증가하였으며, 결합제로서 $Al_{2}O_{3}$, PVA, silica sol이 첨가된 경우는 전위장벽이 각각 0.43, 0.66, 0.52 V로 나타나, PVA가 첨가된 센서에서 전위장벽의 변화가 가장 높아 감도가 우수하게 되는 것을 알 수가 있었다. 한편 센서 최적 작동온도 이상의 온도에서 나타나는 감도의 감소는 흡착가스 입자의 탈착보다는 공기중에서 다결정이 보이는 저항의 온도 의존성에 따라 나타남이 판명되었다. 또한 결합제가 첨가되지 않은 센서와 결합제로서 Pt가 첨가된 센서의 경우, CO가 250 ppm 존재할 때까지도 전위장벽의 크기가 약 0.2 V로 공기중에서와 비슷한 크기를 나타내어, CO와 $NO_{x}$가 혼합된 분위기에서 $NO_{x}$만을 선택적으로 검지하는데 유리함이 밝혀졌다.

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