• Korean Journal of Optics and Photonics
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• v.16 no.4
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• pp.304-312
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• 2005

Field performance of several different types of diffractive optical elements(DOEs) has been carried out. Using Zemax model, we have designed five different types of DOEs, such as transmissive flat-DOE, transmissive curved-DOE, reflective flat-DOE, reflective curved-DOE and parabolic mirror, We have applied two different wavelengths, i.e., 13 m(EUV) and 632.8 nm(visible) to above DOEs. Off_axis dominate aberrations and the diffraction limiting (Rayleigh limit) field angles have been investigated and compared at both wavelengths for each DOE. At diffraction limit, field angle of curved-DOEs was much greater than that of flat-DOEs for both transmission and reflective types. We also showed that dominated off_axis aberration of flat-DOEs was coma, but that of curved-DOEs was mixture of astigmatism and curvature of field. The measured field angle and expected OPD aberrations were well coincided with theoretical ones. Increasing the ratio of field angle with wavelength was more effective in curved-DOEs than flat-DOEs.

• Korean Journal of Optics and Photonics
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• v.6 no.3
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• pp.188-200
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• 1995

A design of unit magnification 2-mirror system with high resolution is presented. It is for soft X-ray(wavelength of 13 nm) projection imaging and suitable for preparation of high density semiconductor chip. In general, a holosymmetric system with unit magnification has the advantage that both coma and distortion are completely eliminated. In our holosymmetric 2-mirror system, spherical aberration is addtionally removed by using two identical paraboloidal mirror surfaces and field curvature aberration is also corrected by balancing Petzval sum and astigmatism which depends on the distance between two mirrors, so that the system is a aplanatic flat-field paraboloidal 2-mirror holosymmetric system. This 2-mirror system is small in size, and has a simple configuration with rotational symmetry about optical axis, and has also small central obscuration. Residual finite aberrations, spot diagrams, and diffraction-based MTF's are analyzed for the check of performances as soft X-ray lithography projection system. As a result, the image sizes for the resolutions of$0.25\mum$and $0.18\mum$are 4.0 mm, 2.5 mm respectively, and depths of focus for those are $2.5\mum$, $2.4\mum$respectively. This system should be useful in the fabrication of 256 Mega DRAM or 1 Giga DRAM. DRAM.