• Korean Journal of Materials Research
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• v.2 no.6
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• pp.417-427
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• 1992

Silicon ion implantation was performed to LPCVD amorphous Si films and the low temperature annealing process followed with various conditions to find the optimal physical properties by studying recrystallization behavior. The uniformity of the recrystallized films was inspected by optical microscopy and for this purpose, new KOH: (IPA) : $H_2$O: $K_2$C${r_2}{O_7}$, etchant was developed. XRD and TEM results showed that the crystallites were grown as a form of dendrite with (111) preferred orientation, and the grain size was increased with dose concentration. The maximum grain size was obtained when the 3${\times}{10^{15}}$c$m^2$ implanted amorphous Si film was recrystallized at 55 $0^{\circ}C$for more than 40 hrs and at this condition the grain size was 3.2${\mu}$m.

• 한국신재생에너지학회:학술대회논문집
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• 2010.06a
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• pp.60.1-60.1
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• 2010

공동주택에서 태양광발전(PV)을 통한 세대 전기에너지 이용은 모듈 설치 면적의 제약으로 인해 전 세대를 대상으로 활용하기에 현실적으로 어려움이 있다. 특히 남향이나 남동, 남서향으로 위치한 거실 창호를 활용하는 경우에도 결정질 실리콘(crystalline silicon) 태양전지 셀로 인한 실내 음영문제 등으로 건물통합형 태양광발전(BIPV) 시스템의 가시성을 확보하는데 한계가 있다. 따라서 이런 문제점을 극복하고자 투광형 비정질실리콘(amorphous silicon) 태양전지를 이용한 발코니창호/커튼월 BIPV 시스템을 구축하고, 테스트베드를 통한 적용성 평가 검증을 수행하였다. 테스트베드는 KCC 중앙연구소 1층 외부 측창에 결정질 BIPV 모듈(A2PEAK 사(社), 최대 출력 210 Wp, W 2,000 mm ${\times}$ H 1,066 mm)과 10% 및 30% 투광형 비정질 BIPV 모듈(Sharp 사(社) See Through type, 최대 출력 135 Wp/123 Wp, W 1,930 mm ${\times}$ H 1,180 mm)을 각각 설치(남서 $30^{\circ}$, 수직 $90^{\circ}$)하여, 2009년 5월에서 8월 사이 4개월에 걸친 모니터링을 통해 실제 발전량 데이터를 확보, 시스템에 대한 분석을 진행하였다. 분석 결과, 설치용량당 일평균 발전량은 결정질형이 1.46 kWh/kWp, 10% 투광형은 1.10 kWh/kWp, 30% 투광형은 0.73 kWh/kWp을 나타내었다. 10% 투광형과 30% 투광형의 모듈 성능 차이는 크지 않으나 발전량에 있어서는 큰 차이를 보였고, 10% 투광형의 설치용량당 일평균 발전량은 경정질형의 75.2% 수준으로 투광형 비정질실리콘 BIPV 시스템의 창호 적용 가능성을 확인하였다. 특히 세대 거실 창호를 통한 가시성 확보는 기존 결정질 BIPV 창호의 단점을 개선하였다. 건자재 일체화로 구축된 가시성확보 BIPV시스템 창호는 단위 세대별 적용이 쉽고, 공동주택에서 PV 시스템의 설치면적을 극대화시키므로 향후 Zero Energy 공동주택 구축에도 활용성이 클 것으로 기대된다.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.279.1-279.1
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• 2016

박막 트랜지스터 (thin film transistor, TFT)는 고밀도, 대면적화로 높은 전자의 이동도가 요구되면서, 비정질 실리콘 (a-Si)에서 다결정 실리콘 (poly-Si) TFT 로 연구되었다. 이에 따라 비정질 실리콘에서 결정질 실리콘으로의 상변화에 대한 결정화 연구가 활발히 진행되었다. 또한, 박막 태양전지 분야에서도 유리기판 위에 비정질 층을 증착한 후에 열처리를 통해 상변화하는 고상 결정화 (solid-phase crystallization, SPC) 기술을 적용하여, CSG (thin-film crystalline silicon on glass) 태양전지를 보고하였다. 이러한 비정질 실리콘 층의 결정화 기술을 결정질 실리콘 태양전지 에미터 형성 공정에 적용하고자 한다. 이 때, 플라즈마화학증착 (Plasma-enhanced chemical vapor deposition, PECVD) 장비로 증착된 비정질 실리콘 층의 열처리를 통한 결정화 정도가 중요한 요소이다. 따라서, 비정질 실리콘 층의 결정화에 영향을 주는 인자에 대해 연구하였다. 비정질 실리콘 증착 조건(H2 가스 비율, 도펀트 유무), 실리콘 기판의 결정방향, 열처리 온도에 따른 결정화 정도를 엘립소미터(elipsometer), 투과전자현미경 (transmission electron microscope, TEM), 적외선 분광기 (Fourier Transform Infrared, FT-IR) 측정을 통하여 비교 하였다. 이를 기반으로 결정화 온도에 따른 비정질 실리콘의 결정화를 위한 활성화 에너지를 계산하였다. 비정질 실리콘 증착 조건 보다 기판의 결정방향이 결정화 정도에 크게 영향을 미치는 것으로 확인하였다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.30 no.3
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• pp.192-197
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• 2017

Hydrogenated Amorphous Silicon (a-Si:H) is used as an emitter layer in HIT (heterojunction with Intrinsic Thin layer) solar cells. Its low band gap and low optical properties (low transmittance and high absorption) cause parasitic absorption on the front side of a solar cell that significantly reduces the solar cell blue response. To overcome this, research on CSC (carrier Selective Contacts) is being actively carried out to reduce carrier recombination and improve carrier transportation as a means to approach the theoretical efficiency of silicon solar cells. Among CSC materials, molybdenum oxide ($MoO_x$) is most commonly used for the hole transport layer (HTL) of a solar cell due to its high work function and wide band gap. This paper analyzes the electrical and optical properties of $MoO_x$ thin films for use in the HTL of HIT solar cells. The optical properties of $MoO_x$ show better performance than a-Si:H and ${\mu}c-SiO_x:H$.

• Advances in nano research
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• v.5 no.3
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• pp.261-279
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• 2017

Spectroscopic investigation of Si quantum dots (Si-QDs) embedded in silicon nitride was performed over a broad stoichiometry range to optimize light emission. Plasma-enhanced chemical vapor deposition was used to grow the $SiN_x$ films on Si (001) substrates. The film composition was controlled via the flow ratio of silane ($SiH_4$) and ammonia ($NH_3$) in the range of R = 0.45-1.0 allowed to vary the Si excess in the range of 21-62 at.%. The films were submitted to annealing at $1100^{\circ}C$ for 30 min in nitrogen to form the Si-QDs. The properties of as-deposited and annealed films were investigated using spectroscopic ellipsometry, Fourier transform infrared spectroscopy, Raman scattering and photoluminescence (PL) methods. Si-QDs were detected in $SiN_x$ films demonstrating the increase of sizes with Si excess. The residual amorphous Si clusters were found to be present in the films grown with Si excess higher than 50 at.%. Multi-component PL spectra at 300 K in the range of 1.5-3.5 eV were detected and nonmonotonous varying total PL peak versus Si excess was revealed. To identify the different PL components, the temperature dependence of PL spectra was investigated in the range of 20-300 K. The analysis allowed concluding that the "blue-orange" emission is due to the radiative defects in a $SiN_x$ matrix, whereas the "red" and "infrared" PL bands are caused by the exciton recombination in crystalline Si-QDs and amorphous Si clusters. The nature of radiative and no radiative defects in $SiN_x$ films is discussed. The ways to control the dominant PL emission mechanisms are proposed.

• Current Photovoltaic Research
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• v.2 no.3
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• pp.103-109
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• 2014

Highly efficient hydrogenated nanocrystalline silicon (nc-Si:H) thin-film solar cells were prepared on flexible stainless steel substrates using plasma-enhanced chemical vapor deposition. To enhance the performance of solar cells, material properties of back reflectors, n-doped seed layers and wide bandgap nc-SiC:H window layers were optimized. The light scattering efficiency of Ag back reflectors was improved by increasing the surface roughness of the films deposited at elevated substrate temperatures. Using the n-doped seed layers with high crystallinity, the initial crystal growth of intrinsic nc-Si:H absorber layers was improved, resulting in the elimination of the defect-dense amorphous regions at the n/i interfaces. The nc-SiC:H window layers with high bandgap over 2.2 eV were deposited under high hydrogen dilution conditions. The vertical current flow of the films was enhanced by the formation of Si nanocrystallites in the amorphous SiC:H matrix. Under optimized conditions, a high conversion efficiency of 9.13% ($V_{oc}=0.52$, $J_{sc}=25.45mA/cm^2$, FF = 0.69) was achieved for the flexible nc-Si:H thin-film solar cells.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.180-180
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• 2010

Thin film transistors (TFTs) based on oxide semiconductors have emerged as a promising technology, particularly for active-matrix TFT-based backplanes. Currently, an amorphous oxide semiconductor, such as InGaZnO, has been adopted as the channel layer due to its higher electron mobility. However, accurate and repeatable control of this complex material in mass production is not easy. Therefore, simpler polycrystalline materials, such as ZnO and $SnO_2$, remain possible candidates as the channel layer. Inparticular, ZnO-based TFTs have attracted considerable attention, because of their superior properties that include wide bandgap (3.37eV), transparency, and high field effect mobility when compared with conventional amorphous silicon and polycrystalline silicon TFTs. There are some technical challenges to overcome to achieve manufacturability of ZnO-based TFTs. One of the problems, the stability of ZnO-based TFTs, is as yet unsolved since ZnO-based TFTs usually contain defects in the ZnO channel layer and deep level defects in the channel/dielectric interface that cause problems in device operation. The quality of the interface between the channel and dielectric plays a crucial role in transistor performance, and several insulators have been reported that reduce the number of defects in the channel and the interfacial charge trap defects. Additionally, ZnO TFTs using a high quality interface fabricated by a two step atomic layer deposition (ALD) process showed improvement in device performance In this study, we report the fabrication of high performance ZnO TFTs with a $Si_3N_4$ gate insulator treated using plasma. The interface treatment using electron cyclotron resonance (ECR) $O_2$ plasma improves the interface quality by lowering the interface trap density. This process can be easily adapted for industrial applications because the device structure and fabrication process in this paper are compatible with those of a-Si TFTs.

• Korean Journal of Metals and Materials
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• v.49 no.4
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• pp.313-320
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• 2011

100 nm-thick hydrogenated amorphous silicon $({\alpha}-Si:H)$ films were deposited on a glass and glass/30 nm Ni substrates by inductively-coupled plasma chemical vapor deposition (ICP-CVD) at temperatures ranging from 100 to $550^{\circ}C$. The sheet resistance, microstructure, phase transformation and surface roughness of the films were characterized using a four-point probe, AFM (atomic force microscope), TEM (transmission electron microscope), AES (Auger electron spectroscopy), HR-XRD(high resolution X-ray diffraction), and micro-Raman spectroscopy. A nano-thick NiSi phase was formed at substrate temperatures >$400^{\circ}C$. AFM confirmed that the surface roughness did not change as the substrate temperature increased, but it increased abruptly to 6.6 nm above $400^{\circ}C$ on the glass/30 nm Ni substrates. HR-XRD and micro-Raman spectroscopy showed that all the Si samples were amorphous on the glass substrates, whereas crystalline silicon appeared at $550^{\circ}C$ on the glass/30 nm Ni substrates. These results show that crystalline NiSi and Si can be prepared simultaneously on Ni-inserted substrates.

• Journal of the Korean Electrochemical Society
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• v.22 no.3
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• pp.112-121
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• 2019

In this study, silicon / carbon nanotube / carbon composite particles with high capacity were fabricated by using micro-sized silicon particles and carbon nanotubes as an anode material for lithium ion batteries. The silicon / carbon nanotube / carbon composite particles were prepared by spray drying method to prepare spherical composite particles. The composite particles have the network structure of the carbon nanotubes around the silicon particles, in which the silicon particles and the carbon nanotubes are bonded by amorphous carbon. It appears that the volume expansion of silicon is effectively buffered and the electrical contact is maintained in the network structure of the composite particles during charge-discharge cycles.

• Current Photovoltaic Research
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• v.4 no.1
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• pp.1-7
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• 2016

Among the various types of solar cells, silicon based two terminal tandem solar cell is one of the most popular one. It is designed to split the absorption of incident AM1.5 solar radiation among two of its component cells, thereby widening the wavelength range of external quantum efficiency (EQE) spectra of the device, in comparison to that of a single junction solar cell. In order to improve the EQE spectra further and raise short circuit current density ($J_{sc}$) an optimization of the tradeoff between the top and bottom cell is needed. In an optimized cell structure, the $J_{sc}$ and hence efficiency of the device can further be enhanced with the help of light trapping scheme. This can be achieved by texturing front and back surface as well as a back reflector of the device. In this brief review we highlight the development of light trapping in the silicon based tandem solar cell.