• Journal of the Speleological Society of Korea
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• no.61
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• pp.5-16
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• 2000

Recently many environmental researcher are concerned about the ecological environment and the issue of environmental pollution in cave. In this paper we discuss about air pollution, water pollution, state of water quality, ecological environment and situation of environmental public damage in cave The concerning of air pollution in cave is mainly to the type of secondary contamination, which much is developed in various fields recently. The natural water in the most of cave is no problems but ground water has slitting with natural water during much raining period. The state of water quality is gradually contaminated with artificial environmental pollution, that is, the contents of kinds of Aluminum, Nickel, Copper, Zinc and Calcium are higher than before. On the other hand it is very important things to keep the control of constant temperature, darkness and humidity in cave. The contamination by lamp flora and even black colored contamination are appeared nowadays. The ecological environment in cave destructed by growing of mi coorganism. In fact the internal of cave is shielded with the state of climate of cave external but the environment of internal cave is contaminated, because blowing from external climate state. In addition to environmental pollution caused by carbon dioxide and body temperature of tourists. By the way eco-examination of cave is black color public damage, green color one and white color one has been discovered, so we need to have the situation of demand of environmental reservation alternatives.

• Proceedings of the Korea Association of Crystal Growth Conference
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• 1999.06a
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• pp.371-387
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• 1999

La2-xSrxCuO4 single-crystalline films were prepared on bulk single crystals of Zn-doped La2CuO4 as the substrates by LPE technique using tow deferent methods. When prepared using an alumina crucible in normal electrical furnace, the La2-xSrxCuO4 films were contaminated with less than 3 at% aluminum from the alumina crucibles. Aluminum contamination either reduced or completely destroyed the superconductivity of the La2-xSrxCuO4 films. For LPE growthby modified TSFZ method using an infrared heating furnace without crucibles, the La2-xSrxCuO4 films of x=0.11 showed superconducting with Tconset 36 K, which is 10 K higher than that in the La2-xSrxCuO4 bulk single crystals.

• Journal of Hydrogen and New Energy
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• v.20 no.1
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• pp.1-8
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• 2009

Hydrogen production by the reaction of aluminum alloys and NaOH solution was studied for an automotive proton exchange membrane fuel cell(PEMFC) application. In our experiment conditions($30{\sim}75^{\circ}C$, NaOH $0.5{\sim}5M$), passivation of aluminum was not occurred. Higher rate of hydrogen production was observed at the reaction with Al alloys that contain impurities. With an increase in reaction temperature, hydrogen production rate by an increase in NaOH concentration increased much. When hydrogen was fed into the anode without filtering, PEMFC cell performance decreased 35% by ionic contamination such as $Na^+$ on the membrane and electrode. Thus, filtering of produced hydrogen is necessary for PEMFC operation.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.6 no.3
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• pp.309-317
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• 1996

Al2O3 thin films were deposited on Si-wafer (100) using organo-aluminum compounds at low pressure by chemical vapor deposition (CVD) method. The vapor of the organo-metallic precursor was carried by pure N2 gas. The deposition rate increased and then saturated as Tsub increased with increasing the AIP flow rate. The main contamination didn't found in deposited films except carbon. The H-O(H2O) IR absorption band decreased in intensity as the deposition temperature increased, and completely disappeared through annealing.

• Journal of Korea Soil Environment Society
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• v.2 no.3
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• pp.31-38
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• 1997

Temporal and spatial comparisons of acid mine drainage contaminated waters are difficult because of the complex physico-chemical nature of the pollutant. In the present study, an acid mine drainage index has been developed and evaluated for the assessment of surface waters. AMD index is calculated using a modified arithmetic weighted index using seven parameters which are most indicative of AMD contamination, i. e. pH value, sulphate, iron, zinc, aluminum, copper and manganese. Weighting is used to express the relative indicator value of each parameter. The proposed AMD index is used to quantify contamination from acid mine drainage over ten different old mine sites and assess the degree of impact on surface on surface waters. As a result of AMD evaluation, the Sukbong Mine located near the Moonkyung province showed lowest AMD value indicating the worst acid mine drainage quality. In overall, Youngdong mine sites showed higher contaimination compared to the other mine sites including Youngsuh, Choongbu, Suhbu and Nambu area.

• Journal of Radiation Protection and Research
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• v.9 no.2
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• pp.112-117
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• 1984

A lot of radioisotopes are applied to medical fields. It's very important to measure the activities on airborne radioiodine discharged in air from $Na^{131}I$ solutions and from patients treated with radioiodine. Also surface decontamination is another one important problem to be completly solved in the isotope laboratory where there is always the possibility of radiation contamination. The Authors measured the activities on airborne radioiodine with RI collector and scintillation counter. 1. The mean accumulative activity of airborne radioiodine discharged into air from $Na^{131}I$ solution was measured as $1.3{\times}10^{-3}/hr$ rate, and the maximum value was $1.8{\times}10^{-3}/hr$. 2. Radioactivity rate per hour of airborne iodine discharged into air from patients treated with $Na^{131}I$ was measured as $6.2{\times}10^{-5}/hr$ at 8 hour after administration of radioiodine and decreased into $2{\times}10^{-6}/hr$ after 24 hour. 3. Metalic surfaces such as stainless steel or aluminum are decontaminated 5 to 6 times more rapidly than wood and concrete surfaces. 4. Decontamination with wet wiping with detergent was 9 to 10 times more rapidly than dry wiping method, but dry wiping was useful for the first step to prevent spreading and flowing from liquid radioactive materials.

• Journal of the Mineralogical Society of Korea
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• v.31 no.2
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• pp.75-86
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• 2018

This study analyzed precipitation environment, heavy metal concentration, mineral composition, and spectral characteristics associated with heavy metal concentration and mineral composition for the reddish brown precipitates occurred in the drainage of Dogye mining station. The pH of the reddish brown precipitates ranges from 7.59 to 7.94 resulting neutral. XRF analysis reveals that the precipitates has high Fe concentration, and contaminated with Ni, Cu, and Zn. Dolomite, calcite, goethite, magnetite, kaolinite, pyrophyllite, quartz and aluminum isopropoxide were identified based on XRD analysis. As a result of spectral analysis associated with heavy metal contamination, visible reflectance increases and infrared reflectance decreases with a increase in heavy metal concentration. The spectral characteristics of the reddish brown precipitates is turned out to be manifested by goethite, magnetite, kaolinite, pyrophyllite and aluminum isopropoxide.

• Proceedings of the Materials Research Society of Korea Conference
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• 2009.11a
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• pp.44.2-44.2
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• 2009

Polycrystalline materials suchas yttria and alumina have been applied as a plasma resisting material for the plasma processing chamber. However, polycrystal line material may easily generate particles and the particles are sources of contamination during the plasma enhanced process. Amorphous material can be suitable to prevent particle generation due to absence of grain-boundaries. We manufactured nitrogen-containing $SiO_2-Al_2O_3-Y_2O_3$ based glasses with various contents of silicon and fixed nitrogen content. The thermal properties, mechanical properties and plasma etching rate were evaluated and compared for the different composition samples. The plasma etching behavior was estimated using XPS with depth profiling. From the result, the plasma etching rate highly depends on the silicon content and it may results from very low volatile temperature of SiF4 generated during plasma etching. The silicon concentration at the plasma etched surface was very low besides the concentration of yttrium and aluminum was relatively high than that of silicon due to high volatile temperature of fluorine compounds which consisted with aluminum and yttrium. Therefore, we conclude that the samples having low silicon content should be considered to obtain low plasma etching rate for the plasma resisting material.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.9 no.3
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• pp.299-302
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• 1999

$La_{2-x}Sr_{x}CuO_{4}$ single-crystalline films were prepared on bulk single crystals of Zn-doped $La_{2-x}Sr_{x}CuO_{4}$ as the substrates by LPE technique using two deferent methods. When prepared using an alumina crucible in normal electrical furnace, the $La_{2-x}Sr_{x}CuO_{4}$ films were contaminated with less than 3 at% aluminum from the alumina crucibles. Aluminum contamination either reduced or completely destroyed the superconductivity of the $La_{2-x}Sr_{x}CuO_{4}$ films, For LPE growth by modified TSFZ method using an infrared heating furnace without crucibles, the $La_{2-x}Sr_{x}CuO_{4}$ films of x=0.11 showed superconducting with $Tc_{onset}=36\;K$, which is 10 K higher than that in the $La_{2-x}Sr_{x}CuO_{4}$ bulk single crystals.

• Bulletin of the Korean Chemical Society
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• v.15 no.1
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• pp.79-83
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• 1994

The organometallic chemical vapor deposition of single precursors, $[Me_2Al({\mu}-NHR)]_2\;(R=^iPr,\;^tBu)$, for alumininum nitride thin films has been investigated to evaluate their poroperties as potential precursors. In chemical vapor deposition processes the gas phase products scattered from a Ni(100) substrate were analyzed by mass spectrometry and the deposited films were characterized by X-ray photoelectron spectroscopy (XPS). The optimum temperatures for the formation of AlN films have been found to be between 700 K and 800 K. Carbon contamination of the films seems to be attributed mainly to the methyl groups bonded to the aluminum atoms. It is apparent that $^tBu$ group is better than $^iPr$ group as a substituent on the nitrogen atom of the single precursors for the AlN thin film formation.