• Bulletin of the Korean Chemical Society
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• v.29 no.11
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• pp.2114-2118
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• 2008

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.29 no.12
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• pp.824-828
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• 2016

In this study, effects of ICP (inductively coupled plasma) treatment on PAR thin film have been investigated. A maximum etch rate of the PAR thin films and the selectivity of PAR to PR were obtained as 110 nm/minand 1.1 in the $CF_4/O_2$ (5:15 sccm) gas mixture. We present the surface properties of PAR thin film with various treatment conditions. The surface morphology and cross section of the PAR thin film was observed by AFM (atomic force microscopy) and FE-SEM (filed emission scanning electron microscopy).

• Proceedings of the KIEE Conference
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• 2007.10a
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• pp.251-252
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• 2007

Nano manipulator is used to manufacture Carbon NanoTube(CNT) tips. Using nano manipulator operator attaches a CNT at the end of Atomic Force Microscopy(AFM) tip, which requires a master mechanic and long manufacture time. Nano manipulator is installed inside Scanning Electron Microscopy (SEM) chamber to observe the operation. This paper presents a control of horizontal axis of nano manipulator via processing SEM image. Edges of AFM tip and CNT are first detected, the position information so obtained is fed to control horizontal axis of nano manipulator. To be specific, visual servoing loop was realized to control the axis more precisely.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.385-385
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• 2010

Copper oxide thin films were deposited on the p-type Si(100) by r.f. magnetron sputtering as a function of different oxygen concentration. The deposited copper oxide thin films were investigated by atomic force microscopy (AFM), scanning electron microscopy (SEM), spectroscopic ellipsometry (SE), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS). The SEM and SE data show that the thickness of the copper oxide films was in the range of 100-400 nm. AFM images show that the surface morphology was depended on the oxygen ratio. The crystal structure of copper oxide films was changed from metallic copper to copper oxide with increasing oxygen concentration. The oxidation states of Cu 2p and O 1s resulted from XPS were consistent with XRD results.

• Korean Journal of Materials Research
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• v.4 no.4
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• pp.379-384
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• 1994

Room-temperature photoluminescent porous Si has been formed by etching Si wafer u-ith the solution of $HF:HNO_{3}: H_{2}O$=l : 5 : 10. We have observed photoluminescence(PL) spectra similar to those reported recently for porous-Si films formed by anodic etching with HF solutions. We have also investigated the dependence of PI, spectra on the etching time which was varied from 1 to 10 minutes. We found that 5-minute etching gave us the strongest PL intensity. We also found by atomic force microscopy( AFM) measurements that the surface fearure size became smaller for longer etching time and the average feature size of the etched Si wafer for 5-minute was about 1, 500~2, 000$\AA$. This indicates that the surface feature of the etched porous Si affects the PL intensity of the sample.

• Journal of the Korean Vacuum Society
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• v.17 no.3
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• pp.215-219
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• 2008

The bonding structure and composition of silicon nitride (SiNx) films were investigated by using Fourier transform infrared spectroscopy (FT-IR). SiNx films were deposited on Si substrate at $340^{\circ}C$ using a conventional PECVD system. The compositions of Si and N in SiNx films were confirmed by using Rutherford backscattering spectroscopy (RBS) and photoluminescence (PL) analysis. The surface morphology of SiNx films was also analyzed by using atomic force microscopy (AFM). It was found that the contents of NH(at. %) is the reverse related with those of SiH corresponding to the result of FT-IR. we conclude that a quantitative analysis on SiNx films can be possible through a precise detection of the contents of H in SiNx films with a FT-IR analysis only.

• Journal of Ceramic Processing Research
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• v.19 no.6
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• pp.525-529
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• 2018

The antireflective (AR) coated poly methyl methacrylate (PMMA) substrate was deposited by atomic layer deposition (ALD) on a self-assembled monolayer (SAM) to improve hydrophobicity and mechano-chemical properties of organic thin films. The water contact angles (WCA) were tested to characterize the surface wettability of SAM octadecyltrichlorosilane (OTS) films. Results showed that a contact angle of $105.9^{\circ}$ was obtained for the SAM films with an annealing process, and the highest WCA of $120^{\circ}$ was achieved for the films prepared by the SAM and ALD multi-process. The surface morphology of the SAM films with different assembly times and varying number of ALD cycles was obtained by atomic force microscopy (AFM). The maximum light transmittance for the SAM films on the PMMA substrate reached 99.9% at a wavelength of 450 nm. It was found that the SAM surfaces were not affected at all by the ALD process.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.598-598
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• 2013

The short lifetime of Proton Exchange Membrane Fuel Cell (PEMFC) is the one of the main problems to be solved for commercializing. Especially, the weak adhesion between metal nanoparticles and supports deteriorate the performances of nanocatalysts, therefore, it is considered to be a major failure mechanism. Using force-distance spectroscopy of atomic force microscopy (AFM), we characterized the adhesion between Pt nanoparticles and carbon supports that is crucially related to the durability for membrane fuel cell (MFC) electrode. In our study, force distance curves measured with Pt coated AFM cantilever, mimicking the behavior of corresponding nanoparticles on carbon supports, leads to the adhesion between metal nanoparticles and carbon supports. We found that theadhesion between Pt and HNO3-treated carbon is enhanced by a factor of 4, compared to Pt and bare carbon support, that is consistent with the macroscopic durability test of PEMFC. The higher adhesion between Pt and HNO3-treated carbon can be explained in light of the stronger chemical interaction by C/O functional groups.

• 제어로봇시스템학회:학술대회논문집
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• 2003.10a
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• pp.1542-1546
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• 2003

Nanotechnology is an important challenge, for which nanoparticle manipulation plays an important role in the assembly of nano elements. In this study, the dynamic equation of system plant is established by van der Waals force, friction, capillary forces etc. To push nanoparticles, strain gauges are used as sensors to actuate an X-Y stage in an atomic force microscopy system. A strategy of pushing nanoparticles is developed based on sliding mode control. Moreover, afuzzy controller is responsible for compensating tip-particle contact loss according to feedback signals of a laser-detector system. According to position control result, experimental results of gold nanoparticle manipulation are presented.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.386.2-386.2
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• 2014

본 연구에서는 바이오 센서 응용을 위해 그래핀을 전극으로 제작하여 그래핀 표면 결함준위에 따른 센서의 민감도를 전기화학 실험을 통해 관찰하였다. 그래핀은 니켈/구리촉매를 이용한 저 진공 화학 기상 증착 장비(Low-Pressure Chemical Vapor Deposition; LP-CVD)와 Photo-lithography로 제작한 것과 탄소 산화물을 환원시켜 만든 환원-그래핀, 두 가지를 사용하였다. 전기화학 실험에서 그래핀 전극 및 Silver/Silver chloride (Ag/AgCl), Fluorine doped Tin Oxide (FTO)은 작업 전극 및 기준 전극, 상대 전극으로 각각 사용하였고, 반응용액은 potassium hexacyanoferrate (III)를 농도를 다르게 하여 사용하였다. 그래핀의 표면 상태, 층수, 결함 정도 등 구조적인 특성은 원자력현미경(Atomic Force Microscopy; AFM), 주사 전자 현미경(Secondary Electron Microscopy; SEM)과 Raman spectroscopy를 각각 이용하여 확인하였고, 그래핀의 결함준위에 따른 반응면적 및 센서 감도 의존성을 전류모드-원자력현미경(Current-Atomic Force Microscopy; I-AFM)과 전기화학 임피던스 분광법(Electrochemical Impedance Spectroscopy; EIS)를 통해 그래핀 전극의 성능을 분석하고, 그래핀 결함 준위에 따른 센서 감도 의존성은 순환전위 분광법 (Cyclic Voltammetry; CV)를 이용하여 관찰하였다. 또한 농도가 다른 반응용액은 센서의 민감도를 관찰하는데 사용하였다. 결과적으로 LP-CVD로 성장한 그래핀과 환원-그래핀의 결함준위에 따른 센서의 성능을 비교 분석한 결과와 반응용액 농도에 따른 센서의 민감도 결과는 그래핀 바이오센서에 대한 응용 및 상용화를 앞당기는데 기여할 것으로 예상한다.