• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 1995년도 추계학술대회 논문집
• /
• pp.74-76
• /
• 1995

ZnO varistor with composition of ZnO(90wt%)-Bi$_2$O$_3$(3wt%)-Sb$_2$O$_3$(3.6wt%)-CO$_2$O$_3$(1.16wt%)-NiO(0.88wt%)-MnO$_2$(0.71wt%)-Cr$_2$O$_3$(0.93wt%) according to Al$_2$O$_3$addtive was fabricated by sintering methods. The effects of Al$_2$O$_3$dopant on the I-V characteristics of ZnO varistors were investigated. These changes of electric properties were found to be caused by the variation of grains and grain boundary related to Al$_2$O$_3$dopting. And the conductive mechanism of ZnO varistor in prebreakdown region were investigated with defect model.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
• /
• pp.303-304
• /
• 2008

Al, N-codoped ZnO(ZnO:N,Al) thin films were deposited on n-type Si(100) substrate at $450^{\circ}C$ with various conditions of ambient gas$(N_2:O_2)$ by DC magnetron sputtering method using ZnO:$Al_2O_3$(2wt%) as a target, and then were annealed at 500, 700, $800^{\circ}C$ in $N_2$ gas for one hour. XRD patterns showed that all of the ZnO:N,Al thin films annealed at $80^{\circ}C$ grew with two peaks, which means poor crystallinity of the thin films deposited. Hall effects in Van der Pauw configuration proved that after annealing the films deposited showed low resistivity and high carrier concentration. While the films annealed at $800^{\circ}C$ showed low resistivity of $\sim10^{-2}\Omega$ cm and high carrier concentration of $\sim10^{19}cm^{-3}$.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2001년도 추계학술대회 논문집 Vol.14 No.1
• /
• pp.525-528
• /
• 2001

ZnO:Al thin film can be used as a transparent conducting oxide(TCO) which has low electric resistivity and high optical transmittance for the front electrode of amorphous silicon solar cells and display devices. This study of electrical, crystallographic and optical properties of Al doped ZnO thin films prepared by Facing Targets Sputtering(FTS), where strong internal magnets were contained in target holders to confine the plasma between the targets, is described. Optimal transmittance and resistivity was obtained by controlling flow rate of $O_2$ gas and substrate temperature. When the $O_2$ gas rate of 0.3 and substrate temperature $200^{\circ}C$, ZnO:Al thin film had strongly oriented c-axis and lower resistivity( < $10^{-4}{\Omega}-cm$ ).

• 한국재료학회지
• /
• 제21권1호
• /
• pp.67-71
• /
• 2011

La doped CuO-ZnO-$Al_2O_3$ powders are prepared by sol-gel method with aluminum isopropoxide and primary distilled water as precursor and solvent. In this synthesized process, the obtained metal oxides caused the precursor such as copper (II) nitrate hydrate and zinc (II) nitrate hexahydrate were added. To improve the surface areas of La doped CuO-ZnO-$Al_2O_3$ powder, sorbitan (z)-mono-9-octadecenoate (Span 80) was added. The synthesized powder was calcined at various temperatures. The dopant was found to affect the surface area and particle size of the mixed oxide, in conjunction with the calcined temperature. The structural analysis and textual properties of the synthesized powder were measured with an X-ray Diffractometer (XRD), a Field-Emission Scanning Electron Microscope (FE-SEM), Bruner-Emmett-Teller surface analysis (BET), Thermogravimetry-Differential Thermal analysis (TG/DTA), $^{27}Al$ solid state Nuclear Magnetic Resonance (NMR) and transform infrared microspectroscopy (FT-IR). An increase of surface area with Span 80 was observed on La doped CuO-ZnO-$Al_2O_3$ powders from $25m^2$/g to $41m^2$/g.

• 한국재료학회지
• /
• 제25권11호
• /
• pp.598-601
• /
• 2015

Using reverse micelle processing, $ZnAl_2O_4$ nanopowders were synthesized from a mixed precursor(consisting of $Zn(NO_3)_2$ and $Al(NO_3)_3$). The $ZnAl_2O_4$ was prepared by mixing the aqueous solution at a molar ratio of Zn : Al = 1 : 2. The average size and distribution of the synthesized powders with heat treatment at $600^{\circ}C$ for 2 h were in the range of 10-20 nm and narrow, respectively. The average size of the synthesized powders increased with increasing water to surfactant molar ratio. The XRD diffraction patterns show that the phase of $ZnAl_2O_4$ was spinel(JCPDS No. 05-0669). The synthesized and calcined powders were characterized using a thermogravimetric - differential scanning calorimeter(TG-DSC), X-ray diffraction analysis (XRD), and high resolution transmission electron microscopy(HRTEM). The effects of the synthesis parameter, such as the molar ratio of water to surfactant, are discussed.

• 한국세라믹학회지
• /
• 제38권4호
• /
• pp.337-342
• /
• 2001

PDP(Plasma Display Panel)용 녹색 형광체인 Zn$_2$SiO$_4$:Mn에 채-dopant로 Al을 첨가하여 졸-겔법으로 합성하였다. 졸-겔법으로 제조한 형광체는 기존의 고상 반응에 의해 합성된 경우보다 낮은 온도(1000-110$0^{\circ}C$)에서 Zn$_2$SiO$_4$단일상을 형성하였으며, 300-500nm의 비교적 균일한 입자를 얻을 수 있었다. 또한, co-dopant인 Al을 첨가함으로써 발광휘도를 향상시키고, 전광시간을 줄일 수 있었다. 한편, TEOS의 가수분해시 $H_2O$/TEOS 비율을 조절하여 발광의 최적 조건을 조사하였다.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.1
• /
• pp.143-146
• /
• 2003

Al doped Zinc Oxide(ZnO:Al) films, which is widely used as a transparent conductor in optoelectronic devices such as solar cell, liquid crystal display, plasma display panel, thermal heater, and other sensors, were prepared by using the capacitively coupled DC magnetron sputtering method. The influence of the substrate temperature, working gas pressure and discharge power on the electrical, optical and morphological properties were investigated experimentally. The consideration on the effect of doping amounts of Al on the electrical and optical properties of ZnO thin film were also carried out. ZnO:Al films with the optimum growth conditions showed resistivity of $9.42{\times}10^{-4}\;{\Omeg}-cm$ and transmittance of 90.88% for 840nm in film thickness in the wavelength range of the visible spectrum.

• 센서학회지
• /
• 제19권5호
• /
• pp.337-341
• /
• 2010

In this work, the nanocrystalline ZnO/polycrystalline(poly) aluminum nitride(AlN)/ Si-layered structure was fabricated for humidity sensor applications based on surface acoustic wave(SAW). The ZnO film was used as a sensitive material layer. The ZnO and AlN(0002) were deposited by a sol-gel process and a pulse reactive magnetron sputtering, respectively. The ZnO sensitive films coated on AlN have a hexagonal wurtzite structure after the thin films annealed at $400^{\circ}C$, $500^{\circ}C$ and $600^{\circ}C$. The surface of the film exhibits sponginess and a nanometer particle size(below 50 nm). The largest shift in the frequency response was at approximately 200 kHz(the relative humidity: 10 %~90 %) for the structure annealed at $400^{\circ}C$. The effect of the change in the environmental temperature on the frequency response of the SAW humidity sensor was also investigated.

• 대한전기학회:학술대회논문집
• /
• 대한전기학회 2007년도 제38회 하계학술대회
• /
• pp.1279-1280
• /
• 2007

$Al_{2}O_{3}$ 절연막을 전하포획층으로 이용하여 Top 게이트 ZnO 나노선 전계효과트랜지스터를 제작하였고, 메모리 효과를 관찰하였다. $Al_{2}O_{3}$ 층을 게이트 절연막과 전하포획층으로 사용하였다. 대표적인 Top 게이트 ZnO 나노선 전계효과트랜지스터에 대하여 게이트 전압을 Double sweep 하였을 때의 드레인 전류-게이트 전압 특성이 반시계 방향의 히스테리시스와 문턱전압변화를 나타냈다. 펄스 형태의 게이트 전압을 1초 동안 인가한 후에, 드레인 전류-게이트 전압 특성의 문턱전압 변화가 0.3 V에서 0.8 V로 증가하였다. 이러한 특성은 게이트 전극에서 음전하 캐리어가 음의 게이트 전압에 대하여 $Al_{2}O_{3}$ 층에 충전되고, 양의 게이트 전압에 대하여 방전되는 것을 나타낸다.

• 대한전기학회:학술대회논문집
• /
• 대한전기학회 2002년도 추계학술대회 논문집 전기물성,응용부문
• /
• pp.79-81
• /
• 2002

ZnO 나노와이어는 ZnO 파우더를 볼밀 처리하여 열증착 방법으로 $1380^{\circ}C$에서 촉매없이 Si 기판위에서 합성되었다. 합성된 ZnO 나노와이어의 길이와 직경은 $20{\sim}30{\mu}m$와 $50{\sim}200$ nm 였다. ZnO 나노와이어 표면을 atomic layer deposition(ALD) 방법으로 $Al_2O_3$ 박막을 얇게 코팅하였다. 성장온도는 $300^{\circ}C$였고, 사용한 전구체는 Trimethlaluminum(TMA)와 distilled water($H_2O$) 이다. Transmission electron microscopy(TEM) 으로 측정한 $Al_2O_3$ 박막의 두께는 40 nm 로서 매우 균일하게 ZnO 나노와이어에 증착되었음을 알 수 있었다.