• Title/Summary/Keyword: Atmospheric Plasma

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Atmospheric Pressure Plasma Etching Technology for Forming Circular Holes in Perovskite Semiconductor Materials (페로브스카이트 반도체 물질에 원형 패턴을 형성하기 위한 상압플라즈마 식각 기술)

  • Kim, Moojin
    • Journal of Convergence for Information Technology
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    • v.11 no.2
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    • pp.10-15
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    • 2021
  • In this paper, we formed perovskite (CH3NH3PbI3) thin films on glass with wet coating methods, and used various analytical techniques to discuss film thickness, surface roughness, crystallinity, composition, and optical property. The coated semiconductor material has no defects and is uniform, the surface roughness value is very small, and a high absorption rate has been observed in the visible light area. Next, in order to implement the hole shape in the organic-inorganic layer, Samples in the order of a metal mask with holes at regular intervals, a glass coated with a perovskite material, and a magnet were etched with atmospheric pressure plasma equipment. The shape of the hole formed in the perovskite material was analyzed by changing the time. It can be seen that more etching is performed as the time increases. The sample with the longest processing time was examined in more detail, and it was classified into 7 regions by the difference according to the location of the plasma.

Sterilization of Bacteria and Fungi in Cultural Heritages using Atmospheric Pressure Plasma Jet System (대기압 플라즈마 제트 시스템을 이용한 문화재 내 세균류 및 진균류의 살균)

  • Jo, Sung-Il;Park, Dong-Min;Lee, Byeong Hoon;So, Myoung-Gi;Ha, Suk-Jin;Jeong, Goo-Hwan
    • Journal of the Korean institute of surface engineering
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    • v.53 no.6
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    • pp.285-292
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    • 2020
  • Ancient cultural heritage made up of wood and organic fibers have been easily disintegrated or decomposed by various microorganisms like bacteria and fungi. Here, we demonstrate the effectiveness of an atmospheric pressure plasma jet (APPJ) system to sterilize the microorganisms in tangible cultural heritage. We collected several specimens from the surface of ancient documents and wooden artifacts. Finally, two bacteria and two fungi were prepared and sterilized using the APPJ treatment. The APPJ system is beneficial to its simple apparatus, quick operation time, and cost-effectiveness. Bacteria were almost sterilized within only 1 min treatment using 15 % O2 and applied bias voltage of 100 V. In case of the fungi, sterilization rate reached over 83 % but difficult to reach over 90 % even 10 min treatment. According to the plasma diagnostics using optical emission spectroscopy, it was found that the reactive oxygen species such as OH groups are critical for sterilization of microorganisms. Although further efforts should be performed, we believe that efficient sterilization could be realized by the simple, quick, and portable APPJ treatment system.

Effect of Atmospheric Plasma Treatment of Carbon Fibers on Crack Resistance of Carbon Fibers-reinforced Epoxy Composites

  • Park, Soo-Jin;Oh, Jin-Seok;Rhee, Kyong-Yop
    • Carbon letters
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    • v.6 no.2
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    • pp.106-110
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    • 2005
  • In this work, the effects of atmospheric oxygen plasma treatment of carbon fibers on mechanical interfacial properties of carbon fibers-reinforced epoxy matrix composites was studied. The surface properties of the carbon fibers were determined by acid/base values, Fourier-transform infrared spectrometer (FT-IR), and X-ray photoelectron spectroscopy (XPS) analyses. Also, the crack resistance properties of the composites were investigated in critical stress intensity factor ($K_{IC}$), and critical strain energy release rate mode II ($G_{IIC}$) measurements. As experimental results, FT-IR of the carbon fibers showed that the carboxyl/ester groups (C=O) at 1632 $cm^{-1}$ and hydroxyl group (O-H) at 3450 $cm^{-1}$ were observed for the plasma treated carbon fibers, and the treated carbon fibers had the higher O-H peak intensity than that of the untreated ones. The XPS results also indicated that the $O_{1S}/C_{1S}$ ratio of the carbon fiber surfaces treated by the oxygen plasma led to development of oxygen-containing functional groups. The mechanical interfacial properties of the composites, including $K_{IC}$ (critical stress intensity factor) and $G_{IIC}$ (critical strain energy release rate mode II), were also improved for the oxygen plasma-treated carbon fibersreinforced composites. These results could be explained that the oxygen plasma treatment played an important role to increase interfacial adhesions between carbon fibers and epoxy matrix resins in our composite system.

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Analysis of Plasma Effects on Seed Germination and Plant Growth

  • Kim, Taesoo;Park, Daehun;Park, Gyungsoon;Choi, Eun Ha
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.253.1-253.1
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    • 2014
  • Plasma technology has been widely used for decontamination, differentiation, and disease treatment. Recently, studies show that plasma has effects on increasing seed germination and plant growth. In spite of increasing number of studies about plasma effects, the interaction between plasma and plants has been rarely informed. In this study, we have analyzed the effects of nonthermal atmospheric pressure plasma on seed germination and growth of coriander (Coriandum sativum), a medicinal plant. We used to Ar, air, and N2 plasma on seed as feeding gases. Plasma was discharged at 0.62 kV, 200 mA, 9.2 W. Seed germination was increased over time when treated with N2 based DBD plasma for exposure times of 30 seconds and 1 minute, everyday. After 7 days, about 80~100% of seeds were germinated in the treatment with N2 based DBD plasma, compared to control (about 40%, only gas treated seeds). In order to elucidate the mechanism of increased germination, we have analyzed characteristics of changes in plant hormones and seed surface structure by SEM.

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Comparative study of plasma effects on human liver normal and cancer cells (정상 간세포와 간암세포의 플라즈마 특성에 관한 비교연구)

  • Kim, Dae-Yeon;Gweon, Bo-Mi;Kim, Dan-Bee;Choe, Won-Ho;Shin, Jennifer H.
    • Proceedings of the KSME Conference
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    • 2008.11a
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    • pp.1539-1542
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    • 2008
  • Plasma is 4th state of matters, which consists of electrons, neutral, and ionized particles. In biomedical research, cold plasma, which is generated in atmospheric condition, has been applied to disinfect microorganisms such as bacteria and yeast cells. Because of its low temperature condition, the heat-sensitive medical device can be easily sterilized by the cold plasma treatment. In recent years, the effects of plasma on mammalian cells have arisen as a new issue. Generally, plasma induces intensity dependent necrotic cell death. In this research, we investigate the feasibility of cold plasma treatment for cancer therapy by conducting comparative study of plasma effects on normal and cancer cells. We use THLE-2 (human liver normal cell) and SK-Hep1 (human liver metathetic cancer cell) as our target cells. The needle type of cold plasma is generated by the Helium plasma device. Two types of cells have different onset plasma conditions for the necrosis, which may be explained by difference in electrical properties of these two cell types.

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The Aging-time change by the plasma-treatment of MgO film in AC-Plasma Display Panels

  • Seo, Gi-Weon;Kim, Jong-Bin;Park, Seung-Tea;Seo, Young-Woo;Kim, Sung-Gyu;Lee, Sang-Han;Lee, Chang-Joon;Kim, Dae-Young;Park, Min-Soo;Kim, Je-Seok;Ryu, Byung-Gil
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07a
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    • pp.721-723
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    • 2005
  • We applied the Atmospheric Pressure Plasma (AP-plasma) to the MgO film to try to control the Aging-time on the PDP production-line. The MgO film surface and the discharge characteristics of AC-PDPs were investigated, using the plasma-treated MgO film. The Aging-time change can be achieved by treating the MgO film with plasma. This method can be adapted to the mass production-line.

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Generation of Low Temperature Plasma and Its Application (저온 플라즈마 발생과 응용)

  • Lee, Bong-Ju
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.51 no.9
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    • pp.413-416
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    • 2002
  • It was reported that low temperature plasma developed by our group was apparently homogeneous and stable at atmospheric pressure, and was generated if the alumina was used as a dielectric insulating material and Ar gas as a plasma gas. This is a structure in which the dielectric materials are covered and arranged in parallel in the one side of electrode. In this experiment, we discovered that dielectric material was important to generate normal electric discharge. To examine the effect of dielectric material on the electric discharge characteristic, the voltage and current of the plasma was measured and the electrical effect of dielectric material was examined. Also, it was applied to an etching of tin oxide films.

Design of the Vacuum Vessel for the KT-2 Project

  • S.R.In;Yoon, B.J.;S.H.Jeong;Lee, B.S.
    • Proceedings of the Korean Nuclear Society Conference
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    • 1996.05d
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    • pp.438-442
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    • 1996
  • The design of the vacuum vessel of KT-2(a large-aspect-ratio, mid-size tokamak) is presented. The KT-2 vacuum vessel provides necessary environments to contain a plasma of double-null configuration with elongation of up to 1.8. The vacuum vessel is designed as an all-metal welded structure. Eddy currents are induced on the vessel during all stages of the plasma operation. Influences of the continuous vessel on the plasma were investigated. No significant effect of the vessel on the plasma in every aspect of null formation, plasma initiation, plasma control was found. Stresses and deformations in the vessel by atmospheric pressure and electromagnetic forces due to the eddy currents were calculated using 3D FEM code.

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Determination of Trace Elements in Atmospheric Dust by X-Ray Fluorescence Spectrometry(II) : X-ray Fluorescence Spectrometric Determination of Light Elements (형광 X선에 의한 대기분진중의 미량성분의 측정(II): 대기부유분진 중 경원소의 X-선 형광분석)

  • 이용근;박현미;이동수;이보경
    • Journal of Korean Society for Atmospheric Environment
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    • v.9 no.3
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    • pp.247-254
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    • 1993
  • A simple and direct method is developed for the determination of light Elements in atmospheric particulates by X-ray fluorescence spectrometry. Calibration standards for the light elements such as Al, Mg, K, Ca, etc are prepared by filtering real atmospheric particulates over variable time and subsequently standardizing them by Inductively Coupled Plasma-Mass Spectrometry(ICP-MS) or Atomic Absorption Spectrophotometry(AAS) analysis. The validity of this calibration method is tested by analyzing more than 100 aerosol samples, collected at urban(Seoul) and rural(Padori) sites over a two year period with this method and then comparing them with those by other accuracy proven methods such as AAS or ICP-MS: for all metals tested the results showed reasonably good agreements (R $\geq$ 0.95).

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Change in Water Contact Angle on Electrospray-Synthesized SiO2 Coated Layers by Plasma Exposure (플라즈마 조사에 의한 전기분무합성 SiO2 코팅층의 물접촉각 변화)

  • Kim, Jae-Hun;Lee, Junseong;Kim, Ji Yeong;Kim, Sang Sub
    • Korean Journal of Materials Research
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    • v.24 no.11
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    • pp.639-643
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    • 2014
  • Hydrophilic $SiO_2$ layers were obtained by the atmospheric-pressure plasma treatment. Superhydrophobic $SiO_2$ layers were first deposited by the electrospray deposition method. The electrospunable solution that was prepared based on the solgel method was sprayed on Si (100) substrates. The surface of the electrosprayed $SiO_2$ layers consisted of the agglomeration of nano-sized grains, which led to a very high roughness and revealed a very high contact angle to water droplets over $162^{\circ}$. After having been exposed to the atmospheric $Ar/O_2$ plasma, the observed superhydrophobicity of the $SiO_2$ layers were greatly changed: a dramatic variation of the water contact angle from $162^{\circ}$ to $3^{\circ}$, namely realization of superhydrophillicity. Interestingly, the surface microstructure was almost preserved. According to the XPS analysis, it is more likely that thanks to the plasma exposure, the surface of $SiO_2$ layers will be cleaned in terms of organic species that are hydrophobic-inducing, consequently leading to the hydrophilic nature observed for the plasma-exposed $SiO_2$ layers.