• 제목/요약/키워드: Aluminum zinc oxide

검색결과 96건 처리시간 0.028초

DC magnetron sputtering을 이용하여 증착한 ZnO 기반의 박막 트랜지스터의 특성 및 stability 향상을 위한 후열처리

  • 김경택;문연건;김웅선;박종완
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.188-188
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    • 2010
  • 최근까지는 주로 비정질 실리콘이 디스플레이의 채널층으로 상용화 되어왔다. 비정질 실리콘 기반의 박막 트랜지스터는 제작의 경제성 및 균일성을 가지고 있어서 널리 상용화되고 있다. 하지만 비정질 실리콘의 구조적인 문제인 낮은 전자 이동도(< 1 cm2/Vs)로 인하여 디스플레이의 대면적화에 부적합하며, 광학적으로 불투명한 특성을 갖기 때문에 차세대 디스플레이의 응용에 불리한 점이 있다. 이런 문제점의 대안으로 현재 국내외 여러 연구 그룹에서 산화물 기반의 반도체를 박막 트랜지스터의 채널층으로 사용하려는 연구가 진행중이다. 산화물 기반의 반도체는 밴드갭이 넓어서 광학적으로 투명하고, 상온에서 증착이 가능하며, 비정질 실리콘에 비해 월등히 우수한 이동도를 가짐으로 디스플레이의 대면적화에 유리하다. 특히 Zinc Oxide, Tin Oxide등의 산화물이 연구되고 있으며, indium이나 aluminum등을 첨가하여 전기적인 특성을 향상시키려는 노력을 보이고 있다. 본 연구에서는 Zinc Oxide 기반의 박막 트랜지스터를 DC magnetron sputtering를 이용하여 상온에서 제작한 후 다양한 조건에서의 후열처리를 통하여 소자의 특성의 최적화를 이루는 것을 시도하였다. 그리고 ITO를 전극으로 사용하여 bottom gate 구조의 박막 트랜지스터를 만들고 air 분위기에서 온도별, 시간별 열처리를 진행하였다. 또한 gate insulator의 처리를 통하여 thin film의 interface 개선을 통하여 소자의 성능 향상을 시도 하였다. semiconductor analyzer로 소자의 출력 특성 및 전이 특성을 평가하였다. 그 결과 기존의 a-Si 기반의 박막 트랜지스터보다 우수한 이동도의 특성을 갖는 ZnO 박막 트랜지스터를 얻었다. 그리고 이를 바탕으로 ZnO를 이용하여 대면적 적합한 디스플레이를 제작할 수 있다는 가능성을 보인다. 그리고 Temperature, Bias Temperature stability, 경시변화 등의 다양한 조건에서의 안정성을 평가하여 안정성이 향상을 확보하여 비정질 실리콘을 대체할 유력한 후보중위 하나가 될 것이라고 생각된다.

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대향타겟 스퍼터링법으로 증착한 AZO 투명전도성 필름 (Medium frequency current sputtered face target aluminum zinc oxide transparent conductive film)

  • 장혜영;최인규;김상호
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2015년도 추계학술대회 논문집
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    • pp.294-294
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    • 2015
  • 대향타겟식 스퍼터링법을 이용해 유연한 기판에 증착시켜 고주파 마그네트론 스퍼터링보다 덜 손상이 입히도록 증착 시켰으며, 플라즈마 주파수를 다양하게 하여 밴딩테스트 후 나빠지는 전기적, 광학적 특성을 개선하고, 그 원인을 분석하였다.

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IN VITRO STUDY OF THE TENSILE BOND STRENGTH OF CEMENT-RETAINED SINGLE IMPLANT PROSTHESIS BY THE VARIOUS PROVISIONAL LUTING CEMENTS AND THE SURFACE TREATMENT OF ABUTMENTS

  • Lee, Hwa-Yeon;Lee, Ho-Sang
    • 대한치과보철학회지
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    • 제40권3호
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    • pp.296-305
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    • 2002
  • The main disadvantage of cement-retained implant restorations is their difficulty in retrievability. Advocates of cemented implant restorations frequently state that retrievability of the restoration can be maintained if a provisional cement is used. The purpose of this study was to find the optimal properties of provisional luting cements and the surface treatment of abutments in single implant abutment system. 30 prefabricated implant abutments, height 8mm, diameter 6mm, 3-degree taper per side, with light chamfer margins were obtained. Three commercially available provisional luting agents which were all zinc oxide eugenol type ; Cavitec, TempBond and TempBond NE were evaluated. No cement served as the control. TempBond along with vaseline, a kind of petrolatum (2:1 ratio) was also evaluated. Ten out of thirty abutments were randomly selected and abutment surfaces were sandblasted with $50{\mu}m$ aluminum oxide. Another ten abutments were sandblasted with $250{\mu}m$ aluminum oxide. A vertical groove, 1 mm deep and 5mm long was cut in each twenty abutments. Ten of them were sandblasted with $50{\mu}m$ aluminum oxide. The full coverage casting crowns were cemented to the abutments with the designated provisional luting agent. Specimens were stored in distilled water at $37^{\circ}C$ for 24 hours. Each specimen was attached to a universal testing machine. A crosshead speed of 0.5mm/min was used to apply a tensile force to each specimen. Within the limitations of this in vitro study, the following conclusions were drawn: 1. Tensile bond strength of provisional luting cements in no surface treatment decreased with the sequence of TempBond NE, TempBond, Cavitec, TempBond with vaseline, no cement. 2. Tensile bond strength more increased by surface treatment. Sandblasting with $250{\mu}m$ aluminum oxide exhibited the highest tensile bond strength in the abutment cemented with TempBond NE and sandblasting with $50{\mu}m$ aluminum oxide exhibited the highest tensile bond strength in cemented with TempBond. 3. In the aspect of a groove formation, tensile bond strength significantly increased in TempBond with vaseline only and the others had no significant effect on tensile bond strength.

기판바이어스와 수소열처리에 의한 AZO 투명전도막의 전기적 특성 (Electrical properties of AZO transparent conductive oxide with substrate bias and $H_2$ annealing)

  • 정윤환;안정근;최대섭;박춘배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.331-331
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    • 2008
  • Transparent conductive oxide (TCO) are necessary as front electrode or anti-reflecting coating for increasing efficiency of LED and Photodiode. In this paper, aluminum-doped Zinc oxide films(AZO) were prepared by RF magnetron sputtering on Si substrate at room temperature with application of substrate bias from -60 to 60 V. Then annealed at temperature of 200, 300 and $400^{\circ}C$ for 1hr in $H_2$ ambient. Structural and electrical property of AZO thin films were investigated.

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NiO/AZO anode를 적용한 OLED의 정공주입 향상에 관한 연구 (A study on the enhancement of hole injection in OLED using NiO/AZO Anode)

  • 진은미;송민종;김진사;박춘배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.444-445
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    • 2007
  • Aluminum-doped zinc oxide (AZO) films are attractive materials as transparent conductive electrode because they are inexpensive, nontoxic and abundant element compared with indium tin oxide (ITO). AZO films have been deposited on glass (coming 1737) substrates by RF magnetron sputtering system. An ultrathin layer of nickel oxide (NiO) was deposited on the AZO anode to enhance the hole injections in organic light-emitting diodes (OLED). The current density-voltage and luminescence-voltage properties of devices were studied and compared with ITO device.

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Influence of surface roughness of ZnO layer on the growth of polycrystalline Si layer via aluminum-induced layer exchange process

  • Choi, Sung-Kuk;Chang, Won-Beom;Jung, Soo-Hoon;Hara, Kosuke;Watanabe, Haruna;Usami, Noritaka;Chang, Ji-Ho
    • Journal of Advanced Marine Engineering and Technology
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    • 제40권8호
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    • pp.692-697
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    • 2016
  • This study investigated the effect of surface roughness of zinc oxide (ZnO) layer on the growth of polycrystalline Si layer via an Al-induced layer exchange process. It was found that the growth rate, grain size, crystallization fraction, and preferential orientation of the polycrystalline Si layer were strongly influenced by the surface roughness of the underlying ZnO layer. As the roughness of the ZnO surface increased, a higher growth rate (~40 min) and preferential Si (100) orientation were obtained because of the spatial concentration fluctuations in the Al-Si alloy, induced by the surface roughness of the underlying ZnO layer.

Bias를 인가한 DC magnetron sputtering 법으로 증착된 ZnO:Al 박막의 구조적 특성과 RTP의 annealing에 따른 영향 (Effects of rapid thermal annealing and bias sputtering on the structure and properties of ZnO:Al films deposited by DC magnetron sputtering)

  • 박경석;이규석;이성욱;박민우;곽동주;임동건
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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    • pp.500-501
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    • 2005
  • Aluminum doped zinc oxide films (ZnO:Al) were deposited on glass substrate by DC magnetron sputtering from a ZnO target mixed with 2 wt% $Al_2O_3$. The effects of substrate bias on the electrical properties and film structure were studied. Films deposited with positive bias have been annealed at $600^{\circ}C$ using rapid thermal anneal (RTA) process. The effects of RTA on the evolution of film microstructure are to be also studied using X-ray diffraction, transmission electron microscopy, and atomic force microscopy. Positive bias sputtering may induce lattice defects caused by electron bombardments during deposition. The as-deposited film microstructure evolves from the film with high defect density to more stable film condition. The electrical properties of the films after RTA process were also studied and the results were correlated with the evolution of film microstructures.

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수산물 가공 폐슬러지를 이용한 인산염인 제거 (Removal of Phosphate by Using Wasted Sludge of Seafood Processing Factory)

  • 최봉종;이승목;김근한
    • 한국환경보건학회지
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    • 제25권3호
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    • pp.23-28
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    • 1999
  • Phosphate removal through adsorbent, such as activated alumina, powdered aluminum oxide, flyash, blasted furnace slag and other materials, is commonly and widely practiced. The purpose of this study was to improve the removal efficiency of phosphorus in waste sludge earned at seafood processing factories. To investigate the utility and the feasibility of this sludge disposal process, experiment was carried out with a batch process. As a result, phosphate removal appears to increase with increasing adsorbent does, but shows no changes at an adsorbent does over 5g/l. With increasing ratios of initial phosphate concentration to adsorbent does, the amount of removed phosphate is increased while phosphate removal(%) is decreased. Wasted sludge, treated with zinc chloride chemically, represented a better efficiency than the untreated activated sludge and zinc chloride itself, when they reacted with phosphate solution.

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Sol-gel dip coating에 의한 ZnO 투명전도막의 특성고찰 (Properties of Zinc oxide films prepared by sol-gel dip coating)

  • 김범석;구상모;김창열
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2003년도 춘계학술발표강연 및 논문개요집
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    • pp.191-191
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    • 2003
  • 가시광선영역에서 높은 광학적 투명도를 갖는 n-type 반도체인 ZnO 박막은 넓은 범위에서 응용되고 있다. 현재 ZnO 박막의 특성 향상을 위하여 여러 원소(Al, Ga)의 도핑을 시도하고 있다. 특히 Al-doped ZnO 박막은 sol-gel dip coating에 의해서도 높은 전기전도도와 투과율로 활발히 연구되고 있다 본 논문에서는 여러 도핑농도를 갖는 Al-doped ZnO 박막이 sol-gel dip coating법에 의해 준비되었다. Al-doped ZnO 박막은 zinc acetate [Zn($CH_3$COO$_2$)ㆍ2$H_2O$] powder 와 여러 도핑농도를 갖는 aluminum nitrate (Al(NO$_3$)$_3$ㆍ9$H_2O$) powder를 알코올에 용해하여 $H_2O$, Ethylene glycol, Ethylene diamine 등을 첨가하여 제조하였다 XRD와 SEM (Scanning electron microscope)이 막의 상형성 분석을 위해 이용되었으며, 가시광선 영역 투과율(UV/VIS spectrophotometer)과 표면전기저항(four point probe)이 주요 특성으로 분석되었다.

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Physical Properties of Indium Reduced Materials for Transparent Conductive Electrodes

  • Kwak, Seung-Hoon;Kwak, Min-Gi;Hong, Sung-Jei;Ju, Byeong-Kwon;Han, Jeong In
    • Current Photovoltaic Research
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    • 제2권1호
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    • pp.14-17
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    • 2014
  • In this paper, indium reduced materials for transparent conductive electrodes (TCE) were fabricated and their physical properties were evaluated. Two of materials, indium-zinc-tin oxide (IZTO) and aluminum (Al) were selected as TCE materials. In case of IZTO nanoparticles, composition ratios of In, Zn and Sn is 8:1:1 were synthesized. Size of the synthesized IZTO nanoparticles were less than 10 nm, and specific surface areas were about $90m^2/g$ indicating particle sizes are very fine. Also, the IZTO nanoparticles were well crystallized with (222) preferred orientation despite it was synthesized at the lowered temperature of $300^{\circ}C$. Composition ratios of In, Zn and Sn were very uniform in accordance with those as designed. Meanwhile, Al was deposited onto glass by sputtering in a vacuum chamber for mesh architecture. The Al was well deposited onto the glass, and no pore was observed from the Al surface. The sheet resistance of Al on glass was about $0.3{\Omega}/{\square}$ with small deviation of $0.025{\Omega}/{\square}$, and adhesion was good on the glass substrate since no pelt-off part of Al was observed by tape test. If the Al mesh is combined with ink coated layer which is consistent of IZTO nanoparticles, it is expected that the good and reliable metal mesh architecture for TCE will be formed.