• Title/Summary/Keyword: Ag-Si Eutectic

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Electrochemical Reduction of SiO2 Granules to One-Dimensional Si Rods Using Ag-Si Eutectic Alloy

  • Lee, Han Ju;Seo, Won-Chul;Lim, Taeho
    • Journal of Electrochemical Science and Technology
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    • v.11 no.4
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    • pp.392-398
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    • 2020
  • Producing solar grade silicon using an inexpensive method is a key factor in lowering silicon solar cell costs; the direct electrochemical reduction of SiO2 in molten salt is one of the more promising candidates for manufacturing this silicon. In this study, SiO2 granules were electrochemically reduced in molten CaCl2 (850℃) using Ag-Si eutectic droplets that catalyze electrochemical reduction and purify the Si product. When Ag is used as the working electrode, the Ag-Si eutectic mixture is formed naturally during SiO2 reduction. However, since the Ag-Si eutectic droplets are liquid at 850℃, they are easily lost during the reduction process. To minimize the loss of liquid Ag-Si eutectic droplets, a cylindrical graphite container working electrode was introduced and Ag was added separately to the working electrode along with the SiO2 granules. The graphite container working electrode successfully prevented the loss of the Ag-Si eutectic droplets during reduction. As a result, the Ag-Si eutectic droplets acted as stable catalysts for the electrochemical reduction of SiO2, thereby producing one-dimensional Si rods through a mechanism similar to that of vapor-liquid-solid growth.

Interfacial Structure of Inconel/$Si_3N_4$ Joint Using Ag-Cu-Ti Brazing Metal (Ag-Cu-Ti Brazing 금속을 이용한 Inconel/$Si_3N_4$ 접합의 계면구조)

  • 정창주;장복기;문종하;강경인
    • Journal of the Korean Ceramic Society
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    • v.33 no.12
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    • pp.1421-1425
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    • 1996
  • Sintered Si3N4 and Inconel composed of Ni(58-63%) Cr(21-25%) Al(1-17%) Mn(<1%) fe(balance) were pressurelessly joined by using Ag-Cu-Ti brazing filler metal at 950℃ and 1200℃ under N2 gas atmosphere of 1atm and their interfacial structures were investigated. In case that the reaction temperature was low as 950℃ its interfacial structure was "Inconel metal/Ti-rich phase layer/brazing filler metal layer/Si3N4 " Ti used as reactive metal existed in between inconel steel and brazing metal and moved to the interface of between brazing filler metal nd Si3N4 according as reaction temperature increased up to 1200℃. The interfacial structure of inconel steel-Si3N4 reacted at 1200℃ was ' inconel metal/Ni-rich phase layer containing of Fe. Cr and Si/Cu-rich phase layer containing of Mn and Si/Si3N4 " Cr Mn, Ni and Fe diffused to the interface of between brazing filler metal and Si3N4 and reacted with Si3N4 The most reactive components of ingredients of inconel metal were Cr and Mn. On the other hand Ti added as reactive components to Ag-Cu eutectic segregated into Ni-rich phase layer,.

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A study on crystallization of a-Si:H films (수소화된 비정질 규소박막의 결정화에 관한 연구)

  • 김도영;임동건;김홍우;심경석;이수홍;이준신
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.8 no.2
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    • pp.269-277
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    • 1998
  • The crystallization method determines the material quality and consequent device performance. This paper investigates the crystallization of a-Si:H films on various substrate materials and analyzes the crystallization effect with and without using eutectic forming metals. From the examinations of the various substrate materials, a metal Mo was selected for the a-Si:H films growth and subsequent crystallization of it. For a sample without any eutectic metal layer, we observed grain size of $0.8{\mu}m$ after $1100^{\circ}C$ anneal treatment. To reduce crystallization temperature, we used some of the eutectic forming metals such as Au, Al and Ag. Poly-Si films with grain size over $10{\mu}m$ and (111) preferential plains were achieved using a premetal layer of Au at an anneal temperature of $700^{\circ}C$. The various crystallization effects of eutectic metal thickness and type were investigated for photovoltaic (PV) device applications.

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A Study on the Characteristics of Sn-Ag-X Solder Joint -The Wettability of Sn-Ag-Bi-In Solder to Plated Substrates- (Sn-Ag-X계 무연솔더부의 특성 연구 -기판 도금층에 따른 Sn-Ag-Bi-In 솔더의 젖음특성-)

  • 김문일;문준권;정재필
    • Journal of the Korean institute of surface engineering
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    • v.35 no.1
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    • pp.11-16
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    • 2002
  • As environmental concerns increasing, the electronics industry is focusing more attention on lead free solder alternatives. In this research, we have researched wettability of intermediate solder of Sn3Ag9Bi5In, which include In and Bi and has similar melting temperature to Sn37Pb eutectic solder. We investigated the wetting property of Sn3Ag9Bi5In. To estimate wettability of Sn3Ag9Bi5In solder on various substrates, the wettability of Sn3Ag9Bi5In solder on high-pure Cu-coupon was measured. Cu-coupon that plated Sn, Ni and Au/Ni and Si-wafer adsorbed Ni/Cu under bump metallurgy on one side. As a result, the wetting property of Sn3Ag9Bi5In solder is a little better than that of Sn37Pb and Sn3.5Ag.

A Study on the Characteristics of Sn-Ag-X Solder Joint (Sn-Ag-X계 무연솔더 접합부의 미세조직 및 전단강도에 관한 연구)

  • 김문일;문준권;정재필
    • Journal of Welding and Joining
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    • v.20 no.2
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    • pp.77-81
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    • 2002
  • Many kinds of Pb-free solder have been investigated because of the environmental concerns. Sn-Ag-Cu system is well blown as most competitive Pb-free solder. However, since Sn-Ag-Cu system has relatively high melting point compared to Sn-Pb eutectic, it may a limitation, the some application. In this study, Bi and In contained solder of $Sn_3Ag_8Bi_5In$ which has relatively lower melting point, $188~204^{\circ}C$, was investigated. $Sn_3Ag_8Bi_5In$ solder ball of $500\mu\textrm{m}$ diameter was set on the Ni/Cu/Cr-UBM and reflow soldered in the range of $220~240^{\circ}C$ for 5~15s. The maximum shear strength of the solder ball was around 170mN by reflowing at $240^{\circ}C$ for 10s. Intermetallic compound formed on the UBM of Si-wafer was analysed by SEM(scanning electron microscope) and XRD(X-ray diffractometer).

A Study on Wetting Behaviors of Al-Coated $SiC_f$ Composite (Al-$SiC_f$ 복합재료에서 보강재의 coating처리가 젖음성에 미치는 영향)

  • Kim, Kyun-Young;Lee, Kyung-Ku;Choi, Dap-Chun;Lee, Doh-Jae
    • Journal of Korea Foundry Society
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    • v.14 no.3
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    • pp.274-284
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    • 1994
  • SiC fibers were coated with Cu, Ag and Ni metallic thin films by magnetron sputtering in order to improve wetting properties between Al matrix and SiC fiber. The wetting behavior of metal coated SiC fiber by pure Al has been studied at $670^{\circ}C{\sim}900^{\circ}C$ range for $10{\sim}90min$. under vacuum atmosphere. Besides, the effect of coated film thickness on the wettability has been investigated. The wetting behavior and interfacial reaction between Al and SiC fibers were analysed with optical microscope and SEM (scanning electron microscope). The wetting behavior of the as-received SiC fiber with Al melt was not uniform, indicated by the contact angles from less than $90^{\circ} to more Al melt was appeared in the initial stage of reation. It was considered that the metallic thin film played an important role in reducing the interfacial free energy and breaking down the aluminum oxide film by eutectic reaction with Al melt. However the wettability of Ni coated SiC fiber was not improved as much as that of Cu or Ag coated SiC fiber. The improvement of wettability by coating thickness is clearly showed in $1{\mu}m$ coated SiC fiber compared with $0.25{\mu}m$ coated SiC.

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