• 제목/요약/키워드: Alloy target

검색결과 113건 처리시간 0.026초

NUMERICAL ANALYSIS OF A SO3 PACKED COLUMN DECOMPOSITION REACTOR WITH ALLOY RA 330 STRUCTURAL MATERIAL FOR NUCLEAR HYDROGEN PRODUCTION USING THE SULFUR- IODINE PROCESS

  • Choi, Jae-Hyuk;Tak, Nam-Il;Shin, Young-Joon;Kim, Chan-Soo;Lee, Ki-Young
    • Nuclear Engineering and Technology
    • /
    • 제41권10호
    • /
    • pp.1275-1284
    • /
    • 2009
  • A directly heated $SO_3$ decomposer for the sulfur-iodine and hybrid-sulfur processes has been introduced and analyzed using the computational fluid dynamics (CFD) code CFX 11. The use of a directly heated decomposition reactor in conjunction with a very high temperature reactor (VHTR) allows for higher decomposition reactor operating temperatures. However, the high temperatures and strongly corrosive operating conditions associated with $SO_3$ decomposition present challenges for the structural materials of decomposition reactors. In order to resolve these problems, we have designed a directly heated $SO_3$ decomposer using RA330 alloy as a structural material and have performed a CFD analysis of the design based on the finite rate chemistry model. The CFD results show the maximum temperature of the structural material could be maintained sufficiently below 1073 K, which is considered the target temperature for RA 330. The CFD simulations also indicated good performance in terms of $SO_3$ decomposition for the design parameters of the present study.

SUBLAYER THICKNESS DEPENDENCE OF THE OPTICALPROPERTIES OF NI/TI AND Fe/Zr MULTILAERS

  • Lee, Y.P.;Kim, K.W.;Lee, G.M.;Rhee, J.Y.;Szymansky, B.;Dubowik, J.;Kucherenko, A.Yu.;Kudryavstev, Y.V.
    • 한국진공학회지
    • /
    • 제6권S1호
    • /
    • pp.70-74
    • /
    • 1997
  • The study of the thickness dependence of the electron energy structure of Fe, Ni, Ti and Zr sublayers in Ni/Ti and Fe/Zr multilayers by using the experimental and computer simulated optical spectroscopy has been performed. A series of Ni/Ti and Fe/Ze multiayered films (MLF) with a bilayer period of 0.5 - 30 nm and constant (Ni/Ti) / different (Fe/Zr) sublayer thickness ratios were prepared by using computer-controlled double-pair target face-to-face sputtering onto a glass substrate at room temperature (RT) Computer simulation of the resulting optical properties of these MLF was carried out by solving of multireflection problem with a matrix method assuming either "sharp" interfaces resulting in rectangular depth profiles of the components or "mixed" (alloy-like) interfaces of variable thickness between pure-metal sublayers. Optical constants of pure bulk metals as well as equiatomic alloy interfaces were employed in these simulations. It was shown that the difference between experimental and simulated optical properties of the investigated MLF increases with decrease in sublayer thickness. This result allows to conclude that the electronic structures of sublayers below 4-5 nm thickness in mlf differ from the corresponding bulk metals.ponding bulk metals.

  • PDF

레이저 광원 형상이 레이저 충격 피닝 잔류응력에 미치는 영향 (Effects of Laser Source Geometry on Laser Shock Peening Residual Stress)

  • 김주희;김윤재;김정수
    • 대한기계학회논문집A
    • /
    • 제36권6호
    • /
    • pp.609-615
    • /
    • 2012
  • 레이저 충격 피닝 처리 시 레이저 광원으로부터 금속표면에 조사되는 레이저 빔 형상은 다양하다. 레이저 형상은 표면에서 발생하는 압력파의 특성을 결정하기 때문에 금속 표면과 깊이 방향에 대한 잔류응력 분포에 영향을 미칠 수 있다. 본 논문에서는 레이저 충격 피닝 처리시 레이저 광원 형상이 인코넬 alloy 600 합금의 잔류응력에 미치는 영향을 분석하였다. 레이저 광원 형상은 원형, 사각형, 타원형 형상이 고려되었으며, 표면과 깊이 방향에 대한 압축잔류응력 특성을 비교하였다. 표면에서 생성되는 압축잔류응력은 원형 레이저 형상이 최대이지만 중심부에서 인장응력이 발생하고, 깊이 방향에서는 타원형 레이저 형상이 최대 압축잔류응력을 생성한다. 소성변형 발생 깊이는 사각형에 비해 원형과 타원형이 양호하다.

열처리 공정을 통한 텅스텐 중합금 관통자의 관통능력 향상에 관한 연구 (Study on the Improving Penetration Performance of Tungsten Heavy Alloy Penetrator by Heat Treatment)

  • 김명현;노주영;이영우;안대희
    • 한국산학기술학회논문지
    • /
    • 제21권2호
    • /
    • pp.322-327
    • /
    • 2020
  • 송탄통 분리형 날개안정철갑탄은 주로 전차체계에서 물리적인 힘으로 장갑 등과 같은 목표물을 관통 및 파괴하는 탄약으로 주로 열화우라늄 또는 텅스텐 중합금 재료를 사용한 관통자가 사용되고 있으나, 가공 및 환경적 측면 등의 이유로 텅스텐 중합금 관통자가 선호되는 실정이다. 텅스텐 중합금 관통자는 재료의 강도 및 인성에 따라 자기첨예화 효과에 의해 관통능력이 결정되는데, 본 연구에서는 인장강도 및 충격에너지에 가장 큰 영향을 받는 것으로 나타났다. 관통능력에 대한 기계적 특성치들에 대한 상관분석 결과, 관통능력에 대하여 인장강도는 상관계수 0.721의 비례관계를, 충격에너지는 상관계수 -0.599의 반비례관계를 나타냈으며, 추가적인 열처리 공정을 통하여 재료의 충격에너지가 감소시킴으로써 관통능력이 향상되는 사실을 실험적으로 입증하였다. 텅스텐 중합금 관통자의 관통능력을 향상시키기 위해서는 재료의 연신율을 약 9 % 이상으로, 인장강도를 약 123 kg/㎟ 이상으로 유지하는 것이 바람직한 것으로 나타났으며, 특히 충격에너지를 약 6.8 kg·m/㎠ 이하로 제어하는 것이 관통능력 향상에 있어서 가장 중요한 요소로 생각된다.

Development of High Entropy Alloy Film using Magnetron Sputtering

  • Kim, Young Seok;Lim, Ki Seong;Kim, Ki Buem
    • 한국표면공학회:학술대회논문집
    • /
    • 한국표면공학회 2018년도 춘계학술대회 논문집
    • /
    • pp.129-129
    • /
    • 2018
  • Hard coating application is effective way of cutting tool for hard-to-machine materials such as Inconel, Ti and composite materials focused on high-tech industries which are widely employed in aerospace, automobile and the medical device industry also Information Technology. In cutting tool for hard-to-machine materials, high hardness is one of necessary condition along with high temperature stability and wear resistance. In recent years, high-entropy alloys (HEAs) which consist of five or more principal elements having an equi-atomic percentage were reported by Yeh. The main features of novel HEAs reveal thermodynamically stable, high strength, corrosion resistance and wear resistance by four characteristic features called high entropy, sluggish diffusion, several-lattice distortion and cocktail effect. It can be possible to significantly extend the field of application such as cutting tool for difficult-to-machine materials in extreme conditions. Base on this understanding, surface coatings using HEAs more recently have been developed with considerable interest due to their useful properties such as high hardness and phase transformation stability of high temperature. In present study, the nanocomposite coating layers with high hardness on WC substrate are investigated using high entropy alloy target made a powder metallurgy. Among the many surface coating methods, reactive magnetron sputtering is considered to be a proper process because of homogeneity of microstructure, improvement of productivity and simplicity of independent control for several critical deposition parameters. The N2 is applied to reactive gas to make nitride system with transition metals which is much harder than only alloy systems. The acceleration voltage from 100W to 300W is controlled by direct current power with various deposition times. The coating layers are systemically investigated by structural identification (XRD), evaluation of microstructure (FE-SEM, TEM) and mechanical properties (Nano-indenter).

  • PDF

폐수처리 반응기용 재질의 부식특성 평가에 대한 연구 (A Study on the Corrosion Characteristics Evaluation for Reactor Material of Waste Water Treatment)

  • 김기태;이태구;문승재;이재헌
    • 플랜트 저널
    • /
    • 제4권2호
    • /
    • pp.60-65
    • /
    • 2008
  • As the operating conditions in a supercritical oxidation reactor are set in high temperature with high pressure causing a reactor suffering from the harsh circumstances. It means the reactor adopts itself with Fe-Cr alloy in acidic atmosphere with low pH value and Ni alloy in basic atmosphere with high pH value due to its superior corrosion resistance. The study, whose target waster water is pertinent to the latter part, has selected Ni alloy such as ostenite type stainless steel 304 and 316, superstainless steel AL6XN, Inconel 625, MAT 21, and titanium Gr. 5 in order to measure corrosion resistance against those samples under the same conditions of temperature and pressure applied for a supercritical oxidation reactor. The result shows the identifiable difference in corrosion resistance by observing the surface states through a scanning probe microscope as well as measuring the weight loss through making the samples above deposited in wastewater for two-week and four-week stay. The purpose of this corrosion experiment is to identify the most corrosion-resistant material among sample species pre-selected according to pH concentration of wastewater in pursue of applying for a reactor exposed to the extreme corrosion environment. It is because such a reactor made of a verified material enables to safeguard a stable operation under the supercritical wastewater processing facility.

  • PDF

마이크로웨이브 magnetron sputtering법으로 제막된 ZnO:Al 박막의 전기광학적 특성 (Electrical and optical properties of ZnO:Al thin films prepared by microwave magnetron sputtering)

  • 유병석;오근호
    • 한국결정성장학회지
    • /
    • 제8권4호
    • /
    • pp.587-591
    • /
    • 1998
  • 마이크로 웨이브를 보조 여기원으로 사용한 직류 magnetron 스퍼터링법으로 Aluminum이 2wt% 포함되어 있는 Zn:Al 합금타겟을 사용하여 AZO(Aluminum doped zinc oxide) 투명 전도막을 제막하였고 그 영향을 조사하였다. 타겟인가 전압이 420V에서 증착된 막의 투과율, 비저항 그리고 증착속도는 각각 50~70%, $5.5{\times}10^{-3}{\Omega}$cm 그리고 6,000$\AA\textrm{mm}^2$/J 이었다. 이 막을 40$0^{\circ}C$에서 30분간의 열처리하면 광투과율은 80% 이상으로 열처리전에 비해 향상되었으며 전도도는 2배 이상 향상되어 비저항값이 $2.0{\times}10^{-3}{\Omega}$cm인 막을 얻을 수 있었다.

  • PDF

고속 충돌 시 발생하는 평면 충격파를 이용한 산화 나노 분말의 치밀화 및 기계적 특성 평가 (Planar Shock Wave Compaction of Oxidized Copper Nano Powders using High Speed Collision and Its Mechanical Properties)

  • 안동현;김우열;박이주;김형섭
    • 한국분말재료학회지
    • /
    • 제21권1호
    • /
    • pp.39-43
    • /
    • 2014
  • Bulk nanostructured copper was fabricated by a shock compaction method using the planar shock wave generated by a single gas gun system. Nano sized powders, average diameter of 100 nm, were compacted into the capsule and target die, which were designed to eliminate the effect of undesired shock wave, and then impacted with an aluminum alloy target at 400 m/s. Microstructure and mechanical properties of the shock compact specimen were analyzed using an optical microscope (OM), scanning electron microscope (SEM), and micro indentation. Hardness results showed low values (approximately 45~80 Hv) similar or slightly higher than those of conventional coarse grained commercial purity copper. This result indicates the poor quality of bonding between particles. Images from OM and SEM also confirmed that no strong bonding was achieved between them due to the insufficient energy and surface oxygen layer of the powders.

원통형 스퍼터링에서 자계와 인가전압이 ITO형성에 미치는 영향 (The effect on formation of ITO by magnetic field and applied vol tape in cylindrical magnetron sputtering)

  • 하홍주;이우근;곽병구;김규섭;조정수;박정후
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 1995년도 추계학술대회 논문집
    • /
    • pp.302-305
    • /
    • 1995
  • ITO(indium tin oxide) that is both conductive in electricity and transparent to the visible ray is called transparent conducting thin film. Nowaday, according to the development of flat panel display such as LCD(Liquid Crystal display, EL(electolumine- scence display), PDP(plasma display panel), ECD(electrocromic display), the higher quality in the low temperature process has been asked to reduce the production cost and to have a good uniformity on a large substrate. In this study, we prepared indium tin oxide(ITO) by a cylindrical DC magnetron sputtering with Indium-tin (9:1) alloy target instead of indium-tin oxide target. To reduce the defact in ITO, the effect on ITO by varing the magnetic field intensity and the applied voltage ares studied. the resistivity of the film deposited in oxygen partial pressure of 5% and substrate temperature of 140$^{\circ}C$. is 1.6${\times}$10$\^$-1/$\Omega$$.$cm with 85% optical transmission in viaible ray.

  • PDF

반응성 스퍼트링으로 형성된 ITO의 유전채 소성에 따른 특성변화 (The Property Change of ITO Prepared by Reactive R.F. Sputtering in POP manufacturing Process)

  • 남상옥;지성원;손제봉;허근도;조정수;박정후
    • 대한전기학회:학술대회논문집
    • /
    • 대한전기학회 1997년도 하계학술대회 논문집 C
    • /
    • pp.1411-1413
    • /
    • 1997
  • The thin film that is electrically conductive and optically transparent is called conductive transparent thin film. ITO(Indium-Tin Oxide) which is a kind of conductive transparent thin film has been widely used in solar cell, transparent electrical heater, selective optical filter, FDP(Flat Display Panel) such as LCD (Liquid Crystal Display), PDP(Plasma Display Panel) and so on. Especially in PDP, ITO films is used as a transparent electrode in order to maintain discharge and decrease consumption power through the improvement of cell structure. In this study, we prepared ITO by reactive r.f. sputtering with indium-tin(Sn wt 10%) alloy target instead of indium-tin oxide target. The ITO films deposited at low temperature $150^{\circ}C$ and 8% $O_2$ partial pressure showed about $3.6{\Omega}/{\square}$. At the end of firing, the resistance of ITO was decreased, the optical transparence was improved above 90%.

  • PDF