• Title/Summary/Keyword: Au-$Ir@SiO_2$

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SYNTHESIS OF SILICA-COATED Au WITH Ag, Co, Cu, AND Ir BIMETALLIC RADIOISOTOPE NANOPARTICLE RADIOTRACERS

  • Jung, Jin-Hyuck;Jung, Sung-Hee;Kim, Sang-Ho;Choi, Seong-Ho
    • Nuclear Engineering and Technology
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    • v.44 no.8
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    • pp.971-976
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    • 2012
  • Silica-coated Au with Ag, Co, Cu, and Ir bimetallic radioisotope nanoparticles were synthesized by neutron irradiation, after coating $SiO_2$ onto the bimetallic particles by the sol-gel St$\ddot{o}$ber process. Bimetallic nanoparticles were synthesized by irradiating aqueous bimetallic ions at room temperature. Their shell and core diameters were recorded by TEM to be 100 - 112 nm and 20 - 50 nm, respectively. The bimetallic radioisotope nanoparticles' gamma spectra showed that they each contained two gamma-emitting nuclides. The nanoparticles could be used as radiotracers in petrochemical and refinery processes that involve temperatures that would decompose conventional organic radioactive labels.

Formation of SiOF Thin Films by FTES/$O_2$-PECVD Method (FTES/$O_2$-PECVD 방법에 의한 SiOF 박막형성)

  • Kim, Duk-Soo;Lee, Ji-Hyeok;Lee, Kwang-Man;Gang, Dong-Sik;Choe, Chi-Kyu
    • Korean Journal of Materials Research
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    • v.9 no.8
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    • pp.825-830
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    • 1999
  • Characteristics of SiOF films deposited by a FTES/$O_2$-plasma enhanced chemical vapor deposition method have been investigated using Fourier transform infrared spectroscopy, X-ray photoelectro spectroscopy, and ellipsometry. Electrical properties such as dielectric constant, dielectric breakdown and leakage current density are investigated using C-V and I-V measurements with MIS(Au/SiOF/p-Si) capacitor structure. Stepcoverage of the films have been also characterized using scanning electron microscopy and ellipsometry. A high quality SiOF film was formed on that the flow rates of FTES and $O_2$were 300sccm, respectively. The dielectric constant of the deposited SiOF film was about 3.1. This value is lower than that of the oxide films obtained using other method. The dielectric breakdown field and leakage current are more than 10MV/cm and about $8[\times}10^{9}A/\textrm{cm}^2$, respectively. The deposited SiOF film with thickness as $2500{\AA}$ on the $0.3{\mu}{\textrm}{m}$ metal pattern shows a high step-coverage without a void.

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Mineralogy and Geochemistry of Iron Hydroxides in the Stream of Abandoned Gold Mine in Kwangyang, Korea (광양 폐금광 수계에 형성된 철수산화물에 대한 광물학적 및 지구화학적 특성)

  • Park, Cheon-Young;Jeoung, Yeon-Joong;Kim, Seoung-Ku
    • Journal of the Korean earth science society
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    • v.22 no.3
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    • pp.208-222
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    • 2001
  • Geochemical investigations on suspended amorphous iron oxide material from the Kwangyang gold mine and its surrounding area, Cheonnam, Korea have been carried out. The sediments samples were collected from 11 location along Kwangyang mine area and were air dried and sieved to -80 mesh. These samples consist mainly of iron, silicon and alumina. The Fe$_2$O$_3$ contents ranges from 17.9 wt.% to 72.3 wt.%. The content of Fe$_2$O$_3$ increase with decreasing Si, Al, Mg, Na, K, Mn, and Ti, whereas the contents of Te, Au, Ga, Bi, Cd, Hg, Sb, and Se increase in the amorphous stream sediments. Amorphous stream sediments have been severely enriched for As (up to 54.9 ppm), Bi (up to 3.77 ppm), Cd (up to 3.65 ppm), Hg (up to 64 ppm), Sb (up to 10.1 ppm), Cu (up to 37.1 ppm), Mo (up to 8.86 ppm), Pb (up to 9.45 ppm) and Zn (up to 29.7 ppm). At the upstream site, the Au content (up to 4.4 ppm) in the amorphous stream sediments are relatively high but those contents decrease with distance of mine location. The content of Ag (up to 0.24 ppm) were low in upstream site but those contents increase significantly in the downstream sites. The X-ray diffraction patterns of the samples have virtually no sharp and discrete peaks, indicating that some samples are amorphous or poorly-ordered. The quartz, goethite, kaolinite and illite were associated in amorphous stream sediments. The infrared spectra for amorphous stream sediments show major absorption bands due to OH stretching, adsorbed molecular water, sulfate and Fe-O stretching, respectively.

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Non-stoichiometric AlOx Films Prepared by Chemical Vapor Deposition Using Dimethylaluminum Isopropoxide as Single Precursor and Their Non-volatile Memory Characteristics

  • Lee, Sun-Sook;Lee, Eun-Seok;Kim, Seok-Hwan;Lee, Byung-Kook;Jeong, Seok-Jong;Hwang, Jin-Ha;Kim, Chang-Gyoun;Chung, Taek-Mo;An, Ki-Seok
    • Bulletin of the Korean Chemical Society
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    • v.33 no.7
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    • pp.2207-2212
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    • 2012
  • Dimethylaluminum isopropoxide (DMAI, $(CH_3)_2AlO^iPr$) as a single precursor, which contains one aluminum and one oxygen atom, has been adopted to deposit non-stoichiometric aluminum oxide ($AlO_x$) films by low pressure metal organic chemical vapor deposition without an additional oxygen source. The atomic concentration of Al and O in the deposited $AlO_x$ film was measured to be Al:O = ~1:1.1 and any serious interfacial oxide layer between the film and Si substrate was not observed. Gaseous by-products monitored by quadruple mass spectrometry show that ${\beta}$-hydrogen elimination mechanism is mainly contributed to the $AlO_x$ CVD process of DMAI precursor. The current-voltage characteristics of the $AlO_x$ film in Au/$AlO_x$/Ir metalinsulator-metal (MIM) capacitor structure show high ON/OFF ratio larger than ${\sim}10^6$ with SET and RESET voltages of 2.7 and 0.8 V, respectively. Impedance spectra indicate that the switching and memory phenomena are based on the bulk-based origins, presumably the formation and rupture of filaments.

UHV Materials (초고진공계재료)

  • 박동수
    • Proceedings of the Korean Vacuum Society Conference
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    • 1998.02a
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    • pp.24-24
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    • 1998
  • 반도체장비를 포함하는 초고진공장비의 園훌化가 급속히 그리고 절실히 요구되고 있는 것이 현실정이다. 當面해서 실현할 국산진공장비의 대상은 廣範圍하다. 즉, 각종 진공 pump ( (rotary, dry, diffusion, cryo, ion, turbo melecular pump), 진공 chamber, 진공 line, gate valve 를 위 시 한 진공 V머ve, flange, gasket, fl않d야lU, mainpulater 퉁 진공 部品이 다. 진공계 의 핵심 은 適切하고 優良한 진공재료의 선태파 사용이다. 진공장비는 사용자가 원하는 진공도를 원하 는 시간 동안 륨空度를 유지해 주어야 한다. 진공재료 선태의 기준사항은:(1) 기체의 透過성 (2) 薰했훌 (3) 혔體放出특성 - -outgassing과 degassing- (4) 機械的 량훌度 (5) 온도 의존성 (6) 化學톡성 (7) 加I성 및 鎔接 성 (8) 課電특성 (9) 磁氣특성 (10) 高速함子 및 放射線 특성 (11) 經濟성 및 調達생 둥이 다. 우량한 초고진공계재료는 풍부하게 개발되어 왔고, 또 新材料들이 개발되고 있다. 여기에서는 주로 초고진공 내지는 극고진공계의 構造材料, 機能材料, 部品材料 일반파 몇가지 신재료의 특 성에 관해서 記述한다. M Mild SteeHSAE, 1112, 1010, 1020, 1022, etc)., S Stainless SteeHAlSI, 304, 304L, 310, 316, 321, 347): 구조재료, chamber, fl하1ges A Aluminum과 Alloys (1060, 1100, 2014, 4032, 6(뻐1): 구조재료, chamber, flanges, gaskets A AI, Al 떠loy는 SS에 代替하는 역 할올 시 작하고 있다. C Copper, Copper Alloys(C11$\alpha$)0, C26800, C61400, Cl7200): 내장인자, gasket, cryopanel, tubing T Titanium, Ziriconium, Haf띠um 및 Alloys: 특히 Ti은 10n pump 용 getter material 이 외 에 U UHV,XHV용 chamber계로서 관심올 끌고 있다. N Nickel, Nickel Alloys (200, 204, 211, monel, nichrome): 부식 방지 , 전자장치 , 자기 장치 귀 금속(Ag, Au, Pt, Pd, Rh, Ir, Os, Ru): 보조부품, gasket, filament, coating, thermocouple, 접 합부위 T TiC, SiC, zrC, HfC, TaC 둥의 탄화물과, BN, TiN, AlN 동의 질화물, 붕화물이 둥장하고 었 다. 유리: Soda Lime, Borosilicate, Potash Soda Lead: View Port, Chamber envelope C Ceramics: AlZ03, BeO, MgO, zrOz, SiOz, MgOzSiOz, 3Alz032SiOz, Z$textsc{k}$hSiOz S상N4: e electrical, thermal insulators, crucibles, boats, single crystals, sepctr려 windows 저자는 최근 저자들이 발견한 Zr-Ti-Cu-Ni-Be amorphous alloys coated cham뾰r가 radiation p proof로 이용될 수 있는 사실을 점검하고 었다 .. Z.Y. Hua 들은 Cs3Sb를 새로운 photocathode 재료로 보고하고 있다.

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