• Title/Summary/Keyword: Anode Characteristics

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Electrolytic Reduction Characteristics of Titanium Oxides in a LiCl-Li2O Molten Salt (LiCl-Li2O 용융염에서 타이타늄 산화물의 전해환원 특성)

  • Lee, Jeong;Kim, Sung-Wook;Lee, Sang-Kwon;Hur, Jin-Mok;Choi, Eun-Young
    • Journal of the Korean Electrochemical Society
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    • v.18 no.4
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    • pp.156-160
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    • 2015
  • Experiments using a metal oxide of a non-nuclear material as a fuel are very useful to develop a new electrolytic reducer for pyroprocessing. In this study, the titanium oxides (TiO and $TiO_2$) were selected and investigated as the non-nuclear fuel for the electrolytic reduction. The immersion tests of TiO and $TiO_2$ in a molten 1.0 wt.% $Li_2O$-LiCl salt revealed that they have solubility of 156 and 2100 ppm, respectively. Then, the Ti metals were successfully produced after the separate electrolytic reduction of TiO and $TiO_2$ in a molten 1.0 wt.% $Li_2O$-LiCl salt. However, Ti was detected on the platinum anode used for the electrolytic reduction of $TiO_2$ unlike TiO due to the dissolution of $TiO_2$ into the salt.

Failure Analysis of Corroded Coating Materials by Acoustic Emission (음향방출법에 의한 용사코팅 피막부식재의 파손 해석)

  • KIM GUI-SHIK;HYUN CHANG-HAE;HONG YONG-UI;SHON CHANG-HWAN
    • Journal of Ocean Engineering and Technology
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    • v.19 no.5 s.66
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    • pp.43-49
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    • 2005
  • This paper is to investigate the effect of corrosion by acoustic emission method in tensile loading and the adhesiveness between substrate and coating layer. The powders used are Zn and Amdry625, respectively. They are coated on brass alloy substrate. AE signals of Zn and Amdry625 coating layer increase drastically in strain $2\%$. However, those of Zn specimen have more than those of Amdry625 specimen. When the specimens executed the corrosion test under $3.5\%$ NaCl solution for 500, 1000 hours, the salt solution penetrated into the surface of the substrate through the pores of the coating layer. As a result, corrosion production formed on the surface of the substrate. The adhesiveness between coating layers is weakened by the polarization and corrosion itself. The AE event, count, and energy of corroded coating specimens decrease, compared to specimens without corrosion. The results are summarized as follows : 1. In the tensile tests, the time that it took to start and develop the cracks and exfoliations between the surface of the substrates and the plasma spray coatings were different according to the type of plasma sprayed material, which are Zn and Amdry625. These phenomena were obvious at the strain rate 1 to $5\%$, and few available data were found after that stage. 2. The specimens with Zn coating showed the characteristics of crack, according to the changes of the tensile strength applied on the substrates while those with Amdry625 showed exfoliation as a result of low adaptation to the tensile strength. 3. The anti-corrosion specimens showed that the adhesive properties between the substrate and the plasma spray coating were strong in the order of Zn, Amdry. It showed that Corroded specimens cracked or exfoliated easily, even with the small energy, because those had a comparatively weakened adhesive property, due to corrosion. 4. Zn specimen showed no corrosion phenomena on the surface of the substrates, because they had the function of sacrifice anode however, Amdry625 specimen showed the corrosion, because it did not have that function.

A Study on the Discharge Guide Technology by infrared Laser Applied to Discharge Processing Devices (적외선 레이저에 의한 방전 유도 기술의 방전 가공 장치에의 적용 연구)

  • 조정수;이동훈;남경훈
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.13 no.1
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    • pp.1-8
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    • 1999
  • In recent years, concern has been raised about the technique of controlling electrical breakdown by using laser in many fields. Especially, laser has attracted much attention in the Electro-Discharge Machining(EDM) because of its many rrents. 1berefore, this research has been perfonred to obtain fundarrental data for the discharge guide technology by a pulsed Nd:YAG laser which can be awJied to discharge processing machining. 1be experilnnts of laser-guided de discharge have been carried out at low air pressure ranging from 0.2 to 20 torr. The minimum laser-guided de discharge voltage $V_{G.min}$ at the given pressures P and distances d between an anode and a cathode was rreasured It is found that $V_{G.min}$ is much lower than the natural discharge voltage $V_{ND}$, and the values of VGrrin and $V_{ND}$ as a function of P.d has a similar tendency. The laser output energy $E_{out}$ decreases with input pulse duration $t_p$ increasing, and the rrore the value of $t_p$ increases, the higher that of V$V_{G.min}$ is obtained because the number of photons N decreases with $t_p$ increasing. In addition, the laser-guided de discharge range and the discharge guide characteristics as laser outpIt $E_{out}$ was investigated.igated.

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Development of an electron source using carbon nanotube field emittes for a high-brightness X-ray tube (탄소나노튜브를 이용한 고휘도 X-선원용 전자빔원 개발)

  • Kim, Seon-Kyu;Heo, Sung-Hwan;Cho, Sung-Oh
    • Journal of the Korean Vacuum Society
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    • v.14 no.4
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    • pp.252-257
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    • 2005
  • A high-brightness electron beam source for a microfocus X-ray tube has been fabricated using a carbon-nanotube (CNT) field emitter. The electron source consists of cathode that includes a CNT field emitter, a beam-extracting grid, and an anode that accelerates that electron beam. The microfocus X-ray tube requires an electron beam with the diameter of less than 5 $\mu$m and beam current of higher than 30 $\mu$A at the position of the X-ray target. To satisfy the requirements, the geometries of the field emitter tips and the electrodes of the gun was optimized by calculating the electron trajectories and beam spatial profile with EGUN code. The CNT tips were fabricated with successive steps: a tungsten wire with the diameter of 200 $\mu$m was chemically etched and was subsequently coated with CNTs by chemical vapor deposition. The experiments of electron emission at the fabricated CNT tips were performed. The design characteristics and basic experimental results of the electron source are reported.

Investigation on Resistance to Hydrogen Embrittlement of High Nitrogen Austenitic Steels for Hydrogen Pipe by the Disc Pressure Test and the Tensile Test on Hydrogen Pre-charged Specimens (디스크 시험 및 수소처리 인장시험에 의한 수소배관용 고질소 스테인리스강의 내수소취성 평가 연구)

  • Dong-won, Shin;Min-kyung, Lee;Jeong Hwan, Kim;Ho-seong, Seo;Jae-hun, Lee
    • Journal of the Korean Institute of Gas
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    • v.26 no.6
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    • pp.16-23
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    • 2022
  • In this study, characteristics of effect on hydrogen gas was investigated to hydrogen embrittlement by disk and tensile tests. The developed and commercial alloy was fabricated to a plate material made from an alloy ingot. The prepared materials were processed in the form of a disk to measure rupture pressure by hydrogen and helium gas at a rate of 0.1 to 1,000 bar/min. In the hydrogen pre-charged tensile test, a specimen was hydrogenated using an anode charging method, and the yield strength, ultimate tensile strength, elongation, and reduction in area rate were carried by a strain rate test. Also, the microstructure was observed to the fracture surface of the tensile test specimen. As a result, the developed materials satisfied endurable hydrogen embrittlement, and the fractured surface showed a brittleness fracture surface with a depth of several ㎛, but dimple due to ductile fracture could be observed.

Investigation of the Signal Characteristics of a Small Gamma Camera System Using NaI(Tl)-Position Sensitive Photomultiplier Tube (NaI(Tl) 섬광결정과 위치민감형 광전자증배관을 이용한 소형 감마카메라의 신호 특성 고찰)

  • Choi, Yong;Kim, Jong-Ho;Kim, Joon-Young;Im, Ki-Chun;Kim, Sang-Eun;Choe, Yearn-Seong;Lee, Kyung-Han;Joo, Koan-Sik;Kim, Byung-Tae
    • The Korean Journal of Nuclear Medicine
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    • v.34 no.1
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    • pp.82-93
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    • 2000
  • Purpose: We characterized the signals obtained from the components of a small gamma camera using Nal(Tl)-position sensitive photomultiplier tube (PSPMT) and optimized the parameters employed in the modules of the system. Materials and Methods: The small gamma camera system consists of a Nal(Tl) crystal ($60{\times}60{\times}6mm^3$) coupled with a Hamamatsu R3941 PSPMT, a resister chain circuit, preamplifiers, nuclear instrument modules (NIMs), an analog to digital converter and a personal computer for control and display. The PSPMT was read out using a resistive charge division circuit which multiplexes the 34 cross wire anode channels into 4 signals (X+, X-, Y+, Y -). Those signals were individually amplified by four preamplifiers and then, shaped and amplified by amplifiers. The signals were discriminated and digitized via triggering signal and used to localize the position of an event by applying the Anger logic. The gamma camera control and image display was performed by a program implemented using a graphic software. Results: The characteristics of signal and the parameters employed in each module of the system were presented. The intrinsic sensitivity of the system was approximately $8{\times}10^3$ counts/sec/${\mu}Ci$. The intrinsic energy resolution of the system was 18% FWHM at 140 keV. The spatial resolution obtained using a line-slit mask and $^{99m}Tc$ point source were, respectively, 2.2 and 2.3 mm FWHM in X and Y directions. Breast phantom containing $2{\sim}7mm$ diameter spheres was successfully imaged with a parallel hole collimator. The image displayed accurate size and activity distribution over the imaging field of view Conclusion: We proposed a simple method for development of a small gamma camera and presented the characteristics of the signals from the system and the optimized parameters used in the modules of the small gamma camera.

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New Approaches for Overcoming Current Issues of Plasma Sputtering Process During Organic-electronics Device Fabrication: Plasma Damage Free and Room Temperature Process for High Quality Metal Oxide Thin Film

  • Hong, Mun-Pyo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.100-101
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    • 2012
  • The plasma damage free and room temperature processedthin film deposition technology is essential for realization of various next generation organic microelectronic devices such as flexible AMOLED display, flexible OLED lighting, and organic photovoltaic cells because characteristics of fragile organic materials in the plasma process and low glass transition temperatures (Tg) of polymer substrate. In case of directly deposition of metal oxide thin films (including transparent conductive oxide (TCO) and amorphous oxide semiconductor (AOS)) on the organic layers, plasma damages against to the organic materials is fatal. This damage is believed to be originated mainly from high energy energetic particles during the sputtering process such as negative oxygen ions, reflected neutrals by reflection of plasma background gas at the target surface, sputtered atoms, bulk plasma ions, and secondary electrons. To solve this problem, we developed the NBAS (Neutral Beam Assisted Sputtering) process as a plasma damage free and room temperature processed sputtering technology. As a result, electro-optical properties of NBAS processed ITO thin film showed resistivity of $4.0{\times}10^{-4}{\Omega}{\cdot}m$ and high transmittance (>90% at 550 nm) with nano- crystalline structure at room temperature process. Furthermore, in the experiment result of directly deposition of TCO top anode on the inverted structure OLED cell, it is verified that NBAS TCO deposition process does not damages to the underlying organic layers. In case of deposition of transparent conductive oxide (TCO) thin film on the plastic polymer substrate, the room temperature processed sputtering coating of high quality TCO thin film is required. During the sputtering process with higher density plasma, the energetic particles contribute self supplying of activation & crystallization energy without any additional heating and post-annealing and forminga high quality TCO thin film. However, negative oxygen ions which generated from sputteringtarget surface by electron attachment are accelerated to high energy by induced cathode self-bias. Thus the high energy negative oxygen ions can lead to critical physical bombardment damages to forming oxide thin film and this effect does not recover in room temperature process without post thermal annealing. To salve the inherent limitation of plasma sputtering, we have been developed the Magnetic Field Shielded Sputtering (MFSS) process as the high quality oxide thin film deposition process at room temperature. The MFSS process is effectively eliminate or suppress the negative oxygen ions bombardment damage by the plasma limiter which composed permanent magnet array. As a result, electro-optical properties of MFSS processed ITO thin film (resistivity $3.9{\times}10^{-4}{\Omega}{\cdot}cm$, transmittance 95% at 550 nm) have approachedthose of a high temperature DC magnetron sputtering (DMS) ITO thin film were. Also, AOS (a-IGZO) TFTs fabricated by MFSS process without higher temperature post annealing showed very comparable electrical performance with those by DMS process with $400^{\circ}C$ post annealing. They are important to note that the bombardment of a negative oxygen ion which is accelerated by dc self-bias during rf sputtering could degrade the electrical performance of ITO electrodes and a-IGZO TFTs. Finally, we found that reduction of damage from the high energy negative oxygen ions bombardment drives improvement of crystalline structure in the ITO thin film and suppression of the sub-gab states in a-IGZO semiconductor thin film. For realization of organic flexible electronic devices based on plastic substrates, gas barrier coatings are required to prevent the permeation of water and oxygen because organic materials are highly susceptible to water and oxygen. In particular, high efficiency flexible AMOLEDs needs an extremely low water vapor transition rate (WVTR) of $1{\times}10^{-6}gm^{-2}day^{-1}$. The key factor in high quality inorganic gas barrier formation for achieving the very low WVTR required (under ${\sim}10^{-6}gm^{-2}day^{-1}$) is the suppression of nano-sized defect sites and gas diffusion pathways among the grain boundaries. For formation of high quality single inorganic gas barrier layer, we developed high density nano-structured Al2O3 single gas barrier layer usinga NBAS process. The NBAS process can continuously change crystalline structures from an amorphous phase to a nano- crystalline phase with various grain sizes in a single inorganic thin film. As a result, the water vapor transmission rates (WVTR) of the NBAS processed $Al_2O_3$ gas barrier film have improved order of magnitude compared with that of conventional $Al_2O_3$ layers made by the RF magnetron sputteringprocess under the same sputtering conditions; the WVTR of the NBAS processed $Al_2O_3$ gas barrier film was about $5{\times}10^{-6}g/m^2/day$ by just single layer.

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