• 반도체디스플레이기술학회지
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• 제8권4호
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• pp.89-94
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• 2009

The influence on a stability of thermal plasma has been investigated in an electrode structure of non-transferred plasma torch. The variations of dynamic characteristic of the arc voltage was analyzed and compared in terms of voltage character and nozzle types for both the step-shaped nozzles and magnetic-approved cylindrical nozzle. From the experimental results, an electrode gap, flow rate of arc gas, and currents are considered as major operational parameters. As conclusion, it was assured that a torch with step-shaped nozzles of magnetic-approved type produce the stable plasma jet.

• Journal of Welding and Joining
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• 제33권1호
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• pp.72-79
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• 2015

Evaluation of fracture toughness of welded structures has a significant influence on the structural design. However the residual stresses is redistributed while the welded structures is cut for preparing specimens. This study investigated an effect of the welding residual stress redistribution on the impact absorption energy of Charpy specimen. SA516Gr70 steel plate by at the flux cored arc welding (FCAW) and gas tungsten arc welding(GTAW) was cutting. Specimens for Charpy impact testing were taken from the welded plate. Two material removal mechanisms (wire cutting and water jet) were used to make the specimens. Welding residual stress and redistribution residual stress were measured using the XRD (X-Ray Diffraction) method. The amount of redistribution of residual stress depends on the different material removal mechanism. Redistribution of residual stress of reduced the impact absorption energy by 15%.

• 전기의세계
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• 제42권1호
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• pp.5-11
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• 1993

금속이나 세라믹 입자를 용사하여 보호피막을 형성하는 기술은 화염을 사용하는 방법에서 시작했으며 용사재료는 분말, 선, 봉의 형태로 공급되었다. 1960년대에 상업적인 plasma 용사장비가 개발되었으며 여기서 사용된 D.C.plasma jet를 이용하여 분말형태의 용사재료를 용융하고 고속으로 피용사테에 용융입자를 분사하여 피용사체면에 충돌시켜 다층의 얇은 피막을 형성한다. 최근(1985년)에는 R.F.(Radio Frequency) Plasma를 이용하여 열전도도가 작은 재료나 산소와 반응성이 큰 재료를 용사하는 방법도 개발되고 있다. 용사피복법은 현재 여러가지 방법이 실용되고 있으며 재료를 용융하는 열원에 따라 분류하면 표1과 같다. 즉 산소와 연료 가스의 혼합에 의한 연소나 폭발에너지를 이용하는 가스식 용사법과 Arc, Plasma등의 전기 에너지를 이용하는 전기식 용사법으로 크게 나눌 수 있다.

• 한국항공우주학회지
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• 제38권12호
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• pp.1240-1246
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• 2010

내경 1.5 mm, 외경 4.8 mm를 갖는 엔탈피 탐침을 설계 제작하고, 17 kW급 비이송식 직류 아크히터로부터 나오는 고엔탈피 Ar 아크 플라즈마 유동의 중심축을 따라 삽입하면서 탐침 첨두가 파괴될 때까지 온도와 속도를 측정하였다. 이 실험으로부터, 설계된 엔탈피 탐침은 대기압 조건에서 최대 12,000 K 의 온도와 600 m/s 의 속도를 갖는 고엔탈피아크 플라즈마 유동장에 대해 탐침 첨두의 파괴 없이 동작할 수 있음을 관찰하였다. 탐침첨두에서 형성되는 비압축성 열경계층 및 열속 방정식으로부터 이 경우의 아크 플라즈마 유동은 약 ${\sim}5{\times}10^7\;W/m^2$의 열속 부하를 전달한 것으로 추측되었다. 이로부터, 설계된 엔탈피 탐침은 $0{\sim}5{\times}10^7\;W/m^2$의 열속 범위 내에서 다양한 형태의 아크히터로부터 발생되는 넓은 범위의 플라즈마 온도, 속도 및 농도를 동시에 측정할 수 있을 것으로 기대된다.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2003년도 춘계학술대회 논문집
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• pp.86-89
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• 2003

Chemical Mechanical Planarization(CMP) has been accepted as the most effective processes for ultra large scale integrated (ULSI) chip manufacturing. However, as the polishing process continues, pad pores get to be glazed by polishing residues, which hinder the supply of new slurry. And pad surface is ununiformly deformed as real contact distance. These defects make material removal rate(MRR) decrease with a number of polishied wafer. Also the desired within-chip planarity, within wafer non-uniformity(WIWNU) and wafer to wafer non-uniformity(WTWNU) arc unable to be achieved. So, pad conditioning in CMP Process is essential to overcome these defects. The eletroplated or brazed diamond conditioner is used as the conventional conditioning. And. allumina long fiber, the jet power of high pressure deionized water, vacuum compression. ultrasonic conditioner aided by cavitation effect and ceramic plate conditioner are once used or under investigation. But. these methods arc not sufficient for ununiformly deformed pad surface and the limits of conditioning effect. So this paper focuses on the characteristics of diamond conditioner which reopens glazed pores and removes ununiformly deformed pad away.

• The Korean Journal of Ceramics
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• 제2권4호
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• pp.212-215
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• 1996

This paper focuses the strength and wear resistance of CVD diamond films. The strength of free-standing CVD diamond films synthesized by microwave plasm CVD, DC plasma CVD, RF plasma CVD and arc discharge plasma jet CVD has been measured by three-point bending test. The wear resistance of CVD diamod films has been evaluated by the pin-on-disk type testing. diamond films coated on the base of sintered tungsten carbide pin by hot filament CVD have been rubbed with a sintered diamond disk in muddy water. Volume removed wear of CVD diamond has been compared with stellite, WC alloy and bearing steel.

• Journal of Advanced Marine Engineering and Technology
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• 제18권3호
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• pp.68-77
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• 1994

TIG welding process is applied for the active metal such as aluminum and titanium, also sometimes for overlay welding of superalloy. However the welding speed to be applied is very low because of the unstable bead formed in the region of high current and high welding speed. The present study was carried out to examine the basic phenomena of high speed TIG melt run welding by the 2% Th - W electrode(dia.3.2mm) of various tip shapes.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2003년도 춘계학술대회
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• pp.1736-1741
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• 2003

The characteristics plasma flow of an atmospheric plasma torch used for thermal plasma processing is studied. In general, it is produced by the arc-gas interactions between a cathode tip and an anode nozzle. The performance of non-transferred plasma torch is significantly dependent on jet flow characteristics out of the nozzle. In this work, the distribution of gas flow that goes out to the atmosphere through a plenum chamber and nozzle is analyzed to evaluate the performance of atmospheric plasma torch. Numerical analysis is carried out with various angles of an inlet flow which can create different swirl flow fields. Moreover, the size of plasma plume is experimentally depicted.

• 열처리공학회지
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• 제13권5호
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• pp.318-323
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• 2000

The planarization of rough polycrystalline diamond films synthesized by DC arc discharge plasma jet CVD (chemical vapor deposition) was attempted using KrF excimer laser pulses. The effects of laser incidence angle and reaction gases (ozone and oxygen) on etching rate of diamond were studied. The temperature change of diamond and graphite with different laser fluences was calculated by computer simulation to explain the etching behavior of diamond films. The threshold energy density from the experiment for etching of pure crystalline diamond was about $1.7J/cm^2$ and fairly matched the simulation value. Preferential etching of a particular crystallographic plane was observed through scanning electron microscopy. The etching rate of diamond with ozone was lower than that with oxygen. When the angle of incidence was $80^{\circ}$ to the diamond surface normal, the peak-to-valley surface roughness was Significantly reduced from $20{\mu}m$ to $0.5{\mu}m$.

• 대한수학회지
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• 제57권1호
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• pp.145-169
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• 2020

Let k be a field of characteristic 0. Let ${\mathfrak{C}}=Spec(k[x,y]/{\langle}f{\rangle})$ be a weighted homogeneous plane curve singularity with tangent space ${\pi}_{\mathfrak{C}}:T_{{\mathfrak{C}}/k}{\rightarrow}{\mathfrak{C}$. In this article, we study, from a computational point of view, the Zariski closure ${\mathfrak{G}}({\mathfrak{C}})$ of the set of the 1-jets on ${\mathfrak{C}}$ which define formal solutions (in F[[t]]² for field extensions F of k) of the equation f = 0. We produce Groebner bases of the ideal ${\mathcal{N}}_1({\mathfrak{C}})$ defining ${\mathfrak{G}}({\mathfrak{C}})$ as a reduced closed subscheme of $T_{{\mathfrak{C}}/k}$ and obtain applications in terms of logarithmic differential operators (in the plane) along ${\mathfrak{C}}$.