• 제목/요약/키워드: Al-N barriers

검색결과 20건 처리시간 0.024초

결정입계 처리에 따른 다결정 실리콘 태양전지의 효율 향상 (Efficiency Improvement of Polycrystalline Silicon Solar Cells using a Grain boundary treatment)

  • 김상수;김재문;임동건;김광호;원충연;이준신
    • E2M - 전기 전자와 첨단 소재
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    • 제10권10호
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    • pp.1034-1040
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    • 1997
  • A solar cell conversion effiency was degraded by grain boundary effect in polycrystalline silicon. Grain boundaries acted as potential barriers as well as recombination centers for the photo-generated carriers. To reduce these effects of the grain boundaries we investigated various influencing factors such as emitter thickness thermal treatment preferential chemical etching of grain boundaries grid design contact metal and top metallization along boundaries. Pretreatment in $N_2$atmosphere and gettering by POCl$_3$and Al were performed to obtain multicrystalline silicon of the reduced defect density. Structural electrical and optical properties of slar cells were characterized before and after each fabrication process. Improved conversion efficiencies of solar cell were obtained by a combination of pretreatment above 90$0^{\circ}C$ emitter layer of 0.43${\mu}{\textrm}{m}$ Al diffusion in to grain boundaries on rear side fine grid finger top Yb metal and buried contact metallization along grain boundaries.

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Optical Properties of a ZnO-MgZnO Quantum-Well

  • Ahn, Do-Yeol;Park, Seoung-Hwan
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제6권3호
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    • pp.125-130
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    • 2006
  • The optical gain and the luminescence of a ZnO quantum well with MgZnO barriers is studied theoretically. We calculated the non-Markovian optical gain and the luminescence for the strained-layer wurtzite quantum well taking into account of the excitonic effects. It is predicted that both optical gain and luminescence are enhanced for the ZnO quantum well when compared with those of InGaN-AlGaN quantum well structure due to the significant reduction of the piezoelectric effects in the ZnO-MgZnO systems.

다중 양자우물 주사형 다이오드와 펄스-모드 신경회로망 구현을 위한 그 응용 (A Novel Multi-Quantum Well Injection Mode Diode And Its Application for the Implementation of Pulse-Mode Neural Circuits)

  • Song Chung Kun
    • 전자공학회논문지A
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    • 제31A권8호
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    • pp.62-71
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    • 1994
  • A novel semiconductor device is proposed to be used as a processing element for the implementation of pulse-mode neural networks which consists of alternating n' GaAs quantum wells and undoped AlGaAs barriers sandwitched between n' GaAs cathode and P' GaAs anode and in simple circuit in conjunction with a parallel capacitive and resistive load the trigger circuit generates neuron-like pulse train output mimicking the function of axon hillock of biological neuron. It showed the sigmoidal relationship between the frequency of the pulse-train and the applied input DC voltage. In conjunction with MQWIMD the various neural circuits are proposed especially a neural chip monolithically integrated with photodetectors in order to perfrom the pattern recognition.

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Electrical characteristics of high-k stack layered tunnel barriers with Post-Rapid thermal Annealing (PRA) for nonvolatile memory application

  • 황영현;유희욱;손정우;조원주
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.186-186
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    • 2010
  • 소자의 축소화에 따라 floating gate 형의 flash 메모리 소자는 얇은 게이트 절연막 등의 이유로, 이웃 셀 간의 커플링 및 게이트 누설 전류와 같은 문제점을 지니고 있다. 이러한 문제점을 극복하기 위해 charge trap flash 메모리 (CTF) 소자가 연구되고 있지만, CTF 메모리 소자는 쓰기/지우기 속도와 데이터 보존 성능간의 trade-off 관계와 같은 문제점을 지니고 있다. 최근, 이를 극복하기 위한 방안으로, 다른 유전율을 갖는 유전체들을 적층시킨 터널 절연막을 이용한 Tunnel Barrier Engineered (TBE) 기술이 주목 받고 있다. 따라서, 본 논문에서는 TBE 기술을 적용한 MIS-capacitor를 높은 유전율을 가지는 Al2O3와 HfO2를 이용하여 제작하였다. 이를 위해 먼저 Si 기판 위에 Al2O3 /HfO2 /Al2O3 (AHA)를 Atomic Layer Deposition (ALD) 방법으로 약 2/1/3 nm의 두께를 가지도록 증착 하였고, Aluminum을 150 nm 증착 하여 게이트 전극으로 이용하였다. Capacitance-Voltage와 Current-Voltage 특성을 측정, 분석함으로써, AHA 구조를 가지는 터널 절연막의 전기적인 특성을 확인 하였다. 또한, high-k 물질을 이용한 터널 절연막을 급속 열처리 공정 (Rapid Thermal Annealing-RTA) 과 H2/N2분위기에서 후속열처리 공정 (Post-RTA)을 통하여 전기적인 특성을 개선 시켰다. 적층된 터널 절연막은 열처리를 통해 터널링 전류의 민감도의 향상과 함께 누설전류가 감소됨으로서 우수한 전기적인 특성이 나타남을 확인하였으며, 적층된 터널 절연막 구조와 적절한 열처리를 이용하여 빠른 쓰기/지우기 속도와 전기적인 특성이 향상된 비휘발성 메모리 소자를 기대할 수 있다.

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Reasons and Motivations for Cigarette Smoking and Barriers against Quitting Among a Sample of Young People in Jeddah, Saudi Arabia

  • Baig, Mukhtiar;Bakarman, Marwan A;Gazzaz, Zohair J;Khabaz, Mohamad N;Ahmed, Tahir J;Qureshi, Imtiaz A;Hussain, Muhammad B;Alzahrani, Ali H;Al-Shehri, Ali A;Basendwah, Mohammad A;Altherwi, Fahd B;Al-Shehri, Fahd M
    • Asian Pacific Journal of Cancer Prevention
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    • 제17권7호
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    • pp.3483-3487
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    • 2016
  • Background: Cigarette smoking is one of the leading causes of death in the world. Tobacco consumption has grave negative consequences for health so that it is important to understand the reasons and motivations towards cigarette smoking and barriers against quitting smoking among the young generation for developing effective policies to control this widespread problem. Materials and Methods: This cross-sectional survey was carried out at the Faculty of Medicine, Rabigh, King Abdulaziz University, Jeddah, Saudi Arabia. A total of 438 young smokers participated from the University and the general population. Data were collected through anonymous, self-administered questionnaires in the Arabic language that contained questions about the reasons and motivations towards cigarette smoking and barriers against quitting smoking. The questionnaire also contained several questions regarding knowledge and attitude of the participants towards cigarette smoking. The data was analyzed on SPSS-16. Results: The mean age of the respondents was $22.9{\pm}3.48$, out of 438 subjects 87 (19.9%) were married, and 351 (80.1%) were unmarried, and 331 (75.6%) belonged to urban areas while 107 (24.5%) were from the rural areas. Responding to a question about a number of cigarettes smoked per day, 31% answered 11-20, 29% answered 21-30, and 25% answered 1-10. Questioned about smokers in the family, 34.5% responded more than one, with 19% for brother and 13% for father. About the reasons for not quitting smoking, 26% described lack of willpower, 25% had no reason, 22% said that people around me smoke, and 15.3% responded stress at home/work. The major motivation for smokers was smoker friends (42%), for 33.8% others, for 12% father/brother and 7.8% media. Conclusions: There are several avoidable and preventable reasons and barriers against quitting smoking. However, knowledge and attitude about smoking were good, and the majority of the smokers were well aware of the associated hazards. Therefore, there is a need to search out ways and means to help them to quit this addiction.

Analysis of the Efficiency Technology Transfer Offices in Management: The Case of Spain and Kazakhstan

  • KIREYEVA, Anel A.;TURDALINA, Sharbanu;MUSSABALINA, Dinara;TURLYBEKOVA, Nadira M.;AKHMETOVA, Zauresh B.
    • The Journal of Asian Finance, Economics and Business
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    • 제7권8호
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    • pp.735-746
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    • 2020
  • This research is defined as a study regarding on structured and systematized of existing literature review of the intersection between intellectual property management, management and technology transfer offices (TTOs). It takes a deeper look at requirements within universities, scientific institutions and the business environment should be interconnected with each other. The literature review shows that TTOs have control over the process of knowledge transfer and they have contributed to improving the efficiency of the use of production and human resources. In this paper, authors proposed the methodological tools based on methodology model, which identified success factors for using project management in TTO between two countries - Kazakhstan and Spain. Further, we used methodology is focused on solving the problems of quantitative analysis based on the use of primary data, which allowed us to reach a huge number of respondents without any restrictions, and secondary data from statistical database. Findings and results are summarized at the end of article show that Kazakhstan is following the path of the Spanish experience. However, Kazakhstan can become more successful in commercializing scientific technologies and transferring knowledge and technologies. In turn, Spain can use the data from our analysis to work on barriers and improve the activities of TTOs.

유기소자의 신뢰성에 영향을 주는 유해 자외선을 차단하기 위한 ALD기반 기능성 브래그반사경 구조 (ALD-based Functional Bragg Reflector Structure to Block Harmful Ultraviolet Rays that Affect the Reliability of Organic Devices)

  • 김현우;이형준;장승미;윤형준;이도균;이용민;박상연;정지훈;임석준;권정현
    • 반도체디스플레이기술학회지
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    • 제22권4호
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    • pp.103-107
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    • 2023
  • To solve the reliability problem of organic devices that are often used outdoors, multifunctional gas barriers that block reactive gases such as moisture and oxygen and reflect harmful light such as ultraviolet rays are needed. In this study, ALD nanolaminate-based optically functional n-DBR was developed to overcome the poor gas permeability of polymer substrates and protect organic devices from harmful light. n-DBR not only achieved a WVTR of 8.76 × 10-6 g·m-2·day-1, but also showed a visible light transmittance of 94.3% and an ultraviolet ray blocking ability of 2.67%. In particular, n-DBR based on a nanolaminate structure maintained its permeability characteristics even in a high temperature and high humidity environment despite being used as a layer of Al2O3. This functional barrier Structure can not only be used as a functional encapsulation barrier for the reliability of organic devices, but can also be used as a tinting film for vehicles.

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저가 지상전력을 위한 다결정 실리콘 태양전지 제작 (The Fabrication of Poly-Si Solar Cells for Low Cost Power Utillity)

  • 김상수;임동건;심경석;이재형;김홍우;이준신
    • 태양에너지
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    • 제17권4호
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    • pp.3-11
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    • 1997
  • 다결정 실리콘에서 결정입계는 광생성된 반송자들의 재결합 중심으로 작용할 뿐 아니라 전위장벽으로 작용하여 태양전지의 변환효율을 감소시킨다. 결정입계의 영향을 줄이기 위해 열처리, 결정입계에 대한 선택적 식각, 결정입계로 함몰전극을 형성하는 방법, 다양한 전극 구조, 초박막 금속 형성 후 전극형성 등 여러가지 요소들을 조사하였다. 질소 분위기에서 $900^{\circ}C$ 전열처리, $POCl_3$ 확산을 통한 게터링, 후면전계 형성을 위한 Al 처리로 다결정 실리콘의 결함밀도를 감소시켰다. 결정입계에서의 반송자 손실을 감소시키기 위한 기판 처리로 Schimmel 식각액을 사용하였다. 이는 texturing 효과와 함께 결정입계를 선택적으로 $10{\mu}m$ 깊이로 식각하였다. 결점입계를 우선적으로 식각한 후면으로 Al을 확산하여 후면에서의 재결합 손실을 감소시켰다. 전극 핑거(grid finger) 간격이 0.4mm인 세밀한 전극 구조에 결정입계로 $0.4{\mu}m$ 깊이로 함몰전극을 추가로 형성하여 태양전지의 단락 전류 밀도가 개선되었다. 80% 이상의 광투과율을 보인 20nm 두께의 크롬 박막 형성으로 직렬 저항을 감소시켰다. 본 논문은 저가의 고효율, 지상 전력용 태양진지를 위해 결정입계에 대한 연구를 하였다.

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Short Channel SB-FETs의 Schottky 장벽 Overlapping (Schottky barrier overlapping in short channel SB-MOSFETs)

  • 최창용;조원주;정홍배;구상모
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.133-133
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    • 2008
  • Recently, as the down-scailing of field-effect transistor devices continues, Schottky-barrier field-effect transistors (SB-FETs) have attracted much attention as an alternative to conventional MOSFETs. SB-FETs have advantages over conventional devices, such as low parasitic source/drain resistance due to their metallic characteristics, low temperature processing for source/drain formation and physical scalability to the sub-10nm regime. The good scalability of SB-FETs is due to their metallic characteristics of source/drain, which leads to the low resistance and the atomically abrupt junctions at metal (silicide)-silicon interface. Nevertheless, some reports show that SB-FETs suffer from short channel effect (SCE) that would cause severe problems in the sub 20nm regime.[Ouyang et al. IEEE Trans. Electron Devices 53, 8, 1732 (2007)] Because source/drain barriers induce a depletion region, it is possible that the barriers are overlapped in short channel SB-FETs. In order to analyze the SCE of SB-FETs, we carried out systematic studies on the Schottky barrier overlapping in short channel SB-FETs using a SILVACO ATLAS numerical simulator. We have investigated the variation of surface channel band profiles depending on the doping, barrier height and the effective channel length using 2D simulation. Because the source/drain depletion regions start to be overlapped each other in the condition of the $L_{ch}$~80nm with $N_D{\sim}1\times10^{18}cm^{-3}$ and $\phi_{Bn}$ $\approx$ 0.6eV, the band profile varies as the decrease of effective channel length $L_{ch}$. With the $L_{ch}$~80nm as a starting point, the built-in potential of source/drain schottky contacts gradually decreases as the decrease of $L_{ch}$, then the conduction and valence band edges are consequently flattened at $L_{ch}$~5nm. These results may allow us to understand the performance related interdependent parameters in nanoscale SB-FETs such as channel length, the barrier height and channel doping.

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CoFe/NiFeSiB/CoFe 자유층을 갖는 이중장벽 자기터널접합의 바이어스전압 의존특성 (Bias Voltage Dependence of Magnetic Tunnel Junctions Comprising Double Barriers and CoFe/NiFeSiB/CoFe Free Layer)

  • 이선영;이장로
    • 한국자기학회지
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    • 제17권3호
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    • pp.120-123
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    • 2007
  • 이 연구에서는 Ta 45/Ru 9.5/IrMn 10/CoFe $3/AlO_x$/자유층/$AlO_x$/CoFe 7/IrMn 10/Ru 60(nm) 구조를 갖는 이중장벽 자기터널접합(double-barrier magnetic tunnel junction: DMTJ)를 다루었다. 자유층은 $Ni_{16}Fe_{62}Si_8B_{14}\;7nm$, $Co_{90}Fe_{10}(fcc)$ 7 nm 및 $CoFet_1$/NiFeSiB $t_2$/CoFe $t_1$으로 구성하였으며 두께 $t_1,\;t_2$는 변화시켰다. 즉 TMR비와 RA를 개선하기 위하여 부분적으로 CoFe층을 대체할 수 있는 비정질 NiFeSiB층이 혼합된 자유층 CoFe/NiFeSiB/CoFe을 갖는 DMTJ를 연구하였다. NiFeSiB($t_1=0,\;t_2=7$)만의 자유층을 갖는 DMTJ는 터널자기저항(TMR)비 28%, 면적-저항곱(RA) $86k{\Omega}{\mu}m^2$, 보자력($H_c$) 11 Oe 및 층간 결합장($H_i$) 20 Oe를 나타내었다. $t_1=1.5,\;t_2=4$인 경우의 하이브리드 DMTJ는 TMR비 30%, RA $68k{\Omega}{\mu}m^2$$H_c\;11\;Oe$를 가졌으나 $H_i$는 37 Oe로 증가하였다. 원자현미경(AFM)과 투과전자현미경(TEM)측정을 통하여 NiFeSiB층 두께가 감소하면 $H_i$가 증가하는 것을 확인하였다. 비정질 NiFeSiB층이 두꺼워지면 보통 계면의 기복을 유도하는 원주형성장(columnar growth)를 지연시키는데 유효하였다. 그러나 NiFeSiB층이 얇으면 표면거칠기는 증가하고 전자기적 Neel 결합 때문에 Hi는 커졌다.