• Title/Summary/Keyword: Barrier film

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Correlation between the Potential Barrier and Variation of Temperature on SiOC thin film (탄소 주입 실리콘 산화 절연박막에서 전위장벽과 온도 변화에 대한 상관성)

  • Oh, Teresa
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.12 no.12
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    • pp.2247-2252
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    • 2008
  • The SiOC films as the carbon doped silicon oxide film were prepared with the variation of flow rater ratios by plasma enhanced chemical vapor deposition. The samples were analyzed by the fourier transform infrared spectroscopy, I-V measurement and scanning electron microscopy. The samples were shown the chemical shift according to the flow rate ratios, and the grain did not formed at the sample with hybrid properties. The leakage currents decreased according to the increasing of the substrate temperature at the sample with hybrid properties, but the potential barrier increased.

Element Analysis related to Mobility and Stability of ZTO Thin Film using the CO2 Gases (이산화탄소를 이용한 ZTO 박막의 이동도와 안정성분석)

  • Oh, Teresa
    • Korean Journal of Materials Research
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    • v.28 no.12
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    • pp.758-762
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    • 2018
  • The transfer characteristics of zinc tin oxide(ZTO) on silicon dioxide($SiO_2$) thin film transistor generally depend on the electrical properties of gate insulators. $SiO_2$ thin films are prepared with argon gas flow rates of 25 sccm and 30 sccm. The rate of ionization of $SiO_2$(25 sccm) decreases more than that of $SiO_2$(30 sccm), and then the generation of electrons decreases and the conductivity of $SiO_2$(25 sccm) is low. Relatively, the conductivity of $SiO_2$(30 sccm) increases because of the high rate of ionization of argon gases. Therefore, the insulating performance of $SiO_2$(25 sccm) is superior to that of $SiO_2$(30 sccm) because of the high potential barrier of $SiO_2$(25 sccm). The $ZTO/SiO_2$ transistors are prepared to research the $CO_2$ gas sensitivity. The stability of the transistor of $ZTO/SiO_2$(25 sccm) as a high insulator is superior owing to the high potential barrier. It is confirmed that the electrical properties of the insulator in transistor devices is an important factor to detect gases.

Life Time Characteristics of OLED Device with AlOx Passivation Film Deposited by RF Magnetron Sputtering (RF 마그네트론 스퍼터링으로 증착된 AlOx 봉지 박막을 갖는 OLED 소자의 수명 특성)

  • An, O-Jin;Ju, Sung-Hoo;Yang, Jae-Woong
    • Journal of Surface Science and Engineering
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    • v.43 no.6
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    • pp.272-277
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    • 2010
  • We investigated the life time characteristics of OLED device with aluminium oxide ($AlO_x$) passivation film on glass substrate and polyethylene terephthalate (PET) substrate by RF magnetron sputtering for the transparent barrier film applied to flexible OLED device. Basic buffer layer was determined as $Alq_3$(500 nm)-LiF(300 nm)-Al(1200 nm), and the most suitable aluminium oxide ($AlO_x$) film have been formed when the partial volume ratio of oxygen was 20% and the sputtering power was 100 watt and the minimum thickness of buffer was $2\;{\mu}m$. $AlO_x$/epoxy hybrid film was also used as a effective passivation layer for the purpose of improving life time characteristics of OLED devices with the glass substrate and the plastic substrate. Besides, the simultaneous deposition of $AlO_x$/epoxy film on back side of PET could result in better improvement of life time.

A pn diode constructed with an n-type ZnO nanowire and a p-type HgTe nanoparticle thin film (ZnO 나노선과 HgTe 나노입자 박막을 이용한 pn 접합 다이오드)

  • Seong, Ho-Jun;Cho, Kyoung-Ah;Kim, Sang-Sig
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.121-121
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    • 2008
  • We propose a novel nanomaterial-based pn diode which constructed with an n-type ZnO nanowire (NW) and a p-type HgTe nanoparticle (NP) thin film. The photo current characteristics of a ZnO NW, a HgTe NP thin film and pn diode constructed with a ZnO NW and a HgTe NP thin film were investigated under illumination of the 325 nm and 633 nm wavelength light. The conductivities of a ZnO NW exposed to the 325 nm and 633 nm wavelength light increased, while the photocurrents taken from the HgTe NP thin film was very close to the dark currents. Moreover, The pn diode exhibited the rectifying characteristics of the dark current and of the photocurrent excited by the 633 nm wavelength light. In contrast, the ohmic characteristics for the photocurrent were observed due to the junction barrier lowering in the conduction band of the ZnO nanowire under the illumination of the 325 nm wavelength light.

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Measurement and Verification of Thermal Conductivity of Multilayer Thin Dielectric Film via Differential $3\omega$ Method (차등 $3\omega$ 기법을 이용한 다층 유전체 박막의 열전도도 측정 및 검증)

  • Shin, Sang-Woo;Cho, Han-Na;Cho, Hyung-Hee
    • Transactions of the Society of Information Storage Systems
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    • v.2 no.1
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    • pp.85-90
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    • 2006
  • In this study, measurement of thermal conductivity of multilayer thin dielectric film has been conducted via differential $3\omega$ method. Also, verification of differential $3\omega$ method has been accomplished with various proposed criteria. The target film for the measurement is 300 nm thick silicon dioxide which is covered with upper protective layer of various thicknesses. The upper protective layer is inserted between the target film and the heater line for purpose of electrical insulator or anti-oxidation barrier since the target film may be a good electrical conductor or a well-oxidizing material. Since the verification of differential $3\omega$ method has not been conducted yet, we have shown that the measurement of thermal conductivity of thin films with upper protective layer via differential $3\omega$ method is verified to be reliable as long as the proposed preconditions of the samples are satisfied. Experimental results show that the experimental errors tend to increase with aspect ratio between thickness of the upper protective layer and width of the heater line due to heat spreading effect.

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A Study on the Surface Properties and Corrosion Behavior of Functional Aluminum 3003 Alloy using Anodization Method (양극산화 방법을 이용한 기능성 알루미늄 3003 합금의 표면 특성 및 부식 거동 연구)

  • Kim, Jisoo;Jeong, Chanyoung
    • Corrosion Science and Technology
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    • v.21 no.4
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    • pp.290-299
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    • 2022
  • Anodizing is an electrochemical surface treatment method conferring corrosion resistance and durability by forming a thick anodization film on the metal surface. Aluminum has a long service life and high thermal conductivity and formability, as well as excellent corrosion resistance. Aluminum 3003 alloy has improved formability, strength, and corrosion resistance due to the addition of a small amount of manganese. However, corrosion occurs in seawater and environments polluted with corrosion-inducing substances, which reduce corrosion resistance. Therefore, it is necessary to artificially form a thick anodized film to improve corrosion resistance. In this study, the anodization treatment time was 4 minutes, and voltages of 10 V, 20 V, 30 V, 40 V, 50 V, 60 V, 70 V, 80 V, 90 V, and 100 V were applied. The thickness and pore size of the oxide film increased according to the applied voltage. A barrier film was formed under voltage conditions from 10 V to 50 V, and a porous film was formed under voltage conditions from 60 V to 100 V. After anodizing, coating was applied. Wettability and corrosion resistance were observed before and after coating according to the surface shape and thickness of the oxide film.

Water Vapor Permeability of SiO2 Oxidative Thin Film by CVD (CVD로 제작된 SiO2 산화막의 투습특성)

  • Lee, Boong-Joo;Shin, Hyun-Yong
    • The Journal of the Korea institute of electronic communication sciences
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    • v.5 no.1
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    • pp.81-87
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    • 2010
  • In this paper, we have fabricated $SiO_2$ oxidation thin films by HDP-CVD(high density plasma-chemical vapor deposition) method for passivation layer or barrier layer of OLED(organic light emitting diode). We have control and estimate the deposition rate and relative index characteristics with process parameters and get optimized conditions. They are gas flow rate($SiH_4:O_2$=30:60[sccm]), 70 [mm] distance from source to substrate and no-bias. The WVTR(water vapor transmission rate) is 2.2 [$g/m^2$_day]. Therefore fabricated thin film can not be applied as passivation layer or barrier layer of OLED.

Study on the Synthesis of Hydrophobic Silica and Its Application for Gas Barrier Film (소수성 실리카의 제조 및 가스차단성 필름으로의 응용에 관한 연구)

  • Yang, Kyeong Min;Chang, Mi Jung;Nam, Kwang Hyun;Chung, Dae-won
    • Applied Chemistry for Engineering
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    • v.28 no.5
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    • pp.554-558
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    • 2017
  • In order to achieve a hydrophobic surface of silica, we reacted silica nanoparticles with hexamethyldisilazane (HMDS) under various reaction conditions. Modification of the surface of silica with organic materials was confirmed by the thermogravity and elemental analysis. The modified silica displayed nearly the same morphology as to the pristine silica. The reaction of 20 g of HMDS with 1 g of silica in decalin at $200^{\circ}C$ for 6 hours was found to be the optimum reaction condition in terms of the dispersity in toluene and the surface roughness of composite films. Oxygen permeation studies of the composite film demonstrated that the modified silica enhanced a gas barrier performance.

A Study on Thermal Stability of Ga-doped ZnO Thin Films with a $TiO_2$ Barrier Layer

  • Park, On-Jeon;Song, Sang-Woo;Lee, Kyung-Ju;Roh, Ji-Hyung;Kim, Hwan-Sun;Moon, Byung-Moo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.434-436
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    • 2013
  • Ga-doped ZnO (GZO) was substitutes of the SnO2:F films on soda lime glass substrate in the photovoltaic devices such as CIGS, CdTe and DSSC due to good properties and low cost. However, it was reported that the electrical resistivity of GZO is unstable above $300^{\circ}C$ in air atmosphere. To improve thermal stability of GZO thin films at high temperature above $300^{\circ}C$ an $TiO_2$ thin film was deposited on the top of GZO thin films as a barrier layer by Pulsed Laser Deposition (PLD) method. $TiO_2$ thin films were deposited at various thicknesses from 25 nm to 100 nm. Subsequently, these films were annealed at temperature of $300^{\circ}C$, $400^{\circ}C$, $500^{\circ}C$ in air atmosphere for 20 min. The XRD measurement results showed all the films had a preferentially oriented ( 0 0 2 ) peak, and the intensity of ( 0 0 2 ) peak nearly did not change both GZO (300 nm) single layer and $TiO_2$ (50 nm)/GZO (300 nm) double layer. The resistivity of GZO (300 nm) single layer increased from $7.6{\times}10^{-4}{\Omega}m$ (RT) to $7.7{\times}10^{-2}{\Omega}m$ ($500^{\circ}C$). However, in the case of the $TiO_2$ (50 nm)/GZO (300 nm) double layer, resistivity showed small change from $7.9{\times}10^{-4}{\Omega}m$ (RT) to $5.2{\times}10^{-3}{\Omega}m$ ($500^{\circ}C$). Meanwhile, the average transmittance of all the films exceeded 80% in the visible spectrum, which suggests that these films will be suitable for photovoltaic devices.

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Increase in Moisture Barrier Properties of Alginate-based Films by Composting with Fatty Acids and $CaCl_{2}$ Treatment (지방산과 $CaCl_{2}$ 처리에 의한 알긴산 필름의 수분저항성 증진)

  • Rhim, Jong-Whan;Kim, Ji-Hye
    • Korean Journal of Food Science and Technology
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    • v.36 no.3
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    • pp.432-439
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    • 2004
  • Increase in water vapor barrier properties of sodium alginate films was studied by preparing composite films with fatty acids, i.e., lauric, palmitic, stearic, and oleic acids, and by treatment with 3% $CaCl_{2}$ solution for 3 min. Film thickness, surface color, microstructure, tensile strength (TS), elongation at break (E), water vapor permeability (WVP), water solubility (WS), and sorption isotherm of films were investigated. Microstructure of films observed with SEM was changed by fatty acid and $CaCl_{2}$ treatments. TS decreased 25-70% depending on fatty acid used, and increased 1.5- to 2-fold by $CaCl_{2}$ treatment. E decreased by both fatty acid and $CaCl_{2}$ treatments. Except oleic acid, WVP decreased significantly (p<0.05) by forming composite films with fatty acids, particularly with stearic acid, WVP decreased more than two-fold. WS also decreased by fatty acid and $CaCl_{2}$ treatments. In stearic acid, WS decreased about 30-fold by combined treatment of fatty acid and $CaCl_{2}$. Sorption isotherm showed typical biphasic pattern with deliquescent point of 0.75. Results of isotherms and BET monolayer moisture content indicated hydrophilicity of film decreased by $CaCl_{2}$ treatment.