• Title/Summary/Keyword: Ar-41

검색결과 175건 처리시간 0.032초

Correlation between Allergic Rhinitis Prevalence and Immune Responses of Children in Ulsan: A Case-control Study (울산지역 초등학생의 알레르기비염 유병과 면역반응과의 상관성: 환자-대조군 연구)

  • Lee, Jiho;Oh, Inbo;Kim, Ahra;Kim, Minho;Sim, Chang sun;Kim, Yangho
    • Journal of Environmental Health Sciences
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    • 제41권4호
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    • pp.249-258
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    • 2015
  • Objectives: This study aims to investigate the correlations between the prevalence of allergic rhinitis (AR) and cytokines among elementary school children in an industrial city, Ulsan, South Korea, and to identify major environmental risk factors associated with AR prevalence. Methods: We conducted a case-control study in June 2009 and February 2010 in order to evaluate the relationship between AR and related cytokines. Data on physician-treated prevalence over the past 12 months and potential risk factors for AR were compiled through a questionnaire from a survey of 339 schoolchildren living in different urban environments. Logistic regression analysis was carried out with propensity score matched data (n=180) to assess the influences of cytokines (IL-13, IL-33, IL-4 and IL-5) on AR prevalence and to determine which environmental factors affected AR. Results: In univariate analysis, the AR prevalence was influenced by family history of AR (mother and siblings), environmental factors (odor condition and irritated symptoms of air pollution), and indoor allergens (D. farinae and D. pteronyssinus). The t-test demonstrated that eosinophils, Immunoglobulin E (IgE), and interleukins (IL-13 and IL-5) were statistically significantly different according to treatment of allergic rhinitis over the preceeding 12 months. The results of the multiple logistic regression analysis showed that a statistically significant association between several factors (such as irritated symptoms of air pollution (OR 4.075, CI 1.735-9.568), IL-13 (OR 0.825, CI 0.734-0.928), odor condition (OR 2.409, CI 0.908-6.389), and AR history of siblings (OR 2.217, CI 0.999-4.921)) and the prevalence of AR was found after adjusting for confounders. Conclusion: These results suggest that AR prevalence is significantly associated with cytokine level, genetic background, and outdoor environmental factors. Although living in a polluted area and genetic background can contribute to an increased risk of childhood AR, cytokine level should be considered as an important factor in the treatment of AR in the last 12 months.

The Effect of AR Technology's Convenience on Purchasing Intentions in Mobile Shopping: Focusing on the Regulation Effect of Purchase Satisfaction (모바일 쇼핑 AR기술의 편리성이 구매의도에 미치는 영향에 관한 연구: 구매만족도의 조절효과를 중심으로)

  • Li, Si-zheng;Qing, Cheng-lin
    • Journal of Digital Convergence
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    • 제19권5호
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    • pp.41-46
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    • 2021
  • This study, centered on mobile phone purchasers, verifies the effect of AR technology's convenience in consumer mobile shopping on consumers' intentions by focusing on the regulation effect of purchase satisfaction. According to the results of the hypothesis of SPSS, convenience has a positive (+) effect on both purchase intent and purchase satisfaction, and purchasing satisfaction plays a partial regulatory role between convenience and purchase intention. The results of this study are expected to provide users with various information using AR technology quickly and accurately in mobile shopping, thereby enhancing consumers' trust, providing pleasure, causing users to purchase intention, and realizing the untapped marketing effect more specifically.

Etching Properties of As-doped ZnO Thin Films in $Cl_2/BCl_3$/Ar Plasma ($Cl_2/BCl_3$/Ar 플라즈마에서의 As-doped ZnO 박막의 식각 특성)

  • Eom, Du-Seung;Gang, Chan-Min;Kim, Dong-Pyo;Kim, Chang-Il
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 한국표면공학회 2008년도 추계학술대회 초록집
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    • pp.41-42
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    • 2008
  • 본 논문에서는 As-doped ZnO 박막의 플라즈마 식각 특성 및 메커니즘에 관하여 실험을 수행 하였다. As-doped ZnO 박막 식각 실험은 유도 결합 플라즈마 식각 장비(inductively coupled plasma;ICP)와 $BCl_3$/Ar 플라즈마에 첨가된 $Cl_2$가스의 비, RF 전력, DC bias voltage, 공정 압력에 대한 식각 속도의 변화를 관찰 하였다. $BCl_3$/Ar 플라즈마에 $Cl_2$ 가스 첨가량 6 sccm 까지는 증가하지만 그 이후 $Cl_2$ 가스의 첨가량이 증가할 때 식각속도가 감소하였다. 이는 플라즈마 내에서 Cl 라디칼의 밀도가 증가함에 따라서 $Ar^+$의 에너지가 감소와 비휘발성 식각 부산물의 증가에 의하여 효과적인 물리적 식각이 이루어 지지 못한 것으로 판단된다. OES를 이용하여 플라즈마 내에서 라디칼들의 빛의 세기를 측정하였고, 식각 후 As-type ZnO 박막 표면에서의 화학적 결합을 보기위해 XPS 분석을 실행하였다.

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On The Etching Mechanism of $ZrO_2$ Thin Films in Inductively Coupled $BCl_3$/Ar Plasma

  • Kim, Man-Su;Jung, Hee-Sung;Min, Nam-Ki;Lee, Hyun-Woo;Kwon, Kwang-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.83-84
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    • 2007
  • $BCl_3$/Ar ICP 플라즈마를 이용한 $ZrO_2$ 박막의 식각 메카니즘이 실험 결과와 모델링을 통해 연구되었다. Ar 가스의 증가에 따라, $ZrO_2$의 식각 속도는 선형 변화의 경향을 보이지 않았고, Ar의 약 30% - 35%에서 41.4nm/min의 최대의 속도를 나타내었다. Langmuir probe 측정과 plasma 모델링 결과로부터, $BCl_3$/Ar 가스 혼합비가 플라즈마 파라미터와 active species의 형성에 큰 영향을 미침을 확인하였다. 한편 surface kinetics 모델링 결과로부터, $ZrO_2$의 식각 속도는 ion-assisted chemical reaction mechanism 에 의해 결정됨을 확인하였다.

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Etch Characteristics of TiN Thin Films in the Inductively Coupled Plasma System (유도 결합 플라즈마를 이용한 TiN 박막의 식각 특성)

  • Um, Doo-Seung;Kang, Chan-Min;Yang, Xue;Kim, Dong-Pyo;Kim, Chang-Il
    • Journal of the Korean institute of surface engineering
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    • 제41권3호
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    • pp.83-87
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    • 2008
  • This study described the effects of RF power, DC bias voltage, chamber pressure and gas mixing ratio on the etch rates of TiN thin film and selectivity of TiN thin film to $SiO_2$ with $BCl_3$/Ar gas mixture. When the gas mixing ratio was $BCl_3$(20%)/Ar(80%) with other conditions were fixed, the maximum etch rate of TiN thin film was 170.6 nm/min. When the DC bias voltage increased from -50 V to -200 V, the etch rate of TiN thin film increased from 15 nm/min to 452 nm/min. As the RF power increased and chamber pressure decreased, the etch rate of TiN thin film showed an increasing tendency. When the gas mixing ratio was $BCl_3$(20%)/Ar(80%) under others conditions were fixed, the intensity of optical emission spectra from radical or ion such as Ar(750.4 nm), $Cl^+$(481.9 nm) and $Cl^{2+}$(460.8 nm) was highest. The TiN thin film was effectively removed by the chemically assisted physical etching in $BCl_3$/Ar ICP plasma.

What Did Elementary School Pre-service Teachers Focus on and What Challenges Did They Face in Designing and Producing a Guided Science Inquiry Program Based on Augmented Reality? (증강현실 기반의 안내된 과학탐구 프로그램 개발에서 초등 예비교사들은 무엇에 중점을 두고, 어떤 어려움을 겪는가?)

  • Chang, Jina;Na, Jiyeon
    • Journal of Korean Elementary Science Education
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    • 제41권4호
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    • pp.725-739
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    • 2022
  • This study aims to analyze what elementary school pre-service teachers focused on and what challenges they faced in designing and producing a guided science inquiry program based on augmented reality (AR) and to provide some implications for teachers' professionalism and teacher education. To this end, focusing on the cases of pre-service teachers who designed and created AR-based guided inquiry programs, the researchers extracted and categorized the pre-service teachers' focus and challenges from the program design and production stages. As a result, in the program design stage, the pre-service teachers tried to construct scenarios that could promote students' active inquiry process. At the same time, drawing on the unique affordances of AR, the pre-service teachers focused on creating vivid visual data in a 3D environment and making meaningful connections between virtual and real-world activities. The pre-service teachers faced challenges in making use of the advantages of AR technology and designing an inquiry program due to a lack of background knowledge about CoSpaces, a content creation program. In the program production stage, the pre-service teachers tried to make their program easy to handle to improve students' concentration on inquiry activities. In addition, challenges of programming using CoSpaces were reported. Based on these results, educational implications were discussed in terms of the pedagogical uses of AR and teachers' professionalism in adopting AR in science inquiry.

Surface Reaction of Na0.5K0.5NbO3 Thin Films in Inductively Coupled BCl3/Cl2/Ar Plasma (BCl3/Cl2/Ar 플라즈마에서의 Na0.5K0.5NbO3 박막의 표면반응)

  • Kim, Dong-Pyo;Um, Doo-Seung;Kim, Gwan-Ha;Woo, Jong-Chang;Kim, Chang-Il
    • Journal of the Korean institute of surface engineering
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    • 제41권6호
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    • pp.269-273
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    • 2008
  • The etch of $(Na_{0.5}K_{0.5})NbO_3$ (NKN) thin film was performed in $BCl_3/Cl_2/Ar$ inductively coupled plasma. It was found that the 1sccm addition $BCl_3$ (5%) into $Cl_2/Ar$ plasma caused a non-monotonic behavior of the NKN etch rate. The maximum etch rate of NKN was 95.3 nm/min at $BCl_3$ (1 sccm)/$Cl_2$ (16 sccm)/Ar (4 sccm), 800 W ICP power, 1 Pa pressure and 400 W bias power. The NKN etch rate shows a monotonic behavior a s the bias power increases. The analysis of the narrow scan spectra of XPS for both a s-deposited and etched NKN films allowed one to assume ion assisted etch mechanism. The most probable reason for the maximum etch rate can be defined as a concurrence of chemical and physical etch pathways.

Ar 및 $O_2$ 유량에 따라 스퍼터된 GZO 박막의 특성변화

  • Kim, Jong-Uk;Kim, Deok-Gyu;Kim, Hong-Bae
    • Proceedings of the Korean Vacuum Society Conference
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.230-230
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    • 2011
  • RF magnetron sputtering을 이용하여 Ar 및 $O_2$유량에 따라 GZO 박막을 유리기판 위에 제작하고 구조적, 광학적, 전기적 특성을 조사하였다. 박막 증착 조건의 초기 압력은 $1.0{\times}10^{-6}$ Torr, RF 파워는 25W, 증착온도는 상온으로 고정하였으며 기판은 Corning 1737 유리 기판을 사용하였다. 공정 변수로 Ar 유량을 40 sccm, 60 sccm, 80 sccm, 100 sccm으로 변화시켰으며, $O_2$ 가스비율을 5~20%으로 변화를 주어 실험을 진행하였다. GZO 타겟은 ZnO,Ga 분말을 각각 97:3 wt.%로 소결된 타겟을 사용하였다. 유리기판 위에 증착된 모든 GZO 박막에서 (002) 면의 우선 배향성이 관찰되었고 평균 85% 이상의 투과율을 나타내었다. 산소유량이 포함되지 않고 Ar 유량이 적은 GZO 박막의 결정성은 향상되었고, 광학적 밴드갭은 증가하였다. Hall 측정 결과 산소의 유량이 포함되어 있는 박막에서는 모두 완전한 산화물에 가까운 화학양론적 조성으로 면저항이 $10^6{\Omega}/{\Box}$ 이상인 부도체 특성을 보였으며, 산소가 포함되지 않은 샘플에서는 투명전도막 특성이 확인되었다. 산소가 포함되지 않은 Ar 유량이 60 sccm일 때 전기비저항 $3.25{\times}10^{-3}{\Omega}cm$, 전하의 농도 $9.41{\times}10^{20}\;cm^{-3}$, 이동도 2.04 $cm^2V^{-1}s^{-1}$로 투명전도막으로 적합한 전기적 특성을 얻었다. GZO 박막의 경우 산소가 포함될 경우 결정성이 저하되고, 절연특성을 갖는 것을 확인할 수 있었다.

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Control Strategy for a Grid Stabilization of a Large Scale PV Generation System based on German Grid Code (독일 계통 연계 규정에 기반 된 대용량 태양광 발전 시스템의 계통 안정화를 위한 제어 전략)

  • Bae, Young-Sang;Kim, Rae-Young
    • The Transactions of the Korean Institute of Power Electronics
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    • 제19권1호
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    • pp.41-50
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    • 2014
  • The rising penetration of renewable energy resulted in the development of grid-connected large-scale power plants. Therefore, grid stabilization, which depends on the system-type or grid of each country, plays an important role and has been strengthened by different grid codes. With this background, VDE-AR-N 4105 for photovoltaic (PV) systems connected to the low-voltage grid and the German Association of Energy and Water Industries (BDEW) introduced the medium-voltage grid code for connecting power plants to the grid and they are the most stringent certifications. In this paper, an optimal control strategy scheme for three-phase grid-connected PV system is enhanced with VDE-AR-N 4105 and BDEW grid code, where both active/reactive powers are controlled. Simulation and experimental results of 100kW PV inverter are shown to verify the effectiveness of the proposed implemental control strategy.

ESTIMATION OF ALUMINUM AND ARGON ACTIVATION SOURCES IN THE HANARO COOLANT

  • Jun, Byung-Jin;Lee, Byung-Chul;Kim, Myung-Seop
    • Nuclear Engineering and Technology
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    • 제42권4호
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    • pp.434-441
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    • 2010
  • The activation products of aluminum and argon are key radionuclides for operational and environmental radiological safety during the normal operation of open-tank-in-pool type research reactors using aluminum-clad fuels. Their activities measured in the primary coolant and pool surface water of HANARO have been consistent. We estimated their sources from the measured activities and then compared these values with their production rates obtained by a core calculation. For each aluminum activation product, an equivalent aluminum thickness (EAT) in which its production rate is identical to its release rate into the coolant is determined. For the argon activation calculation, the saturated argon concentration in the water at the temperature of the pool surface is assumed. The EATs are 5680, 266 and 1.2 nm, respectively, for Na-24, Mg-27 and Al-28, which are much larger than the flight lengths of the respective recoil nuclides. These values coincide with the water solubility levels and with the half-lives. The EAT for Na-24 is similar to the average oxide layer thickness (OLT) of fuel cladding as well; hence, the majority of them in the oxide layer may be released to the coolant. However, while the average OLT clearly increases with the fuel burn-up during an operation cycle, its effect on the pool-top radiation is not distinguishable. The source of Ar-41 is in good agreement with the calculated reaction rate of Ar-40 dissolved in the coolant.