• Title/Summary/Keyword: BARRIER METAL

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Nanoscale microstructure and magnetic transport in AlN/Co/AlN/Co... discontinuous multilayers

  • Yang, C.J.;Zhang, M.;Zhang, Z.D.;Han, J.S.
    • Proceedings of the Korean Magnestics Society Conference
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    • 2003.06a
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    • pp.21-21
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    • 2003
  • Microstructure and magnetic transport phenomina in rf sputtered AlN/Co type ten-layered discontinuous films of nanoscaled [AlN (3 nm)/Co (t nm)]...$\sub$10/ with t$\sub$Co/=1.0∼2.0 nm have been investigated. The microstructure and tunneling magnetic resistance of the samples are strongly dependent on the thickness of Co layer. Negative tunneling magneto-resistance due to the spin-dependent transport has been observed along the current-in-plane configuration in the samples having the Co layers below 1.6 nm thick. When the thickness of Co layer was less than 1,2 nm, randomly oriented granular Co particles were completely isolated and embedded in amorphous AlN matrix, and the films showed the superparamagnetic behavior with a high MR value of Δ$\rho$/$\rho$$\sub$0/=1.8 %. As t$\sub$Co/ increases, a transition from the regime of co-existence of superparamagnetic and ferromagnetic behaviors to ferromagnetic behavior was observed. Tunneling barrier called "decay length for tunneling" for the films having the thickness of Co layer from 1.4 to 1.6 nm was measured to be ranged from 0.004 to 0.021 ${\AA}$$\^$-1/.

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Vibrational Analysis of Azacrown Ether Complex with Li Metal Cation

  • Min, Kyung-Chul;Park, Sun-Kyung;Lee, Choong-Keun;Kim, Chang-Suk;Lee, Nam-Soo
    • Bulletin of the Korean Chemical Society
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    • v.31 no.11
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    • pp.3385-3390
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    • 2010
  • $Li^+$ ion complex of azacrown ether with restricted motion of freedom and pseudo-bilateral symmetry was studied by infrared spectroscopy, which has shown simplified and broadened vibrational features. The C=O and N-H stretching bands, in particular, shows anomalous broadening nearly ${\sim}50\;cm^{-1}$. The density functional calculation at the level of BP86/6-31+$G^{**}$ shows that $Li^+$ ion is trapped and rather free to move around inside the cavity, as much as about $0.70\;{\AA}$. Through the relocation of $Li^+$ ion inside the cavity, the conformational changes would occur rapidly in its symmetry $C_1\;{\rightleftarrows}\;C_2\;{\rightleftarrows}\;C_1$$. The potential barrier was obtained to be merely ~2.2 kJ/mol for $C_1\;{\rightarrow}\;C_2$. During this conformational alteration, the amide backbone twists concurrently its dihedral angle side to side about up to ${\pm}3$ degree. Selected vibrational modes were interpreted in terms of the force constant variations of local symmetry coordinates between conformations in the framework of $C_1\;{\rightleftarrows}\;C_2\;{\rightleftarrows}\;C_1$.

On the effective analysis method of micro pattern forming on the thin sheet metal (마이크로 박판 미세 패턴 성형공정에 대한 해석 효율성 연구)

  • Cha, S.H.;Shin, M.S.;Kim, J.H.;Kim, J.B.;Lee, H.J.;Song, J.H.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2009.05a
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    • pp.56-59
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    • 2009
  • Roll forming process is one of important metal processing technology because the process is simple and economical. These days, roll forming process is tried to be employed in manufacturing the circuit board, barrier ribs and solar cell plate for productivity. However, it is difficult to apply to the forming of micro scale or sub-micro scale pattern. In this study, the roll forming processing for the micro scale is designed and analyzed. In this study, the forming of micro pattern for solar cell plate by incremental roll forming process is analyzed. The solar cell plate may have thousands of patterns, and the analysis of forming considering all the patterns is impossible due to the computational costs. In this study, analyses are carried out for various numbers of patterns and the results are compared. It is shown that the analyses results with four row patterns and twelve row patterns are same. So, it is considered that the analysis can be carried out for only four rows of pattern for the design of incremental roll forming process.

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Growth of Al2O3/Al Composite by Directed Metal Oxidation of Al Surface Doped with Sodium Source

  • Park, Hong Sik;Kim, Dong Seok;Kim, Do Kyung
    • Journal of the Korean Ceramic Society
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    • v.50 no.6
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    • pp.439-445
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    • 2013
  • Both an unreinforced $Al_2O_3$/Al matrix and a ${\alpha}-Al_2O_3$ particulate reinforced composite have been produced by the oxidation of an Al surface doped with NaOH in the absence of any other dopant. Fabrication of the matrix was initiated by the formation of $NaAlO_2$, which provides a favorable surface structure for the matrix formation by breaking the protective $Al_2O_3$ layer on Al. During the matrix growth, the external surface of the growth front was covered with a very thin sodium-rich oxide. A cyclic formation process of the sodium-rich oxide on the growth surface was proposed for the sodium-induced directed metal oxidation process. This process involves dissolution of the sodium-rich oxide, motion of Na to the growth front, and re-formation of the oxide on the surface. Near-net-shape composites were fabricated by infiltrating an $Al_2O_3$/Al matrix into a ${\alpha}-Al_2O_3$ particulate preform, without growth barrier materials. The infiltration distance increased almost linearly in the NaOH-doped preform.

Electrical characterization of OLED using metal free phthalocyanine (H2Pc) layer (무금속 프탈로시아닌(metal free phthalocyanine: H2Pc) 층이 삽입된 OLED의 전기적 특성 분석)

  • Ahn, Tae-Jun;Lee, Jong Ho;Choi, Bum Ho;Yu, Yun Seop
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2018.10a
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    • pp.195-196
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    • 2018
  • We have investigated electrical and optical characteristics of $H_2Pc$ introduced OLED devices. $H_2Pc$ layer acted on tunnel barrier for incident electrons. we have also observed that energy band of the proposed structure was varied as applied electric field by simulation using TCAD program.

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Role of Oxidants for Metal CMP Applications (금속 CMP 적용을 위한 산화제의 역할)

  • 서용진;김상용;이우선
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.4
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    • pp.378-383
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    • 2004
  • Tungsten is widely used as a plug for the multi-level interconnection structures. However, due to the poor adhesive properties of tungsten(W) on SiO$_2$ layer, the Ti/TiN barrier layer is usually deposited onto SiO$_2$ for increasing adhesion ability with W film. Generally, for the W-CMP(chemical mechanical polishing) process, the passivation layer on the tungsten surface during CMP plays an important role. In this paper, the effect of oxidant on the polishing selectivity of W/Ti/TiN layer was investigated. The alumina(A1$_2$O$_3$)-based slurry with $H_2O$$_2$ as the oxidizer was used for CMP applications. As an experimental result, for the case of 5 wt% oxidizer added, the removal rates were improved and polishing selectivity of 1.4:1 was obtained. It was also found that the CMP characteristics of W and Ti metal layer including surface roughness were strongly dependent on the amounts of $H_2O$$_2$ oxidizer.

3-D Simulation of Nanoscale SOI n-FinFET at a Gate Length of 8 nm Using ATLAS SILVACO

  • Boukortt, Nour El Islam;Hadri, Baghdad;Caddemi, Alina;Crupi, Giovanni;Patane, Salvatore
    • Transactions on Electrical and Electronic Materials
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    • v.16 no.3
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    • pp.156-161
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    • 2015
  • In this paper, we present simulation results obtained using SILVACO TCAD tools for a 3-D silicon on insulator (SOI) n-FinFET structure with a gate length of 8 nm at 300K. The effects of variations of the device’s key electrical parameters, such as threshold voltage, subthreshold slope, transconductance, drain induced barrier lowering, oncurrent, leakage current and on/off current ratio are presented and analyzed. We will also describe some simulation results related to the influence of the gate work function variations on the considered structure. These variations have a direct impact on the electrical device characteristics. The results show that the threshold voltage decreases when we reduce the gate metal work function Φm. As a consequence, the behavior of the leakage current improves with increased Φm. Therefore, the short channel effects in real 3-D FinFET structures can reasonably be controlled and improved by proper adjustment of the gate metal work function.

Effect of chemical in post Ru CMP Cleaning solutions on abrasive particle adhesion and removal (Post Ru CMP Cleaning에서 연마입자의 흡착과 제거에 대한 chemical의 첨가제에 따른 영향)

  • Kim, In-Kwon;Kim, Tae-Gon;Cho, Byung-Gwun;Son, Il-Ryong;Park, Jin-Goo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.529-529
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    • 2007
  • Ruthenium (Ru) is a white metal and belongs to platinum group which is very stable chemically and has a high work function. It has been widely studied to apply Ru as an electrode material in memory devices and a Cu diffusion barrier metal for Cu interconnection due to good electrical conductivity and adhesion property to Cu layer. To planarize deposited Ru layer, chemical mechanical planarization(CMP) was suggested. However, abrasive particle can induce particle contamination on the Ru layer surface during CMP process. In this study, zeta potentials of Ru and interaction force of alumina particles with Ru substrate were measured as a function of pH. The etch rate and oxidation behavior were measured as a function of chemical concentration of several organic acids and other acidic and alkaline chemicals. PRE (particle removal efficiency) was also evaluated in cleaning chemical.

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Crystal Structure Control of Calcareous Deposit Films Formed by Pulse Electrodeposition Process in Seawater and Their Properties (해수 중 펄스 전착 프로세스 의해 제작한 석회질 피막의 결정구조 제어 및 특성 평가)

  • Park, Jun-Mu;Lee, Seung-Hyo
    • Journal of Surface Science and Engineering
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    • v.52 no.2
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    • pp.103-110
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    • 2019
  • As an anti-corrosion method in seawater, cathodic protection is widely recognized as the most effective and technically appropriate corrosion prevention methodology for marine structures against harsh corrosive environment. When applying the cathodic protection in seawater, the surface of the metal facilities the formation of compounds of $CaCO_3$ and $Mg(OH)_2$. These mixed compounds are generally called 'calcareous deposits'. This layer functions as a barrier against the corrosive environment and functions to further inhibit the corrosion process and then leading to a decrease in current demand for cathodic protection. However, calcareous deposit films are partially formed on the surface of the cathode and there are some difficulties to maintain both a corrosion resistance for a long period of time and a strong adhesion between deposits and base metal. In this study, the pulse electrodeposition process was applied to improve adhesion and corrosion resistance of the calcareous deposit films, and to solve the problem of hydrogen embrittlement at high current density. The uniform and compact calcareous deposit films were prepared by pulse electrodeposition process, and their properties were characterized using various surface analytical techniques together with electrochemical methods.

Coating Performance of SiO2 / Epoxy Composites as a Corrosion Protector

  • Rzaij, Dina R.;Ahmed, Nagham Y.;Alhaboubi, Naseer
    • Corrosion Science and Technology
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    • v.21 no.2
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    • pp.111-120
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    • 2022
  • To solve the corrosion problem of industrial equipment and other constructions containing metals, corrosion protection can be performed by using coating which provides a barrier between the metal and its environment. Coatings play a significant role in protecting irons and steels in harsh marine and acid environments. This study was conducted to identify an anti-corrosive epoxy coating for carbon steel composite with 0.1, 0.3, and 0.5 wt% concentrations of nanoparticles of SiO2 using the dip-coating method. The electrochemical behavior was analyzed with open circuit potential (OCP) technics and polarization curves (Tafle) in 3.5 wt% NaCl and 5 vol% H2SO4 media. The structure, composition, and morphology were characterized using different analytical techniques such as X-ray Diffraction (XRD), Fourier Transform Infrared spectrum (FT-IR), and Scanning Electron Microscopy (SEM). Results revealed that epoxynano SiO2 coating demonstrated a lower corrosion rate of 2.51 × 10-4 mm/year and the efficiency of corrosion protection was as high as 99.77%. The electrochemical measurement showed that the nano-SiO2 / epoxy coating enhanced the anti-corrosive performance in both NaCl and H2SO4 media.