• Title/Summary/Keyword: Anodic film

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Three-Dimensional (3D) Anodic Aluminum Surfaces by Modulating Electrochemical Method

  • Jeong, Chanyoung;Choi, Chang-Hwan
    • Journal of the Korean institute of surface engineering
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    • v.50 no.6
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    • pp.427-431
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    • 2017
  • Anodic aluminum oxide (AAO) film has recently attracted much attention as a key material for the fabrication of various nanostructures. A control of anodizing voltage (U) was employed to render different anodic aluminum oxide (AAO) nanostructures with pore diameter ($D_p$) and interpore distance ($D_{int}$) in oxalic acid. In this work, we study the effect of stepwise modulation of anodizing voltages on the shape and dimension of porous structures along the vertical direction and demonstrate the fabrication of hierarchical layers of systematically controlled three-dimensional (3D) pore profile.

Thin film process of anodic aluminum oxidation for optoelectronic nano-devices (나노 광소자 응용을 위한 알루미늄 양극산화박막 공정)

  • Choi, Jae-Ho;Baek, Ha-Bong;Kim, Keun-Joo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.106-107
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    • 2007
  • We fabricated anodic aluminium oxides (AAO) on Si and sapphire substrates from the electrochemical reactions of thin AI films in an aqueous solution of oxalic acid. The thin AI films have deposited on Si and Sapphire substructure by using E-beam evaporation and thermal evaporation, respectively. The formation of AAO structures has investigated from FE-SEM measurement image and showed randomly distributed phase of nanoholes instead of the periodic lattice of photonic crystals. The AAO structure on sapphire shows the double layers of nanoholes.

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Development of Fabrication Technique of Highly Ordered Nano-sized Pore Arrays using Thin Film Aluminum (박막 알루미늄을 이용한 규칙적으로 정렬된 나노급 미세기공 어레이 제조기술 개발)

  • Lee, Jae-Hong;Kim, Chang-Kyo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.8
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    • pp.708-713
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    • 2005
  • An alumina membrane with nano-sized pore array by anodic oxidation using the thin film aluminum deposited on silicon wafer was fabricated. It Is important that the sample prepared by metal deposition method has a flat aluminum surface and a good adhesion between the silicon wafer and the thin film aluminum. The oxidation time was controlled by observation of current variation. While the oxalic acid with 0.2 M was used for low voltage anodization under 100 V, the chromic acid with 0.1 M was used for high voltage anodization over 100 V. The nano-sized pores with diameter of $60\~120$ nm was obtained by low voltage anodization of $40\~80$ V and those of $200\~300$ nm was obtained by high voltage anodization of $140\~200$ V. The pore widening process was employed for obtaining the one-channel with flat surface because the pores of the alumina membrane prepared by the fixed voltage method shows the structure of two-channel with rough surface. Finally, the sample was immersed to the phosphoric acid with 0.1 M concentration to etching the barrier layer.

Improvement of Corrosion Resistance for Copper Tube by Electrochemical Passivation (전기화학적 부동태화에 의한 동관의 내식성 개선 연구)

  • Min, Sung-Ki;Kim, Kyung-Tae;Hwang, Woon-Suk
    • Corrosion Science and Technology
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    • v.10 no.4
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    • pp.125-130
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    • 2011
  • This study was performed to improve the corrosion resistance and the stability of passive film on copper tube by potentiostatic polarization method in synthetic tap water. Formation of passive film was carried out by anodic potentiostatic polarization at various passivation potentials and passivation times in 0.1 M NaOH solution. Stability of passive film and corrosion resistance was evaluated by self-activation time, ${\tau}_0$ from passive state to active state on open-circuit state in 0.1 M NaOH solution. Addition of polyphosphate in NaOH solution prolonged the self-activation time and improved the corrosion resistance, and the addition of 5 ppm polyphosphate was most effective. It was also observed that better corrosion resistance was obtained by potentiostatic polarization at 1.0 V (vs. SCE) than at any other passivation potentials. Passivated copper tube showed perfect corrosion resistance for the immersion test in synthetic tap water showing that the anodic potentiostatic polarization treatment in 0.1 M NaOH with 5 ppm polyphosphate solution would be effective in improving the corrosion resistance and preventing the blue water problem.

Magnetic Properties of Ni Nanostructures Made by using Nanoporous Anodic Alumina (AAO를 이용한 Ni 나노구조체의 자기적 특징)

  • Lee, S.G.;Shin, S.W.;Lee, J.;Lee, J.H.;Kim, T.G.;Song, J.H.
    • Journal of the Korean Magnetics Society
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    • v.14 no.3
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    • pp.105-108
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    • 2004
  • Array of magnetic Ni nanostructures has been fabricated on Si substrate by using nanoporous alumina film as a mask during deposition. The nanostructures are truncated cone-shape and the lateral sizes are comparable to height. While the continuous film shows well-defined in-plane magnetization, the nanostructure shows perpendicular component of magnetization at remanence. The hysterectic behavior of nanostructures is dominated by the demagnetizing field instead of interaction among them.

Numerical Simulation of Interactions between Corrosion Pits on Stainless Steel under Loading Conditions

  • Wang, Haitao;Han, En-Hou
    • Corrosion Science and Technology
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    • v.16 no.2
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    • pp.64-68
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    • 2017
  • The interactions between corrosion pits on stainless steel under loading conditions are studied by using a cellular automata model coupled with finite element method at a mesoscopic scale. The cellular automata model focuses on a metal/film/electrolyte system, including anodic dissolution, passivation, diffusion of hydrogen ions and salt film hydrolysis. The Chopard block algorithm is used to improve the diffusion simulation efficiency. The finite element method is used to calculate the stress concentration on the pit surface during pit growth, and the effect of local stress and strain on anodic current is obtained by using the Gutman model, which is used as the boundary conditions of the cellular automata model. The transient current characteristics of the interactions between corrosion pits under different simulation factors including the breakdown of the passive film at the pit mouth and the diffusion of hydrogen ions are analyzed. The analysis of the pit stability product shows that the simulation results are close to the experimental conclusions.

Fabrication of the alumina membrane with nano-sized pore array using the thin film aluminum (박막 알루미늄을 이용한 나노미터 크기의 미세기공 형성)

  • Lee, Byoung-Wook;Lee, Jae-Hong;Lee, Eui-Sik;Kim, Chang-Kyu
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.120-122
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    • 2005
  • An alumina membrane with nano-sized pore array by anodic oxidation using thin film aluminum deposited on silicon wafer was fabricated. It is important that the sample prepared by metal deposition method has a flat aluminum surface and a good adhesion between the silicon wafer and the thin film aluminum. The oxidation time was controlled by observation of current variation. While the oxalic acid with 0.2M was used for low voltage anodization under 100V, the chromic acid with 0.1M was used for high voltage anodization over 100V. The nano-sized pores with diameter of 60~120nm was obtained by low voltage anodization of 40~90V and those of 200~300nm was obtained by high voltage anodization of 120~160V. Finally, the sample was immersed to the phosphoric acid with 0.1M concentration to etching the barrier layer. The sample will be applied to electronic sensors, field emission display, and template for nano-structure.

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Effects of Hydration Treatments on the Phase Transition of Anodic Aluminum Oxide Layers (알루미늄 양극산화 피막의 상전이에 미치는 수화처리의 영향)

  • Joo, E.K.;Kim, S.S.;Oh, H.J.;Cho, S.H.;Chi, C.S.
    • Korean Journal of Materials Research
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    • v.12 no.7
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    • pp.540-544
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    • 2002
  • Hydration treatments were performed on the pure aluminum substrate at $100^{\circ}C$ followed by anodizing and heat treatments on the layers. The transformation behaviors of the oxide layers according to the hydration treatment were studied using TEM, XRD, RBS etc. Above $90^{\circ}C$ the hydrous oxide film could be formed, which were turned out to be hydrous oxides(AlOOH $nH_2$O). The anodization on the hydrous oxide film was more effective for the transition of amorphous anodic oxides to the crystalline $\Upsilon-Al_2$ $O_3$ comparing with the case for anodizing on the aluminum substrate without hydration treatment And additional heat treatments were also helpful for the acceleration of the transformation of the hydrous oxide to $\Upsilon-Al_2$ $O_3$. During the heat treatment the interface between $\Upsilon-Al_2$ $O_3$and the hydrous oxide layers migrated to the outer side of hydrous layer.

The Formation of Anodic Oxide Film by Anodizing Voltage and Time of 6061 Aluminum Alloy (알루미늄 6061 합금의 양극 산화 인가 전압과 시간에 따른 표면의 산화피막층 형성 거동)

  • Park, Youngju;Jeong, Chanyoung
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.34 no.1
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    • pp.68-72
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    • 2021
  • Aluminum is a lightweight metal and has excellent properties with regard to conductivity, workability, and strength. It has been used in various industries owing to its economic benefits. To improve upon the mechanical properties and processability by adding various alloying elements to aluminum, improving the corrosion resistance and heat resistance by electrochemically forming a porous anodic film having a thickness and hardness on the surface of the aluminum alloy is crucial. In this study, the aluminum 6061 alloy was controlled by an anodization process in a 0.3M oxalic acid electrolyte at room temperature to investigate the oxide film parameters such as porosity and thickness depending on the modulating applied voltage and time. The anodizing experiment was performed by increasing the time from 1 h to 9 h at 2-h intervals at applied voltages of 50 V and 60 V.

A.c. Impedance Measurement of CP-Ti in 0.1 M NaOH Solution

  • Moon, Sungmo;Kwon, Mikyung;Kim, Jusuk
    • Journal of Electrochemical Science and Technology
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    • v.3 no.4
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    • pp.185-189
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    • 2012
  • A.c. impedances of mechanically polished CP-Ti specimens were measured at open-circuit potential (OCP) with immersion time and under applied anodic potentials between -0.2 and 1 $V_{Ag/AgCl}$ in 0.1 M NaOH solution. Capacitances of native oxide films ($C_{ox,na}$) grown naturally and capacitances of anodic oxide films ($C_{ox,an}$) formed under applied anodic potentials were obtained to examine the growth of native and anodic oxide films in 0.1 M NaOH solution and how to use $C_{ox,na}$ for the surface area measurement of Ti specimen. $1/C_{ox,na}$ and $1/C_{ox,an}$ appeared to be linearly proportional to OCP and applied potential ($E_{app}$), with proportional constants of 0.086 and 0.051 $uF^{-1}\;V^{-1}$, respectively. The $C_{ox,na}$ also appeared to be linearly proportional to geometric surface area of the mechanically polished CP-Ti fixture specimen, with proportional constants of 11.3 and $8.5{\mu}F\;cm^{-2}$ at -0.45 $V_{Ag/AgCl}$ and -0.25 $V_{Ag/AgCl}$ of OCPs, respectively, in 0.1 M NaOH solution. This linear relationship between $C_{ox,na}$ and surface area is suggested to be applicable for the measurement of real surface area of Ti specimen.