• 공업화학
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• 제18권1호
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• pp.17-23
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• 2007

제지용 무기안료에 항균기능과 광촉매 탈취기능을 부여하기 위해 hybridization system을 이용하여 Ag 용액과 $TiO_2$로 표면 개질 처리하여 기능성 무기안료를 제조하고, 이를 이용하여 항균 및 탈취 기능을 갖는 특수지를 제조한 후 내항균 특성을 평가하였다. 내항균 평가로는 균의 생성여부를 눈으로 직접 확인 할 수 있는 halo test법, 균들의 생육 저하효과를 확인하는 방법인 inhibition growth test와 정균감소법을 사용하였다. 또한 제조된 항균기능성 특수지를 벽지용도로 적용하고자 하였으며, 내항균 평가 시 항균벽지 주위로 선명한 클리어 존이 형성되어 균의 성장 억제를 육안으로 확인할 수 있었다. 항균 및 탈취기능을 지니는 특수지의 휘발성 유기화합물 분해능 평가를 위한 benzene의 광촉매 분해 효율실험에서 반응시간 80min 동안 45~50%의 제거효율을 보였으며, 반응시간 30 min 정도에서 분해효율이 90% 이상 도달함을 알 수 있었다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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• pp.502-502
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• 2007

Current thin film process using memory device fabrication process use expensive processes such as manufacturing of photo mask, coating of photo resist, exposure, development, and etching. However, direct printing technology has the merits about simple and cost effective processes because inks are directly injective without mask. And also, this technology has the advantage about fabrication of fine pattern line on various substrates such as PCB, FCPB, glass, polymer and so on. In this work, we have fabricated the fine and thick metal pattern line for the electronic circuit board using metal ink contains Ag nano-particles. Metal lines are fabricated by two types of printing methods. One is a conventional printing method which is able to quick fabrication of fine pattern line, but has various difficulties about thick and high resolution DPI(Dot per Inch) pattern lines because of bulge and piling up phenomenon. Another(Second) methods is sequential printing method which has a various merits of fabrication for fine, thick and high resolution pattern lines without bulge. In this work, conductivities of metal pattern line are investigated with respect to printing methods and pattern thickness. As a result, conductivity of thick pattern is about several un.

• 한국재료학회지
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• 제16권11호
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• pp.692-697
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• 2006

Deodorization of natural zeolites have been improved not only for polar but also for non-polar pollutants by sucessive ion exchanges of H and Ag ions starting from Korean natural zeolite with high adsorption capacity. The modified zeolites with $TiO_2$ coating on the surface revealed high deodorization and photocatalytic decomposition effects. Further modification was made with $10{\sim}20nm$ silica nano particles coating on the surface, the resulting composite particles of $SiO_2/TiO_2/modified$ natural zeolite revealed not only comparable deodorization but also better durability and resisatnce to color change compared to the $TiO_2$/modified natural zeolite without much compensation of photocatalytic decomposition effect, when the composite particles were exposed to the polypropylene non-woven fiber coated with organic binder. It is expected for the composite particle prepared here to be used as indoor building materials for indoor air quality control.

• Korean Chemical Engineering Research
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• 제54권1호
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• pp.114-119
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• 2016

본 연구에서는 박테리아 셀룰로오스(BC)와 같은 천연고분자에 전도성 고분자 PEDOT:PEG와 graphene, 은나노와이어(AgNW)를 코팅하여 전도성을 부여하고자 하였다. 미리 PEDOT:PEG와 황산을 10~20%를 혼합하여 그 용액을 전자 스핀 코팅으로 BC 기판에 코팅하였다. 그 후, 전도성을 향상시키고자 graphene과 AgNW로 코팅하여 hall effect로 측정하였다. 그 결과, 대조군 PEDOT:PEG로 코팅한 BC 막의 전자농도($2.487{\times}10^{10}/cm^3$)에 비해 PEDOT:PEG에 황산을 10%로 혼합하여 코팅시킨 BC막($8.093{\times}10^{15}/cm^3$) 쪽이 $3.25{\times}10^5$배 높은 값을 나타내는 것으로 전도도가 대폭 향상되었음을 알 수 있었다. 또한, SEM분석으로 PEDOT:PEG가 황산처리에 의해 폴리머 형상으로 변화된 것을 확인 할 수 있었다. 분자구조의 변화를 FTIR분석결과 $1200cm^{-1}$ 파장의 S-O그룹이 황산처리 전에 비해 황산 혼합한 쪽에서 크게 상승된 것이 확인되었다. 이 방법을 이용하여 소량의 PEDOT:PEG사용으로 투명성을 확보할 수 있으며 미리 황산을 처리하는 것으로 제조공정을 단순하게 할 것으로 사료된다.

• 한국표면공학회지
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• 제49권3호
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• pp.301-306
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• 2016

The effects of nanotexturing and post-etching on the reflection and quantum efficiency properties of diamond wire sawn (DWS) multicrystalline silicon (mc-Si) solar cell have been investigated. The chemical solutions, which are acidic etching solution (HF-$HNO_3$), metal assisted chemical etching (MAC etch) solutions ($AgNO_3$-HF-DI, HF-$H_2O_2$-DI) and post-etching solution (diluted KOH at $80^{\circ}C$), were used for micro- and nano-texturing at the surface of diamond wire sawn (DWS) mc-Si wafer. Experiments were performed with various post-etching time conditions in order to determine the optimized etching condition for solar cell. The reflectance of mc-Si wafer texturing with acidic etching solution showed a very high reflectance value of about 30% (w/o anti-reflection coating), which indicates the insufficient light absorption for solar cell. The formation of nano-texture on the surface of mc-Si contributed to the enhancement of light absorption. Also, post-etching time condition of 240 s was found adequate to the nano-texturing of mc-Si due to its high external quantum efficiency of about 30% at short wavelengths and high short circuit current density ($J_{sc}$) of $35.4mA/cm^2$.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.396-396
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• 2012

$TiO_2$ anatase nanotube arrays (NTAs) were grown by electrochemical anodization and followed annealing of Ti foil. Ethylene glycol/$NH_4F$-based organic electrolyte was used for electrolyte solution and using second anodization process to obtain free-standing NTAs. After obtaining NTAs, ITO film was deposited by sputtering process on bottom of NTAs. UV-curable NOA was used for attach free-standing NTAs on flexible plastic substrate (PEN). Solid state electrolyte (spiro-OMeTAD) was coated via spin-coating method on top of attached NTAs. Ag was deposited as a counter electrode. Under AM 1.5 simulated sunlight, optical characteristics of devices were investigated. In order to use flexible polymer substrate, processes have to be conducted at low temperature. In case of $TiO_2$ nano particles (NPs), however, crystallization of NPs at high temperature above $450^{\circ}C$ is required. Because NTAs were conducted high temperature annealing process before NTAs transfer to PEN, it is favorable for using PEN as flexible substrate. Fabricated flexible solid-state DSSCs make possible the preventing of liquid electrolyte corrosion and leakage, various application.

• Current Photovoltaic Research
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• 제2권4호
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• pp.173-176
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• 2014

We have investigated the seed layer formation of front side contact using the inkjet printing process. Conductive silver ink was printed on textured Si wafers with 80 nm thick $SiN_x$ anti reflection coating (ARC) layers and thickened by light induced plating (LIP). The inkjet printable sliver inks were specifically formulated for inkjet printing on these substrates. Also, a novel method to prepare nano-sized glass frits by the sol-gel process with particle sizes around 5 nm is presented. Furthermore, dispersion stability of the formulated ink was measured using a Turbiscan. By implementing these glass frits, it was found that a continuous and uniform seed layer with a line width of $40{\mu}m$ could be formed by a inkjet printing process. We also investigated the contact resistance between the front contact and emitter using the transfer length model (TLM). On an emitter with the sheet resistance of $60{\Omega}/sq$, a specific contact resistance (${\rho}_c$) below $10m{\Omega}{\cdot}cm^2$ could be achieved at a peak firing temperature around $700^{\circ}C$. In addition, the correlation between the contact resistance and interface microstructures were studied using scanning electron microscopy (SEM). We found that the added glass particles act as a very effective fire through agent, and Ag crystallites are formed along the interface glass layer.