• 제목/요약/키워드: Atomic force microscopy (AFM)

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Magnetoresistance of Planar Ferromagnetic Junction Defined by Atomic Force Microscopy

  • Yu, D.S.;Jerng, S.K.;Kim, Y.S.;Chun, S.H.
    • Journal of Magnetics
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    • 제14권4호
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    • pp.172-174
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    • 2009
  • Nanolithography by atomic force microscope local oxidation was applied to the fabrication of planar-type Ni/Ni oxide/Ni junctions from 10 nm-thick Ni films. The junction characteristics were sensitive to the lithography conditions such as the bias voltage. Successful oxidation produced junctions of nonlinear current-voltage characteristics, implying the formation of oxide barriers. Magnetoresistance (MR) at low temperatures resembled that of spin valves.

Tribo-Nanolithography를 이용한 액중 나노가공기술 개발 (Nanoscale Fabrication in Aqueous Solution using Tribo-Nanolithography)

  • 박정우;이득우
    • 한국정밀공학회지
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    • 제22권2호
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    • pp.194-201
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    • 2005
  • Nanoscale fabrication of silicon substrate in an aqueous solution based on the use of atomic force microscopy was demonstrated. A specially designed cantilever with diamond tip, allowing the formation of damaged layer on silicon substrate easily by a simple scratching process (Tribo-Nanolithography, TNL), has been applied instead of conventional silicon cantilever for scanning. A slant nanostructure can be fabricated by a process in which a thin damaged layer rapidly forms in the substrate at the diamond tip-sample junction along scanning path of the tip and simultaneously the area uncovered with the damaged layer is being etched. This study demonstrates how the TNL parameters can affect the formation of damaged layer and the shape of 3-D structure, hence introducing a new process of AFM-based nanolithography in aqueous solution.

Nanoscale Fabrication in Aqueous Solution using Tribo-Nanolithography

  • Park, Jeong-Woo;Lee, Deug-Woo;Kawasegi, Noritaka;Morita, Noboru
    • International Journal of Precision Engineering and Manufacturing
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    • 제7권4호
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    • pp.8-13
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    • 2006
  • Nanoscale fabrication of silicon substrate in an aqueous solution based on the use of atomic force microscopy was demonstrated. A specially designed cantilever with a diamond tip, allowing the formation of a mask layer on the silicon substrate by a simple scratching process (Tribo-Nanolithography, TNL), has been applied instead of the conventional silicon cantilever for scanning. A slant nanostructure can be fabricated by a process in which a thin mask layer rapidly forms on the substrate at the diamond tip-sample junction along scanning path of the tip, and simultaneously, the area uncovered with the mask layer is etched. This study demonstrates how the TNL parameters can affect the formation of the mask layer and the shape of 3-D structure, hence introducing a new process of AFM-based nanolithography in aqueous solution.

Structural and Dielectric Studies of LLDPE/O-MMT Nanocomposites

  • Zazoum, Bouchaib;David, Eric;Ngo, Anh Dung
    • Transactions on Electrical and Electronic Materials
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    • 제15권5호
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    • pp.235-240
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    • 2014
  • Nanocomposites made of linear low density polyethylene (LLDPE) and organo-modified montmorillonite (O-MMT) were processed by melt compounding from a commercially available premixed LLDPE/nanoclay masterbatch, at different nanoclay loadings, by co-rotating twin-screw extruder. The morphological and dielectric properties of LLDPE/O-MMT nanocomposites were investigated to understand the structure-dielectric properties relationship in the nanocomposites. The microstructures of the materials were characterized by wide angle X-ray diffraction (WAXD), scanning electron microscopy (SEM), transmission electron microscopy (TEM) and atomic force microscopy (AFM). Initial findings by FTIR spectroscopy characterization indicated the absence of any chemical interaction between LLDPE and nanoclay during the extrusion process, while DSC showed that a 1% wt loading of nanoclay particles increased the degree of crystallinity of the nanocomposites samples. On the other hand, XRD, SEM, TEM and AFM indicated that nanoclay layers were intercalated or exfoliated in the LLDPE matrix. A correlation between the structure and dielectric properties of LLDPE/O-MMT nanocomposites was found and discussed.

A Study of Hair Damage by Magic Straight Perm

  • Lim, Sun-Nye
    • Applied Microscopy
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    • 제42권3호
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    • pp.129-135
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    • 2012
  • In this study, the changes in hair quality before and after Magic straight perm have been evaluated through a hair damage measurement method. For this, a healthy high school student's (age18 years) wavy hair was selected and permed on the left and right sides. Then, the changes caused by physical methods which were applied during the fl at iron-based Magic straight perm were evaluated based on the hair damage measurement method before and after the Magic straight perm. According to the protein release test after the Magic straight perm, 1.26% in average and 0.14% was observed in Cool Magic straight perm sample. In a field emission scanning electron microscopy (FE-SEM) test, saw teeth-shaped partial desquamation of cuticle cells and impurities were observed in the warm-treated hair sample. In atomic force microscope (AFM), line-profile is a method to represent roughness data on hair. According to analysis on 3-dimensional (3D) images, the hair with Cool Magic straight perm was lower than the hair with Warm Magic perm in terms of the color change of 3D images. In addition, vertical changes were observed in the hair with Cool Magic perm. As a result, irregular surface roughness was observed. This study proposed a method to minimize hair damage by cooling down the heat with the cool hair straightener as soon as the Warm Magic was finished.

Cu CMP 공정중 Wafer 표면의 알루미나 연마입자의 점착 (Adhesion of Alumina Slurry Particles on Wafer Surfaces during Cu CMP)

  • 홍의관;박진구
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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    • pp.1292-1295
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    • 2004
  • 본 연구는 Cu CMP공정 중 알루미나 연마입자의 wafer 표면에서의 점착과 오염을 AFM (Atomic Force Microscopy)을 사용하여 슬러리내에서 점착력 측정과 실제 연마 후 wafer 표면의 오염을 실험적으로 비교 평가하였다. 연마입자의 adhesionn force 측정에 있어서도 역시 wafer들의 zetapotential 결과와 잘 일치하였으며, 모든 wafer 종류에 관계없이, 산성 영역에서 염기성영역의 슬러리가 적용됨에 따라 adhesion force가 작아짐을 확인할 수 있었다. 특히 FSG wafer의 zetapotential 결과는 비록 산성 분위기에서는 양성 전하값을 나타내었으나, 염기성 분위기의 pH에서는 급격하게 음성 전하값을 나타내었고, 이는 adhesionn force결과와 FESEM 결과와 잘 일치하였다.

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SIMS, XPS, AFM을 이용한 LCD blue color filter의 고분자 표면 연구 (Characterization of polymer surface of LCD blue color filters using SIMS, XPS and AFM)

  • 김승희;김태형;이상호;이종완
    • 한국진공학회지
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    • 제6권4호
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    • pp.321-325
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    • 1997
  • LCD용 칼라 필터를 제작하는 방법으로 감광성 고분자(photosensitive polymer)에 광 리소그라피(photolithography)기술이 많이 이용되어지고 있다. 이로 인해 감광성 고분자 표 면의 물리적, 화학적 성질이 변하게 되는데, 이는 후속 공정인 플라즈마 식각이나 ITO 전극 의 증착 등에도 많은 영향을 주므로, 각 공정에 따른 이들 고분자의 표면 연구는 매우 중요 하다. 본 논문에서는 blue 칼라 필터의 고분자 표면에 대한 연구를 SIMS와 XPS를 이용하 여 수행하였으며, 표면의 거칠기 변화를 AFM을 통해 관찰하였다. SIMS와 XPS결과로부터 초기 공정인 blue 칼라 필터를 스핀 코팅하고 pre bake한 상태에서는 주로 칼라 필터의 주 성분인 단량체와 결합제의 고분자 물질이 표면에 드러나 있다가, 노광 과정을 거치고 post bake한 시료에서는 색깔을 내는 안료 성분이 표면에 드러남을 확인하였고, AFM을 통해서 는 post bake후에 표면에 더 거칠어 짐을 관찰하였다.

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AFM을 이용한 수직배향막 폴리머 표면위의 액정배향에 관한 연구 (Study on the LC Alignment on Vertical Alignment Polymer Surface using the AFM)

  • 김완철;송선애;전일철;이종문;이승희
    • 한국전기전자재료학회논문지
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    • 제16권6호
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    • pp.510-514
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    • 2003
  • We have studied the alignment of liquid crystals (LCs) on homeotropic polymeric surface that is scanned using an atomic force microscope (AFM) tip by optical polarizing microscopy and computer simulation. The scanned areas on one substrate are 5 $\mu\textrm{m}$ ${\times}$ 5 $\mu\textrm{m}$, 10 $\mu\textrm{m}$ ${\times}$ 10 $\mu\textrm{m}$, and 20 $\mu\textrm{m}$ ${\times}$ 20 $\mu\textrm{m}$ and this substrate is assembled to another substrate coated. with homeotropic polymer. The fabricated micro-LC cell using two substrates does not show any hysteresis and disclination lines inside the nano-rubbing areas, while changing voltage up and down. This indicates that the pretilt angle exists in the areas, thereby forming a hybrid LC configuration. From the experimental and computer simulation results, we can understand that the AFM rubbing clearly changes surface status of homeotropic alignment layer and causes the pretilt angle to an initial scanning direction.

Low Temperature Encapsulation-Layer Fabrication of Organic-Inorganic Hybrid Thin Film by Atomic Layer Deposition-Molecular Layer Deposition

  • 김세준;김홍범;성명모
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.274-274
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    • 2013
  • We fabricate encapsulation-layer of OLED panel from organic-inorganic hybrid thin film by atomic layer deposition (ALD) molecular layer deposition (MLD) using Al2O3 as ALD process and Adipoyl Chloride (AC) and 1,4-Butanediamine as MLD process. Ellipsometry was employed to verify self-limiting reaction of MLD. Linear relationship between number of cycle and thickness was obtained. By such investigation, we found that desirable organic thin film fabrication is possible by MLD surface reaction in monolayer scale. Purging was carried out after dosing of each precursor to eliminate physically adsorbed precursor with surface. We also confirmed roughness of the organic thin film by atomic force microscopy (AFM). We deposit AC and 1,4-Butanediamine at $70^{\circ}C$ and investigated surface roughness as a function of increasing thickness of organic thin film. We confirmed precursor's functional group by IR spectrum. We calculated WVTR of organic-inorganic hybrid super-lattice epitaxial layer using Ca test. WVTR indicates super-lattice film can be possibly use as encapsulation in flexible devices.

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Phase Imaging of Worn Surface of TiN Coating and Interpretation by Force Spectroscopy

  • Hyo Sok;Chizhik, S-A;I Luzinov
    • KSTLE International Journal
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    • 제1권2호
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    • pp.69-75
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    • 2000
  • The paper compares topography, phase contrast and force spectroscopy in atomic force microscopy data for evaluating the microheterogeneity of surface layer. The worn surface of ion-plated TiN coating was measured using both a laboratory-built and a commercial AFM. The results of analysis revealed structural and micromechanical heterogeneity of the worn surfaces. We demonstrated that the phase image allows relatively qualitative estimation of elastic modulus of the sample surface. The tribolayer formed in the worn surface possessed much lower stiffness than the original coating. It is shown that the most stable phase imaging is provided with a stiff cantilever. In this case, phase contrast is well conditioned, first of all, by microheterogeneity of elastic properties of the investigated surfaces. In this study an attempt was also made to correlate the results of phase imaging with that of the farce spectroscopy. The joint analysis of information on the surface properties obtained by the phase imaging and quantitative data measured with the force spectroscopy methods allows a better understanding of the nature of the surface micromechanical heterogeneity.

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