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The Periodic Moving Average Filter for Removing Motion Artifacts from PPG Signals

  • Lee, Han-Wook;Lee, Ju-Won;Jung, Won-Geun;Lee, Gun-Ki
    • International Journal of Control, Automation, and Systems
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    • 제5권6호
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    • pp.701-706
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    • 2007
  • The measurement accuracy for heart rate or $SpO_2$ using photoplethysmography (PPG) is influenced by how well the noise from motion artifacts and other sources can be removed. Eliminating the motion artifacts is particularly difficult since its frequency band overlaps that of the basic PPG signal. Therefore, we propose the Periodic Moving Average Filter (PMAF) to remove motion artifacts. The PMAF is based on the quasi-periodicity of the PPG signals. After segmenting the PPG signal on periodic boundaries, we average the $m^{th}$ samples of each period. As a result, we remove the motion artifacts well without the deterioration of the characteristic point.

질산 제거 및 재이용 기술 (Nitrate Removal and Recycling Technique)

  • 심상준;이경희;조영상
    • 청정기술
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    • 제3권2호
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    • pp.31-33
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    • 1997
  • Nitrate contamination in surface water and ground water have increased in Korea. This trend has raised concern because nitrates caused methemoglobinemia in infants. To remove nitrates from waters, various purification processes including ion-exchange, biological denitrification, and chemical denitrification are currently in use for the treatment of water. However, little economically advantageous process exists for the industrial scale treatment of effluents highly polluted with nitrates. A new process has been developed for nitrate and other salts removal from polluted waters. Alumina cement and lime served as precipitating agents to remove nitrate with stirring at basic pH. Decreasing alumina content in alumina cement result in a increasing in nitrate removal yield. Stable removal of nitrate(1000mg/L) was readily achieved by two-stage removal process.

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습식 스크러버를 이용한 NOx 제거에 관한 연구 (The Simultaneous removal of NOx using Wet Scrubber)

  • 김재강;이주열;박병현;최진식
    • 한국응용과학기술학회지
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    • 제32권2호
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    • pp.296-301
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    • 2015
  • The experiment was performed for in order to remove NOx which is generated in the Ship's engine. it was performed test in order to remove NOx which is generated in the Ship's engine. It was used as the oxidizing agent sodium chlorite. Use the oxidizer is nitrogen monoxide was oxidized to nitrogen dioxide. and was tested pH adjustment to increase the efficiency of oxidizing. An aqueous solution of sodium hydroxide was used for the nitrogen dioxide absorbent. Low concentration of the solution, it showed a high efficiency. improves the absorption efficiency by add additives.

Specimen Preparation for Scanning Electron Microscope Using a Converted Sample Stage

  • Kim, Hyelan;Kim, Hyo-Sik;Yu, Seungmin;Bae, Tae-Sung
    • Applied Microscopy
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    • 제45권4호
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    • pp.214-217
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    • 2015
  • This study introduces metal coating as an effective sample preparation method to remove charge-up caused by the shadow effect during field emission scanning electron microscope (FE-SEM) analysis of dynamic structured samples. During a FE-SEM analysis, charge-up occurs when the primary electrons (input electrons) that scan the specimens are not equal to the output electrons (secondary electrons, backscattered electrons, auger electrons, etc.) generated from the specimens. To remove charge-up, a metal layer of Pt, Au or Pd is applied on the surface of the sample. However, in some cases, charge-up still occurs due to the shadow effect. This study developed a coating method that effectively removes charge-up. By creating a converted sample stage capable of simultaneous tilt and rotation, the shadow effect was successfully removed, and image data without charge-up were obtained.

저온 수처리장치 열교환기의 열전달 특성에 관한 연구 (A Study on the Performance Prediction of Low Temperature Thermal Desorption System)

  • 이춘태
    • 동력기계공학회지
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    • 제13권6호
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    • pp.76-81
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    • 2009
  • Thermal desorption systems are designed to remove organic compounds from solid matrices such as soils, sludges and filter cakes without thermally destroying them. It is a separation technology, not a destruction technology. Since it is a thermal process, there is a common belief that temperature is the only significant parameter to be monitored. While it is true that better removal efficiencies are usually achieved at higher temperatures, other factors must be considered. Since the process is governed by mass transfer, heating time and the amount of mixing are also key parameters in optimizing removal efficiency. Thermal desorption have been successfully used for just about every organic contaminant found to date. It has also been used to remove mercury. In the present study, the numerical simulation has been performed to investigate the characteristics of heat transfer of LTTD(low temperature thermal desorption). The commercial software, AMESIM was applied for analyzing the heat transfer process in the LTTD.

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Squalene투여가 마우스의 감염 방위기능에 미치는 영향 (The Effect of Squalene Administration on the Protective Fuction Against Infection in Mice)

  • 박해영;안년형
    • 한국임상약학회지
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    • 제2권1호
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    • pp.41-53
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    • 1992
  • This study was designed to estimate the ability of squalene treated mice to eliminate systemically infected bacteria and fungi and to elucidate the mechanism. As a result of measuring the ability to remove systemically infected bacteria and fungi, The ability of mice to remove the organism was found to increase in squalene treated mice when compared with control mice. And also the ability of phagocytic cells to produce Reactive Oxygen Intermediate(R.O.I.) increased in squalene treated mice. When the NADPH oxidase activity that make R.O.I. produce was measured, the activity increased in squalene treated mice, too. Therefore the good clearance of live organism in squalene treated mice is likely to relate to phagocytic cell activation. The activation of phagocytic cells might be mediated via the increased production of R.O.I. due to the increase of NADPH oxidase activity.

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Continental Land Cover Mapping/Monitoring and Ground Truth Database

  • Tateishi, Ryutaro;Wen, Chen-Gang;Park, Jong-Geol
    • 대한원격탐사학회:학술대회논문집
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    • 대한원격탐사학회 1999년도 Proceedings of International Symposium on Remote Sensing
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    • pp.13-18
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    • 1999
  • Land cover map of 30 arc-second grid by NOAA AVHRR data for the whole Asia was produced by the authors as the project of the Asian Association on Remote Sensing(AARS). Land cover change monitoring of continental scale by satellite data needs preprocessing to remove undesirable factors due to noises, atmosphere, or the effect by solar zenith angle. The paper describes the method to remove these factors. The most important thing for better mapping/monitoring in the future is the accumulation of ground truth data by many land cover related researchers. The project of the development of Global Land Cover Ground Truth Database(GLCGT-DB) is proposed.

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Etching Characteristics of Au Film using Capacitively Coupled CF4/Ar Plasma

  • Kim, Gwang-Beom;Hong, Sang-Jeen
    • 동굴
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    • 제82호
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    • pp.1-4
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    • 2007
  • In this paper, the etching of Au films using photoresist masks on Si substrates was investigated using a capacitively coupled plasma etch reactor. The advantages of plasma etch techniques over current methods for Au metalization include the ability to simplify the metalization process flow with respect to resist lift-off schemes, and the ability to cleanly remove etched material without sidewall redeposition, as is seen in ion milling. The etch properties were measured for different gas mixing ratios of CF4/Ar, and chamber pressures while the other conditions were fixed. According to statistical design of experiment (DOE), etching process of Au films was characterized and also 20 samples were fabricated followed by measuring etch rate, selectivity and etch profile. There is a chemical reaction between CF4 and Au. Au- F is hard to remove from the surface because of its high melting point. The etching products can be sputtered by Ar ion bombardment.

Scenedesmus sp.를 이용한 하수의 영양물질 제거에 관한 연구 (A Study on the Nutrient Removal of Wastewater Using Scenedemus sp.)

  • 이희자
    • 한국환경과학회지
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    • 제8권4호
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    • pp.443-449
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    • 1999
  • This paper describe the working of algal culture system under batch and continuous feeding effluents in biological treatment process. The main objective of this study was the determination of fundamental opeating parameters such as dilution rates, light intensity, biomass concentration, nutrients contents, which engender an effective nutrient and organic waste removal process. The results of this research indicate that the algae system will remove effectively nutrient and organic waste. In batch cultures, 91.8% dissolved orthophosphate and 83.3% ammonia nitrogen were removed from the sewage in ten days. In continuous flow systems, a detention time of 2.5 days was found adequate to remove 91% T-P, 87% T-N and 95% $NH_3-N$. At 22-28$^{\circ}C$, 60 rpm, with an intensity of 3500 Lux, the specific growth rate, k was 0.59/day in batch experiments. The optimal growth temperature and nutrients rate (N/P) were respectively $25^{\circ}C$ and 3~5. With an abundant supply of untrients, it was possible to sustain substantial population densities in the temperature range of 22~28$^{\circ}C$.

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구리 CMP 후 연마입자 제거에 화학 기계적 세정의 효과 (Effect of Chemical Mechanical Cleaning(CMC) on Particle Removal in Post-Cu CMP Cleaning)

  • 김영민;조한철;정해도
    • 대한기계학회논문집A
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    • 제33권10호
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    • pp.1023-1028
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    • 2009
  • Cleaning is required following CMP (chemical mechanical planarization) to remove particles. The minimization of particle residue is required with each successive technology generation, and the cleaning of wafers becomes more complicated. In copper damascene process for interconnection structure, it utilizes 2-step CMP consists of Cu and barrier CMP. Such a 2-steps CMP process leaves a lot of abrasive particles on the wafer surface, cleaning is required to remove abrasive particles. In this study, the chemical mechanical cleaning(CMC) is performed various conditions as a cleaning process. The CMC process combined mechanical cleaning by friction between a wafer and a pad and chemical cleaning by CMC solution consists of tetramethyl ammonium hydroxide (TMAH) / benzotriazole (BTA). This paper studies the removal of abrasive on the Cu wafer and the cleaning efficiency of CMC process.