• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.345-345
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• 2008

최근 전자 소자의 고주파화, 소형화에 대한 요구가 증대 되면서 많은 소자들을 하나의 시스템에 3차원적으로 실장시키는 SOP (System-on-Package)가 새로운 대안으로 떠오르고 있으며 SOP를 실현하기 위해서는 집적기판에 대한 저온화 공정 기술이 절실히 필요한 실정이다. 현재 집적기판에 사용되는 재료로서 세라믹이 널리 알려져 있지만 세라믹은 취성이 있으며 $1000^{\circ}C$ 이상의 고온화 공정 프로세스를 필요로 하는 근본적인 약점이 있다. 이에 본 연구에서는 상온에서 고속으로 치밀한 성막을 가능케 하는 Aerosol Deposition Method (ADM)를 이용하여 최초로 세라믹-폴리머 복합체 후막을 성공적으로 제작하였다. XRD와 FT-IR 분석 결과 $Al_2O_3$-PMMA, $Al_2O_3$-PI 혼합물을 출발 파우더로 사용하여 제조한 후막이 세라믹-폴리머 복합체임을 확인할 수 있었다. 또한 SEM 분석결과 $Al_2O_3$-PMMA 복합체와 $Al_2O_3$-PI 복합체의 표면 양상이 매우 다르다는 점을 확인하였으며 $Al_2O_3$-PMMA 복합체의 성막률이 $Al_2O_3$-PI 복합체의 성막률에 비해 매우 낮음을 확인하였다. 이러한 현상들은 폴리머 파우더들의 경도와 탄성 차이 때문인 것으로 사료되어 이를 증명하기 위한 실험을 실시하였다. 결국 PMMA 막과 PI 막에 대한경도측정결과와 PMMA 파우더와 PI 파우더의 유성 볼밀링 전후에 대한 SEM 이미지를 통해 PMMA 파우더가 PI 파우더에 비해 경도가 낮으며 반면 탄성이 높다는 것을 간접적으로 확인할 수 있었다. 이와 같은 분석을 통하여 ADM을 이용한 세라믹-폴리머 복합체 후막의 제조에 있어 폴리머 파우더의 경도와 탄성이 매우 큰 영향을 미친다는 것을 알 수 있었다. 본 연구에서는 세라믹-폴리머 복합체 후막을 성공적으로 제조하기 위해서 폴리머 파우더의 적절한 선택이 중요함을 알 수 있었으며 ADM을 이용한 세라믹-폴리머 복합체 후막의 제조에 대한 가이드 라인을 제시할 수 있을 것으로 기대된다.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.7 no.2
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• pp.235-243
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• 1997

The high-$T_c$ superconducting phase, $YBa_2Cu_3O_x$, was deposited on the single crystal MgO substrate, using a liquid aerosol feed method in a plasma enhanced chemical vapor deposition(PECVD) reactor. The effect of the plasma distribution depending on the design of a reactor was studied by the analysis of the microstructures of thin films. The particles landed were frequently observed on the films and the two causes that were responsible for the particle deposition were explained. The particles were deposited by the unstable and non-uniform plasma and the low evaporation rate of the precursors. Also, the thin film deposition rate decreased significantly as the distance between the evaporating location and the substrate increased.

• Journal of the Korean Ceramic Society
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• v.40 no.8
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• pp.715-719
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• 2003

The Aerosol Deposition (AD) process will be proposed as a new fabrication technology for the integrated RF modules. $\alpha$-A1$_2$O$_3$ thick films were successfully grown on glass and Al substrates at room temperature by the AD process. Relative dielectric permittivity and loss tangent of the $Al_2$O$_3$ thick films on Al showed 9.5 and 0.005, respectively. To form microstrip lines on aerosol-deposited A1903 thick films, copper electroplating and lithography processes were employed, and the square-type cross section with sharp edges could be obtained. Low-pass LC filters with 10 GHz cutoff frequency were simulated by an electromagnetic analysis, exhibiting the validity of the AD process as a fabrication technology f3r integrated RF modules.

• Journal of the Korean Ceramic Society
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• v.36 no.9
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• pp.946-953
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• 1999

The etching characteristics of Er-doped sodium borosilicate glass film for the planar optical waveguides were investigated using reactive ion etching. The etch rate decreased as the pressure in creased but increased as the RF power increased. The etch rate increased as the flow rate C2F gas and the amount of O2 addition increased but decreased over critical point (C2F6 7,5 accm O2 20%) The etch rate was 180${\AA}$/min under C2F6 7.5 sccm O2 20% RF power 270 W, pressure 150 mTorr. With this optimum etching condition and subsequent heat treatment at 975$^{\circ}C$ for 30 minutes planar optical waveguides having improved sidewall roughness were fabricated successfully.

• Journal of the Korean Ceramic Society
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• v.45 no.7
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• pp.411-417
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• 2008

Aerosol Deposition Method (ADM) is a novel technique to grow ceramic thick films with high density and nano-crystal structure at room temperature. $^{1,2)}$ For these unique advantages of ADM, it would be applied to the fabrication process of 3-D integration ceramic modules effectively. However, it is critical to control the properties of starting powders, because a film formation through ADM is achieved by impaction and consolidation of starting powders on the substrates. We fabricated alumina thick films by ADM for the application to integral substrates for RF modules. When the as-received alumina powders were used as a starting material without any treatments, it was observed that the dielectric properties of as-deposited alumina films, such as relative permittivity and loss tangent, showed high dependency on the frequency. In this study, some techniques of powder pre-treatments to improve the dielectric properties of alumina thick films will be shown and the effects of starting powders on the properties of AD films will be discussed.

• Transactions on Electrical and Electronic Materials
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• v.14 no.4
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• pp.165-171
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• 2013

Nanostructured pure a-C and nitrogen doped a-C: N thin films with small particle size of, ~50 nm were obtained by Aerosol-assisted CVD method from the natural precursor camphor oil. Five samples were prepared for the a-C and a-C: N respectively, with the deposition temperatures ranging from $400^{\circ}C$ to $600^{\circ}C$. At high temperature, the AFM clarifies an even smoother image, due to the increase of the energetic carbon ion bombardment at the surface of the thin film. An ohmic contact was acquired from the current-voltage solar simulator characterization. The higher conductivity of a-C: N, of ${\sim}{\times}10^{-2}Scm^{-1}$ is due to the decrease in defects since the spin density gap decrease with the nitrogen addition. Pure a-C exhibit absorption coefficient, ${\alpha}$ of $10^4cm^{-1}$, whereas for a-C:N, ${\alpha}$ is of $10^5cm^{-1}$. The high ${\sigma}$ value of a-C:N is due to the presence of more graphitic component ($sp^2$ carbon bonding) in the carbon films.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.111-111
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• 2010

최근 전자 소자의 집적기술은 기존의 2차원에서 System on package (SOP) 개념에 기반을 둔 3차원 집적 기술로 발전 되어가고 있다. 소자의 3차원 실장을 실현시키는 과정에서 세라믹의 여러 유용성이 언급되어져 왔지만, 취성이 매우 크다는 등의 단점이 있었다. 이러한 이유로 연성을 가지는 폴리머와 세라믹을 합성한 복합체 기판에 대하여 많은 연구가 되고 있다. 그러나 세라믹 제작을 위해서는 높은 공정온도가 요구되고 있고 이러한 높은 공정상에서의 온도는 3차원 실장에 있어서 문제점이 되고 있다. 이러한 문제점을 극복하기 위하여 상온에서 치밀한 세라믹 후막을 제작할 수 있는 공정인 Aerosol Deposition Method (ADM)방법으로 세라믹-폴리머 후막의 제조를 시도하였다. 일반적으로 ADM은 수백 나노의 출발 파우더를 사용하여 치밀한 세라믹 막을 형성하는데 사용된다. 본 연구에서는 ADM으로 100 nm미만의 나노 세라믹 파우더를 사용하여 다공성의 세라믹 후막을 제조한 후 resin을 함침시키는 방법으로 세라믹-폴리머 후막의 제조를 시도하였다. 그 결과 운송가스, aerosol 농도 등의 공정조건을 변화시켜 다공성의 $Al_2O_3$ 후막을 제조하였고, 이 다공성 후막은 반투명의 특성을 보이며 고충전율로 형성되었다. 이렇게 제조된 나노 다공성 $Al_2O_3$ 후막에 cyanate ester resin을 함침시키는 방법을 사용하여 $Al_2O_3$-cyanate ester 복합체 후막을 제조하였으며, 이의 비유전율 및 품질계수는 각각 1 MHz에서 6.7, 1000으로 우수한 유전특성을 보임이 확인되었다.

• Transactions of the Korean hydrogen and new energy society
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• v.21 no.4
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• pp.271-277
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• 2010

$(Ba(Zr_{0.85}Y_{0.15})O_{3-\delta})$ oxide, showing high protonic conductivity at high temperatures and good chemical stability with $CO_2$ are referred to as hydrogen separation membrane. For high efficiency of hydrogen separation ($H_2$ flux and selectivity) and low fabrication cost, ultimate thin and dense BZY-Ni layer has to be coated on a porous substrate such as $ZrO_2$. Aerosol depostion (AD) process is a novel technique to grow ceramic film with high density and nano-crystal structure at room-temperature, and may be applicable to the fabrication process of AD integration ceramic layer effectively. XRD, SEM, X-ray mapping measurements were conducted in order to analyze the characteristics of BZY-Ni membrane fabricated by AD process. it is observed that it is homogeneous distribution for BZY-Ni. The result of $H_2$ permeation rate suggests that BZY-Ni composite is higher than BZY.

• Particle and aerosol research
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• v.5 no.2
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• pp.83-90
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• 2009

This paper describes a condensation-evaporation method (CEM) to produce size-controlled spherical silver nanoparticles by perturbing coagulation and coalescence processes in the gas phase. Polydisperse silver nanoparticles generated by the CEM were first introduced into a differential mobility analyzer (DMA) to select a group of silver nanoparticles with same electrical mobility, which also enables to make a group of nanoparticles with elongated structures and same projected area. These silver nanoparticles selected by the DMA were then in-situ sintered at ${\sim}600^{\circ}C$, and then they were observed to turn into spherical shaped nanoparticles by the rapid coalescence process. With the assistance of modified converging-typed quartz reactor, we can also produce the 10 times higher number concentration of silver nanoparticles compared with a general quartz reactor with uniform diameter. Finally, the spherical silver nanoparticles with 30 nm were electrostatically deposited on the surface of silicon substrate with the coverage rate of ~4%/hr. This useful preparation method of size-controlled monodisperse silver nanoparticles developed in this work can be applied to the various studies for characterizing the physical, chemical, optical, and biological properties of nanoparticles as a function of their size.

• International Journal of Precision Engineering and Manufacturing
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• v.9 no.1
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• pp.51-53
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• 2008

A new nano-particle deposition system (NPDS) was developed for a ceramic and metal coating process. Nano- and micro-sized powders were sprayed through a supersonic nozzle at room temperature and low vacuum conditions to create ceramic and metal thin films on metal and polymer substrates without thermal damage. Ceramic titanium dioxide ($TiO_2$) powder was deposited on polyethylene terephthalate substrates and metal tin (Sn) powder was deposited on SUS substrates. Deposition images were obtained and the resulting chemical composition was measured using X-ray photoelectron spectroscopy. The test results demonstrated that the new NPDS provides a noble coating method for ceramic and metal materials.