• 제목/요약/키워드: Ag films

검색결과 572건 처리시간 0.026초

AZO/Ag/AZO 다층박막의 Ag두께에 따른 특성 연구 (Influence of Ag thickness on properties of AZO/Ag/AZO Multi-layer Thin Films)

  • 연제호;김홍배
    • 반도체디스플레이기술학회지
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    • 제16권2호
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    • pp.27-31
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    • 2017
  • AZO/Ag/AZO multi-layer films deposited on glass substrate by RF magnetron sputtering and thermal evaporator have a much better electrical properties than Al-doped ZnO thin films. The multi-layer structure consisted of three layers, AZO/Ag/AZO, the electrical and optical properties of AZO/Ag/AZO were changed mainly by thickness of Ag layers. The optimum thickness of Ag layers was determined to be $90{\AA}$ for high optical transmittance and good electrical conductivity. The Ag layers thickness $90{\AA}$ is an optical transmittance greater than 80% of visible light and the obtained multilayer thin film with the low resistivity of $8.05{\times}10-3{\Omega}cm$ and the low sheet resistance $5.331{\Omega}/sq$. Applying to TCO and Solar electrode will improve efficiency.

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Rapid Thermal Annealing at the Temperature of 650℃ Ag Films on SiO2 Deposited STS Substrates

  • Kim, Moojin;Kim, Kyoung-Bo
    • Applied Science and Convergence Technology
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    • 제26권6호
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    • pp.208-213
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    • 2017
  • Flexible opto-electronic devices are developed on the insulating layer deposited stainless steel (STS) substrates. The silicon dioxide ($SiO_2$) material as the diffusion barrier of Fe and Cr atoms in addition to the electrical insulation between the electronic device and STS is processed using the plasma enhanced chemical vapor deposition method. Noble silver (Ag) films of approximately 100 nm thickness have been formed on $SiO_2$ deposited STS substrates by E-beam evaporation technique. The films then were annealed at $650^{\circ}C$ for 20 min using the rapid thermal annealing (RTA) technique. It was investigated the variation of the surface morphology due to the interaction between Ag films and $SiO_2$ layers after the RTA treatment. The results showed the movement of Si atoms in silver film from $SiO_2$. In addition, the structural investigation of Ag annealed at $650^{\circ}C$ indicated that the Ag film has the material property of p-type semiconductor and the bandgap of approximately 1 eV. Also, the films annealed at $650^{\circ}C$ showed reflection with sinusoidal oscillations due to optical interference of multiple reflections originated from films and substrate surfaces. Such changes can be attributed to both formation of $SiO_2$ on Ag film surface and agglomeration of silver film between particles due to annealing.

MOCVD공정에 의한 Ag 기판 위에 YBCO 박막의 증착 (Preparation of YBCO films on Ag substrates by MOCVD process)

  • 김호진;주진호;전병혁;김찬중
    • 한국초전도저온공학회:학술대회논문집
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    • 한국초전도저온공학회 2003년도 추계학술대회 논문집
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    • pp.79-82
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    • 2003
  • We prepared YBCO coated conductor by direct deposition of YBCO on Ag substrate by a MOCVD method. The Ag substrate was only prepared by cold rolling. The XRD data of the as-rolled Ag tape showed the formation of dominant (420) oriented grains. Processing variables were the oxygen partial pressure (Po$_2$) and deposition temperature (T$_{d}$). It was found that the a-axis oriented films were grown at lower T$_{d}$ below 80$0^{\circ}C$, while the c-axis oriented films were grown about 80$0^{\circ}C$. The surface of the films consisted of a second inclusion phase dispersed in the YBCO matrix. The Cu-rich phase regions were observed at the YBCO/Ag interface probably due to the inter-diffusion of Ag and Cu. Cu.

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RF magnetron sputter에 의해 제조된 AZO/Ag/AZO 다층박막의 Ag 두께가 전기적 광학적 특성에 미치는 영향 (Influence of Ag Thickness on Electrical and Optical Properties of AZO/Ag/AZO Multi-layer Thin Films by RF Magnetron Sputtering)

  • 안진형;강태원;김동원;김상호
    • 한국표면공학회지
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    • 제39권1호
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    • pp.9-12
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    • 2006
  • Al-doped ZnO(AZO)/Ag/AZO multi-layer films deposited on PET substrate by RF magnetron sputtering have a much better electrical properties than Al-doped ZnO single-layer films. The multi-layer structure consisted of three layers, AZO/Ag/AZO, the optimum thickness of Ag layers was determined to be $112{\AA}$ for high optical transmittance and good electrical conductivity. With about $1800{\AA}$ thick AZO films, the multi-layer showed a high optical transmittance in the visible range of the spectrum. The electrical and optical properties of AZO/Ag/AZO were changed mainly by thickness of Ag layers. A high quality transparent electrode, having a resistance as low as $6\;W/{\square}$ and a high optical transmittance of 87% at 550 nm, was obtained by controlling Ag deposition parameters.

Hot wall epitaxy(HWE)법에 의한 $AgGaSe_2$ 단결정 박막 성장과 열처리 효과 (Growth and effect of thermal annealing for $AgGaSe_2$ single crystal thin film by hot wall epitaxy)

  • 백승남;홍광준;김장복
    • 한국결정성장학회지
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    • 제16권5호
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    • pp.189-197
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    • 2006
  • [$AgGaSe_2$] 단결정 박막을 수평 전기로에서 합성한 $AgGaSe_2$ 다결정을 증발원으로하여, hot wall epitaxy(HWE) 방법으로 증발원과 기판(반절연성-GaAs(100))의 온도를 각각 $630^{\circ}C,\;420^{\circ}C$로 고정하여 성장하였다. 이때 단결정 박막의 결정성은 광발광 스펙트럼과 이중결정 X-선 요동곡선(DCRC)으로 부터 구하였다. $AgGaSe_2$의 광흡수 스펙트럼으로부터 구한 온도에 의존하는 에너지 밴드갭 $E_g(T)$는 Varshni 공식에 fitting한 결과 $E_g(T)=1.9501eV-(8.79x10^{-4}eV/K)T^2(T+250K)$를 잘 만족하였다. 성장된 $AgGaSe_2$ 단결정 박막을 Ag, Ga, Se 분위기에서 각각 열처리하여 10K에서 photoluminescience(PL) spectrum을 측정하여 점 결함의 기원을 알아보았다. PL 측정으로 부터 얻어진 $V_{Ag},\;V_{Se},\;Ag_{int}$, 그리고 $Se_{int}$는 주개와 받개로 분류되어졌다. $AgGaSe_2$ 단결정 박막을 Ag 분위기에서 열처리하면 p형으로 변환됨을 알 수 있었다. 또한, Ga 분위기에서 열처리하면 열처리 이전의 PL 스펙트럼을 보이고 있어서, $AgGaSe_2$ 단결정 박막에서 Ga은 안정된 결합의 형태로 있기 때문에 자연 결함의 형성에는 관련이 없음을 알았다.

동시 스퍼터링법에 이용하여 제작한 TiO2와 Ag/TiO2 광학 박막의 특성 (Characteristics of TiO2 and Ag/TiO2 optical thin film by Co-sputtering method)

  • 김상철;한성홍;김의정;이충우;주종현;김구철
    • 한국광학회지
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    • 제16권2호
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    • pp.168-173
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    • 2005
  • 고주파 마그네트론 동시 스퍼터링법을 이용하여 $TiO_2$ 박막에 Ag를 도핑한 $Ag/TiO_2$ 박막을 제작하고, 열처리 온도에 따른 박막의 물리적, 화학적 특성을 조사하였다. XRD 측정 결과로부터 금속을 도핑한 박막이 순수 $TiO_2$ 박막보다 결정크기가 더 작은 것을 확인하였으며, SEM 측정 결과로부터 $Ag/TiO_2$ 박막은 순수 $TiO_2$ 박막보다 골자의 크기가 작고 균일하다는 것을 알 수 있었다. 제작된 박막은 가시광선 영역에서 높은 투과율을 나타내었다. $600^{\circ}C$에서 열처리한 박막은 아나타제 결정상이 나타났으며, $900^{\circ}C$에서 열처리한 박막은 아나타제와 루타일상이 혼합되어 나타났다 특히, $900^{\circ}C$에서 열처리한 경우 아나타제에서 루타일로의 상전이에 따른 밴드갭 에너지의 변화에 의해 박막의 흡수단이 장파장 영역으로 이동하였다. 또한 박막 내의 흡수와 산란효과에 의해 투과율이 감소하였다. $Ag/TiO_2$ 박막의 광활성은 순수 $TiO_2$ 박막보다 우수함을 알 수 있었다.

Ag 나노완충층 두께에 따른 AZO/Ag 투명전극의 전기광학적 특성 연구 (Influence of Ag Nano-buffer Layer Thickness on the Opto-electrical Properties of AZO/Ag Transparent Electrode Films)

  • 엄태영;송영환;문현주;김대현;조윤주;김대일
    • 열처리공학회지
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    • 제29권6호
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    • pp.272-276
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    • 2016
  • Al doped ZnO (AZO) single layer and AZO/Ag bi-layered films were deposited on the glass substrates by radio frequency and direct current magnetron sputtering and then the effect of Ag buffer layer on the electrical and optical properties of the films was investigated. The thicknesses of AZO upper layer was kept as 100 nm, while Ag buffer layer was varied from 5 to 15 nm. The observed results mean that opto-electrical properties of the AZO films is influenced with Ag buffer layer and AZO film with 10 nm thick Ag buffer layer show the higher opto-electrical performance than that of the AZO single layer film prepared in this study.

비정질 As2Se3 박막에 첨가된 은이 전기 및 광학적 성질에 미치는 효과 (Effects of Ag Additives on Electrical and Optical Properties of As2Se3 Thin Films)

  • 이찬구;이수대;김덕훈;문정학
    • 한국안광학회지
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    • 제1권2호
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    • pp.63-69
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    • 1996
  • 비정질 $As_2Se_3$ 박막에 첨가된 Ag가 전기 및 광학적 성질에 미치는 효과를 연구하기 위해 직류전기전도도와 광투과도를 측정하였다. 직류전기전도도에서 구한 활성화에너지 $E_g$와 광투과도에서 구한 광학적 갭 $E_{opt}$는 Ag의 함량이 증가할수록 감소하였고, Urbach 꼬리는 Ag의 함량 변화에 관계없이 거의 일정한 것으로 나타났다. 시료에 첨가된 Ag의 함량이 5mol% 이하이면 Ag 함량의 증가에 대한 직류활성화에너지의 감소율은 광학적 갭의 감소율에 비해 크게 변하였다. Ag가 5mol% 이상 첨가되었을 때에는 Ag 함량의 증가에 대한 $E_g$의 감소율과 $E_{opt}$의 감소율이 비슷하였다. 이와 같은 현상은 Ag의 함량이 5mol% 이하인 시료에서는 Fermi준위가 이동도단 쪽으로 옮기고 Ag의 함량이 5mol% 이상이면 이동도단이 Fermi준위 쪽으로 옮기는 것을 의미한다.

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Hot Wall Epitaxy (HWE)법에 의해 성장된 $AgGaSe_2$ 에피레이어의 점결함 연구 (Point defect for $AgGaSe_2$ epilayers grown by hot wall epitaxy)

  • 홍명석;홍광준
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.98-99
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    • 2008
  • To obtain the single crystal thin films, $AgGaSe_2$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the hot wall epitaxy (HWE) system. The source and substrate temperatures were $630^{\circ}C$ and $420^{\circ}C$, respectively. The temperature dependence of the energy band gap of the $AgGaSe_2$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g$(T) 1.9501 eV - ($8.79\times10^{-4}$ eV/K)$T^2$/(T + 250 K). After the as-grown $AgGaSe_2$ single crystal thin films was annealed in Ag-, Se-, and Ga-atmospheres, the origin of point defects of $AgGaSe_2$ single crystal thin films has been investigated by the photoluminescence(PL) at 10K. The native defects of $V_{Ag}$, $V_{Se}$, $Ag_{int}$, and $Se_{int}$ obtained by PL measurements were classified as a donors or acceptors type. And we concluded that the heat-treatment in the Ag-atmosphere converted $AgGaSe_2$ single crystal thin films to an optical p-type. Also, we confirmed that Ga in $AgGaSe_2$/GaAs did not form the native defects because Ga in $AgGaSe_2$ single crystal thin films existed in the form of stable bonds.

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Hot Wall Epitaxy (HWE)법에 의한 $AgGaSe_2$ 단결정 박막 성장과 불순물 열처리 효과 (Growth and effect of thermal annealing of impurity for $AgGaSe_2$ single crystal thin film by hot wall epitaxy)

  • 이상열;홍광준
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.79-80
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    • 2007
  • To obtain the single crystal thin films, $AgGaSe_2$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the hot wall epitaxy (HWE) system. The source and substrate temperatures were $630^{\circ}C\;and\;420^{\circ}C$, respectively. The temperature dependence of the energy band gap of the $AgGaSe_2$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g$(T) = 1.9501 eV - ($8.79{\times}10^{-4}$ eV/K)$T^2$/(T + 250 K). After the as-grown $AgGaSe_2$ single crystal thin films was annealed in Ag-, Se-, and Ga-atmospheres, the origin of point defects of $AgGaSe_2$ single crystal thin films has been investigated by the photoluminescence(PL) at 10 K. The native defects of $V_{Ag},\;V_{Se},\;Ag_{int},\;and\;Se_{int}$ obtained by PL measurements were classified as a donors or acceptors type. And we concluded that the heat-treatment in the Ag-atmosphere converted $AgGaSe_2$ single crystal thin films to an optical p-type. Also, we confirmed that Ga in $AgGaSe_2$/GaAs did not form the native defects because Ga in $AgGaSe_2$ single crystal thin films existed in the form of stable bonds.

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