• 한국표면공학회지
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• 제31권3호
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• pp.133-141
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• 1998

Stainless is widely used for various purposes due to its good corrosion resistance. There has been much research to produce the color stainless steel by several methods. In this experiment, TixN films have been deposited on the SUS304 substrate by the DC magnetron sputtering system and the color and texture of the films as a function of coating conditions has been studies. The TixN films showed a (111) preferred orintation in bias-free conditions. The texture of coated later was changed from (111) to (200) to (2200 with a change of the bias from -1000V to -3000V. When the bias is low, coated elements have low energy. Therefore, the texturct (111) of low surface energy. The mobility of atoms was increased with the increase of the blas and texture was changed to the other plane. Non-etched specimens all exhibited strong (111) texture. This result shows that (111) is a loose plane and of non-etched specimens all exhibited. High growing velocity of (111) of especially was main texture of Non-etched specimens. Low working pressure($4\times10^{-3}$torr) was more effective than figh working pressure ($6\times10^{-3}$torr) for the gold color of $Ti_xN$ film. L and b were increased and a was decreased with the increase of bias voltage. Accordingly, We obtained the near gold color of $Ti_xN$ film(L;92, a;1~1.5 b:24~29.50. As a result of reflectance. And as the bias increased, the reflectance was proportional to the increasing bias voltage, but we took the top reflectance when the bias voltage was -200V.

• 공업화학
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• 제3권1호
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• pp.88-99
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• 1992

광 전기분해시 양극으로 사용되는 산화티타늄 반도체 전극의 안정성을 증대시키고 효율향상을 위해서 순수한 티타늄 전극을 양극 산화법, 전기로 산화법, 불꽃 산화법으로 산화 피막을 제조하였으며 In을 Ti와 $TiO_2$소지에 전기도금을 한 후 전기로 산화법으로 혼합 산화물을 제조하였다. 또한 $Al_2O_3$ 와 NiO는 진공증착 방법을 이용하여 Ti 소지위에 증착시킨 후 전기로 산화법을 이용하여 혼합 산화물을 제조하였다. 에너지변환 효율(${\eta}$)은 인가전위에 따라서 다른 값을 갖는데 0.6V로 계산하여 보면 $1200^{\circ}C$의 불꽃으로 2분간 산화시킨 전극이 0.98%로 가장 큰 값을 가졌으며 양극 산화법으로 제조한 전극의 ${\eta}$는 0.14%로 작은 값을 보여 주었다. 한편 $800^{\circ}C$ 전기로에서 10분간 산화시킨 전극의 ${\eta}$는 0.57%로 띠간 에너지는 2.9eV로 나타났다. 한편 In을 Ti 및 $TiO_2$ 소지위에 전기도금시킨 전극의 ${\eta}$는 0.8%였으며 인가전위가 증가함에 따라서 ${\eta}$는 증가하였다. 그러나 $Al_2O_3$와 NiO를 Ti소지위에 진공증착시킨 전극의 ${\eta}$는 다른 전극들에 비해서 가장 낮은 값을 나타내었다.