• 제목/요약/키워드: Ballistic Lead Computation

검색결과 2건 처리시간 0.019초

전투차량의 사격통제 성능향상을 위한 탄도해 리드 계산 기법 (A ballistic lead-computation method to improve firing accuracy of army combat vehicles)

  • 전영미
    • 한국군사과학기술학회지
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    • 제10권2호
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    • pp.31-37
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    • 2007
  • This paper presents a ballistic lead-computation method which utilizes automatic video tracking, tracking assistance and roll uncoupling. The method is able to improve the firing accuracy of army fighting vehicles such as main battle tanks. In the experiment, the efficiency of the proposed method is evaluated by an error analysis in real operating environment. The proposed method has been applied to the fire control system of a military vehicle and proved through the development test of the vehicle.

3D feature profile simulation for nanoscale semiconductor plasma processing

  • Im, Yeon Ho
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.61.1-61.1
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    • 2015
  • Nanoscale semiconductor plasma processing has become one of the most challenging issues due to the limits of physicochemical fabrication routes with its inherent complexity. The mission of future and emerging plasma processing for development of next generation semiconductor processing is to achieve the ideal nanostructures without abnormal profiles and damages, such as 3D NAND cell array with ultra-high aspect ratio, cylinder capacitors, shallow trench isolation, and 3D logic devices. In spite of significant contributions of research frontiers, these processes are still unveiled due to their inherent complexity of physicochemical behaviors, and gaps in academic research prevent their predictable simulation. To overcome these issues, a Korean plasma consortium began in 2009 with the principal aim to develop a realistic and ultrafast 3D topography simulator of semiconductor plasma processing coupled with zero-D bulk plasma models. In this work, aspects of this computational tool are introduced. The simulator was composed of a multiple 3D level-set based moving algorithm, zero-D bulk plasma module including pulsed plasma processing, a 3D ballistic transport module, and a surface reaction module. The main rate coefficients in bulk and surface reaction models were extracted by molecular simulations or fitting experimental data from several diagnostic tools in an inductively coupled fluorocarbon plasma system. Furthermore, it is well known that realistic ballistic transport is a simulation bottleneck due to the brute-force computation required. In this work, effective parallel computing using graphics processing units was applied to improve the computational performance drastically, so that computer-aided design of these processes is possible due to drastically reduced computational time. Finally, it is demonstrated that 3D feature profile simulations coupled with bulk plasma models can lead to better understanding of abnormal behaviors, such as necking, bowing, etch stops and twisting during high aspect ratio contact hole etch.

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