• 제목/요약/키워드: Additional substrate

검색결과 254건 처리시간 0.03초

Effects of Residual PMMA on Graphene Field-Effect Transistor

  • Jung, J.H.;Kim, D.J.;Sohn, I.Y.;Lee, N.E.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.561-561
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    • 2012
  • Graphene, two dimensional single layer of carbon atoms, has tremendous attention due to its superior property such as fast electron mobility, high thermal conductivity and optical transparency, and also found many applications such as field-effect transistors (FET), energy storage and conversion, optoelectronic device, electromechanical resonators and chemical sensors. Several techniques have been developed to form the graphene. Especially chemical vapor deposition (CVD) is a promising process for the large area graphene. For the electrically isolated devices, the graphene should be transfer to insulated substrate from Cu or Ni. However, transferred graphene has serious drawback due to remaining polymeric residue during transfer process which induces the poor device characteristics by impurity scattering and it interrupts the surface functionalization for the sensor application. In this study, we demonstrate the characteristics of solution-gated FET depending on the removal of polymeric residues. The solution-gated FET is operated by the modulation of the channel conductance by applying a gate potential from a reference electrode via the electrolyte, and it can be used as a chemical sensor. The removal process was achieved by several solvents during the transfer of CVD graphene from a copper foil to a substrate and additional annealing process with H2/Ar environments was carried out. We compare the properties of graphene by Raman spectroscopy, atomic force microscopy(AFM), and X-ray Photoelectron Spectroscopy (XPS) measurements. Effects of residual polymeric materials on the device performance of graphene FET will be discussed in detail.

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Wideband Low-Reflection Transmission Lines for Bare Chip on Multilayer PCB

  • Ramzan, Rashad;Fritzin, Jonas;Dabrowski, Jerzy;Svensson, Christer
    • ETRI Journal
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    • 제33권3호
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    • pp.335-343
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    • 2011
  • The pad pitch of modern radio frequency integrated circuits is in the order of few tens of micrometers. Connecting a large number of high-speed I/Os to the outside world with good signal fidelity at low cost is an extremely challenging task. To cope with this requirement, we need reflection-free transmission lines from an on-chip pad to on-board SMA connectors. Such a transmission line is very hard to design due to the difference in on-chip and on-board feature size and the requirement for extremely large bandwidth. In this paper, we propose the use of narrow tracks close to chip and wide tracks away from the chip. This narrow-to-wide transition in width results in impedance discontinuity. A step change in substrate thickness is utilized to cancel the effect of the width discontinuity, thus achieving a reflection-free microstrip. To verify the concept, several microstrips were designed on multilayer FR4 PCB without any additional manufacturing steps. The TDR measurements reveal that the impedance variation is less than 3 ${\Omega}$ for a 50 ${\Omega}$ microstrip and S11 better than -9 dB for the frequency range 1 GHz to 6 GHz when the width changes from 165 ${\mu}m$ to 940 ${\mu}m$, and substrate thickness changes from 100 ${\mu}m$ to 500 ${\mu}m$.

Novel deposition technology for nano-crystalline silicon thin film at low temperature by hyper-thermal neutral beam assisted CVD system

  • Jang, Jin-Nyoung;Song, Byoung-Chul;Oh, Kyoung-Suk;Yoo, Suk-Jae;Lee, Bon-Ju;Choi, Soung-Woong;Park, Young-Chun;Hong, Mun-Pyo
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.1025-1027
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    • 2009
  • Novel low temperature deposition process for nano-crystalline Si thin film is developed with the hyper-thermal neutral beam (HNB) technology. By our HNB assisted CVD system, the reactive particles can induce crystalline phase in Si thin films and effectively combine with heating effect on substrate. At low deposition temperature under $80^{\circ}C$, the HNB with proper incident energy controlled by the reflector bias can effectively enhance the nano-crystalline formation in Si thin film without any additional process. The electrical properties of Si thin films can be varied from a-Si to nc-Si according to change of HNB energy and substrate temperature. Characterization of these thin films with conductivity reveal that crystalline of Si thin film can increase by assist of HNB with appropriate energy during low temperature deposition. And low temperature prcoessed nc-Si TFT performance has on-off ratio as order 5.

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Electrical breakdown free SWCNT thin film transistors on flexible polyimide substrate

  • 박재현;하정숙
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.58-58
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    • 2010
  • Carbon nanotubes (CNTs) have been extensively studied owing to its superior electrical properties, especially high electron mobility, which can be applied to various nano-electronic devices. However, synthesized CNTs have a mixture of metallic and semiconducting tubes so that their separation has been a tremendous obstacle to the practical application in electronic device structures. Among the different separation methods, electrical breakdown process to selectively burn out the metallic tubes has been quite successful though it needs additional process in the fabrication of device structures. Here, we report on the selective but not perfect growth of semiconducting nanotubes via use of diluted ferritin catalyst. SWCNTs were grown on ferritin catalyst, where the concentration of the ferritin solution was changed. In this way, we could fabricate the electrical breakdown free SWCNT thin film transistors on the flexible polyimide (PI) substrate. When we used the ferritin diluted by 1/2000, ~ 60 % of the SWCNT thin film transistors showed a perfect p-type behavior with an on/off current ratio higher than $10^5$ and on-current greater than $10^{-7}$ A. We will also discuss the photo-response of such formed thin film transistors over both visible and UV light.

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알루미늄 양극산화 피막의 상전이에 미치는 수화처리의 영향 (Effects of Hydration Treatments on the Phase Transition of Anodic Aluminum Oxide Layers)

  • 주은균;김성수;오한준;조수행;지충수
    • 한국재료학회지
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    • 제12권7호
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    • pp.540-544
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    • 2002
  • Hydration treatments were performed on the pure aluminum substrate at $100^{\circ}C$ followed by anodizing and heat treatments on the layers. The transformation behaviors of the oxide layers according to the hydration treatment were studied using TEM, XRD, RBS etc. Above $90^{\circ}C$ the hydrous oxide film could be formed, which were turned out to be hydrous oxides(AlOOH $nH_2$O). The anodization on the hydrous oxide film was more effective for the transition of amorphous anodic oxides to the crystalline $\Upsilon-Al_2$ $O_3$ comparing with the case for anodizing on the aluminum substrate without hydration treatment And additional heat treatments were also helpful for the acceleration of the transformation of the hydrous oxide to $\Upsilon-Al_2$ $O_3$. During the heat treatment the interface between $\Upsilon-Al_2$ $O_3$and the hydrous oxide layers migrated to the outer side of hydrous layer.

이온빔 플라즈마 처리된 플라스틱 기판에 의한 OLED의 광추출 효율 향상 (Improvement of Out-coupling Efficiency of Organic Light Emitting Device by Ion-beam Plasma-treated Plastic Substrate)

  • 김현우;송태민;이형준;전용민;권정현
    • 반도체디스플레이기술학회지
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    • 제21권2호
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    • pp.7-10
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    • 2022
  • A functional polyethylene terephthalate substrate to increase light extraction efficiency of organic light-emitting diodes is studied. We formed nano-structured PET surfaces by controlling the power, gas, and exposure time of the linear ion-beam. The haze of the polyethylene terephthalate can be controlled from 0.2% to 76.0% by changing the peak-to-valley roughness of nano structure by adjusting the exposure cycle. The treated polyethylene terephthalate shows average haze of 76.0%, average total transmittance of 86.6%. The functional PET increases the current efficiency of organic light-emitting diodes by 47% compared to that of organic light-emitting diode on bare polyethylene terephthalate. In addition to polyethylene terephthalate with light extraction performance, by conducting additional research on the development of functional PET with anti-reflection and barrier performance, it will be possible to develop flexible substrates suitable for organic light-emitting diodes lighting and transparent flexible displays.

Raman scattering spectroscopy as a characterization method of coated conductors

  • Um, Y.M.;Jo, W.
    • 한국초전도ㆍ저온공학회논문지
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    • 제9권4호
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    • pp.24-27
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    • 2007
  • The purpose of this work is to develop, integrate, and implement an optical characterization method to evaluate physical properties in coated conductors and investigate the local distribution of the causes of degraded performance. The method that we selected at this moment is Raman scattering spectroscopy, which is accompanied with measurements of local supercurrent transport, phase composition, microstructure, and epitaxy quality for coated conductors that range in size up to multi-meter-length tapes and that embrace the entire tape embodiment (substrate through cap layer). The establishment of Raman spectroscopy as an on-line process monitoring tool is our eventual goal of research, but it requires very robust and cost-effective equipments. We analyzed $YBa_2Cu_3O_7(YBCO)$ thin films grown at various substrate temperatures by using Raman spectroscopy. YBCO films were grown by a high-rate electron-beam co-evaporation method. Raman spectra of YBCO films with lower-transport properties exhibit additional phonon modes at ${\sim}300cm^{-1}$, ${\sim}600cm^{-1}$ and ${\sim}630cm^{-1}$, which are related to second-phases such as $Ba_2Cu_3O_{5.9}$ and $BaCuO_2$. We propose a new method to characterize Raman spectra of coated conductors for an in-line quality control.

기상휘발법에 의한 이산화규소 나노와이어의 성장에 미치는 가스의 영향 (Effect of Ambient Gas to Growth of SiO2 Nanowires by Vapor Evaporation Method)

  • 노대호;김재수;변동진;이재훈;양재웅;김나리
    • 한국재료학회지
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    • 제15권5호
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    • pp.323-333
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    • 2005
  • Effects of gases to growth of $SiO_2$ nanowires were characterized. $N_2$, Ar, and $O_2$ gas's effect were determined. $SiO_2$ nanowires growth scheme was varied by kind and flow rates of gases because of amounts of $O_2$. Flow rates of gases and kind of substrates affected nanowires' diameters, lengths and morphologies of grown nano wires. With increasing flow rates of gases, nanowire's diameter increased because of additional VS and SLS reactions. By TEM characterization, We knows that, grown $SiO_2$ nanowires on Si substrate showed two shell structures. These shapes of nanowires were formed by reaction of additional SLS growth. Grown $SiO_2$ nanowires showed blue luminescence by PL characterization These Blue luminescence was due to quantum confinement effect and oxygen vacancies in the nanowires.

DC Magetron Suttering법으로 제작한 Ti$_{x}$N 박막의 밀착력에 미치는 첨가원소(C,H,O) (The Effects of Additional Gases(C,H,O) on Adhesive strength Ti$_{x}$N Films Prepared by the DC Magetron Suttering Method)

  • 김학동;조성식
    • 한국표면공학회지
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    • 제31권3호
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    • pp.142-150
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    • 1998
  • Stainless steel is being used widely for various purposes due to its good corrosion resistance. There has been much research to produce colored stainless steel by several methods such as anodizing and ion plating. In this experiment, we coated TiN(C,O,H)films SUS304 substraate with the DC magnetron spttering system made by Leybold Heraeus and studied the interlater structure and abhesive strength of the films as a function of additional gases, acetylene, hydrogen and oxygen. When the acetylene gas was added into the chamber, the specimen with the interlayer phase had good adhesion due to the toughness of the $\gamma'-Fe_4N$ plase induced from a solid solution of carbon atoms, while low adhesion appeared on the specimen of the non interlayer phase. The formation of the interlayer phase($\gamma'-Fe_4N$) was due to hydrogen embrittlement and internal stress induced by $\gamma'-Fe_4N$ formation in the interlayer. We could fine the interlayer phase ($\gamma'-Fe_4N$) at the interface between the film and the substrate of the TEM image when $\gamma'-Fe_4N$ was detected by the X-ray duffraction metheod.

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Gate/Body-Tied 구조의 고감도 광검출기를 이용한 2500 fps 고속 바이너리 CMOS 이미지센서 (2500 fps High-Speed Binary CMOS Image Sensor Using Gate/Body-Tied Type High-Sensitivity Photodetector)

  • 김상환;권현우;장준영;김영모;신장규
    • 센서학회지
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    • 제30권1호
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    • pp.61-65
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    • 2021
  • In this study, we propose a 2500 frame per second (fps) high-speed binary complementary metal oxide semiconductor (CMOS) image sensor using a gate/body-tied (GBT) p-channel metal oxide semiconductor field effect transistor-type high-speed photodetector. The GBT photodetector generates a photocurrent that is several hundred times larger than that of a conventional N+/P-substrate photodetector. By implementing an additional binary operation for the GBT photodetector with such high-sensitivity characteristics, a high-speed operation of approximately 2500 fps was confirmed through the output image. The circuit for binary operation was designed with a comparator and 1-bit memory. Therefore, the proposed binary CMOS image sensor does not require an additional analog-to-digital converter (ADC). The proposed 2500 fps high-speed operation binary CMOS image sensor was fabricated and measured using standard CMOS process.