• Title/Summary/Keyword: Barrier potential

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Electrical Properties of TiO2 Thin Film and Junction Analysis of a Semiconductor Interface

  • Oh, Teresa
    • Journal of information and communication convergence engineering
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    • v.16 no.4
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    • pp.248-251
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    • 2018
  • To research the characteristics of $TiO_2$ as an insulator, $TiO_2$ films were prepared with various annealing temperatures. It was researched the currents of $TiO_2$ films with Schottky barriers in accordance with the contact's properties. The potential barrier depends on the Schottky barrier and the current decreases with increasing the potential barrier of $TiO_2$ thin film. The current of $TiO_2$ film annealed at $110^{\circ}C$ was the lowest and the carrier density was decreased and the resistivity was increased with increasing the hall mobility. The Schottky contact is an important factor to become semiconductor device, the potential barrier is proportional to the hall mobility, and the hall mobility increased with increasing the potential barrier and became more insulator properties. The reason of having the high mobility in the thin films in spite of the lowest carrier concentration is that the conduction mechanism in the thin films is due to the band-to-band tunneling phenomenon of electrons.

A New Two-Dimensional Model for the Drain-Induced Barrier Lowering of Fully Depleted Short-Channel SOI-MESFET's

  • Jit, S.;Pandey, Prashant;Pal, B.B.
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.3 no.4
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    • pp.217-222
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    • 2003
  • A new two-dimensional analytical model for the potential distribution and drain-induced barrier lowering (DIBL) effect of fully depleted short-channel Silicon-on-insulator (SOI)-MESFET's has been presented in this paper. The two dimensional potential distribution functions in the active layer of the device is approximated as a simple parabolic function and the two-dimensional Poisson's equation has been solved with suitable boundary conditions to obtain the bottom potential at the Si/oxide layer interface. It is observed that for the SOI-MESFET's, as the gate-length is decreased below a certain limit, the bottom potential is increased and thus the channel barrier between the drain and source is reduced. The similar effect may also be observed by increasing the drain-source voltage if the device is operated in the near threshold or sub-threshold region. This is an electrostatic effect known as the drain-induced barrier lowering (DIBL) in the short-gate SOI-MESFET's. The model has been verified by comparing the results with that of the simulated one obtained by solving the 2-D Poisson's equation numerically by using the pde toolbox of the widely used software MATLAB.

Barrier-Transition Cooling in LED

  • Kim, Jedo
    • Journal of Power System Engineering
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    • v.17 no.5
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    • pp.44-51
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    • 2013
  • This paper proposes and analyzes recycling of optical phonons emitted by nonradiative decay, which is a major thermal management concern for high-power light emitting diodes (LED), by introducing an integrated, heterogeneous barrier cooling layer. The cooling is proportional to the number of phonons absorbed per electron overcoming the potential barrier, while the multi-phonon absorption rate is inversely proportional to this number. We address the theoretical treatment of photon-electron-phonon interaction/transport kinetics for optimal number of phonons (i.e., barrier height). We consider a GaN/InGaN LED with a metal/AlGaAs/GaAs/metal potential barrier and discuss the energy conversion rates. We find that significant amount of heat can be recycled by the barrier transition cooling layer.

Effect of Recombination and Decreasing Low Current on Barrier Potential of Zinc Tin Oxide Thin-Film Transistors According to Annealing Condition

  • Oh, Teresa
    • Journal of information and communication convergence engineering
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    • v.17 no.2
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    • pp.161-165
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    • 2019
  • In this study, zinc tin oxide (ZTO) thin-film transistors are researched to observe the correlation between the barrier potential and electrical properties. Although much research has been conducted on the electronic radiation from Schottky contacts in semiconductor devices, research on electronic radiation that occurs at voltages above the threshold voltage is lacking. Furthermore, the current phenomena occurring below the threshold voltage need to be studied. Bidirectional transistors exhibit current flows below the threshold voltage, and studying the characteristics of these currents can help understand the problems associated with leakage current. A factor that affects the stability of bidirectional transistors is the potential barrier to the Schottky contact. It has been confirmed that Schottky contacts increase the efficiency of the element in semiconductor devices, by cutting off the leakage current, and that the recombination at the PN junction is closely related to the Schottky contacts. The bidirectional characteristics of the transistors are controlled by the space-charge limiting currents generated by the barrier potentials of the SiOC insulated film. Space-charge limiting currents caused by the tunneling phenomenon or quantum effect are new conduction mechanisms in semiconductors, and are different from the leakage current.

Simulation of electron tunneling time through a potential barrier (전위 장벽에 대한 전자의 터널링 시간의 시뮬레이션)

  • Lee, Wook;Lee, Byoung-Ho
    • The Transactions of the Korean Institute of Electrical Engineers
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    • v.45 no.1
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    • pp.159-163
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    • 1996
  • Simulated electron tunneling time through a potential barrier is compared with theoretical phase time. For a GaAs/Al/sub 0.3/Ga/sub 0.7/As/GaAs potential barrier with 300 meV height and 3 nm or 5 nm width, simulations are performed with various average electron energies and momentum deviations. The simulation results become closer to the theoretical phase time as the average electron energy decreases and as the momentum deviation decreases. It is also shown that a barrier, which is due to the peak spectrum shift in the momentum space after tunneling. (author). refs., figs.

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Selective Sensing of Carbon Monoxide Gas in CuO banded ZnO Ceramics (CuO띠가 입혀진 ZnO 소결체의 일산화탄소에 대한 선택적 감지 특성)

  • 신병철
    • Journal of the Korean Ceramic Society
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    • v.30 no.10
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    • pp.819-822
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    • 1993
  • The purpose of this paper is a investigation of sensing mechanism for the carbon monoxide gas in CuO infiltrated ZnO ceramics. Potential barriers between CuO and ZnO can explain the selective sensing of carbon monoxide gas in the physically contacted CuO/ZnO ceramics. A specimen having no potential barrier between CuO and ZnO was prepared to see whether the gas sensing mechanism is related to the potential barrier. CuO and ZnO was prepared to see whether the gas sensing mechanism is related to the potential barrier. CuO was painted on the non electrode sides of ZnO ceramics. The CuO painted ZnO ceramics showed that the sensitivityfor the carbon moxnoxide gas was 1.3 times as high as that for the hydrogen gas. It is almost same gas sensitivity as that of the CuO infiltrated ZnO ceramics.

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Analysis of Drain Induced Barrier Lowering for Double Gate MOSFET According to Channel Doping Concentration (채널도핑강도에 대한 이중게이트 MOSFET의 DIBL분석)

  • Jung, Hak-Kee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.16 no.3
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    • pp.579-584
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    • 2012
  • In this paper, drain induced barrier lowering(DIBL) has been analyzed as one of short channel effects occurred in double gate(DG) MOSFET. The DIBL is very important short channel effects as phenomenon that barrier height becomes lower since drain voltage influences on potential barrier of source in short channel. The analytical potential distribution of Poisson equation, validated in previous papers, has been used to analyze DIBL. Since Gaussian function been used as carrier distribution for solving Poisson's equation to obtain analytical solution of potential distribution, we expect our results using this model agree with experimental results. The change of DIBL has been investigated for device parameters such as channel thickness, oxide thickness and channel doping concentration.

Analysis of Drain Induced Barrier Lowering for Double Gate MOSFET According to Channel Doping Intensity (채널도핑강도에 대한 DGMOSFET의 DIBL분석)

  • Jung, Hak-Kee
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2011.10a
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    • pp.888-891
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    • 2011
  • In this paper, drain induced barrier lowering(DIBL) has been analyzed as one of short channel effects occurred in double gate(DG) MOSFET. The DIBL is very important short channel effects as phenomenon that barrier height becomes lower since drain voltage influences on potential barrier of source in short channel. The analytical potential distribution of Poisson equation, validated in previous papers, has been used to analyze DIBL. Since Gaussian function been used as carrier distribution for solving Poisson's equation to obtain analytical solution of potential distribution, we expect our results using this model agree with experimental results. The change of DIBL has been investigated for device parameters such as channel thickness, oxide thickness and channel doping intensity.

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Computer simulation of agglomeration in colloidal alumina powder suspension (콜로이드성 알루미나 분말 입자의 응집현상의 컴퓨터 시뮬레이션)

  • 김종철;오근호
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.9 no.2
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    • pp.224-230
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    • 1999
  • Agglomeration of colloidal alumina particles in a suspension is simulated. Particles in a suspension have potential energies between them and move to decrease the summation of all the potential energies between particles. The effects of various types of potential curves on particle agglomeration were checked. Strong short range attractive energy without repulsive energy barrier makes small strong clusters with disordered network structure but weak short-range force with big repulsive energy barrier makes big agglomerates with a close packing structure. As particles are agglomerated the potential energy with strong repulsive energy barrier between agglomerates gradually decreases the importance of the repulsive energy barrier and induces a different type of agglomeration behavior.

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Study on GZO Thin Films as Insulator, Semiconductor and Conductor Depending on Annealing Temperature (열처리 온도에 따라서 절연체, 반도체, 전도체의 특성을 갖는 GZO 박막의 특성연구)

  • Oh, Teresa
    • Korean Journal of Materials Research
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    • v.26 no.6
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    • pp.342-346
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    • 2016
  • To observe the bonding structure and electrical characteristics of a GZO oxide semiconductor, GZO was deposited on ITO glasses and annealed at various temperatures. GZO was found to change from crystal to amorphous with increasing of the annealing temperatures; GZO annealed at $200^{\circ}C$ came to have an amorphous structure that depended on the decrement of the oxygen vacancies; increase the mobility due to the induction of diffusion currents occurred because of an increment of the depletion layer. The increasing of the annealing temperature caused a reduction of the carrier concentration and an increase of the bonding energy and the depletion layer; therefore, the large potential barrier increased the diffusion current dna the Hall mobility. However, annealing temperatures over $200^{\circ}C$ promoted crystallinity by the defects without oxygen vacancies, and then degraded the depletion layer, which became an Ohmic contact without a potential barrier. So the current increased because of the absence of a potential barrier.